CN103454769B - 光学系统、曝光装置以及制造器件的方法 - Google Patents
光学系统、曝光装置以及制造器件的方法 Download PDFInfo
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- CN103454769B CN103454769B CN201310208070.1A CN201310208070A CN103454769B CN 103454769 B CN103454769 B CN 103454769B CN 201310208070 A CN201310208070 A CN 201310208070A CN 103454769 B CN103454769 B CN 103454769B
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
- G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0836—Catadioptric systems using more than three curved mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-127531 | 2012-06-04 | ||
| JP2012127531A JP6041541B2 (ja) | 2012-06-04 | 2012-06-04 | 露光装置及びデバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103454769A CN103454769A (zh) | 2013-12-18 |
| CN103454769B true CN103454769B (zh) | 2016-05-04 |
Family
ID=49737318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310208070.1A Active CN103454769B (zh) | 2012-06-04 | 2013-05-30 | 光学系统、曝光装置以及制造器件的方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6041541B2 (enrdf_load_stackoverflow) |
| KR (1) | KR20130136390A (enrdf_load_stackoverflow) |
| CN (1) | CN103454769B (enrdf_load_stackoverflow) |
| TW (1) | TWI490540B (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6463087B2 (ja) * | 2014-11-14 | 2019-01-30 | キヤノン株式会社 | 露光装置、および物品の製造方法 |
| JP6386896B2 (ja) * | 2014-12-02 | 2018-09-05 | キヤノン株式会社 | 投影光学系、露光装置、および、デバイス製造方法 |
| JP6896404B2 (ja) * | 2016-11-30 | 2021-06-30 | キヤノン株式会社 | 露光装置及び物品の製造方法 |
| JP7358106B2 (ja) * | 2019-07-31 | 2023-10-10 | キヤノン株式会社 | 光学装置、投影光学系、露光装置及び物品の製造方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4690528A (en) * | 1983-10-05 | 1987-09-01 | Nippon Kogaku K. K. | Projection exposure apparatus |
| CN1618114A (zh) * | 2002-06-28 | 2005-05-18 | 佳能株式会社 | 反射镜设备、曝光设备以及器件制造方法 |
| CN1746775A (zh) * | 2004-08-13 | 2006-03-15 | Asml荷兰有限公司 | 光刻设备和器件制造方法 |
| TW200912562A (en) * | 2007-07-31 | 2009-03-16 | Canon Kk | Optical system, exposure device, and device manufacturing method |
| CN101625455A (zh) * | 2008-07-09 | 2010-01-13 | 佳能株式会社 | 投影光学系统、曝光装置以及器件制造方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61144020A (ja) * | 1984-12-18 | 1986-07-01 | Canon Inc | 露光装置 |
| JPH0845824A (ja) * | 1994-08-03 | 1996-02-16 | Toshiba Corp | 露光装置 |
| JP3521416B2 (ja) * | 1995-10-06 | 2004-04-19 | 株式会社ニコン | 投影露光装置 |
| JPH09180985A (ja) * | 1995-12-25 | 1997-07-11 | Nikon Corp | 投影露光装置 |
| JP2001290279A (ja) * | 2000-04-04 | 2001-10-19 | Canon Inc | 走査型露光装置 |
| AU2003242268A1 (en) * | 2002-06-11 | 2003-12-22 | Nikon Corporation | Exposure system and exposure method |
| US6809888B1 (en) * | 2003-04-16 | 2004-10-26 | Ultratech, Inc. | Apparatus and methods for thermal reduction of optical distortion |
| DE102004060184A1 (de) * | 2004-12-14 | 2006-07-06 | Carl Zeiss Smt Ag | EUV-Spiegelanordnung |
| DE102005017262B3 (de) * | 2005-04-12 | 2006-10-12 | Xtreme Technologies Gmbh | Kollektorspiegel für plasmabasierte kurzwellige Strahlungsquellen |
| US7959310B2 (en) * | 2006-09-13 | 2011-06-14 | Carl Zeiss Smt Gmbh | Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element |
| JP2008292761A (ja) * | 2007-05-24 | 2008-12-04 | Canon Inc | 露光装置及びデバイス製造方法 |
| JP2009162951A (ja) * | 2007-12-28 | 2009-07-23 | Canon Inc | 反射屈折型投影光学系及びそれを有する露光装置 |
| JP2009192569A (ja) * | 2008-02-12 | 2009-08-27 | Canon Inc | 露光装置およびデバイス製造方法 |
| EP2136250A1 (en) * | 2008-06-18 | 2009-12-23 | ASML Netherlands B.V. | Lithographic apparatus and method |
| JP5587578B2 (ja) * | 2008-09-26 | 2014-09-10 | ギガフォトン株式会社 | 極端紫外光源装置およびパルスレーザ装置 |
| JP2010128301A (ja) * | 2008-11-28 | 2010-06-10 | Canon Inc | 露光装置 |
| JP5495547B2 (ja) * | 2008-12-25 | 2014-05-21 | キヤノン株式会社 | 処理装置、およびデバイス製造方法 |
| JP2011039172A (ja) * | 2009-08-07 | 2011-02-24 | Canon Inc | 露光装置およびデバイス製造方法 |
| JP5595001B2 (ja) * | 2009-10-06 | 2014-09-24 | キヤノン株式会社 | 投影光学系、露光装置及びデバイス製造方法 |
| CN102243444B (zh) * | 2010-05-14 | 2013-04-10 | 北京京东方光电科技有限公司 | 一种曝光设备、掩膜板及曝光方法 |
-
2012
- 2012-06-04 JP JP2012127531A patent/JP6041541B2/ja active Active
-
2013
- 2013-05-07 TW TW102116193A patent/TWI490540B/zh active
- 2013-05-30 CN CN201310208070.1A patent/CN103454769B/zh active Active
- 2013-05-31 KR KR1020130062198A patent/KR20130136390A/ko not_active Ceased
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4690528A (en) * | 1983-10-05 | 1987-09-01 | Nippon Kogaku K. K. | Projection exposure apparatus |
| CN1618114A (zh) * | 2002-06-28 | 2005-05-18 | 佳能株式会社 | 反射镜设备、曝光设备以及器件制造方法 |
| CN1746775A (zh) * | 2004-08-13 | 2006-03-15 | Asml荷兰有限公司 | 光刻设备和器件制造方法 |
| TW200912562A (en) * | 2007-07-31 | 2009-03-16 | Canon Kk | Optical system, exposure device, and device manufacturing method |
| CN101625455A (zh) * | 2008-07-09 | 2010-01-13 | 佳能株式会社 | 投影光学系统、曝光装置以及器件制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201350902A (zh) | 2013-12-16 |
| JP2013250541A (ja) | 2013-12-12 |
| KR20130136390A (ko) | 2013-12-12 |
| JP6041541B2 (ja) | 2016-12-07 |
| CN103454769A (zh) | 2013-12-18 |
| TWI490540B (zh) | 2015-07-01 |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |