WO2009082008A1 - 過酸化水素除去方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置 - Google Patents

過酸化水素除去方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置 Download PDF

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Publication number
WO2009082008A1
WO2009082008A1 PCT/JP2008/073802 JP2008073802W WO2009082008A1 WO 2009082008 A1 WO2009082008 A1 WO 2009082008A1 JP 2008073802 W JP2008073802 W JP 2008073802W WO 2009082008 A1 WO2009082008 A1 WO 2009082008A1
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Prior art keywords
hydrogen peroxide
water
ion exchange
ozone
anion exchanger
Prior art date
Application number
PCT/JP2008/073802
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English (en)
French (fr)
Japanese (ja)
Inventor
Hiroshi Sugawara
Original Assignee
Organo Corporation
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Filing date
Publication date
Application filed by Organo Corporation filed Critical Organo Corporation
Priority to JP2009547145A priority Critical patent/JP5441714B2/ja
Publication of WO2009082008A1 publication Critical patent/WO2009082008A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J41/00—Anion exchange; Use of material as anion exchangers; Treatment of material for improving the anion exchange properties
    • B01J41/04—Processes using organic exchangers
    • B01J41/05—Processes using organic exchangers in the strongly basic form
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/722—Oxidation by peroxides
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C02F2001/422—Treatment of water, waste water, or sewage by ion-exchange using anionic exchangers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/18—Removal of treatment agents after treatment

Definitions

  • the present invention relates to a method and apparatus for removing hydrogen peroxide-containing water, a method and apparatus for producing ozone water, and a method and apparatus for cleaning with water from which hydrogen peroxide has been removed.
  • ultrapure water used for cleaning silicon wafers in the semiconductor industry, as shown in FIG. 5, is a pretreatment system 10, a primary pure water system 20, a secondary pure water system (sub-water). It is manufactured by processing raw water (industrial water, city water, well water, etc.) by an ultrapure water manufacturing apparatus 210 constituted by a system 40.
  • the pretreatment system 10 includes, for example, a raw water tank 12, a coagulation sedimentation device 14, a filtration device 16, and a filtration water tank 18.
  • the pretreatment system removes suspended substances and colloidal substances contained in the raw water of the raw water tank 12.
  • the primary pure water system 20 includes, for example, an ion exchange device 22, an ultraviolet irradiation device 24, a microfiltration membrane device 26, a reverse osmosis (RO) membrane device 28, and a deaeration device 30.
  • the primary pure water system 20 removes ions and organic components from the raw water from which suspended substances and the like have been removed by the pretreatment system 10 to obtain primary pure water.
  • the subsystem 40 is a system for producing ultrapure water.
  • the subsystem 40 includes, for example, a primary pure water tank 42, a heat exchanger 44, an ultraviolet oxidation device 46, a non-regenerative ion exchange device 48, and a final filter (UF membrane) device 50.
  • the non-regenerative ion exchange device 48 is filled with an ion exchanger including an anion exchanger.
  • the subsystem 40 is a process for producing ultrapure water by further increasing the purity of the primary pure water obtained by the primary pure water system 20.
  • the primary pure water obtained by the primary pure water system 20 is stored in the primary pure water tank 42.
  • the primary pure water in the primary pure water tank 42 is adjusted to a predetermined temperature by the heat exchanger 44.
  • the ultraviolet oxidizer 46 irradiates ultraviolet rays to decompose the TOC (total organic carbon) component in the pure water into organic acids and further to carbon dioxide.
  • the organic acid and carbon dioxide are removed by the anion exchanger of the non-regenerative ion exchanger 48.
  • the fine particles are removed, and ultrapure water is produced.
  • the purity of the ultrapure water is maintained while circulating in the subsystem 40.
  • a part of the ultrapure water is supplied to each use point 250, 252, 254. In each use point, ultrapure water is used as it is for cleaning wafers or the like, or ozone is further dissolved in ultrapure water and used for cleaning.
  • An object of the present invention is to effectively remove hydrogen peroxide from water containing hydrogen peroxide over a long period of time by an ion exchange device.
  • the hydrogen peroxide removal method of the present invention is characterized in that water containing hydrogen peroxide is intermittently passed through an ion exchange device containing an OH-type anion exchanger.
