JP5698902B2 - 光学物品およびその製造方法 - Google Patents
光学物品およびその製造方法 Download PDFInfo
- Publication number
- JP5698902B2 JP5698902B2 JP2009199467A JP2009199467A JP5698902B2 JP 5698902 B2 JP5698902 B2 JP 5698902B2 JP 2009199467 A JP2009199467 A JP 2009199467A JP 2009199467 A JP2009199467 A JP 2009199467A JP 5698902 B2 JP5698902 B2 JP 5698902B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- germanium
- lens
- sample
- antireflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 57
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000010410 layer Substances 0.000 claims description 439
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 74
- 229910052732 germanium Inorganic materials 0.000 claims description 72
- 239000000758 substrate Substances 0.000 claims description 57
- 238000000151 deposition Methods 0.000 claims description 35
- 238000007740 vapor deposition Methods 0.000 claims description 26
- 230000003373 anti-fouling effect Effects 0.000 claims description 25
- 150000001875 compounds Chemical class 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 20
- 229910052723 transition metal Inorganic materials 0.000 claims description 18
- 150000003624 transition metals Chemical class 0.000 claims description 18
- 239000004033 plastic Substances 0.000 claims description 14
- 229920003023 plastic Polymers 0.000 claims description 14
- 239000002344 surface layer Substances 0.000 claims description 3
- 239000000523 sample Substances 0.000 description 79
- 239000010408 film Substances 0.000 description 44
- 230000008021 deposition Effects 0.000 description 30
- 150000002500 ions Chemical class 0.000 description 30
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 26
- 229910004298 SiO 2 Inorganic materials 0.000 description 24
- 229910010413 TiO 2 Inorganic materials 0.000 description 19
- 239000011521 glass Substances 0.000 description 17
- 229920005989 resin Polymers 0.000 description 17
- 239000011347 resin Substances 0.000 description 17
- 239000000463 material Substances 0.000 description 15
- 238000001771 vacuum deposition Methods 0.000 description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 239000007789 gas Substances 0.000 description 14
- 238000000869 ion-assisted deposition Methods 0.000 description 13
- 239000000377 silicon dioxide Substances 0.000 description 13
- SCCCLDWUZODEKG-UHFFFAOYSA-N germanide Chemical compound [GeH3-] SCCCLDWUZODEKG-UHFFFAOYSA-N 0.000 description 12
- 239000010936 titanium Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 10
- 239000010419 fine particle Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 239000002585 base Substances 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000008199 coating composition Substances 0.000 description 8
- -1 isocyanate compound Chemical class 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 239000006059 cover glass Substances 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 235000012239 silicon dioxide Nutrition 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000002609 medium Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 239000000428 dust Substances 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 229920001225 polyester resin Polymers 0.000 description 4
- 239000005871 repellent Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 3
- 150000003961 organosilicon compounds Chemical class 0.000 description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 3
- 239000004645 polyester resin Substances 0.000 description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 description 3
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- 229910004495 HfGe Inorganic materials 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 239000011354 acetal resin Substances 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229920003180 amino resin Polymers 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920006324 polyoxymethylene Polymers 0.000 description 2
- 230000002940 repellent Effects 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910006137 NiGe Inorganic materials 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001246 colloidal dispersion Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 150000002291 germanium compounds Chemical class 0.000 description 1
