JP5940809B2 - ナノ構造化物品及びナノ構造化物品の作製方法 - Google Patents

ナノ構造化物品及びナノ構造化物品の作製方法 Download PDF

Info

Publication number
JP5940809B2
JP5940809B2 JP2011544481A JP2011544481A JP5940809B2 JP 5940809 B2 JP5940809 B2 JP 5940809B2 JP 2011544481 A JP2011544481 A JP 2011544481A JP 2011544481 A JP2011544481 A JP 2011544481A JP 5940809 B2 JP5940809 B2 JP 5940809B2
Authority
JP
Japan
Prior art keywords
article
nanostructured
matrix
electrode
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011544481A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012514239A (ja
JP2012514239A5 (enExample
Inventor
エム．デイビッド モーゼス
エム．デイビッド モーゼス
ケー．ハートツェル アンドリュー
ケー．ハートツェル アンドリュー
ジェイ．へブリンク ティモシー
ジェイ．ヘブリンク ティモシー
ユ タ−ファ
ユ タ−ファ
チャン ジュン−イン
チャン ジュン−イン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2012514239A publication Critical patent/JP2012514239A/ja
Publication of JP2012514239A5 publication Critical patent/JP2012514239A5/ja
Application granted granted Critical
Publication of JP5940809B2 publication Critical patent/JP5940809B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B1/00—Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B1/005—Constitution or structural means for improving the physical properties of a device
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/008—Processes for improving the physical properties of a device
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/047—Optical MEMS not provided for in B81B2201/042 - B81B2201/045
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0361—Tips, pillars
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Laminated Bodies (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Electron Tubes For Measurement (AREA)
JP2011544481A 2008-12-30 2009-12-18 ナノ構造化物品及びナノ構造化物品の作製方法 Expired - Fee Related JP5940809B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14151708P 2008-12-30 2008-12-30
US61/141,517 2008-12-30
PCT/US2009/068657 WO2010123528A2 (en) 2008-12-30 2009-12-18 Nanostructured articles and methods of making nanostructured articles

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014247152A Division JP2015062077A (ja) 2008-12-30 2014-12-05 ナノ構造化物品及びナノ構造化物品の作製方法

Publications (3)

Publication Number Publication Date
JP2012514239A JP2012514239A (ja) 2012-06-21
JP2012514239A5 JP2012514239A5 (enExample) 2013-01-17
JP5940809B2 true JP5940809B2 (ja) 2016-06-29

Family

ID=43011660

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2011544481A Expired - Fee Related JP5940809B2 (ja) 2008-12-30 2009-12-18 ナノ構造化物品及びナノ構造化物品の作製方法
JP2014247152A Pending JP2015062077A (ja) 2008-12-30 2014-12-05 ナノ構造化物品及びナノ構造化物品の作製方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2014247152A Pending JP2015062077A (ja) 2008-12-30 2014-12-05 ナノ構造化物品及びナノ構造化物品の作製方法

Country Status (7)

Country Link
US (1) US9908772B2 (enExample)
EP (1) EP2379443B1 (enExample)
JP (2) JP5940809B2 (enExample)
KR (1) KR101719009B1 (enExample)
CN (2) CN102325719A (enExample)
BR (1) BRPI0923760A2 (enExample)
WO (1) WO2010123528A2 (enExample)

Families Citing this family (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG172204A1 (en) 2008-12-30 2011-07-28 3M Innovative Properties Co Antireflective articles and methods of making the same
KR101615787B1 (ko) * 2008-12-30 2016-04-26 쓰리엠 이노베이티브 프로퍼티즈 컴파니 나노구조화 표면의 제조 방법
US20100258111A1 (en) * 2009-04-07 2010-10-14 Lockheed Martin Corporation Solar receiver utilizing carbon nanotube infused coatings
US9111658B2 (en) 2009-04-24 2015-08-18 Applied Nanostructured Solutions, Llc CNS-shielded wires
WO2010144183A1 (en) 2009-04-24 2010-12-16 Lockheed Martin Corporation Cnt-based signature control material
BRPI1014711A2 (pt) 2009-04-27 2016-04-12 Applied Nanostrctured Solutions Llc aquecimento de resistência com base em cnt para descongelar estruturas de compósito
US8987632B2 (en) * 2009-10-09 2015-03-24 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Modification of surface energy via direct laser ablative surface patterning
US20110089958A1 (en) * 2009-10-19 2011-04-21 Applied Nanostructured Solutions, Llc Damage-sensing composite structures
US9167736B2 (en) 2010-01-15 2015-10-20 Applied Nanostructured Solutions, Llc CNT-infused fiber as a self shielding wire for enhanced power transmission line
CA2790205A1 (en) 2010-03-02 2011-09-09 Applied Nanostructured Solutions, Llc Spiral wound electrical devices containing carbon nanotube-infused electrode materials and methods and apparatuses for production thereof
CN102918612A (zh) 2010-03-02 2013-02-06 应用奈米结构公司 具注入碳纳米管纤维电装置及其制造方法
BR112012022082A2 (pt) * 2010-03-03 2016-06-14 3M Innovative Properties Co polarizador revestido com uma superfície nanoestruturada e método para fabricação do mesmo
EP2566681B1 (en) 2010-05-03 2018-09-26 3M Innovative Properties Company Method of making a nanostructure
US8780526B2 (en) 2010-06-15 2014-07-15 Applied Nanostructured Solutions, Llc Electrical devices containing carbon nanotube-infused fibers and methods for production thereof
US8449662B2 (en) * 2010-07-29 2013-05-28 Pioneer Astronuatics Dust repellent surface coating
JP2014508370A (ja) 2010-09-23 2014-04-03 アプライド ナノストラクチャード ソリューションズ リミテッド ライアビリティー カンパニー 強化送電線のセルフシールドワイヤとしてのｃｎｔ浸出繊維
KR20140015443A (ko) * 2011-03-09 2014-02-06 쓰리엠 이노베이티브 프로퍼티즈 컴파니 입자 크기가 큰 건식 실리카를 포함하는 반사 방지 필름
KR101846605B1 (ko) * 2011-03-14 2018-05-18 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다층 나노구조화된 물품
JP6110319B2 (ja) 2011-03-14 2017-04-05 スリーエム イノベイティブ プロパティズ カンパニー ナノ構造化物品
KR101918335B1 (ko) 2011-08-17 2018-11-13 쓰리엠 이노베이티브 프로퍼티즈 캄파니 나노구조화된 물품 및 이의 제조 방법
EP2764060A2 (en) * 2011-10-06 2014-08-13 Solvay SA Coating composition and antireflective coating prepared therefrom
CN102586769B (zh) * 2012-01-31 2015-08-05 马鞍山拓锐金属表面技术有限公司 一种无磷金属表面处理剂及其使用方法
BR112014018980A8 (pt) * 2012-02-01 2017-07-11 3M Innovative Properties Company Materiais nanoestruturados e métodos para a produção dos mesmos
US9085464B2 (en) 2012-03-07 2015-07-21 Applied Nanostructured Solutions, Llc Resistance measurement system and method of using the same
CN104335078B (zh) 2012-03-26 2017-08-08 3M创新有限公司 纳米结构化材料及其制造方法
KR20140147857A (ko) * 2012-03-26 2014-12-30 쓰리엠 이노베이티브 프로퍼티즈 캄파니 물품 및 그의 제조 방법
ZA201205278B (en) * 2012-04-13 2013-04-24 Applied Nanostructured Sols Cns-shielded wires
US11133118B2 (en) 2012-05-22 2021-09-28 University Of Massachusetts Patterned nanoparticle structures
KR101421026B1 (ko) * 2012-06-12 2014-07-22 코닝정밀소재 주식회사 유기발광소자용 광추출층 기판 및 그 제조방법
CN103576372A (zh) * 2012-07-23 2014-02-12 天津富纳源创科技有限公司 液晶面板
CN103576370A (zh) * 2012-07-23 2014-02-12 天津富纳源创科技有限公司 偏光片
US9989692B2 (en) 2012-10-08 2018-06-05 Corning Incorporated Methods and apparatus for providing improved display components
