JP5685257B2 - マイクロメカニカル可変同調型ファブリー・ペロー干渉計及びその製造方法 - Google Patents
マイクロメカニカル可変同調型ファブリー・ペロー干渉計及びその製造方法 Download PDFInfo
- Publication number
- JP5685257B2 JP5685257B2 JP2012530300A JP2012530300A JP5685257B2 JP 5685257 B2 JP5685257 B2 JP 5685257B2 JP 2012530300 A JP2012530300 A JP 2012530300A JP 2012530300 A JP2012530300 A JP 2012530300A JP 5685257 B2 JP5685257 B2 JP 5685257B2
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- interferometer
- gap
- fabry
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 230000003287 optical effect Effects 0.000 claims description 52
- 239000000758 substrate Substances 0.000 claims description 52
- 238000000034 method Methods 0.000 claims description 24
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 28
- 229910052814 silicon oxide Inorganic materials 0.000 description 25
- 210000003739 neck Anatomy 0.000 description 14
- 230000005855 radiation Effects 0.000 description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 229910052581 Si3N4 Inorganic materials 0.000 description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 210000003679 cervix uteri Anatomy 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006353 environmental stress Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/021—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using plane or convex mirrors, parallel phase plates, or particular reflectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0243—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows having a through-hole enabling the optical element to fulfil an additional optical function, e.g. a mirror or grating having a throughhole for a light collecting or light injecting optical fiber
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Spectrometry And Color Measurement (AREA)
- Micromachines (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20095976A FI20095976A0 (fi) | 2009-09-24 | 2009-09-24 | Mikromekaanisesti säädettävä Fabry-Perot -interferometri ja menetelmä sen tuottamiseksi |
| FI20095976 | 2009-09-24 | ||
| PCT/FI2010/050739 WO2011036346A1 (en) | 2009-09-24 | 2010-09-24 | Micromechanical tunable fabry-perot interferometer and a method for producing the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013506154A JP2013506154A (ja) | 2013-02-21 |
| JP2013506154A5 JP2013506154A5 (enExample) | 2014-12-18 |
| JP5685257B2 true JP5685257B2 (ja) | 2015-03-18 |
Family
ID=41136437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012530300A Active JP5685257B2 (ja) | 2009-09-24 | 2010-09-24 | マイクロメカニカル可変同調型ファブリー・ペロー干渉計及びその製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8995044B2 (enExample) |
| EP (1) | EP2480867B1 (enExample) |
| JP (1) | JP5685257B2 (enExample) |
| FI (1) | FI20095976A0 (enExample) |
| WO (1) | WO2011036346A1 (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI125897B (fi) | 2011-06-06 | 2016-03-31 | Teknologian Tutkimuskeskus Vtt Oy | Mikromekaanisesti säädettävä Fabry-Perot-interferometri ja menetelmä sen valmistamiseksi |
| FI125368B (en) * | 2012-06-08 | 2015-09-15 | Teknologian Tutkimuskeskus Vtt Oy | Micromechanically adjustable Fabry-Perot interferometer system and method for achieving this |
