JP5840454B2 - 還元型無電解銀めっき液及び還元型無電解銀めっき方法 - Google Patents
還元型無電解銀めっき液及び還元型無電解銀めっき方法 Download PDFInfo
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- JP5840454B2 JP5840454B2 JP2011235559A JP2011235559A JP5840454B2 JP 5840454 B2 JP5840454 B2 JP 5840454B2 JP 2011235559 A JP2011235559 A JP 2011235559A JP 2011235559 A JP2011235559 A JP 2011235559A JP 5840454 B2 JP5840454 B2 JP 5840454B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
- C23C18/1879—Use of metal, e.g. activation, sensitisation with noble metals
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
Description
下記に示す、それぞれの還元型無電解銀めっき液を調製した。
硝酸銀を銀濃度として9.0×10−3mol/L(1.0g/L)、還元剤としてヒドロキシルアンモニウム塩(硫酸ヒドロキシルアンモニウム)1.24×10−3mol/L、錯化剤としてEDTA0.15mol/L(50g/L)を含有し、さらにシアン化カリウム1mg/Lを添加してめっき液中のシアン化物イオン濃度を0.006×10−3mol/Lとした水溶液を、苛性ソーダを用いてpH9.0として還元型無電解銀めっき液とした。
シアン化カリウム300mg/Lを添加してめっき液中のシアン化物イオン濃度を1.8×10−3mol/Lとしたこと以外は、実施例1と同様にして還元型無電解銀めっき液を調製した。
シアン化カリウム500mg/Lを添加してめっき液中のシアン化物イオン濃度を3.0×10−3mol/Lとしたこと以外は、実施例1と同様にして還元型無電解銀めっき液を調製した。
シアン化カリウム1000mg/Lを添加してめっき液中のシアン化物イオン濃度を6.5×10−3mol/Lとしたこと以外は、実施例1と同様にして還元型無電解銀めっき液を調製した。
シアン化カリウム2000mg/Lを添加してめっき液中のシアン化物イオン濃度を12.5×10−3mol/Lとしたこと以外は、実施例1と同様にして還元型無電解銀めっき液を調製した。
硝酸銀に代えてシアン化銀カリウムを銀濃度として9.0×10−3mol/L(1.0g/L)添加し、さらにシアン化カリウム300mg/Lを添加して、めっき液中の合計シアン化物イオン濃度を19.8×10−3mol/Lとしたこと以外は、実施例1と同様にして還元型無電解銀めっき液を調製した。
硝酸銀に代えてシアン化銀カリウムを銀濃度として9.0×10−3mol/L(1.0g/L)添加し、シアン化カリウムを添加せず、めっき液中のシアン化物イオン濃度を18.0×10−3mol/Lとしたこと以外は、実施例1と同様にして還元型無電解銀めっき液を調製した。
シアン化カリウムを添加しなかったこと以外は、実施例1と同様にして還元型無電解銀めっき液を調製した。すなわち、シアンフリーの還元型無電解銀めっき液を調製した。
シアン化カリウムを2100mg/Lを添加してめっき液中のシアン化物イオン濃度を13.0×10−3mol/Lとしたこと以外は、実施例1と同様にして還元型無電解銀めっき液を調製した。
次に、上記実施例1〜5のように、シアン化物イオン濃度を0.006×10−3mol/L〜12.5×10−3mol/Lの範囲にコントロールした還元型無電解銀めっき液において、好ましい還元剤について検討した。なお、実験は、上記実施例2の組成を基本組成として行った。
還元剤としてヒドラジン(硫酸ヒドラジン)1.24×10−3mol/Lを添加したこと以外は、実施例2と同様にしてシアン化物イオン濃度が0.006×10−3mol/Lである還元型無電解銀めっき液を調製した。
還元剤としてホルムアルデヒド1.24×10−3mol/Lを添加したこと以外は、実施例2と同様にしてシアン化物イオン濃度が0.006×10−3mol/Lである還元型無電解銀めっき液を調製した。
Claims (4)
- 水溶性銀塩と、還元剤とを含有する還元型無電解銀めっき液であって、
0.006×10−3mol/L〜12.5×10−3mol/Lのシアン化物イオンを含有し、上記還元剤は、硫酸ヒドロキシルアンモニウム、酢酸ヒドロキシルアンモニウムから選択される1種以上である還元型無電解銀めっき液。 - 上記水溶性銀塩はシアン化合物以外の銀塩であり、上記シアン化物イオンはアルカリ金属シアン化物として含有される請求項1記載の還元型無電解銀めっき液。
- pHが8〜11である請求項1又は2記載の還元型無電解銀めっき液。
- 上記請求項1乃至3の何れか1項記載の還元型無電解銀めっき液を用い、被めっき物に対して無電解銀めっきを施す還元型無電解銀めっき方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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JP2011235559A JP5840454B2 (ja) | 2011-10-27 | 2011-10-27 | 還元型無電解銀めっき液及び還元型無電解銀めっき方法 |
EP12843616.9A EP2772566B1 (en) | 2011-10-27 | 2012-10-09 | Plating bath for the electroless deposition of silver and corresponding method |
US14/352,145 US20140242288A1 (en) | 2011-10-27 | 2012-10-09 | Reducing electroless silver plating solution and reducing electroless silver plating method |
PCT/JP2012/076141 WO2013061773A1 (ja) | 2011-10-27 | 2012-10-09 | 還元型無電解銀めっき液及び還元型無電解銀めっき方法 |
TW101138421A TWI572742B (zh) | 2011-10-27 | 2012-10-18 | Reduction Electroless Silver Plating Solution and Reduced Electroless Silver Plating Method |
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JP2011235559A JP5840454B2 (ja) | 2011-10-27 | 2011-10-27 | 還元型無電解銀めっき液及び還元型無電解銀めっき方法 |
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JP2013091833A JP2013091833A (ja) | 2013-05-16 |
JP5840454B2 true JP5840454B2 (ja) | 2016-01-06 |
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US (1) | US20140242288A1 (ja) |
EP (1) | EP2772566B1 (ja) |
JP (1) | JP5840454B2 (ja) |
TW (1) | TWI572742B (ja) |