DE102012021494A1 (de) * 2012-11-02 2014-05-08 Volkswagen Aktiengesellschaft Schichtstruktur auf Silikonbasis mit oleophob-hydrophober Oberfläche sowie elektrische Maschine mit einer solchen
US9636521B2 (en) 2013-07-12 2017-05-02 Jonathan Isserow Heat and light treatment device using nanotechnology
US10010445B2 (en) 2013-01-23 2018-07-03 Jonathan Isserow Treatment device using nanotechnology
US10583037B2 (en) 2013-01-23 2020-03-10 Transqtronics, Llc. Heating device using exothermic chemical reaction
US9675817B2 (en) 2013-01-23 2017-06-13 Jonathan Isserow Heating device using exothermic chemical reaction
US20150202834A1 (en) * 2014-01-20 2015-07-23 3M Innovative Properties Company Lamination transfer films for forming antireflective structures
TW201539736A (zh) 2014-03-19 2015-10-16 3M Innovative Properties Co 用於藉白光成色之 oled 裝置的奈米結構
KR101688364B1 (ko) 2014-04-22 2016-12-20 샤프 가부시키가이샤 살균 작용을 구비한 표면을 갖는 합성 고분자막, 합성 고분자막을 갖는 적층체, 합성 고분자막의 표면을 사용한 살균 방법, 및 합성 고분자막의 표면의 재활성화 방법
CN106456817B (zh) 2014-04-28 2019-06-18 夏普株式会社 具有杀菌作用的过滤器和容器
JP5933151B1 (ja) * 2014-11-20 2016-06-08 シャープ株式会社 殺菌作用を備えた表面を有する合成高分子膜および合成高分子膜の表面を用いた殺菌方法
CN107105725B (zh) 2014-12-25 2021-08-10 夏普株式会社 保存食品的方法、食品用膜、食品用容器以及处理食品的方法
WO2016175170A1 (ja) * 2015-04-30 2016-11-03 シャープ株式会社 殺菌作用を備えた表面を有する合成高分子膜
US10907019B2 (en) * 2015-06-23 2021-02-02 Sharp Kabushiki Kaisha Synthetic polymer film provided with surface having sterilizing activity
US10375953B2 (en) 2015-07-17 2019-08-13 Sharp Kabushiki Kaisha Synthetic polymer film having surface that is provided with bactericidal action, and film comprising same
US10604443B2 (en) * 2015-08-27 2020-03-31 Surrey Nanosystems Limited Low reflectivity coating and method and system for coating a substrate
JP6605612B2 (ja) * 2015-09-17 2019-11-13 シャープ株式会社 殺菌作用を備えた表面を有する合成高分子膜、合成高分子膜の製造方法および合成高分子膜の表面を用いた殺菌方法
JP6784487B2 (ja) 2015-10-30 2020-11-11 デクセリアルズ株式会社 光学体、および表示装置
JP6608037B2 (ja) * 2016-02-15 2019-11-20 シャープ株式会社 光学部材、及び、アクリル系重合性組成物
WO2017179531A1 (ja) * 2016-04-15 2017-10-19 シャープ株式会社 殺菌作用を備えた表面を有する合成高分子膜
US11111395B2 (en) * 2016-12-22 2021-09-07 3M Innovative Properties Company Surface structured articles and methods of making the same
US10584418B1 (en) 2017-02-23 2020-03-10 Northrop Grumman Systems Corporation Plasma treatment of carbon nanotube sheet materials to reduce optical reflectance
WO2018237236A1 (en) * 2017-06-23 2018-12-27 Austin Smith Homogeneous anaerobically stable quantum dot concentrates
US10968292B2 (en) 2017-09-26 2021-04-06 Sharp Kabushiki Kaisha Synthetic polymer film whose surface has microbicidal activity, photocurable resin composition, manufacturing method of synthetic polymer film, and sterilization method with use of surface of synthetic polymer film
US12038592B2 (en) 2018-01-05 2024-07-16 3M Innovative Properties Company Stray light absorbing film
US10830787B2 (en) * 2018-02-20 2020-11-10 General Electric Company Optical accelerometers for use in navigation grade environments
JP6751731B2 (ja) 2018-02-21 2020-09-09 シャープ株式会社 合成高分子膜および合成高分子膜の製造方法
JP6761437B2 (ja) 2018-03-15 2020-09-23 シャープ株式会社 殺菌作用を備えた表面を有する合成高分子膜、合成高分子膜を有するプラスチック製品、合成高分子膜の表面を用いた殺菌方法、光硬化性樹脂組成物、および合成高分子膜の製造方法
US11112542B2 (en) 2018-11-30 2021-09-07 Largan Precision Co., Ltd. Miniature optical lens assembly having optical element, imaging apparatus and electronic device
CN109765235A (zh) * 2019-03-08 2019-05-17 深圳大学 一种二维纳米材料各向异性的快速检测方法
WO2022090901A1 (en) 2020-10-30 2022-05-05 3M Innovative Properties Company Ultraviolet c (uv-c) light reflector including fluoropolymer films
US12235411B2 (en) * 2020-12-18 2025-02-25 Orlaco Products, B.V. Mirror replacement system
EP4271996B1 (en) 2020-12-31 2025-12-24 3M Innovative Properties Company Nanopatterned films with patterned surface chemistry
CN117363203B (zh) * 2023-11-08 2024-12-03 宁波激智科技股份有限公司 一种go-poss改性耐磨抗静电背涂涂层组合物及一种增亮膜

