JP5435477B2 - ダイヤモンド微粒子を分散させた複合めっき液及びその製造方法 - Google Patents
ダイヤモンド微粒子を分散させた複合めっき液及びその製造方法 Download PDFInfo
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- JP5435477B2 JP5435477B2 JP2010012598A JP2010012598A JP5435477B2 JP 5435477 B2 JP5435477 B2 JP 5435477B2 JP 2010012598 A JP2010012598 A JP 2010012598A JP 2010012598 A JP2010012598 A JP 2010012598A JP 5435477 B2 JP5435477 B2 JP 5435477B2
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- composite plating
- fine particles
- plating solution
- diamond fine
- ions
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- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000371 poly(diallyldimethylammonium chloride) polymer Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000011158 quantitative evaluation Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
- C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
- C01B32/28—After-treatment, e.g. purification, irradiation, separation or recovery
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemically Coating (AREA)
Description
−(CH2CH2O)n−(nは約4以上、好ましくは約10以上の整数)
が挙げられる。また、PDMS残基としては、
−[Si(CH3)2−O]m−(mは約3以上、好ましくは40以上の整数)
が挙げられる(特開2006−219591号公報参照)。
<無電解複合めっき液の組成>
・硫酸ニッケル六水和物 25〜30g/リットル
・界面活性剤 0.5〜10g/リットル
・ダイヤモンド微粒子 0.5〜10g/リットル
・リンゴ酸(錯化剤) 10〜50g/リットル
・コハク酸(錯化剤) 10〜50g/リットル
・次亜リン酸ナトリウム(還元剤) 20〜50g/リットル
<アニオン性官能基導入ダイヤモンド微粒子の作製>
ダイヤモンド微粒子は、住石マテリアルズ株式会社製のSCMファインダイヤ(平均粒径;20nm)を用いた。また、ダイヤモンド微粒子の表面にアニオン性官能基を導入するマクロアゾ開始剤として、和光純薬工業株式会社製の「V−501(4,4’−azobis(4−cyanoantanoic acid))」(以下「V−501」という)を使用した。
<複合めっき液の組成>
・硫酸ニッケル六水和物 25g/リットル
・次亜リン酸ナトリウム一水和物 30g/リットル
・リンゴ酸 25g/リットル
・乳酸 20g/リットル
・コハク酸 5g/リットル
・ホウ砂 5g/リットル
・ダイヤモンド微粒子分散液 2g/リットル
<PEG導入ダイヤモンド微粒子の作製>
試験管に、実施例1と同様のダイヤモンド微粒子を0.05g、PEGマクロアゾ開始剤として和光純薬工業株式会社製の「VPE−0201」を2.0g加えた。さらに、反応触媒として、o−ジクロロベンゼンを15ミリリットル加え、マグネティックスターラーで撹拌しながら、窒素雰囲気下で70℃に加熱して反応させた。
<複合めっき液の組成>
・硫酸ニッケル六水和物 25g/リットル
・次亜リン酸ナトリウム一水和物 30g/リットル
・リンゴ酸 25g/リットル
・乳酸 20g/リットル
・コハク酸 5g/リットル
・ホウ砂 5g/リットル
・ダイヤモンド微粒子分散液 0.1g/リットル
Claims (8)
- アゾ系ラジカル開始剤と水系溶媒中で反応させてアニオン性官能基が導入されたダイヤモンド微粒子をカチオン性界面活性剤とともに分散させてpH3〜8の範囲に調整した分散液を作製し、作製された分散液を金属めっき液に添加してpH3〜5の範囲に調整し、ダイヤモンド微粒子を安定して分散させた複合めっき液を製造することを特徴とする複合めっき液の製造方法。
- 前記ダイヤモンド微粒子の平均粒径が1nm〜1000nmであることを特徴とする請求項1に記載の製造方法。
- 前記界面活性剤は、分子量が30,000〜200,000である単独重合体又は共重合体の界面活性剤であることを特徴とする請求項1又は2に記載の製造方法。
