CN101319301B - 光学薄膜的成膜方法、光学基板以及光学薄膜的成膜装置 - Google Patents

光学薄膜的成膜方法、光学基板以及光学薄膜的成膜装置 Download PDF

Info

Publication number
CN101319301B
CN101319301B CN2008100982743A CN200810098274A CN101319301B CN 101319301 B CN101319301 B CN 101319301B CN 2008100982743 A CN2008100982743 A CN 2008100982743A CN 200810098274 A CN200810098274 A CN 200810098274A CN 101319301 B CN101319301 B CN 101319301B
Authority
CN
China
Prior art keywords
substrate
optical
holding
thin film
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2008100982743A
Other languages
English (en)
Chinese (zh)
Other versions
CN101319301A (zh
Inventor
龟卦川伸也
西利真
高田元生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Dempa Kogyo Co Ltd
Original Assignee
Nihon Dempa Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Dempa Kogyo Co Ltd filed Critical Nihon Dempa Kogyo Co Ltd
Publication of CN101319301A publication Critical patent/CN101319301A/zh
Application granted granted Critical
Publication of CN101319301B publication Critical patent/CN101319301B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12389—All metal or with adjacent metals having variation in thickness
    • Y10T428/12396—Discontinuous surface component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Filters (AREA)
CN2008100982743A 2007-06-05 2008-05-28 光学薄膜的成膜方法、光学基板以及光学薄膜的成膜装置 Expired - Fee Related CN101319301B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007148760 2007-06-05
JP2007148760A JP5295524B2 (ja) 2007-06-05 2007-06-05 光学薄膜成膜方法
JP2007-148760 2007-06-05

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN2013100643783A Division CN103149617A (zh) 2007-06-05 2008-05-28 光学薄膜的成膜方法、光学基板以及光学薄膜的成膜装置

Publications (2)

Publication Number Publication Date
CN101319301A CN101319301A (zh) 2008-12-10
CN101319301B true CN101319301B (zh) 2013-04-03

Family

ID=40096144

Family Applications (2)

Application Number Title Priority Date Filing Date
CN2008100982743A Expired - Fee Related CN101319301B (zh) 2007-06-05 2008-05-28 光学薄膜的成膜方法、光学基板以及光学薄膜的成膜装置
CN2013100643783A Pending CN103149617A (zh) 2007-06-05 2008-05-28 光学薄膜的成膜方法、光学基板以及光学薄膜的成膜装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN2013100643783A Pending CN103149617A (zh) 2007-06-05 2008-05-28 光学薄膜的成膜方法、光学基板以及光学薄膜的成膜装置

Country Status (3)

Country Link
US (2) US8075947B2 (https=)
JP (1) JP5295524B2 (https=)
CN (2) CN101319301B (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5132534B2 (ja) * 2008-12-01 2013-01-30 日本電波工業株式会社 光学部品の製造方法
CN101698931B (zh) * 2009-11-18 2012-11-07 九江学院 一种制备超晶格热电薄膜材料的双闪蒸法装置
JP2012145958A (ja) * 2012-03-14 2012-08-02 Nippon Dempa Kogyo Co Ltd 光学素子
US9371577B2 (en) * 2013-12-31 2016-06-21 Halliburton Energy Services, Inc. Fabrication of integrated computational elements using substrate support shaped to match spatial profile of deposition plume
EP3366804B1 (en) * 2017-02-22 2022-05-11 Satisloh AG Box coating apparatus for vacuum coating of substrates, in particular spectacle lenses
CN111139442B (zh) * 2019-12-31 2024-06-25 中山市博顿光电科技有限公司 旋转夹具及真空镀膜设备
CN115440919A (zh) * 2021-06-03 2022-12-06 Tcl科技集团股份有限公司 发光器件及其制备方法、显示器件
KR102806817B1 (ko) * 2021-07-15 2025-05-12 캐논 톡키 가부시키가이샤 성막 장치, 성막 방법 및 증발원 유닛
JP7519139B1 (ja) * 2023-10-10 2024-07-19 株式会社オプトラン 蒸着装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1188516A (zh) * 1996-04-01 1998-07-22 东丽株式会社 带薄膜基板的制造方法和制造装置
CN1669117A (zh) * 2002-05-13 2005-09-14 美商克立股份有限公司 用于mocvd反应器的衬托器

