JP5837869B2 - 原料気化供給装置 - Google Patents

原料気化供給装置 Download PDF

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Publication number
JP5837869B2
JP5837869B2 JP2012267021A JP2012267021A JP5837869B2 JP 5837869 B2 JP5837869 B2 JP 5837869B2 JP 2012267021 A JP2012267021 A JP 2012267021A JP 2012267021 A JP2012267021 A JP 2012267021A JP 5837869 B2 JP5837869 B2 JP 5837869B2
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JP
Japan
Prior art keywords
raw material
control device
gas
flow rate
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012267021A
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English (en)
Japanese (ja)
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JP2014114463A (ja
JP2014114463A5 (enExample
Inventor
敦志 日高
敦志 日高
正明 永瀬
正明 永瀬
哲 山下
哲 山下
西野　功二
功二 西野
池田　信一
信一 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikin Inc
Original Assignee
Fujikin Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2012267021A priority Critical patent/JP5837869B2/ja
Application filed by Fujikin Inc filed Critical Fujikin Inc
Priority to PCT/JP2013/006812 priority patent/WO2014087592A1/ja
Priority to US14/650,496 priority patent/US9994955B2/en
Priority to CN201380057690.8A priority patent/CN104822858B/zh
Priority to KR1020157003850A priority patent/KR101613141B1/ko
Priority to TW102143011A priority patent/TWI503443B/zh
Publication of JP2014114463A publication Critical patent/JP2014114463A/ja
Publication of JP2014114463A5 publication Critical patent/JP2014114463A5/ja
Application granted granted Critical
Publication of JP5837869B2 publication Critical patent/JP5837869B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C9/00—Methods or apparatus for discharging liquefied or solidified gases from vessels not under pressure
    • F17C9/02—Methods or apparatus for discharging liquefied or solidified gases from vessels not under pressure with change of state, e.g. vaporisation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B1/00—Methods of steam generation characterised by form of heating method
    • F22B1/28—Methods of steam generation characterised by form of heating method in boilers heated electrically
    • F22B1/284—Methods of steam generation characterised by form of heating method in boilers heated electrically with water in reservoirs
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B1/00—Methods of steam generation characterised by form of heating method
    • F22B1/28—Methods of steam generation characterised by form of heating method in boilers heated electrically
    • F22B1/284—Methods of steam generation characterised by form of heating method in boilers heated electrically with water in reservoirs
    • F22B1/285—Methods of steam generation characterised by form of heating method in boilers heated electrically with water in reservoirs the water being fed by a pump to the reservoirs

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Sustainable Energy (AREA)
  • Sustainable Development (AREA)
  • Thermal Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
JP2012267021A 2012-12-06 2012-12-06 原料気化供給装置 Active JP5837869B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2012267021A JP5837869B2 (ja) 2012-12-06 2012-12-06 原料気化供給装置
US14/650,496 US9994955B2 (en) 2012-12-06 2013-11-20 Raw material vaporization and supply apparatus
CN201380057690.8A CN104822858B (zh) 2012-12-06 2013-11-20 原料气化供给装置
KR1020157003850A KR101613141B1 (ko) 2012-12-06 2013-11-20 원료 기화 공급 장치
PCT/JP2013/006812 WO2014087592A1 (ja) 2012-12-06 2013-11-20 原料気化供給装置
TW102143011A TWI503443B (zh) 2012-12-06 2013-11-26 Raw material gasification supply device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012267021A JP5837869B2 (ja) 2012-12-06 2012-12-06 原料気化供給装置

Publications (3)

Publication Number Publication Date
JP2014114463A JP2014114463A (ja) 2014-06-26
JP2014114463A5 JP2014114463A5 (enExample) 2015-06-25
JP5837869B2 true JP5837869B2 (ja) 2015-12-24

Family

ID=50883034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012267021A Active JP5837869B2 (ja) 2012-12-06 2012-12-06 原料気化供給装置

Country Status (6)

Country Link
US (1) US9994955B2 (enExample)
JP (1) JP5837869B2 (enExample)
KR (1) KR101613141B1 (enExample)
CN (1) CN104822858B (enExample)
TW (1) TWI503443B (enExample)
WO (1) WO2014087592A1 (enExample)

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JP6712440B2 (ja) * 2015-03-13 2020-06-24 株式会社堀場エステック 液体材料気化装置、液体材料気化システム
JP6578125B2 (ja) 2015-04-30 2019-09-18 株式会社フジキン 気化供給装置
JP6627474B2 (ja) * 2015-09-30 2020-01-08 東京エレクトロン株式会社 原料ガス供給装置、原料ガス供給方法及び記憶媒体
DE102016208166A1 (de) * 2016-05-12 2017-11-16 Robert Bosch Gmbh Kraftstoffversorgungssystem für eine gasbetriebene Brennkraftmaschine und Verfahren zum Betreiben eines Kraftstoffversorgungssystems
US20190257551A1 (en) * 2016-09-28 2019-08-22 Clean Planet Inc. Heat generating system
JP6948803B2 (ja) 2017-03-02 2021-10-13 東京エレクトロン株式会社 ガス供給装置、ガス供給方法及び成膜方法
JP6877188B2 (ja) * 2017-03-02 2021-05-26 東京エレクトロン株式会社 ガス供給装置、ガス供給方法及び成膜方法
WO2019021948A1 (ja) * 2017-07-25 2019-01-31 株式会社フジキン 流体制御装置
JP7097085B2 (ja) 2017-07-25 2022-07-07 株式会社フジキン 流体制御装置
CN108128955A (zh) * 2017-12-27 2018-06-08 江苏南大光电材料股份有限公司 含mo源溶剂的回收装置及其方法
US11788190B2 (en) * 2019-07-05 2023-10-17 Asm Ip Holding B.V. Liquid vaporizer
KR102767031B1 (ko) * 2019-08-29 2025-02-14 가부시키가이샤 후지킨 유체 공급 시스템
JP7577339B2 (ja) 2019-09-19 2024-11-05 株式会社フジキン 気化供給装置
US20230002900A1 (en) 2019-12-16 2023-01-05 Fujikin Incorporated Vaporization supply method and vaporization supply device
JP7412747B2 (ja) * 2020-01-30 2024-01-15 株式会社フジキン 圧電素子駆動式バルブ、圧力式流量制御装置及び気化供給装置
DE102020001894A1 (de) 2020-03-24 2021-09-30 Azur Space Solar Power Gmbh Metallorganische chemische Gasphasenepitaxie- oder Gasphasenabscheidungsvorrichtung
JP7470375B2 (ja) * 2020-03-30 2024-04-18 株式会社フジキン 流体制御装置及びこれを用いた流体制御システム
KR102323922B1 (ko) * 2020-05-18 2021-11-09 주식회사 제이원테크코리아 발광분광분석기의 아르곤 가스 유지관리 시스템 및 그 방법
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Also Published As

Publication number Publication date
CN104822858A (zh) 2015-08-05
JP2014114463A (ja) 2014-06-26
WO2014087592A1 (ja) 2014-06-12
KR20150030770A (ko) 2015-03-20
KR101613141B1 (ko) 2016-04-18
US9994955B2 (en) 2018-06-12
CN104822858B (zh) 2017-08-01
US20150322567A1 (en) 2015-11-12
TWI503443B (zh) 2015-10-11
TW201441412A (zh) 2014-11-01

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