JP5674663B2 - スルー基板ビアの側壁及び他の深堀りエッチングされた構造を平滑化するためのポストエッチング反応性プラズマミーリング - Google Patents
スルー基板ビアの側壁及び他の深堀りエッチングされた構造を平滑化するためのポストエッチング反応性プラズマミーリング Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims description 72
- 238000003801 milling Methods 0.000 title claims description 64
- 238000000034 method Methods 0.000 claims description 77
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 64
- 229910052710 silicon Inorganic materials 0.000 claims description 64
- 239000010703 silicon Substances 0.000 claims description 64
- 239000007789 gas Substances 0.000 claims description 37
- 238000005530 etching Methods 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 35
- 238000009499 grossing Methods 0.000 claims description 25
- 229920002120 photoresistant polymer Polymers 0.000 claims description 14
- 239000003153 chemical reaction reagent Substances 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 claims description 3
- 238000012545 processing Methods 0.000 description 67
- 230000008569 process Effects 0.000 description 47
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 238000001020 plasma etching Methods 0.000 description 10
- 230000003746 surface roughness Effects 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 239000001307 helium Substances 0.000 description 7
- 229910052734 helium Inorganic materials 0.000 description 7
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 230000000737 periodic effect Effects 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000001000 micrograph Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000013529 heat transfer fluid Substances 0.000 description 3
- 238000009616 inductively coupled plasma Methods 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 229920006254 polymer film Polymers 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32146—Amplitude modulation, includes pulsing
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
- H01L21/31138—Etching organic layers by chemical means by dry-etching
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76898—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics formed through a semiconductor substrate
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76814—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics post-treatment or after-treatment, e.g. cleaning or removal of oxides on underlying conductors
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- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
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Description
本明細書内で説明される反応性プラズマミーリングプロセスの様々な例示的実施形態の実施例は、カリフォルニア州サンタクララのアプライドマテリアルズから入手可能なDPS II TSV処理チャンバ(Processing Chamber)内で実行された。DPS II TSV処理チャンバは、統合化処理システム(Integrated Processing System)の一部として使用されてもよく、これもアプライドマテリアルから入手可能であり、(統合化処理システムを構成する)異なる処理チャンバの組み合わせ間の移動によって基板を周囲環境に曝露すること無しに多様な処理手順を可能にする。有利な統合化処理システムは、Centura(商標名)メインフレームシステム(Mainframe System)であり、これもアプライドマテリアルから入手可能である。
エッチングされる構造の深さが200μmから500μm又はそれよりも更に大きい範囲内にある多くの例がある。一例は、エレクトロニクスのパッケージングに使用される種類のスルー基板ビア(TSV)である。しばしば、そのような基板はシリコン含有基板であり、スルーシリコンビア、TSVとも言われるかもしれない。エッチングの深さが要求されるため、特に高速エッチングが要求される。可能なエッチング速度は、エッチングプロセスの間に起こるビア側壁のノッチングによって制限されてきた。許容されるかもしれないノッチ深さは、特定のアプリケーションに依存する。例えば、構造が銅を充填するビアである半導体デバイス又はパッケージングアプリケーションでは、基板によっては、ビア内に銅を充填する堆積の前に、エッチングされたビア表面の上に障壁層を堆積することがしばしば必要となる。通常、障壁層は、物理的堆積スパッタリング法を用いて堆積される。スパッタリングは、「照準線」プロセスであるので、ビア側壁上でのノッチングの存在は、エッチングされたビア表面の上に連続した障壁層の形成を妨げるかもしれない。この問題を避けるために、例えば、側壁のノッチングの発生を減少させるために、シリコン基板のエッチング速度を、その下において、技術的に可能な限り遅くしなければならない。