Family Cites Families (82)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2064987B (en) 1979-11-14 1983-11-30 Toray Industries Process for producing transparent shaped article having enhanced anti-reflective effect
JPS62274080A (ja) 1986-05-21 1987-11-28 Hitachi Ltd プラズマ処理方法
US5104929A (en) 1988-04-11 1992-04-14 Minnesota Mining And Manufacturing Company Abrasion resistant coatings comprising silicon dioxide dispersions
US5304279A (en) 1990-08-10 1994-04-19 International Business Machines Corporation Radio frequency induction/multipole plasma processing tool
JP3360898B2 (ja) 1993-10-05 2003-01-07 日東電工株式会社 反射防止部材の製造方法及び偏光板
US5909314A (en) * 1994-02-15 1999-06-01 Dai Nippon Printing Co., Ltd. Optical functional materials and process for producing the same
US5948166A (en) 1996-11-05 1999-09-07 3M Innovative Properties Company Process and apparatus for depositing a carbon-rich coating on a moving substrate
US5888594A (en) 1996-11-05 1999-03-30 Minnesota Mining And Manufacturing Company Process for depositing a carbon-rich coating on a moving substrate
DE19708776C1 (de) 1997-03-04 1998-06-18 Fraunhofer Ges Forschung Entspiegelungsschicht sowie Verfahren zur Herstellung derselben
JPH10301105A (ja) 1997-05-01 1998-11-13 Bridgestone Corp 液晶表示装置用偏光板及び液晶表示装置
AU2314899A (en) 1998-01-13 1999-08-02 Minnesota Mining And Manufacturing Company Modified copolyesters and improved multilayer reflective films
JP3940546B2 (ja) 1999-06-07 2007-07-04 株式会社東芝 パターン形成方法およびパターン形成材料
US6890448B2 (en) * 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
US6372829B1 (en) 1999-10-06 2002-04-16 3M Innovative Properties Company Antistatic composition
US6376590B2 (en) 1999-10-28 2002-04-23 3M Innovative Properties Company Zirconia sol, process of making and composite material
JP4759780B2 (ja) 1999-12-07 2011-08-31 凸版印刷株式会社 低屈折率組成物、低屈折率膜、光学多層膜および反射防止膜
US6811867B1 (en) 2000-02-10 2004-11-02 3M Innovative Properties Company Color stable pigmented polymeric films
US6483635B1 (en) * 2000-06-07 2002-11-19 Cirrex Corp. Apparatus for light amplification
JP2002122702A (ja) 2000-10-17 2002-04-26 Matsushita Electric Ind Co Ltd 光学フィルム、及び表示素子
JP2002196117A (ja) 2000-12-25 2002-07-10 Nitto Denko Corp 光拡散層、光拡散性シート及び光学素子
JP3921952B2 (ja) 2001-02-28 2007-05-30 凸版印刷株式会社 撮像素子及びその製造方法
JP2002286906A (ja) * 2001-03-23 2002-10-03 Mitsubishi Chemicals Corp 反射防止方法及び反射防止構造並びに反射防止構造を有する反射防止構造体及びその製造方法
CA2436008A1 (en) 2001-04-10 2002-10-24 Toray Fine Chemicals Co., Ltd. Curable coating composition
DE60202617T2 (de) 2001-08-02 2006-03-23 3M Innovative Properties Co., St. Paul Optisch klare und antistatische haftklebemittel
KR100724135B1 (ko) * 2001-10-05 2007-06-04 신에쓰 가가꾸 고교 가부시끼가이샤 퍼플루오로폴리에테르-변성 실란, 표면처리제, 및반사방지 필터
JP2003129008A (ja) 2001-10-24 2003-05-08 Nitto Denko Corp 放射線硬化型保護シート
JP2003279705A (ja) 2002-03-25 2003-10-02 Sanyo Electric Co Ltd 反射防止部材
EP1537445B1 (en) 2002-09-05 2012-08-01 Nanosys, Inc. Nanocomposites
DE10241708B4 (de) 2002-09-09 2005-09-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Reduzierung der Grenzflächenreflexion von Kunststoffsubstraten sowie derart modifiziertes Substrat und dessen Verwendung
