JP5295524B2 - 光学薄膜成膜方法 - Google Patents

光学薄膜成膜方法 Download PDF

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Publication number
JP5295524B2
JP5295524B2 JP2007148760A JP2007148760A JP5295524B2 JP 5295524 B2 JP5295524 B2 JP 5295524B2 JP 2007148760 A JP2007148760 A JP 2007148760A JP 2007148760 A JP2007148760 A JP 2007148760A JP 5295524 B2 JP5295524 B2 JP 5295524B2
Authority
JP
Japan
Prior art keywords
substrate
optical
holding
vapor deposition
holding frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007148760A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008304497A5 (https=
JP2008304497A (ja
Inventor
伸也 亀卦川
利真 西
元生 高田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Dempa Kogyo Co Ltd
Original Assignee
Nihon Dempa Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Dempa Kogyo Co Ltd filed Critical Nihon Dempa Kogyo Co Ltd
Priority to JP2007148760A priority Critical patent/JP5295524B2/ja
Priority to CN2013100643783A priority patent/CN103149617A/zh
Priority to CN2008100982743A priority patent/CN101319301B/zh
Priority to US12/133,287 priority patent/US8075947B2/en
Publication of JP2008304497A publication Critical patent/JP2008304497A/ja
Publication of JP2008304497A5 publication Critical patent/JP2008304497A5/ja
Priority to US13/293,057 priority patent/US8367191B2/en
Application granted granted Critical
Publication of JP5295524B2 publication Critical patent/JP5295524B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12389—All metal or with adjacent metals having variation in thickness
    • Y10T428/12396—Discontinuous surface component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Filters (AREA)
JP2007148760A 2007-06-05 2007-06-05 光学薄膜成膜方法 Expired - Fee Related JP5295524B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007148760A JP5295524B2 (ja) 2007-06-05 2007-06-05 光学薄膜成膜方法
CN2013100643783A CN103149617A (zh) 2007-06-05 2008-05-28 光学薄膜的成膜方法、光学基板以及光学薄膜的成膜装置
CN2008100982743A CN101319301B (zh) 2007-06-05 2008-05-28 光学薄膜的成膜方法、光学基板以及光学薄膜的成膜装置
US12/133,287 US8075947B2 (en) 2007-06-05 2008-06-04 Optical thin-film-forming methods and optical elements formed using same
US13/293,057 US8367191B2 (en) 2007-06-05 2011-11-09 Optical thin-films and optical elements comprising same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007148760A JP5295524B2 (ja) 2007-06-05 2007-06-05 光学薄膜成膜方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012056791A Division JP2012145958A (ja) 2012-03-14 2012-03-14 光学素子

Publications (3)

Publication Number Publication Date
JP2008304497A JP2008304497A (ja) 2008-12-18
JP2008304497A5 JP2008304497A5 (https=) 2010-03-18
JP5295524B2 true JP5295524B2 (ja) 2013-09-18

Family

ID=40096144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007148760A Expired - Fee Related JP5295524B2 (ja) 2007-06-05 2007-06-05 光学薄膜成膜方法

Country Status (3)

Country Link
US (2) US8075947B2 (https=)
JP (1) JP5295524B2 (https=)
CN (2) CN101319301B (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5132534B2 (ja) * 2008-12-01 2013-01-30 日本電波工業株式会社 光学部品の製造方法
CN101698931B (zh) * 2009-11-18 2012-11-07 九江学院 一种制备超晶格热电薄膜材料的双闪蒸法装置
JP2012145958A (ja) * 2012-03-14 2012-08-02 Nippon Dempa Kogyo Co Ltd 光学素子
US9371577B2 (en) * 2013-12-31 2016-06-21 Halliburton Energy Services, Inc. Fabrication of integrated computational elements using substrate support shaped to match spatial profile of deposition plume
EP3366804B1 (en) * 2017-02-22 2022-05-11 Satisloh AG Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses
CN111139442B (zh) * 2019-12-31 2024-06-25 中山市博顿光电科技有限公司 旋转夹具及真空镀膜设备
CN115440919A (zh) * 2021-06-03 2022-12-06 Tcl科技集团股份有限公司 发光器件及其制备方法、显示器件
KR102806817B1 (ko) * 2021-07-15 2025-05-12 캐논 톡키 가부시키가이샤 성막 장치, 성막 방법 및 증발원 유닛
JP7519139B1 (ja) * 2023-10-10 2024-07-19 株式会社オプトラン 蒸着装置

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JPH02176601A (ja) * 1988-09-28 1990-07-09 Mitsubishi Electric Corp 投影レンズおよびその製造方法
JPH04143266A (ja) * 1990-10-05 1992-05-18 Nippon Telegr & Teleph Corp <Ntt> 低応力膜形成装置
US5872655A (en) * 1991-07-10 1999-02-16 Optical Coating Laboratory, Inc. Monolithic linear variable filter and method of manufacture
US5308461A (en) * 1992-01-14 1994-05-03 Honeywell Inc. Method to deposit multilayer films
JPH06337310A (ja) * 1992-10-23 1994-12-06 Matsushita Electric Ind Co Ltd 光学多層膜並びにその成膜方法及びその成膜装置
CN1188516A (zh) * 1996-04-01 1998-07-22 东丽株式会社 带薄膜基板的制造方法和制造装置
JPH10280130A (ja) 1997-04-01 1998-10-20 Nikon Corp 真空蒸着方法及び真空蒸着装置
JP2000252350A (ja) * 1999-03-04 2000-09-14 Kokusai Electric Co Ltd 基板受け渡し装置
JP3900759B2 (ja) * 1999-10-01 2007-04-04 凸版印刷株式会社 スパッタリング成膜用の基板ホルダー及びそれを用いたフォトマスクブランクスの製造方法
US6852473B2 (en) * 2000-01-12 2005-02-08 Infineon Technologies Richmond, Lp Anti-reflective coating conformality control
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Also Published As

Publication number Publication date
CN101319301A (zh) 2008-12-10
US20080305314A1 (en) 2008-12-11
CN103149617A (zh) 2013-06-12
US20120064315A1 (en) 2012-03-15
US8367191B2 (en) 2013-02-05
CN101319301B (zh) 2013-04-03
US8075947B2 (en) 2011-12-13
JP2008304497A (ja) 2008-12-18

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