  • a plurality of the ion exchange devices may be arranged in parallel, and the water containing the hydrogen peroxide may be alternately passed through the plurality of ion exchange devices.
  • the ion exchanger may be a single bed form of an OH type anion exchanger.
  • the OH type anion exchanger may be a strongly basic anion exchanger.
  • the method for producing ozone water of the present invention is characterized in that ozone is dissolved in water from which hydrogen peroxide has been removed by the hydrogen peroxide removal method.
  • the hydrogen peroxide removing device of the present invention is characterized by having an ion exchange device containing an OH type anion exchanger and means for intermittently passing water containing hydrogen peroxide through the ion exchange device.
  • a plurality of the ion exchange devices may be arranged in parallel, and may have means for alternately passing water containing hydrogen peroxide through the plurality of ion exchange devices.
  • the ion exchange device may be a single bed form of an OH type anion exchanger.
  • the OH type anion exchanger may be a strongly basic anion exchanger.
  • the ozone water production apparatus of the present invention is characterized by comprising the hydrogen peroxide removing device and means for dissolving ozone in the water from which hydrogen peroxide has been removed.
  • the cleaning method of the present invention is characterized in that an electronic component or an electronic component manufacturing apparatus is cleaned with water from which hydrogen peroxide has been removed by the hydrogen peroxide removal method. Moreover, the cleaning apparatus of the present invention is characterized in that the electronic component or the electronic component manufacturing apparatus is cleaned with the hydrogen peroxide removing device and water from which hydrogen peroxide has been removed.
  • FIG. 1 is a flowchart of the ultrapure water production apparatus 8 according to the embodiment of the present invention.
  • pure water includes “ultra pure water”.
  • the ultrapure water production apparatus 8 is different from the conventional ultrapure water production apparatus 210 shown in FIG. 5 in that a hydrogen peroxide removal apparatus 53 including one ion exchange device 52, an opening / closing valve 51, and a control device 70 is provided. It is added and includes a pretreatment system 10, a primary pure water system 20, a subsystem 40, and a hydrogen peroxide removal device 53. Between the subsystem 40 and the use point 60, an opening / closing valve 51 and an ion exchange device 52 are arranged in this order. The subsystem 40 is connected to each use point 62, 64.
  • a raw water tank 12, a coagulation sedimentation apparatus 14, a filtration apparatus 16, and a filtration water tank 18 are sequentially installed.
  • the pretreatment system 10 removes suspended substances and colloidal substances contained in the raw water of the raw water tank 12.
  • the raw water tank 12, the coagulation sedimentation apparatus 14, the coagulation sedimentation apparatus 14, the filtration apparatus 16, and the filtration water tank 18 are not particularly limited, and existing apparatuses can be used.
  • an ion exchange device 22 In the primary pure water system 20, an ion exchange device 22, an ultraviolet irradiation device 24, a microfiltration membrane device 26, an RO membrane device 28, and a deaeration device 30 are sequentially installed.
  • the ion exchanger 22 is filled with an ion exchanger.
  • any form such as a single bed form of an anion exchanger or a cation exchanger, or a mixed bed form or a multiple bed form of an anion exchanger and a cation exchanger, can be used. Also good.
  • the ultraviolet irradiation device 24 is not particularly limited, and an existing device can be used.
  • an ultraviolet oxidizer that can irradiate ultraviolet rays having a wavelength around 185 nm in addition to ultraviolet rays having a wavelength around 254 nm.
  • An ultraviolet oxidizer that can strongly irradiate ultraviolet rays having a wavelength of around 185 nm is preferable in terms of decomposition of the TOC component contained in the filtered water obtained by the pretreatment system 10.
  • the microfiltration membrane device 26 is not particularly limited, and an existing device can be used.
  • the RO membrane device 28 is not particularly limited, and an existing device can be used.
  • the deaeration device 30 is not particularly limited, and an existing device can be used. For example, a vacuum deaerator, a membrane deaerator, etc. can be mentioned.
  • the subsystem 40 is a system for producing ultrapure water by further increasing the purity of the primary pure water obtained by the primary pure water system 20.