TW557363B (en) 2002-10-15 2003-10-11 Optimax Tech Corp Anti-glare film
US20040125266A1 (en) * 2002-10-30 2004-07-01 Akihiro Miyauchi Functioning substrate with a group of columnar micro pillars and its manufacturing method
JP4897192B2 (ja) * 2002-10-30 2012-03-14 株式会社日立製作所 柱状微小突起群を備えた機能性基板とその製造方法
WO2004066946A2 (en) 2003-01-28 2004-08-12 Georgetown University Method for evaluating the efficacy of certain cancer treatments
DK1479734T3 (da) * 2003-05-20 2009-05-11 Dsm Ip Assets Bv Nanostruktureret overflade-coatingsproces, nanostrukturerede coatinger og artikler omfattende coatingen
JP4475016B2 (ja) 2003-06-30 2010-06-09 東レ株式会社 ハードコートフィルム、反射防止フィルムおよび画像表示装置
JP4505670B2 (ja) * 2003-08-29 2010-07-21 株式会社ニコン 透過型光学素子の製造方法
US7074463B2 (en) 2003-09-12 2006-07-11 3M Innovative Properties Company Durable optical element
US7030008B2 (en) * 2003-09-12 2006-04-18 International Business Machines Corporation Techniques for patterning features in semiconductor devices
KR100577693B1 (ko) 2004-05-20 2006-05-10 광주과학기술원 콜로이드 다중 입자층 구조를 이용한 반사 방지막과 이의제조방법
US7850319B2 (en) 2004-05-27 2010-12-14 Panasonic Corporation Light-absorbing member
US8574789B2 (en) * 2004-07-08 2013-11-05 Toyota Motor Engineering & Manufacturing North America, Inc. Dendritic metal nanostructures for fuel cells and other applications
US7378136B2 (en) 2004-07-09 2008-05-27 3M Innovative Properties Company Optical film coating
US20060019102A1 (en) 2004-07-26 2006-01-26 Kuppsuamy Kanakarajan Flame-retardant halogen-free polyimide films useful as thermal insulation in aircraft applications and methods relating thereto
US7170666B2 (en) 2004-07-27 2007-01-30 Hewlett-Packard Development Company, L.P. Nanostructure antireflection surfaces
US20060134400A1 (en) 2004-12-17 2006-06-22 Nitto Denko Corporation Hard-coated film and method of manufacturing the same
US7264872B2 (en) 2004-12-30 2007-09-04 3M Innovative Properties Company Durable high index nanocomposites for AR coatings
US7241437B2 (en) 2004-12-30 2007-07-10 3M Innovative Properties Company Zirconia particles
JP4855781B2 (ja) 2005-02-01 2012-01-18 日東電工株式会社 反射防止ハードコートフィルム、光学素子および画像表示装置
US20070031639A1 (en) * 2005-08-03 2007-02-08 General Electric Company Articles having low wettability and methods for making
US20070047087A1 (en) 2005-08-25 2007-03-01 Fuji Photo Film Co., Ltd. Optical film, polarizing plate and image display device
US20070065638A1 (en) 2005-09-20 2007-03-22 Eastman Kodak Company Nano-structured thin film with reduced light reflection
WO2007037276A1 (ja) 2005-09-29 2007-04-05 Dai Nippon Printing Co., Ltd. 反射防止膜
US20070104922A1 (en) * 2005-11-08 2007-05-10 Lei Zhai Superhydrophilic coatings
US20070118939A1 (en) 2005-11-10 2007-05-24 C.R.F. Societa Consortile Per Azioni Anti-reflection nano-metric structure based on porous alumina and method for production thereof
JP2007193323A (ja) * 2005-12-22 2007-08-02 Fujifilm Corp 反射防止フィルム、及びそれを用いたプラズマディスプレイパネル用前面板、プラズマディスプレイパネル表示装置、画像表示装置