Claims (4)
- 滑らかな表面を生成するためにシリコン含有構造の内面を反応性プラズマミーリングする方法であって、
前記シリコン含有構造の前記内面及び外面から残留高分子材料を除去するステップと、
前記シリコン含有構造にパルス化されたRF電力でバイアスを掛けながら、シリコンと反応する試薬を含む原料ガス及び不活性ガスから生成される反応性プラズマで前記シリコン含有構造の前記内面を処理するステップであって、前記パルス周波数が約10Hzから約1000Hzまでの範囲にあり、及び前記デューティ時間%が2%から40%までの範囲にあり、これによって前記構造のミーリングされた内面が700nm以下のノッチ深さを有するステップを含む方法。 - 前記構造は、前記パルス周波数が約50Hzから約180Hzまでの範囲にあり、及び前記デューティ時間%が5%から30%までの範囲にあるパルス化されたRF電力でバイアスを掛けられる請求項1記載の方法。
- シリコン含有材料が側壁表面上に存在するエッチングされた構造の内部側壁表面を平滑化する方法であって、
いかなる残留フォトレジストをも基板表面から除去するステップを含み、それを通して前記構造はエッチングされ、
前記方法は、前記構造のエッチングの間に、前記構造の前記内部側壁表面上に堆積された残留保護高分子材料を除去するステップと、
前記シリコン含有構造にパルス化されたRF電力でバイアスを掛けながら、前記エッチングされた構造の前記内面を、シリコンと反応する試薬を含む原料ガス及び不活性ガスから生成される反応性プラズマで処理するステップであって、前記パルス周波数が約10Hzから約1000Hzまでの範囲にあり、及び前記デューティ時間%が2%から40%までの範囲にあり、これによって前記構造のミーリングされた内面が700nm以下のノッチ深さを有するステップを更に含む方法。 - 前記基板にバイアスを掛けるために使用される前記RF電力の周波数は、約200kHzから約400kHzまでの範囲にある請求項3記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/229,946 | 2008-08-27 | ||
US12/229,946 US9039908B2 (en) | 2008-08-27 | 2008-08-27 | Post etch reactive plasma milling to smooth through substrate via sidewalls and other deeply etched features |
PCT/US2009/004613 WO2010027400A2 (en) | 2008-08-27 | 2009-08-11 | Post etch reactive plasma milling to smooth through substrate via sidewalls and other deeply etched features |
Publications (3)
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JP2012501540A JP2012501540A (ja) | 2012-01-19 |
JP2012501540A5 JP2012501540A5 (ja) | 2012-09-27 |
JP5674663B2 true JP5674663B2 (ja) | 2015-02-25 |
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JP2011524970A Expired - Fee Related JP5674663B2 (ja) | 2008-08-27 | 2009-08-11 | スルー基板ビアの側壁及び他の深堀りエッチングされた構造を平滑化するためのポストエッチング反応性プラズマミーリング |
Country Status (6)
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US (1) | US9039908B2 (ja) |
JP (1) | JP5674663B2 (ja) |
KR (1) | KR101468614B1 (ja) |
CN (1) | CN102165565B (ja) |
TW (1) | TWI494996B (ja) |
WO (1) | WO2010027400A2 (ja) |
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US8133349B1 (en) | 2010-11-03 | 2012-03-13 | Lam Research Corporation | Rapid and uniform gas switching for a plasma etch process |
US8987140B2 (en) | 2011-04-25 | 2015-03-24 | Applied Materials, Inc. | Methods for etching through-silicon vias with tunable profile angles |
KR101867998B1 (ko) | 2011-06-14 | 2018-06-15 | 삼성전자주식회사 | 패턴 형성 방법 |
US9305810B2 (en) | 2011-06-30 | 2016-04-05 | Applied Materials, Inc. | Method and apparatus for fast gas exchange, fast gas switching, and programmable gas delivery |
US9023227B2 (en) | 2011-06-30 | 2015-05-05 | Applied Materials, Inc. | Increased deposition efficiency and higher chamber conductance with source power increase in an inductively coupled plasma (ICP) chamber |
CN103159163B (zh) * | 2011-12-19 | 2016-06-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 基片刻蚀方法及基片处理设备 |
US9041210B2 (en) | 2012-06-19 | 2015-05-26 | International Business Machines Corporation | Through silicon via wafer and methods of manufacturing |
US9159574B2 (en) * | 2012-08-27 | 2015-10-13 | Applied Materials, Inc. | Method of silicon etch for trench sidewall smoothing |
CN103887164B (zh) * | 2012-12-20 | 2017-07-04 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种深硅刻蚀方法 |
US20150087144A1 (en) * | 2013-09-26 | 2015-03-26 | Taiwan Semiconductor Manufacturing Company Ltd. | Apparatus and method of manufacturing metal gate semiconductor device |
KR102148336B1 (ko) * | 2013-11-26 | 2020-08-27 | 삼성전자주식회사 | 표면 처리 방법, 반도체 제조 방법 및 이에 의해 제조된 반도체 장치 |
CN104752331B (zh) * | 2013-12-31 | 2018-08-07 | 中微半导体设备(上海)有限公司 | 一种硅通孔刻蚀方法 |
KR102233577B1 (ko) | 2014-02-25 | 2021-03-30 | 삼성전자주식회사 | 반도체 소자의 패턴 형성 방법 |
TWI614806B (zh) * | 2015-12-16 | 2018-02-11 | 提升矽晶穿孔製程速度之方法 | |
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GB201608926D0 (en) * | 2016-05-20 | 2016-07-06 | Spts Technologies Ltd | Method for plasma etching a workpiece |
GB201620680D0 (en) * | 2016-12-05 | 2017-01-18 | Spts Technologies Ltd | Method of smoothing a surface |
JP7281741B2 (ja) * | 2019-08-23 | 2023-05-26 | パナソニックIpマネジメント株式会社 | 素子チップのスムージング方法および素子チップの製造方法 |
KR102297835B1 (ko) * | 2019-11-21 | 2021-09-02 | (재)한국나노기술원 | 테이퍼 형태의 경사벽을 갖는 비아 홀 제조 방법 |
GB202020822D0 (en) * | 2020-12-31 | 2021-02-17 | Spts Technologies Ltd | Method and apparatus |
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JPH0689880A (ja) * | 1992-09-08 | 1994-03-29 | Tokyo Electron Ltd | エッチング装置 |
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JP3217875B2 (ja) * | 1992-11-05 | 2001-10-15 | 株式会社日立製作所 | エッチング装置 |
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US6846746B2 (en) | 2002-05-01 | 2005-01-25 | Applied Materials, Inc. | Method of smoothing a trench sidewall after a deep trench silicon etch process |
US20040097077A1 (en) * | 2002-11-15 | 2004-05-20 | Applied Materials, Inc. | Method and apparatus for etching a deep trench |
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US20050170670A1 (en) * | 2003-11-17 | 2005-08-04 | King William P. | Patterning of sacrificial materials |
JP4653470B2 (ja) | 2004-12-02 | 2011-03-16 | 株式会社アルバック | エッチング方法 |
US7481943B2 (en) * | 2005-08-08 | 2009-01-27 | Silverbrook Research Pty Ltd | Method suitable for etching hydrophillic trenches in a substrate |
JP4812512B2 (ja) * | 2006-05-19 | 2011-11-09 | オンセミコンダクター・トレーディング・リミテッド | 半導体装置の製造方法 |
JP5143382B2 (ja) | 2006-07-27 | 2013-02-13 | オンセミコンダクター・トレーディング・リミテッド | 半導体装置及びその製造方法 |
CN101148765B (zh) | 2006-09-19 | 2010-05-12 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 硅片蚀刻方法 |
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2008
- 2008-08-27 US US12/229,946 patent/US9039908B2/en active Active
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- 2009-08-11 CN CN200980133906.8A patent/CN102165565B/zh not_active Expired - Fee Related
- 2009-08-11 KR KR1020117007111A patent/KR101468614B1/ko not_active IP Right Cessation
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JP2012501540A (ja) | 2012-01-19 |
CN102165565A (zh) | 2011-08-24 |
CN102165565B (zh) | 2015-08-12 |
US20100055400A1 (en) | 2010-03-04 |
WO2010027400A3 (en) | 2010-04-29 |
US9039908B2 (en) | 2015-05-26 |
TWI494996B (zh) | 2015-08-01 |
TW201009933A (en) | 2010-03-01 |
KR101468614B1 (ko) | 2014-12-04 |
KR20110052723A (ko) | 2011-05-18 |
WO2010027400A2 (en) | 2010-03-11 |
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