  • the subsystem 40 is sequentially installed so that the primary pure water tank 42, the heat exchanger 44, the ultraviolet oxidation device 46, the non-regenerative ion exchange device 48, and the final filter (UF membrane) device 50 can circulate ultrapure water. ing.
  • the ultraviolet oxidation device 46 is not particularly limited as long as it has an ability to effectively decompose the TOC component in the primary pure water, and an existing device can be used.
  • the existing device can be used as the non-regenerative ion exchange device 48.
  • the non-regenerative ion exchange device 48 is filled with an ion exchanger.
  • an ion exchanger There are no particular limitations on the packing form of the ion exchanger, and any form such as a single bed form of an anion exchanger or a cation exchanger, or a mixed bed form or a multiple bed form of an anion exchanger and a cation exchanger, can be used. It is preferable that it is determined according to the quality of primary pure water and the quality of the intended ultrapure water.
  • the heat exchanger 44 is not particularly limited as long as the primary pure water can be set to an arbitrary temperature, and an existing apparatus can be used.
  • the UF membrane device 50 is not particularly limited, and an existing device can be used.
  • the filling form of the ion exchange device 52 is not particularly limited as long as the OH type anion exchanger is filled.
  • Single bed form of OH type anion exchanger may be used, mixed bed form with other anion exchangers may be used, mixed bed form with cation exchanger or multiple bed form may be used.
  • the OH-type anion exchanger is preferably packed in a single bed form.
  • the OH-type anion exchanger may be a strongly basic anion exchanger or a weakly basic anion exchanger. However, it is preferable to select a strongly basic anion exchanger from the viewpoint of improving the ability to remove hydrogen peroxide.
  • the type of OH type anion exchanger is not particularly limited, and examples thereof include ion exchange resins, ion exchange fibers, and monolithic porous ion exchangers. Among these, it is preferable to use an ion exchange resin having high versatility.
  • the shape of the ion exchange resin is not particularly limited, and may be a gel shape, a porous shape, or a macroporous shape.
  • the ion exchanger filled in the ion exchange device 52 may be a regenerative type or a non-regenerative type. However, since the ion exchanger may be contaminated when it is regenerated, In the present embodiment, which is installed immediately before the point 60, the non-regenerative type is preferable.
  • the ion exchange device 52 preferably includes a blow valve on the secondary side. Since water staying in the apparatus when water flow is stopped may be contaminated by the eluate from the inner wall of the ion exchanger or ion exchanger 52, the contaminated water immediately after the start of water flow is drained. It is.
  • the hydrogen peroxide removing device 53 includes an ion exchange device 52, an opening / closing valve 51, and a control device 70.
  • “Means for intermittently passing water containing hydrogen peroxide to an ion exchange device filled with an OH-type anion exchanger” means control for performing water flow to the ion exchange device 52 and stopping water flow.
  • the device is not particularly limited as long as it has such a function.
  • the control device 70 that opens and closes the opening / closing valve 51 installed on the primary side of the ion exchange device 52 at regular intervals, or the activation of a pump for supplying ultrapure water from the subsystem 40 to the ion exchange device 52 And the control apparatus which performs a stop may be sufficient.
  • the opening / closing of the opening / closing valve 51 and the starting and stopping of the pump may be performed automatically or manually.
  • the raw water is sequentially processed in the precipitation agglomeration tank 14 and the filtration device 16 to mainly remove colloids and suspended substances to obtain filtered water.
  • the obtained filtered water is stored in the filtered water tank 18.
  • the filtered water in the filtered water tank 18 is adsorbed and removed by the ion exchanger 22, and the TOC that is ion-exchanged is removed by the ion exchanger.
  • the filtered water is irradiated with ultraviolet rays by the ultraviolet irradiation device 24 to sterilize the filtered water, or the TOC component in the filtered water is decomposed to a state of organic acid and further to carbon dioxide.
  • the microfiltration membrane device 26 and the RO membrane device 28 remove particle components and decomposition products such as organic acids generated by the ultraviolet irradiation device 24.
  • the permeated water is removed by the deaerator 30 to obtain dissolved primary oxygen.
  • the purity of the primary pure water obtained by the primary pure water system 20 is further increased to obtain ultrapure water.
  • the primary pure water obtained by the primary system is stored in the primary pure water tank 42.
  • the primary pure water is brought to a predetermined temperature by the heat exchanger 44 and then irradiated with ultraviolet rays by the ultraviolet oxidizer 46 to decompose the TOC component in the water into an organic acid and further to carbon dioxide.
  • hydrogen peroxide is produced in the water during UV irradiation.
  • the non-regenerative ion exchange device 48 removes a trace amount of ion components and organic acids and carbon dioxide generated by ultraviolet irradiation.
  • UF particles are removed by the UF membrane device 50 to obtain ultrapure water.
  • a part of the obtained ultrapure water is sent to the use points 62 and 64 as they are.
  • another part of the obtained ultrapure water is passed through the ion exchange device 52, and after contacted with the OH type anion exchanger to remove hydrogen peroxide, it is sent to the use point 60.
  • Other part of the ultrapure water is returned to the primary pure water tank 42 and circulates in the subsystem 40.
  • the control device 70 closes the open / close valve 51 and stops water flow.
  • control device 70 opens the opening / closing valve 51, restarts the water flow, and restarts the removal of hydrogen peroxide in the ultrapure water. In this manner, water flow and stop to the ion exchange device 52 are repeatedly performed.
  • the flow rate to the ion exchange device 52 of ultrapure water is not particularly limited, and can be determined according to the capability of the ion exchange device 52.
  • the space velocity (SV) for the anion exchanger is preferably set in the range of 1 to 500 L / LR ⁇ h ⁇ 1, and is preferably set in the range of 10 to 100 L / LR ⁇ h ⁇ 1. More preferred.
  • SV is represented by L / LR ⁇ h ⁇ 1 which is a flow rate (L) circulated in one hour per unit volume (LR) of the ion exchanger.
  • the water flow period to the ion exchange device 52 in the present embodiment is not particularly limited, and the amount of hydrogen peroxide in the ultrapure water and the treatment amount are taken into consideration, and the hydrogen peroxide in the ultrapure water is less than the desired concentration. It is preferable to set arbitrarily within the period in which the ability to remove the light is maintained. In addition, the water passage period may be set at a fixed time, or the amount of hydrogen peroxide leak measured on the secondary side of the ion exchange device 52, and the time when the concentration reaches a certain concentration is set as the end point of the water flow period. You may do it.
  • the period during which the water flow to the ion exchange device 52 is stopped is not particularly limited, and the ion exchange device is considered in consideration of the amount of ultrapure water treated, the concentration of hydrogen peroxide in ultrapure water, the size of the ion exchange device 52, and the like.
  • a period during which the hydrogen peroxide removal capacity of 52 is restored can be set.
  • the period of time during which water flow is stopped is in the range of 1 to 24 hours. It is preferable to set.
  • the ultrapure water before removing hydrogen peroxide in the present embodiment is not particularly limited, but it is preferable that the resistivity is 15 M ⁇ ⁇ cm or more and TOC 10 ppb or less.
  • the temperature of the ultrapure water is not particularly limited, but is preferably 5 to 40 ° C, more preferably 15 to 30 ° C, and further preferably 20 to 25 ° C.
  • the hydrogen peroxide removal ability of the ion exchange device 52 can be restored by stopping the flow of ultrapure water to the ion exchange device 52. For this reason, hydrogen peroxide in ultrapure water can be effectively removed over a long period of time by repeating the water flow to and the stop of the ion exchange device 52.
  • FIG. 2 is a flowchart of the ultrapure water production apparatus 100 according to the second embodiment.
  • the hydrogen peroxide removing device 53 of the first embodiment shown in FIG. 1 is changed to a hydrogen peroxide removing device 55 in which ion exchange devices 52a and 52b are arranged in parallel.
  • the hydrogen peroxide removing device 55 includes ion exchange devices 52a and 52b arranged in parallel, and an open / close valve 51a is connected to the primary side of the ion exchange device 52a, so that the primary ion exchange device 52b is primary.
  • An open / close valve 51b is connected to the side. Further, a control device 72 is connected to the on-off valves 51a and 52b.
  • the flow paths on the primary side of the open / close valves 51 a and 51 b are integrated into one flow path and connected to the subsystem 40. Further, the secondary-side flow paths of the ion exchange devices 52a and 52b are connected to the use point 61 after being integrated into one flow path.