TW200732691A (en) * 2005-12-22 2007-09-01 Fujifilm Corp Antireflection film, front plate for plasma display panel using the same, plasma display panel-display device, and image display device
US7848021B2 (en) 2006-02-17 2010-12-07 Fujifilm Corporation Optical film, antireflection film, polarizing plate and image display device
JP5252811B2 (ja) 2006-05-16 2013-07-31 日東電工株式会社 防眩性ハードコートフィルム、偏光板および画像表示装置
CN101479777B (zh) 2006-05-31 2011-07-06 株式会社半导体能源研究所 显示设备和电子装置
EP1862827B2 (en) * 2006-05-31 2012-05-30 CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement Nano-structured Zero-order diffractive filter
JP4466959B2 (ja) * 2006-06-22 2010-05-26 日本製粉株式会社 卵とじ類の製造方法
JP5359270B2 (ja) 2006-06-30 2013-12-04 王子ホールディングス株式会社 単粒子膜エッチングマスクを用いた微細構造体の製造方法およびナノインプリント用または射出成型用モールドの製造方法
US7842352B2 (en) * 2006-08-09 2010-11-30 Massachusetts Institute Of Technology Nanoparticle coatings and methods of making
US20080135089A1 (en) * 2006-11-15 2008-06-12 General Electric Company Graded hybrid amorphous silicon nanowire solar cells
JP4986138B2 (ja) * 2006-11-15 2012-07-25 独立行政法人産業技術総合研究所 反射防止構造を有する光学素子用成形型の製造方法
DE102006056578A1 (de) * 2006-11-30 2008-06-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung einer Nanostruktur an einer Kunststoffoberfläche
JP5098662B2 (ja) 2007-01-22 2012-12-12 大日本印刷株式会社 光学積層体、偏光板及び画像表示装置
JP4155337B1 (ja) 2007-02-21 2008-09-24 ソニー株式会社 防眩性フィルムおよびその製造方法、ならびに表示装置
FR2913231B1 (fr) * 2007-03-02 2009-07-10 Essilor Int Article ayant une surface nanotexturee a proprietes superhydrophobes.
CN101657522B (zh) 2007-04-13 2014-05-07 3M创新有限公司 防静电光学透明的压敏粘合剂
US7604381B2 (en) 2007-04-16 2009-10-20 3M Innovative Properties Company Optical article and method of making
US20090087629A1 (en) 2007-09-28 2009-04-02 Everaerts Albert I Indium-tin-oxide compatible optically clear adhesive
JP4945460B2 (ja) 2008-01-04 2012-06-06 株式会社東芝 反射防止構造の形成方法および反射防止構造
JP2011509338A (ja) 2008-01-11 2011-03-24 スリーエム イノベイティブ プロパティズ カンパニー 延伸剥離性の光学的に透明な感圧性接着剤
DE102008018866A1 (de) 2008-04-15 2009-10-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Reflexionsminderndes Interferenzschichtsystem und Verfahren zu dessen Herstellung
US20090305012A1 (en) * 2008-06-07 2009-12-10 Kevin Song Functional Optical Films with Nanostructures
US20090316060A1 (en) 2008-06-18 2009-12-24 3M Innovative Properties Company Conducting film or electrode with improved optical and electrical performance
JP5210748B2 (ja) 2008-07-28 2013-06-12 富士フイルム株式会社 防眩性反射防止フィルムの製造方法
US20100028564A1 (en) 2008-07-29 2010-02-04 Ming Cheng Antistatic optical constructions having optically-transmissive adhesives
US20100221513A1 (en) * 2008-09-05 2010-09-02 Wisconsin Alumni Research Foundation Self sintering transparent nanoporous thin-films for use in self-cleaning, anti-fogging, anti-corrosion, anti-erosion electronic and optical applications
SG172204A1 (en) 2008-12-30 2011-07-28 3M Innovative Properties Co Antireflective articles and methods of making the same
KR101615787B1 (ko) 2008-12-30 2016-04-26 쓰리엠 이노베이티브 프로퍼티즈 컴파니 나노구조화 표면의 제조 방법

