JP5441714B2 - 純水の製造方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置 - Google Patents

純水の製造方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置 Download PDF

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JP5441714B2
JP5441714B2 JP2009547145A JP2009547145A JP5441714B2 JP 5441714 B2 JP5441714 B2 JP 5441714B2 JP 2009547145 A JP2009547145 A JP 2009547145A JP 2009547145 A JP2009547145 A JP 2009547145A JP 5441714 B2 JP5441714 B2 JP 5441714B2
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Japan
Prior art keywords
water
ion exchange
hydrogen peroxide
pure water
ozone
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Expired - Fee Related
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JP2009547145A
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English (en)
Japanese (ja)
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JPWO2009082008A1 (ja
Inventor
広 菅原
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Organo Corp
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Organo Corp
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J41/00—Anion exchange; Use of material as anion exchangers; Treatment of material for improving the anion exchange properties
    • B01J41/04—Processes using organic exchangers
    • B01J41/05—Processes using organic exchangers in the strongly basic form
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/722—Oxidation by peroxides
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C02F2001/422—Treatment of water, waste water, or sewage by ion-exchange using anionic exchangers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/18—Removal of treatment agents after treatment
JP2009547145A 2007-12-26 2008-12-26 純水の製造方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置 Expired - Fee Related JP5441714B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009547145A JP5441714B2 (ja) 2007-12-26 2008-12-26 純水の製造方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007333451 2007-12-26
JP2007333451 2007-12-26
PCT/JP2008/073802 WO2009082008A1 (ja) 2007-12-26 2008-12-26 過酸化水素除去方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置
JP2009547145A JP5441714B2 (ja) 2007-12-26 2008-12-26 純水の製造方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置

Publications (2)

Publication Number Publication Date
JPWO2009082008A1 JPWO2009082008A1 (ja) 2011-05-06
JP5441714B2 true JP5441714B2 (ja) 2014-03-12

Family

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Family Applications (1)

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JP2009547145A Expired - Fee Related JP5441714B2 (ja) 2007-12-26 2008-12-26 純水の製造方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置

Country Status (3)

Country Link
JP (1) JP5441714B2 (zh)
TW (1) TWI461370B (zh)
WO (1) WO2009082008A1 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5604143B2 (ja) * 2009-03-18 2014-10-08 オルガノ株式会社 溶存酸素除去水の製造方法、溶存酸素除去水の製造装置、溶存酸素処理槽、超純水の製造方法、水素溶解水の製造方法、水素溶解水の製造装置および電子部品の洗浄方法
JP5750236B2 (ja) * 2010-05-25 2015-07-15 オルガノ株式会社 純水製造方法及び装置
EP2735546B1 (en) * 2012-11-21 2018-02-07 Ovivo Inc. Treatment of water, particularly for obtaining ultrapure water
JP6752692B2 (ja) * 2016-11-18 2020-09-09 オルガノ株式会社 水処理方法および装置
JP7125850B2 (ja) * 2018-03-29 2022-08-25 オルガノ株式会社 ガス溶解水供給システムおよびガス溶解水供給方法
KR102648342B1 (ko) * 2018-05-02 2024-03-15 노무라마이크로사이엔스가부시키가이샤 오존수의 제조법
JP7033691B1 (ja) * 2021-10-29 2022-03-10 野村マイクロ・サイエンス株式会社 温超純水製造システムの立ち上げ方法、立ち上げプログラム、及び温超純水製造システム

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6071085A (ja) * 1983-09-28 1985-04-22 Kurita Water Ind Ltd 過酸化水素の除去方法
JPH05261369A (ja) * 1992-03-18 1993-10-12 Kurita Water Ind Ltd 排超純水中の過酸化水素の除去方法
JPH05261366A (ja) * 1992-03-18 1993-10-12 Kurita Water Ind Ltd 酸性過酸化水素含有水の処理方法
JPH10324506A (ja) * 1997-03-27 1998-12-08 Mitsubishi Gas Chem Co Inc 高純度過酸化水素水の製造方法
JP2000015272A (ja) * 1998-07-03 2000-01-18 Japan Organo Co Ltd オゾン水製造方法及び装置
JP2003033671A (ja) * 2001-07-26 2003-02-04 Sumitomo Chem Co Ltd 過酸化水素水精製用アニオン交換樹脂充填塔

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005095280A1 (ja) * 2004-03-31 2005-10-13 Kurita Water Industries Ltd. 超純水製造装置
JP5124946B2 (ja) * 2006-01-12 2013-01-23 栗田工業株式会社 超純水製造装置における超純水中の過酸化水素の除去方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6071085A (ja) * 1983-09-28 1985-04-22 Kurita Water Ind Ltd 過酸化水素の除去方法
JPH05261369A (ja) * 1992-03-18 1993-10-12 Kurita Water Ind Ltd 排超純水中の過酸化水素の除去方法
JPH05261366A (ja) * 1992-03-18 1993-10-12 Kurita Water Ind Ltd 酸性過酸化水素含有水の処理方法
JPH10324506A (ja) * 1997-03-27 1998-12-08 Mitsubishi Gas Chem Co Inc 高純度過酸化水素水の製造方法
JP2000015272A (ja) * 1998-07-03 2000-01-18 Japan Organo Co Ltd オゾン水製造方法及び装置
JP2003033671A (ja) * 2001-07-26 2003-02-04 Sumitomo Chem Co Ltd 過酸化水素水精製用アニオン交換樹脂充填塔

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JPWO2009082008A1 (ja) 2011-05-06
WO2009082008A1 (ja) 2009-07-02
TW200938491A (en) 2009-09-16
TWI461370B (zh) 2014-11-21

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