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02176601A (ja) * 1988-09-28 1990-07-09 Mitsubishi Electric Corp 投影レンズおよびその製造方法
JPH04143266A (ja) * 1990-10-05 1992-05-18 Nippon Telegr & Teleph Corp <Ntt> 低応力膜形成装置
US5872655A (en) * 1991-07-10 1999-02-16 Optical Coating Laboratory, Inc. Monolithic linear variable filter and method of manufacture
US5308461A (en) * 1992-01-14 1994-05-03 Honeywell Inc. Method to deposit multilayer films
JPH06337310A (ja) * 1992-10-23 1994-12-06 Matsushita Electric Ind Co Ltd 光学多層膜並びにその成膜方法及びその成膜装置
JPH10280130A (ja) 1997-04-01 1998-10-20 Nikon Corp 真空蒸着方法及び真空蒸着装置
JP2000252350A (ja) * 1999-03-04 2000-09-14 Kokusai Electric Co Ltd 基板受け渡し装置
JP3900759B2 (ja) * 1999-10-01 2007-04-04 凸版印刷株式会社 スパッタリング成膜用の基板ホルダー及びそれを用いたフォトマスクブランクスの製造方法
US6852473B2 (en) * 2000-01-12 2005-02-08 Infineon Technologies Richmond, Lp Anti-reflective coating conformality control
CN1397024A (zh) * 2000-01-28 2003-02-12 住友电气工业株式会社 加热器模块和光波导模块
JP2001351874A (ja) 2000-06-09 2001-12-21 Ebara Corp 基板回転装置
US7195797B2 (en) * 2000-07-10 2007-03-27 Atomic Telecom High throughput high-yield vacuum deposition system
JP2002363745A (ja) * 2001-06-08 2002-12-18 Canon Inc スパッタによる膜の形成方法、光学部材、およびスパッタ装置
JP2003183821A (ja) * 2001-12-14 2003-07-03 Nikon Corp スパッタリング装置
JP2003192390A (ja) * 2001-12-19 2003-07-09 Nippon Shinku Kogaku Kk ガラス製光学素子の製造方法及びそれに用いる固定治具
US20050099611A1 (en) * 2002-06-20 2005-05-12 Nikon Corporation Minimizing thermal distortion effects on EUV mirror
JP4526776B2 (ja) * 2003-04-02 2010-08-18 株式会社半導体エネルギー研究所 発光装置及び電子機器
JP2005010736A (ja) * 2003-05-22 2005-01-13 Fujikura Ltd 光ファイバおよびこれを用いた導光体、導光体を用いた気体の浄化方法および液体の浄化方法
US6972136B2 (en) * 2003-05-23 2005-12-06 Optima, Inc. Ultra low residual reflection, low stress lens coating and vacuum deposition method for making the same
JP2005038914A (ja) * 2003-07-16 2005-02-10 Matsushita Electric Ind Co Ltd 圧電薄膜の形成装置
JP2005133110A (ja) * 2003-10-28 2005-05-26 Konica Minolta Opto Inc スパッタリング装置
EP1536036B1 (en) * 2003-11-14 2007-06-20 Sharp Kabushiki Kaisha Thin film forming apparatus
JP2005320568A (ja) * 2004-05-07 2005-11-17 Olympus Corp 薄膜形成装置及び膜厚監視方法
JP3966869B2 (ja) * 2004-05-11 2007-08-29 株式会社昭和真空 基板ドーム
JP4468867B2 (ja) * 2005-07-08 2010-05-26 日本電信電話株式会社 面内閉じ込め構造を有する多層膜フィルタおよび光波長フィルタ
JP4675791B2 (ja) * 2006-01-31 2011-04-27 株式会社東芝 ディスク装置およびその製造方法
US20070245955A1 (en) * 2006-04-25 2007-10-25 Jds Uniphase Corporation Substrate holder for optical coating machines

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1188516A (zh) * 1996-04-01 1998-07-22 东丽株式会社 带薄膜基板的制造方法和制造装置
CN1669117A (zh) * 2002-05-13 2005-09-14 美商克立股份有限公司 用于mocvd反应器的衬托器

Also Published As

Publication number Publication date
CN101319301A (zh) 2008-12-10
US20080305314A1 (en) 2008-12-11
CN103149617A (zh) 2013-06-12
US20120064315A1 (en) 2012-03-15
US8367191B2 (en) 2013-02-05
JP5295524B2 (ja) 2013-09-18
US8075947B2 (en) 2011-12-13
JP2008304497A (ja) 2008-12-18

Similar Documents

Publication Publication Date Title
CN101319301B (zh) 光学薄膜的成膜方法、光学基板以及光学薄膜的成膜装置
JP4540746B2 (ja) 光学薄膜蒸着装置及び光学薄膜の製造方法
JP5647924B2 (ja) 光学部材の製造方法
TW201923126A (zh) 高折射率氫化矽薄膜的製備方法、高折射率氫化矽薄膜、濾光疊層和濾光片
US8559094B2 (en) Thermochromic smart window and method of manufacturing the same
US6142097A (en) Optical membrane forming apparatus and optical device produced by the same
CN101726767A (zh) 光学物品及其制造方法
JP2008304497A5 (https=)
JP2004037545A (ja) Ｎｄフィルタ及びこれを用いた絞り装置
JP2006227432A (ja) 光学フィルタの製造方法及びこれを用いた光学フィルタ並びに光量調整装置
JP4804830B2 (ja) 多層膜の成膜方法および成膜装置
JP2013147752A (ja) 光学素子
JP2012145958A (ja) 光学素子
KR102579089B1 (ko) 이온빔 스퍼터링 장치를 이용한 편광필터 제조방법
JP2005017986A (ja) Ｎｄフィルタ、ｎｄフィルタの製造方法、及びこれらのｎｄフィルタを有する光量絞り装置、カメラ
JP2007078715A (ja) プラスチック製光学部品およびこれを用いた光学ユニット、ならびにプラスチック光学部品上に無機系防湿皮膜を形成する方法
JPH09189801A (ja) 耐熱性反射防止膜付き光学部品
JP2007171542A (ja) 光学絞り用ｎｄフィルタと該ｎｄフィルタを備えた光学絞り装置
KR20090130717A (ko) 마이크로 렌즈용 코팅필름 및 그 제조방법
JP2005301032A (ja) 光学薄膜成膜装置及び光学薄膜成膜方法並びに光学素子
JP2009104026A (ja) 光学フィルタの製造方法及び光学フィルタ並びに撮像光量調整装置
JP2006171645A (ja) 光学多層膜及び光学素子
WO2009125802A1 (ja) 蒸発源及び成膜装置
JP2007070657A (ja) 防汚性光学物品の製造装置
JP2006195327A (ja) 光学素子と、その製造方法と、それを用いたレンズユニットと、それを用いた電子機器

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130403

Termination date: 20160528