WO (1) | WO2013061773A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
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CH710579A1 (fr) * | 2014-12-23 | 2016-06-30 | Metalor Tech Int Sa | Procédé de placage autocatalytique d'un métal précieux. |
US20170051411A1 (en) * | 2015-08-20 | 2017-02-23 | Macdermid Acumen, Inc. | Electroless Silver Plating Bath and Method of Using the Same |
JP6650136B2 (ja) * | 2015-09-02 | 2020-02-19 | 学校法人神奈川大学 | フレキシブル熱電変換部材の作製方法 |
JP6645881B2 (ja) * | 2016-03-18 | 2020-02-14 | 上村工業株式会社 | 銅めっき液及び銅めっき方法 |
KR102077426B1 (ko) * | 2019-07-01 | 2020-04-08 | 최철수 | 박형 전도성 부직포 제조방법 및 이에 의해 제조된 박형 전도성 부직포 |
CN112159975A (zh) * | 2020-10-12 | 2021-01-01 | 福建新大陆环保科技有限公司 | 在细长玻璃管内镀金属银制备高压电极的方法 |
CN114808052B (zh) * | 2022-04-02 | 2024-03-15 | 中国机械总院集团武汉材料保护研究所有限公司 | 一种氰化物镀银溶液的无氰化转化方法 |
CN114959666A (zh) * | 2022-05-12 | 2022-08-30 | 李正新 | 化学镀银液以及化学镀银新方法 |
CN114932218B (zh) * | 2022-05-30 | 2023-08-04 | 暨南大学 | 一种通过化学镀银来降低3d打印锌粉蒸发形成锌银合金的方法 |
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JPS5020012B1 (ja) * | 1964-06-24 | 1975-07-11 | ||
US4113658A (en) * | 1967-04-14 | 1978-09-12 | Stamicarbon, N.V. | Process for homogeneous deposition precipitation of metal compounds on support or carrier materials |
CA945305A (en) * | 1970-04-20 | 1974-04-16 | Frederick W. Schneble (Jr.) | Electroless silver plating |
JPS52111835A (en) * | 1976-03-18 | 1977-09-19 | Tokyo Shibaura Electric Co | Method of stabilizing nonnelectrolytic plating solution |
DE3419755A1 (de) * | 1984-05-26 | 1985-11-28 | Bayer Ag, 5090 Leverkusen | Chemisches versilberungsbad |
US4746541A (en) * | 1985-12-16 | 1988-05-24 | Hoechst Celanese Corporation | Electrically conductive thermally stabilized acrylic fibrous material and process for preparing same |
NO304746B1 (no) * | 1989-05-04 | 1999-02-08 | Ad Tech Holdings Ltd | Gjenstand som motstÕr mikrobiologisk vekst bestÕende av et ikke-ledende subtrat som er belagt med et trat som er belagt medfremgangsmate for a avsette |
DE4210513A1 (de) * | 1992-03-31 | 1993-10-07 | Henkel Kgaa | Nickel-freie Phosphatierverfahren |
JP3074415B2 (ja) | 1992-04-02 | 2000-08-07 | 昭和電工株式会社 | 銀メッキ銅粉の製造方法 |
JP3937373B2 (ja) | 1998-06-25 | 2007-06-27 | 奥野製薬工業株式会社 | 自己触媒型無電解銀めっき液 |
JP2000309875A (ja) | 1999-04-23 | 2000-11-07 | Okuno Chem Ind Co Ltd | 置換型無電解銀めっき液 |
JP2002180259A (ja) | 2000-12-12 | 2002-06-26 | Shipley Co Llc | めっき液における金属析出促進化合物および該化合物を含むめっき液 |
JP4171604B2 (ja) | 2002-03-18 | 2008-10-22 | 株式会社大和化成研究所 | 無電解めっき浴及び該めっき浴を用いて得られた金属被覆物 |
JP2008085305A (ja) * | 2006-08-31 | 2008-04-10 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
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2011
- 2011-10-27 JP JP2011235559A patent/JP5840454B2/ja active Active
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2012
- 2012-10-09 WO PCT/JP2012/076141 patent/WO2013061773A1/ja active Application Filing
- 2012-10-09 US US14/352,145 patent/US20140242288A1/en not_active Abandoned
- 2012-10-09 EP EP12843616.9A patent/EP2772566B1/en active Active
- 2012-10-18 TW TW101138421A patent/TWI572742B/zh active
Also Published As
Publication number | Publication date |
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JP2013091833A (ja) | 2013-05-16 |
TWI572742B (zh) | 2017-03-01 |
EP2772566A1 (en) | 2014-09-03 |
US20140242288A1 (en) | 2014-08-28 |
EP2772566B1 (en) | 2019-03-06 |
TW201331413A (zh) | 2013-08-01 |
WO2013061773A1 (ja) | 2013-05-02 |
EP2772566A4 (en) | 2015-07-01 |
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