| JP6211833B2 (ja) * | 2013-07-02 | 2017-10-11 | 浜松ホトニクス株式会社 | ファブリペロー干渉フィルタ |
| JP6356427B2 (ja) | 2014-02-13 | 2018-07-11 | 浜松ホトニクス株式会社 | ファブリペロー干渉フィルタ |
| JP6292055B2 (ja) * | 2014-06-26 | 2018-03-14 | 株式会社デンソー | ファブリペロー干渉計の製造方法 |
| TWI581004B (zh) | 2015-11-18 | 2017-05-01 | 財團法人工業技術研究院 | 可調式光學裝置 |
| JP6341959B2 (ja) | 2016-05-27 | 2018-06-13 | 浜松ホトニクス株式会社 | ファブリペロー干渉フィルタの製造方法 |
| FI3467565T3 (fi) | 2016-05-27 | 2024-03-19 | Hamamatsu Photonics Kk | Tuotantomenetelmä Fabryn-Perot’n interferenssisuodatinta varten |
| CN109196405B (zh) | 2016-05-27 | 2021-09-10 | 浜松光子学株式会社 | 法布里-帕罗干涉滤光器的制造方法 |
| JP6861214B2 (ja) * | 2016-08-24 | 2021-04-21 | 浜松ホトニクス株式会社 | ファブリペロー干渉フィルタ |
| KR102508597B1 (ko) | 2016-08-24 | 2023-03-13 | 하마마츠 포토닉스 가부시키가이샤 | 패브리 페로 간섭 필터 |
| KR20240052898A (ko) | 2017-11-17 | 2024-04-23 | 하마마츠 포토닉스 가부시키가이샤 | 흡착 방법 |
| JP6899314B2 (ja) | 2017-11-17 | 2021-07-07 | 浜松ホトニクス株式会社 | 吸着方法 |
| JP7313115B2 (ja) | 2017-11-24 | 2023-07-24 | 浜松ホトニクス株式会社 | 光検査装置及び光検査方法 |
| JP6983633B2 (ja) | 2017-11-24 | 2021-12-17 | 浜松ホトニクス株式会社 | ウェハの検査方法、及びウェハ |
| JP7131901B2 (ja) | 2017-11-24 | 2022-09-06 | 浜松ホトニクス株式会社 | 運搬方法 |
| JP6526771B1 (ja) | 2017-11-24 | 2019-06-05 | 浜松ホトニクス株式会社 | ウェハ |
| JP6517309B1 (ja) | 2017-11-24 | 2019-05-22 | 浜松ホトニクス株式会社 | 異物除去方法、及び光検出装置の製造方法 |
| JP7025903B2 (ja) | 2017-11-24 | 2022-02-25 | 浜松ホトニクス株式会社 | 電気的検査方法 |
| JP6710721B2 (ja) * | 2018-06-14 | 2020-06-17 | 浜松ホトニクス株式会社 | ファブリペロー干渉フィルタ |
| DE102018211325A1 (de) * | 2018-07-10 | 2020-01-16 | Robert Bosch Gmbh | Fabry-Perot-Interferometer-Einheit und Verfahren zur Herstellung einer Fabry-Perot-Interferometer-Einheit |
| JP7120543B2 (ja) * | 2018-08-22 | 2022-08-17 | 日清紡マイクロデバイス株式会社 | Ｍｅｍｓ素子の製造方法 |
| DE102019203932A1 (de) * | 2019-03-22 | 2020-09-24 | Robert Bosch Gmbh | Interferometereinrichtung und Verfahren zur Herstellung einer Interferometereinrichtung |
| DE102019206758A1 (de) * | 2019-05-10 | 2020-11-12 | Robert Bosch Gmbh | Spiegeleinrichtung für eine Interferometereinrichtung, Interferometereinrichtung und Verfahren zum Herstellen einer Spiegeleinrichtung |
| DE102019217184A1 (de) | 2019-11-07 | 2021-05-12 | Robert Bosch Gmbh | Verfahren zum Herstellen einer Zwischenkomponente in einer mikromechanischen Fabry-Perot-Interferometervorrichtung, Verfahren zum Herstellen einer mikromechanischen Fabry-Perot-Interferometervorrichtung und mikromechanische Fabry-Perot-Interferometervorrichtung |
| CN111924797B (zh) * | 2020-09-29 | 2021-01-08 | 深圳市海谱纳米光学科技有限公司 | 一种具有可动镜面的法珀腔器件及其制作工艺 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI94804C (fi) * | 1994-02-17 | 1995-10-25 | Vaisala Oy | Sähköisesti säädettävä pintamikromekaaninen Fabry-Perot-interferometri käytettäväksi optisessa materiaalianalyysissä |
| FI98325C (fi) * | 1994-07-07 | 1997-05-26 | Vaisala Oy | Selektiivinen infrapunadetektori |
| US6324192B1 (en) * | 1995-09-29 | 2001-11-27 | Coretek, Inc. | Electrically tunable fabry-perot structure utilizing a deformable multi-layer mirror and method of making the same |
| FR2768812B1 (fr) * | 1997-09-19 | 1999-10-22 | Commissariat Energie Atomique | Interferometre fabry-perot accordable integre |
| FR2832512B1 (fr) * | 2001-11-16 | 2004-01-02 | Atmel Grenoble Sa | Composant de filtrage optique accordable |