  • the “means for alternately passing water containing hydrogen peroxide through a plurality of ion exchange devices” in the present embodiment is a control device that alternately performs water flow to the ion exchange devices 52a and 52b and stops water flow.
  • a control device that alternately performs water flow to the ion exchange devices 52a and 52b and stops water flow.
  • water is supplied to each of the ion exchange devices 52a and 52b from the control device 72 that alternately opens and closes the opening / closing valves 51a and 51b installed on the primary side of the ion exchange devices 52a and 52b at regular intervals, respectively.
  • It may be a control device for starting and stopping the pump.
  • opening / closing of the opening / closing valves 51a and 51b and starting and stopping of the pump may be performed automatically or manually.
  • the ultrapure water produced by the subsystem 40 is passed through the ion exchange device 52a to remove hydrogen peroxide, and then supplied to the use point 61.
  • the control device 72 opens the open / close valve 51b and starts water flow through the ion exchange device 52b. At this time, the water treated by the ion exchange device 52 b is drained without being supplied to the use point 61. On the other hand, the supply of the water treated by the ion exchange device 52a to the use point 61 is continued.
  • the drainage of the ion exchange device 52b is stopped, and the water treated by the ion exchange device 52b is supplied to the use point 61.
  • the control device 72 closes the open / close valve 51a to stop water flow to the ion exchange device 52a.
  • the hydrogen peroxide removal in the ion exchange device 52a is switched to the hydrogen peroxide removal in the ion exchange device 52b.
  • the control device 72 After passing water through the ion exchange device 52b for a certain period of time, the control device 72 opens the open / close valve 51a to start water passage to the ion exchange device 52a. At this time, the water treated by the ion exchange device 52 a is drained without being supplied to the use point 61. On the other hand, the supply of the water treated by the ion exchange device 52b to the use point 61 is continued. Furthermore, after the end of a certain period, drainage of the ion exchange device 52 a is stopped, and water treated by the ion exchange device 52 a is supplied to the use point 61. Next, the control device 72 closes the open / close valve 51b to stop water flow to the ion exchange device 52b.
  • the same ones as the ion exchange device 52 of the first embodiment can be used.
  • the period of water flow to the ion exchange devices 52a and 52b there are no particular limitations on the period of water flow to the ion exchange devices 52a and 52b, and the amount of hydrogen peroxide and the amount of treatment in ultrapure water, as well as the recovery period for removing hydrogen peroxide from the ion exchange devices 52a and 52b, are determined.
  • the water flow period may be stopped after a predetermined period of time, or the leakage amount of hydrogen peroxide is measured on the secondary side of the ion exchange devices 52a and 52b to reach a certain concentration. The water flow may be stopped at that time.
  • the period for stopping the water flow to the ion exchangers 52a and 52b is not particularly limited, taking into consideration the amount of ultrapure water treated, the concentration of hydrogen peroxide in the ultrapure water, the scale of the ion exchangers 52a and 52b, and the like.
  • a period for recovering the hydrogen peroxide removal ability can be set. For example, in order to treat ultrapure water containing hydrogen peroxide of 15 to 30 ppb and maintain the hydrogen peroxide concentration at a concentration of 10 ppb or less, it is preferably set in the range of 1 hour to 24 hours.
  • the drainage period after resuming water flow at the time of switching between the ion exchangers 52a and 52b is not particularly limited, and a period sufficient to drain contaminated water staying in the ion exchanger 52a or 52b is set. It is preferable.
  • the two ion exchange devices 52a and 52b can be alternately switched to pass water, hydrogen peroxide is continuously removed without stopping the supply of ultrapure water to the use point 61. be able to.
  • FIG. 3 is a flowchart of the ozone water production apparatus 110 according to the third embodiment.
  • an ozone dissolving device 54 is installed on the secondary side of the hydrogen peroxide removing device 53 of the first embodiment shown in FIG. 1, and an ozone generating device 56 is provided in the ozone dissolving device 54. It is connected.
  • the ozone dissolving device 54 is not particularly limited, a membrane dissolving device for dissolving ozone gas in water through a gas permeable membrane, a device for dissolving ozone gas in water by bubbling, a device for dissolving ozone gas in water through an ejector, Examples include a device that supplies ozone gas upstream of the pump and dissolves it by stirring in the pump.
  • the gas permeable membrane used for dissolving the membrane is preferably a fluororesin-based hydrophobic porous membrane that can withstand the strong oxidizing power of ozone.
  • the ozone generator 56 is not specifically limited, The ozone generator by silent discharge, an electrolysis method, etc. is mentioned.
  • the ultrapure water produced by the subsystem 40 is processed by the hydrogen peroxide removing device 53 to remove hydrogen peroxide.
  • the ozone gas produced by the ozone generator 56 is sent to the ozone dissolver 54.
  • the ozone gas is dissolved by the ozone dissolving device 54 in the water from which the hydrogen peroxide has been removed.
  • Ozone water in which ozone of a predetermined concentration is dissolved in water is supplied to the use point 66.
  • the dissolved ozone concentration is not particularly limited, and is preferably set according to the use at the use point 66. For example, it is preferably set within a range of 1 to 100 ppm according to the use.
  • FIG. 4 is a flowchart of the ozone water production apparatus 120 according to the fourth embodiment.
  • the hydrogen peroxide removing device 53 of the third embodiment shown in FIG. 3 is changed to a hydrogen peroxide removing device 55 in which ion exchange devices 52a and 52b are arranged in parallel.
  • the ultrapure water produced by the subsystem 40 is processed by the hydrogen peroxide removing device 55 to remove hydrogen peroxide.
  • the ozone gas produced by the ozone generator 56 is sent to the ozone dissolver 54.
  • ozone gas is dissolved by the ozone dissolving device 54, and ozone water in which ozone of a predetermined concentration is dissolved is supplied to the use point 67.
  • the two ion exchange devices 52a and 52b can be switched alternately to pass water, hydrogen peroxide in water can be removed continuously.
  • ozone water with a stable ozone concentration can be continuously supplied to the use point.
  • high-concentration ozone water can be supplied to the use point stably and continuously.
  • the hydrogen peroxide removal method and the hydrogen peroxide removal apparatus of the present invention are not limited to the above-described embodiments.
  • branched water (ultra pure water) from the outlet of the UF membrane device 50 of the subsystem 40 is used as treated water and is passed through each ion exchange device.
  • the water to be treated is not limited to the branched water and may be water containing hydrogen peroxide.
  • it may be the outlet water of the ultraviolet oxidation device 46 and the non-regenerative ion exchange device 48, or may be water in which ultrapure water produced by the subsystem 40 is received in a tank.
  • the water of the primary system 20 may be sufficient.
  • the hydrogen peroxide removing device 53 or 55 is arranged while the branch water of the subsystem 40 is sent to each use point.
  • the arrangement location is not limited to this.
  • the non-regenerative ion exchange device 48 may be provided with “means for intermittently passing water containing hydrogen peroxide” such as the hydrogen peroxide removing device 53 or 55.
  • a “means for alternately passing water containing hydrogen peroxide through a plurality of ion exchange devices” may be provided in a form such as the hydrogen peroxide removing device 55.
  • the two ion exchange devices 52a and 52b are arranged in parallel as the hydrogen peroxide removal device 55, but the number of the ion exchange devices may be three or more. It is preferable to determine the number of installed units in consideration of the amount of water treated and the capacity of the ion exchangers in the ion exchange devices 52a and 52b.
  • the pretreatment system 10, the primary pure water system 20, and the subsystem 40 in the first to fourth embodiments are examples, and are not limited to the above-described embodiments. Devices other than those described above can be used, or other combinations can be used.
  • the opening / closing valve 51 is installed on the temporary side of the ion exchange device 52, and the opening / closing valves 51a, 51b are installed on the temporary side of the ion exchange devices 52a, 52b.
  • the installation location of is not limited to this, and may be installed on the secondary side of the ion exchange devices 52, 52a, 52b.
  • the water from which hydrogen peroxide has been removed is directly sent to the use point by the ion exchange device 52 or the ion exchange device 52a or 52b, but the ion exchange devices 52, 52a, Another device may be installed on the secondary side of 52b.
  • a filtration membrane device microwave filter device or UF membrane device
  • another device particularly a filtration membrane device for removing fine particles, may be installed on the secondary side of the ion exchange devices 52, 52a, 52b.