Also Published As

Publication number Publication date
KR20110099768A (ko) 2011-09-08
US9908772B2 (en) 2018-03-06
US20110281068A1 (en) 2011-11-17
BRPI0923760A2 (pt) 2016-01-26
CN102325719A (zh) 2012-01-18
EP2379443A2 (en) 2011-10-26
WO2010123528A3 (en) 2011-01-06
WO2010123528A2 (en) 2010-10-28
KR101719009B1 (ko) 2017-03-22
EP2379443B1 (en) 2018-07-11
JP2015062077A (ja) 2015-04-02
JP2012514239A (ja) 2012-06-21
CN106185793A (zh) 2016-12-07
EP2379443A4 (en) 2012-09-19

Similar Documents

Publication Publication Date Title
JP5940809B2 (ja) ナノ構造化物品及びナノ構造化物品の作製方法
JP6174300B2 (ja) 反射防止物品及びこれを作製する方法
JP5788807B2 (ja) ナノ構造化表面を製造する方法
JP6110319B2 (ja) ナノ構造化物品
JP6014057B2 (ja) 多層のナノ構造化物品
JP2013521534A (ja) ナノ構造化表面を有するコーティングされた偏光子、及びこれを作製する方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20121122

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20121122

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130729

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130813

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20131113

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20131120

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131205

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20140805

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141205

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20150119

A912 Re-examination (zenchi) completed and case transferred to appeal board

Free format text: JAPANESE INTERMEDIATE CODE: A912

Effective date: 20150327

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160229

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160519

R150 Certificate of patent or registration of utility model

Ref document number: 5940809

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees