JP6027613B2 - 銅被膜形成剤及び銅被膜の形成方法 - Google Patents
銅被膜形成剤及び銅被膜の形成方法 Download PDFInfo
- Publication number
- JP6027613B2 JP6027613B2 JP2014524689A JP2014524689A JP6027613B2 JP 6027613 B2 JP6027613 B2 JP 6027613B2 JP 2014524689 A JP2014524689 A JP 2014524689A JP 2014524689 A JP2014524689 A JP 2014524689A JP 6027613 B2 JP6027613 B2 JP 6027613B2
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- Prior art keywords
- copper
- coating
- branched
- carbon atoms
- bonded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 0 Cc1c(*)[n](*)c(*)n1 Chemical compound Cc1c(*)[n](*)c(*)n1 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
- B05D1/005—Spin coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/30—Processes for applying liquids or other fluent materials performed by gravity only, i.e. flow coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/30—Processes for applying liquids or other fluent materials performed by gravity only, i.e. flow coating
- B05D1/305—Curtain coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
- B05D1/42—Distributing applied liquids or other fluent materials by members moving relatively to surface by non-rotary members
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
- C07F1/08—Copper compounds
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012154124 | 2012-07-09 | ||
| JP2012154124 | 2012-07-09 | ||
| PCT/JP2013/065108 WO2014010328A1 (ja) | 2012-07-09 | 2013-05-30 | 銅被膜形成剤及び銅被膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2014010328A1 JPWO2014010328A1 (ja) | 2016-06-20 |
| JP6027613B2 true JP6027613B2 (ja) | 2016-11-16 |
Family
ID=49915802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014524689A Active JP6027613B2 (ja) | 2012-07-09 | 2013-05-30 | 銅被膜形成剤及び銅被膜の形成方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US10405422B2 (h) |
| EP (1) | EP2871260B1 (h) |
| JP (1) | JP6027613B2 (h) |
| KR (1) | KR102086501B1 (h) |
| CN (1) | CN104471108B (h) |
| BR (1) | BR112015000524B1 (h) |
| IN (1) | IN2015DN00149A (h) |
| MY (1) | MY171068A (h) |
| TW (1) | TWI567231B (h) |
| WO (1) | WO2014010328A1 (h) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016079439A (ja) * | 2014-10-14 | 2016-05-16 | 四国化成工業株式会社 | 銅被膜形成剤およびその利用 |
| JP6775531B2 (ja) * | 2015-06-11 | 2020-10-28 | ナショナル リサーチ カウンシル オブ カナダ | 高導電性銅フィルムの調製 |
| TWI842668B (zh) | 2017-02-08 | 2024-05-21 | 加拿大國家研究委員會 | 具低黏度與低加工溫度之銀分子油墨 |
| TWI874294B (zh) | 2017-02-08 | 2025-03-01 | 加拿大國家研究委員會 | 可印刷分子油墨 |
| TW201842087A (zh) | 2017-02-08 | 2018-12-01 | 加拿大國家研究委員會 | 具改良之熱穩定性的分子油墨 |
| JP6573650B2 (ja) | 2017-09-15 | 2019-09-11 | 住友化学株式会社 | ガス分離方法 |
| JP6573942B2 (ja) * | 2017-09-15 | 2019-09-11 | 住友化学株式会社 | ガス分離方法 |
| KR102124324B1 (ko) * | 2018-11-14 | 2020-06-18 | 와이엠티 주식회사 | 도금 적층체 및 인쇄회로기판 |
| JP7427325B2 (ja) * | 2019-06-18 | 2024-02-05 | 株式会社ディスコ | テープ貼着方法 |
| CN118202008A (zh) * | 2021-11-11 | 2024-06-14 | 柯尼卡美能达株式会社 | 非感光性表面改性剂、层叠体、印刷电路板和电子器件 |
| WO2025177880A1 (ja) * | 2024-02-20 | 2025-08-28 | Jsr株式会社 | 貫通電極付ガラス基板の製造方法及び銅膜形成用組成物 |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5217335A (en) * | 1975-08-01 | 1977-02-09 | Hitachi Ltd | Chemical copper plating solution |
| US4818255A (en) * | 1987-02-10 | 1989-04-04 | Kozo Director-general of Agency of Industrial Science and Technology Iizuka | Material for gas separation |
| KR0137370B1 (ko) | 1988-11-07 | 1998-04-27 | 니시가와 레이치 | 구리 도금된 수지 제품의 제조방법 |
| JPH06181387A (ja) * | 1992-12-15 | 1994-06-28 | Mitsubishi Gas Chem Co Inc | 銅膜形成基材の製造法 |
| TW263534B (h) * | 1993-08-11 | 1995-11-21 | Makkusu Kk | |
| US20030148024A1 (en) * | 2001-10-05 | 2003-08-07 | Kodas Toivo T. | Low viscosity precursor compositons and methods for the depositon of conductive electronic features |
| KR100707818B1 (ko) * | 1998-09-14 | 2007-04-13 | 이비덴 가부시키가이샤 | 프린트 배선판 및 그 제조방법 |
| JP3986743B2 (ja) | 2000-10-03 | 2007-10-03 | 株式会社日立製作所 | 配線基板とその製造方法及びそれに用いる無電解銅めっき液 |
| JP4309602B2 (ja) * | 2001-04-25 | 2009-08-05 | メック株式会社 | 銅または銅合金と樹脂との接着性を向上させる方法、ならびに積層体 |