- 150000002440 hydroxy compounds Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000004149 tartrazine Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
- G02C7/108—Colouring materials
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C2202/00—Generic optical aspects applicable to one or more of the subgroups of G02C7/00
- G02C2202/16—Laminated or compound lenses
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Eyeglasses (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009199467A JP5698902B2 (ja) | 2009-03-04 | 2009-08-31 | 光学物品およびその製造方法 |
| US12/710,701 US8128225B2 (en) | 2009-03-04 | 2010-02-23 | Optical article and process for producing the same |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009050325 | 2009-03-04 | ||
| JP2009050325 | 2009-03-04 | ||
| JP2009199467A JP5698902B2 (ja) | 2009-03-04 | 2009-08-31 | 光学物品およびその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010231174A JP2010231174A (ja) | 2010-10-14 |
| JP2010231174A5 JP2010231174A5 (enExample) | 2012-09-13 |
| JP5698902B2 true JP5698902B2 (ja) | 2015-04-08 |
Family
ID=42677971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009199467A Expired - Fee Related JP5698902B2 (ja) | 2009-03-04 | 2009-08-31 | 光学物品およびその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8128225B2 (enExample) |
| JP (1) | JP5698902B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010231172A (ja) * | 2009-03-04 | 2010-10-14 | Seiko Epson Corp | 光学物品およびその製造方法 |
| JP2012032690A (ja) | 2010-08-02 | 2012-02-16 | Seiko Epson Corp | 光学物品およびその製造方法 |
| JP5956843B2 (ja) * | 2012-06-22 | 2016-07-27 | Hoya株式会社 | 眼鏡レンズおよびその製造方法 |
| US9389433B2 (en) * | 2013-03-15 | 2016-07-12 | Johnson Johnson Vision Care, Inc. | Methods and apparatus to form ophthalmic devices incorporating photonic elements |
| WO2016066994A1 (en) * | 2014-10-31 | 2016-05-06 | Pilkington Group Limited | Anti-reflective coated glass article |
| JP6881172B2 (ja) * | 2017-09-13 | 2021-06-02 | Agc株式会社 | 反射防止膜付透明基体、およびそれを用いた表示装置 |
| CN107966751B (zh) * | 2017-12-27 | 2024-06-18 | 宁波舜宇红外技术有限公司 | 一种锗系镜片及其制备方法 |
| JP2022069258A (ja) * | 2020-10-23 | 2022-05-11 | 東海光学株式会社 | プラスチック光学製品及びプラスチック眼鏡レンズ |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2746598B2 (ja) * | 1988-04-25 | 1998-05-06 | グンゼ株式会社 | 可視光選択透過膜 |
| EP0438398B1 (en) * | 1988-10-14 | 1996-03-27 | Northrop Grumman Corporation | Optically transparent electrically conductive semiconductor windows and methods of manufacture |
| JPH06313802A (ja) | 1993-04-28 | 1994-11-08 | Topcon Corp | 赤外域多層膜 |
| US5619596A (en) * | 1993-10-06 | 1997-04-08 | Seiko Instruments Inc. | Method and apparatus for optical pattern recognition |
| JPH10293207A (ja) * | 1997-02-24 | 1998-11-04 | Toray Ind Inc | カラーフィルターおよびカラーフィルターの製造方法 |
| JP3534384B2 (ja) * | 1997-07-11 | 2004-06-07 | 富士写真光機株式会社 | 導電性反射防止膜およびその製造方法 |
| JP4046921B2 (ja) | 2000-02-24 | 2008-02-13 | 触媒化成工業株式会社 | シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材 |
| KR100768175B1 (ko) * | 2001-02-07 | 2007-10-17 | 삼성에스디아이 주식회사 | 광학적 전기적 특성을 지닌 기능성 박막 |
| KR101005989B1 (ko) * | 2002-06-11 | 2011-01-05 | 코니카 미놀타 홀딩스 가부시키가이샤 | 표면 처리 방법 및 광학 부품 |
| JP2004341052A (ja) * | 2003-05-13 | 2004-12-02 | Ito Kogaku Kogyo Kk | 光学要素 |
| JP2005301208A (ja) | 2004-03-17 | 2005-10-27 | Seiko Epson Corp | 防汚性光学物品の製造方法 |
| JP2006126782A (ja) | 2004-10-01 | 2006-05-18 | Seiko Epson Corp | 光学物品の防汚層処理方法 |
| JP2006308844A (ja) * | 2005-04-28 | 2006-11-09 | Seiko Epson Corp | プラスチックレンズ及びプラスチックレンズの製造方法 |
| JP5098137B2 (ja) * | 2005-06-01 | 2012-12-12 | 株式会社ブリヂストン | 反射防止フィルム |
| JP4958536B2 (ja) * | 2006-01-12 | 2012-06-20 | 富士フイルム株式会社 | 反射防止膜 |
| JP4793011B2 (ja) | 2006-02-13 | 2011-10-12 | 三菱電機株式会社 | 反射防止膜形成方法 |
-
2009
- 2009-08-31 JP JP2009199467A patent/JP5698902B2/ja not_active Expired - Fee Related
-
2010
- 2010-02-23 US US12/710,701 patent/US8128225B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US8128225B2 (en) | 2012-03-06 |
| JP2010231174A (ja) | 2010-10-14 |
| US20100225882A1 (en) | 2010-09-09 |
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| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120727 |
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