- 前記金属めっき液は、ニッケルイオン、コバルトイオン、銅イオン、金イオン、鉄イオン、パラジウムイオン、白金イオン、スズイオン及びロジウムイオンよりなる群から選ばれた1種又は2種以上の金属イオンを含むことを特徴とする請求項1から3のいずれかに記載の製造方法。
- 請求項1から4のいずれかに記載された製造方法により製造されたことを特徴とする複合めっき液。
- 前記ダイヤモンド微粒子の濃度が0.1g/リットル〜20g/リットルであることを特徴とする請求項5に記載の複合めっき液。
- 請求項1から4のいずれかに記載の製造方法により製造された複合めっき液を用いて基材表面にめっき処理を行うことにより、前記ダイヤモンド微粒子を金属マトリックス中に均一に分散させた複合めっき膜を形成することを特徴とする複合めっき方法。
- 請求項7に記載の複合めっき方法により形成された複合めっき膜。
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JP2010012598A JP5435477B2 (ja) | 2010-01-22 | 2010-01-22 | ダイヤモンド微粒子を分散させた複合めっき液及びその製造方法 |
PCT/JP2011/050156 WO2011089933A1 (ja) | 2010-01-22 | 2011-01-07 | ダイヤモンド微粒子を分散させた複合めっき液及びその製造方法 |
CN201180006904.XA CN102753734B (zh) | 2010-01-22 | 2011-01-07 | 使金刚石微粒分散的复合镀覆液及其制造方法 |
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JP5614538B2 (ja) * | 2010-09-30 | 2014-10-29 | アイテック株式会社 | 複合めっき被膜の形成方法 |
JP5691984B2 (ja) * | 2011-10-06 | 2015-04-01 | トヨタ自動車株式会社 | 摺動部材およびその製造方法 |
JP5691007B2 (ja) * | 2012-03-14 | 2015-04-01 | 東洋インキScホールディングス株式会社 | ダイヤモンド微粒子を含む分散体 |
JP6062276B2 (ja) * | 2013-02-13 | 2017-01-18 | オリエンタルチエン工業株式会社 | ローラチェーン |
JP2014201779A (ja) * | 2013-04-02 | 2014-10-27 | 古河電気工業株式会社 | 粒子が分散された複合めっき材、該複合めっき材の製造方法、および該複合めっき材を製造するためのめっき液 |
CN107923042A (zh) | 2015-07-06 | 2018-04-17 | 卡尔博迪昂有限公司 | 金属镀层及其制备方法 |
US9702045B2 (en) | 2015-07-06 | 2017-07-11 | Carbodeon Ltd Oy | Metallic coating and a method for producing the same |
JP6618311B2 (ja) * | 2015-09-28 | 2019-12-11 | 株式会社ダイセル | ナノダイヤモンド含有メッキ膜およびナノダイヤモンド含有メッキ物 |
WO2017061246A1 (ja) * | 2015-10-08 | 2017-04-13 | 株式会社ダイセル | メッキ液からのナノダイヤモンド回収方法 |
JP6706095B2 (ja) * | 2016-03-01 | 2020-06-03 | 株式会社荏原製作所 | 無電解めっき装置および無電解めっき方法 |
JP2017201053A (ja) * | 2016-05-06 | 2017-11-09 | 豊橋鍍金工業株式会社 | 複合めっき方法および親水性粒子 |
JP2018083960A (ja) * | 2016-11-22 | 2018-05-31 | 株式会社ダイセル | ナノダイヤモンド含有メッキ液製造方法およびナノダイヤモンド含有メッキ液 |
CN106937491A (zh) * | 2017-04-05 | 2017-07-07 | 广东浪潮大数据研究有限公司 | 一种基于pcb板卡金手指电镀镍和电镀金工艺及其应用 |
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JP2021042397A (ja) * | 2017-12-15 | 2021-03-18 | 幹晴 高木 | めっき皮膜の結晶粒の微細化方法 |
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JPWO2020013188A1 (ja) * | 2018-07-12 | 2021-07-15 | 株式会社ダイセル | 卑金属めっき膜 |
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JP6945761B1 (ja) * | 2021-06-16 | 2021-10-06 | 株式会社Jcu | コンポジットめっき液用添加剤 |
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