| US6951666B2 (en) | 2001-10-05 | 2005-10-04 | Cabot Corporation | Precursor compositions for the deposition of electrically conductive features |
| EP1461345B1 (en) * | 2001-12-12 | 2006-05-31 | E.I. Du Pont De Nemours And Company | Copper deposition using copper formate complexes |
| JP3939735B2 (ja) * | 2003-05-16 | 2007-07-04 | ハリマ化成株式会社 | 銅微粒子焼結体型の微細形状導電体の形成方法、該方法を応用した銅微細配線ならびに銅薄膜の形成方法 |
| DE10325243A1 (de) | 2003-06-03 | 2004-12-23 | Basf Ag | Abscheidung von Kupferschichten auf Substraten |
| JP4360981B2 (ja) | 2003-07-03 | 2009-11-11 | メック株式会社 | 銅薄膜の製造方法 |
| DE602004018068D1 (de) | 2003-07-03 | 2009-01-15 | Mec Co Ltd | Kupferverbindung und Verfahren zur Herstellung einer dünnen Kupferschicht damit |
| JP3952410B2 (ja) * | 2004-02-10 | 2007-08-01 | タムラ化研株式会社 | 金属の表面処理剤、プリント回路基板およびプリント回路基板の金属の表面処理方法 |
| TW200613586A (en) | 2004-07-22 | 2006-05-01 | Rohm & Haas Elect Mat | Leveler compounds |
| US7550179B2 (en) * | 2004-08-30 | 2009-06-23 | E.I Du Pont De Nemours And Company | Method of copper deposition from a supercritical fluid solution containing copper (I) complexes with monoanionic bidentate and neutral monodentate ligands |
| US20060096867A1 (en) * | 2004-11-10 | 2006-05-11 | George Bokisa | Tin alloy electroplating system |
| JP4489618B2 (ja) * | 2005-03-14 | 2010-06-23 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
| US7662981B2 (en) | 2005-07-16 | 2010-02-16 | Rohm And Haas Electronic Materials Llc | Leveler compounds |
| JP2008205430A (ja) * | 2007-01-26 | 2008-09-04 | Konica Minolta Holdings Inc | 金属パターン形成方法及び金属塩混合物 |
| KR20080083790A (ko) | 2007-03-13 | 2008-09-19 | 삼성전자주식회사 | 무전해 구리 도금액, 그의 제조방법 및 무전해 구리도금방법 |
| JP5167270B2 (ja) | 2007-11-19 | 2013-03-21 | 日本パーカライジング株式会社 | 金属材料用下地処理剤および金属材料の下地処理方法 |
| JP2009256218A (ja) | 2008-04-14 | 2009-11-05 | Toray Ind Inc | 銅前駆体組成物およびそれを用いた銅膜の製造方法。 |
| US8449948B2 (en) * | 2009-09-10 | 2013-05-28 | Western Digital (Fremont), Llc | Method and system for corrosion protection of layers in a structure of a magnetic recording transducer |
| US20110220512A1 (en) * | 2010-03-15 | 2011-09-15 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
| US8268157B2 (en) * | 2010-03-15 | 2012-09-18 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
| JP5620795B2 (ja) * | 2010-11-26 | 2014-11-05 | 株式会社Adeka | 銅膜形成用組成物及び該組成物を用いた銅膜の製造方法 |
| KR101194541B1 (ko) * | 2010-12-09 | 2012-10-26 | 삼성전기주식회사 | 주석 또는 주석 합금 도금의 변색 방지제, 및 이를 이용한 회로 기판 및 그 제조방법 |
| JP5615227B2 (ja) * | 2011-05-23 | 2014-10-29 | 四国化成工業株式会社 | 銅または銅合金の表面処理剤及びその利用 |
-
2013
- 2013-05-30 CN CN201380036469.4A patent/CN104471108B/zh active Active
- 2013-05-30 MY MYPI2015700064A patent/MY171068A/en unknown
- 2013-05-30 EP EP13816923.0A patent/EP2871260B1/en active Active
- 2013-05-30 US US14/413,532 patent/US10405422B2/en active Active
- 2013-05-30 BR BR112015000524-1A patent/BR112015000524B1/pt active IP Right Grant
- 2013-05-30 IN IN149DEN2015 patent/IN2015DN00149A/en unknown
- 2013-05-30 KR KR1020157000590A patent/KR102086501B1/ko active Active
- 2013-05-30 WO PCT/JP2013/065108 patent/WO2014010328A1/ja active Application Filing
- 2013-05-30 JP JP2014524689A patent/JP6027613B2/ja active Active
- 2013-05-31 TW TW102119536A patent/TWI567231B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2014010328A1 (ja) | 2014-01-16 |
| IN2015DN00149A (h) | 2015-06-12 |
| KR102086501B1 (ko) | 2020-03-09 |
| TW201406991A (zh) | 2014-02-16 |
| JPWO2014010328A1 (ja) | 2016-06-20 |
| US20150189748A1 (en) | 2015-07-02 |
| EP2871260B1 (en) | 2019-03-06 |
| CN104471108A (zh) | 2015-03-25 |
| TWI567231B (zh) | 2017-01-21 |
| EP2871260A4 (en) | 2016-07-06 |
| EP2871260A1 (en) | 2015-05-13 |
| KR20150034168A (ko) | 2015-04-02 |
| CN104471108B (zh) | 2020-05-05 |
| BR112015000524B1 (pt) | 2021-03-30 |
| BR112015000524A2 (pt) | 2019-12-31 |
| MY171068A (en) | 2019-09-24 |
| US10405422B2 (en) | 2019-09-03 |
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