  • AmberJet 4002 OH-type strongly basic anion exchange resin, gel type
  • the water in this example was obtained by passing primary pure water through a heat exchanger, a membrane deaerator, an ultraviolet oxidation device, a non-regenerative mixed bed ion exchanger, and a UF membrane device in this order.
  • Example 2 An acrylic column was packed with 100 mL of an ion exchange resin, Amberlite IRA900 (OH) (OH-type strongly basic anion exchange resin, macroporous type) manufactured by Rohm and Haas, and an ion exchange apparatus B. Got. Thereafter, water was continuously passed for 10 days in the same manner as in Example 1 to obtain treated water.
  • GM-02RES ozone-dissolving membrane module
  • the hydrogen peroxide concentration in the treated water and the ozone concentration in the ozone water at 3 hours and 4 days after the start of production of the ozone water were measured, and the results are shown in Table 3.
  • TOC 1 ppb or less ultrapure water (hereinafter the same in Comparative Example 3).
  • Example 3 Ozone water was produced under the same conditions as in Example 5 except that water having a hydrogen peroxide concentration of 15 to 20 ppb was not passed through the ion exchanger C.
  • the hydrogen peroxide concentration in the treated water and the ozone concentration in the ozone water were measured 4 days after the start of production of the ozone water, and the results are shown in Table 3.
  • Hydrogen peroxide concentration As a method for quantifying low-concentration hydrogen peroxide in ultrapure water, a known phenol phthaline method, for example, the method described in Japanese Patent Publication No. 56-54582 was applied.
  • the ozone concentration was measured by ultraviolet absorption spectrophotometry using a portable dissolved ozone concentration meter (OM-101P-30, manufactured by Aplix Corporation).
  • Example 5 ozone water was produced using treated water from which hydrogen peroxide had been removed by passing water through an ion exchange device, so that treatment was performed even 4 days after the start of ozone water production.
  • the water maintained a hydrogen peroxide concentration of 10 ppb or less, and the ozone concentration of ozone water also exceeded 40 ppm.
  • Comparative Example 3 since the water to be treated was not passed through the ion exchange device, the hydrogen peroxide concentration in the water was at a high level. Further, the ozone water produced with such water had a lower ozone concentration than that of Example 5. From this, and from the results of Examples 1 to 4, by repeating the water flow / stop to the ion exchange device and removing hydrogen peroxide in the water, ozone water having a stable concentration can be obtained over a long period of time. Furthermore, it was suggested that highly concentrated ozone water could be obtained.
  • water containing hydrogen peroxide is intermittently passed through the ion exchange device.
  • hydrogen peroxide is contained. Since water is alternately passed, hydrogen peroxide can be effectively removed from water containing hydrogen peroxide over a long period of time.
PCT/JP2008/073802 2007-12-26 2008-12-26 過酸化水素除去方法およびその装置、オゾン水製造方法およびその装置、並びに洗浄方法およびその装置 WO2009082008A1 (ja)

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JP2010240642A (ja) * 2009-03-18 2010-10-28 Japan Organo Co Ltd 溶存酸素除去水の製造方法、溶存酸素除去水の製造装置、溶存酸素処理槽、超純水の製造方法、水素溶解水の製造方法、水素溶解水の製造装置および電子部品の洗浄方法
JP2011245380A (ja) * 2010-05-25 2011-12-08 Japan Organo Co Ltd 純水製造方法及び装置
EP2735546A1 (en) * 2012-11-21 2014-05-28 Ovivo Luxembourg S.à.r.l. Treatment of water, particularly for obtaining ultrapure water
JP2019176069A (ja) * 2018-03-29 2019-10-10 オルガノ株式会社 ガス溶解水供給システム
WO2019212046A1 (ja) * 2018-05-02 2019-11-07 国立大学法人東北大学 加熱オゾン水の製造方法、加熱オゾン水および半導体ウエハ洗浄液

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JP2010240642A (ja) * 2009-03-18 2010-10-28 Japan Organo Co Ltd 溶存酸素除去水の製造方法、溶存酸素除去水の製造装置、溶存酸素処理槽、超純水の製造方法、水素溶解水の製造方法、水素溶解水の製造装置および電子部品の洗浄方法
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