| JP2005025020A (ja) * | 2003-07-04 | 2005-01-27 | Seiko Epson Corp | 波長可変干渉フィルタ及びその製造方法 |
| EP2032956A2 (en) * | 2006-05-23 | 2009-03-11 | Regents Of The University Of Minnesota | Tunable finesse infrared cavity thermal detectors |
| JP4784495B2 (ja) * | 2006-11-28 | 2011-10-05 | 株式会社デンソー | 光学多層膜ミラーおよびそれを備えたファブリペロー干渉計 |
| JP5050922B2 (ja) | 2008-02-27 | 2012-10-17 | 株式会社デンソー | ファブリペロー干渉計 |
| JP5067209B2 (ja) * | 2008-03-06 | 2012-11-07 | 株式会社デンソー | ファブリペロー干渉計 |
-
2009
- 2009-09-24 FI FI20095976A patent/FI20095976A0/fi not_active Application Discontinuation
-
2010
- 2010-09-24 US US13/498,143 patent/US8995044B2/en active Active
- 2010-09-24 WO PCT/FI2010/050739 patent/WO2011036346A1/en not_active Ceased
- 2010-09-24 JP JP2012530300A patent/JP5685257B2/ja active Active
- 2010-09-24 EP EP10818467.2A patent/EP2480867B1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| FI20095976A0 (fi) | 2009-09-24 |
| US20120181647A1 (en) | 2012-07-19 |
| EP2480867A1 (en) | 2012-08-01 |
| WO2011036346A1 (en) | 2011-03-31 |
| EP2480867B1 (en) | 2023-09-20 |
| JP2013506154A (ja) | 2013-02-21 |
| EP2480867A4 (en) | 2018-01-03 |
| US8995044B2 (en) | 2015-03-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5685257B2 (ja) | マイクロメカニカル可変同調型ファブリー・ペロー干渉計及びその製造方法 | |
| JP5714570B2 (ja) | 調節可能な微小機械ファブリ・ペロー干渉計、中間産物、およびその製造方法 | |
| JP5687802B2 (ja) | 調整可能なマイクロメカニカルファブリー・ペローの干渉計およびその製造方法 | |
| JP5512019B2 (ja) | 微小機械的で整調可能なファブリ・ペロー干渉計配列物、および同一物を製造するための方法 | |
| CN105339829B (zh) | 法布里‑珀罗干涉滤光片 | |
| JP2013506154A5 (enExample) | ||
| JP6211315B2 (ja) | ファブリペロー干渉フィルタ | |
| US20050105184A1 (en) | Tunable filter membrane structures and methods of making | |
| CN101004476A (zh) | 光学设备、波长可变滤波器、波长可变滤波器模块及光谱分析器 | |
| JP4548245B2 (ja) | 波長可変フィルタ | |
| JP2005031326A (ja) | 光フィルター | |
| JP6070435B2 (ja) | ファブリペローフィルタ、それを備えたファブリペロー干渉計、および、ファブリペローフィルタの製造方法 | |
| CN104698584B (zh) | 双梁式热驱动可调谐滤波器及其制作方法 | |
| JP2003185941A (ja) | ファブリペローフィルタ | |
| JP5515314B2 (ja) | 波長選択型赤外線検出器 | |
| JP5577983B2 (ja) | ファブリペロー干渉計の製造方法 | |
| JP4831242B2 (ja) | 波長可変フィルタ | |
| JP4831245B2 (ja) | 波長可変フィルタ |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20131030 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131126 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140224 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140303 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140325 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140428 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140725 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140801 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140827 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140903 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140925 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20141006 |
|
| A524 | Written submission of copy of amendment under article 19 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A524 Effective date: 20141027 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20150113 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20150116 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5685257 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |