JP5277218B2 - 薄膜塗工装置に設ける乾燥装置 - Google Patents

薄膜塗工装置に設ける乾燥装置 Download PDF

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Publication number
JP5277218B2
JP5277218B2 JP2010178909A JP2010178909A JP5277218B2 JP 5277218 B2 JP5277218 B2 JP 5277218B2 JP 2010178909 A JP2010178909 A JP 2010178909A JP 2010178909 A JP2010178909 A JP 2010178909A JP 5277218 B2 JP5277218 B2 JP 5277218B2
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JP
Japan
Prior art keywords
drying chamber
film
drying
hot air
chamber forming
Prior art date
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Expired - Fee Related
Application number
JP2010178909A
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English (en)
Japanese (ja)
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JP2012037163A (ja
JP2012037163A5 (enrdf_load_stackoverflow
Inventor
欣英 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CLEAN TECHNOLOGY CO., LTD.
Original Assignee
CLEAN TECHNOLOGY CO., LTD.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CLEAN TECHNOLOGY CO., LTD. filed Critical CLEAN TECHNOLOGY CO., LTD.
Priority to JP2010178909A priority Critical patent/JP5277218B2/ja
Priority to KR1020100112736A priority patent/KR20120022499A/ko
Priority to TW100122601A priority patent/TW201217732A/zh
Priority to CN201110227098.0A priority patent/CN102371239B/zh
Publication of JP2012037163A publication Critical patent/JP2012037163A/ja
Publication of JP2012037163A5 publication Critical patent/JP2012037163A5/ja
Application granted granted Critical
Publication of JP5277218B2 publication Critical patent/JP5277218B2/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B13/00—Machines and apparatus for drying fabrics, fibres, yarns, or other materials in long lengths, with progressive movement
    • F26B13/10—Arrangements for feeding, heating or supporting materials; Controlling movement, tension or position of materials
    • F26B13/14—Rollers, drums, cylinders; Arrangement of drives, supports, bearings, cleaning

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Solid Materials (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2010178909A 2010-08-09 2010-08-09 薄膜塗工装置に設ける乾燥装置 Expired - Fee Related JP5277218B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010178909A JP5277218B2 (ja) 2010-08-09 2010-08-09 薄膜塗工装置に設ける乾燥装置
KR1020100112736A KR20120022499A (ko) 2010-08-09 2010-11-12 박막 도공 장치에 설치되는 건조장치
TW100122601A TW201217732A (en) 2010-08-09 2011-06-28 characterized by having a construction designed as an up-down double-layered structure to increase drying length, thereby greatly saving drying space and reducing cost
CN201110227098.0A CN102371239B (zh) 2010-08-09 2011-08-09 设于薄膜涂布装置的干燥装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010178909A JP5277218B2 (ja) 2010-08-09 2010-08-09 薄膜塗工装置に設ける乾燥装置

Publications (3)

Publication Number Publication Date
JP2012037163A JP2012037163A (ja) 2012-02-23
JP2012037163A5 JP2012037163A5 (enrdf_load_stackoverflow) 2012-08-09
JP5277218B2 true JP5277218B2 (ja) 2013-08-28

Family

ID=45790790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010178909A Expired - Fee Related JP5277218B2 (ja) 2010-08-09 2010-08-09 薄膜塗工装置に設ける乾燥装置

Country Status (4)

Country Link
JP (1) JP5277218B2 (enrdf_load_stackoverflow)
KR (1) KR20120022499A (enrdf_load_stackoverflow)
CN (1) CN102371239B (enrdf_load_stackoverflow)
TW (1) TW201217732A (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103341436A (zh) * 2013-06-21 2013-10-09 李琴 烘箱旋转机架
CN103316824A (zh) * 2013-06-21 2013-09-25 李琴 一种旋转架
JP2015206529A (ja) * 2014-04-18 2015-11-19 クリーン・テクノロジー株式会社 薄膜塗工装置に設ける乾燥装置
KR101865563B1 (ko) * 2015-12-02 2018-06-11 (주)덕산테코피아 질소 건조식 글러브 박스
JP6665555B2 (ja) * 2016-01-28 2020-03-13 富士ゼロックス株式会社 乾燥装置
CN107051818B (zh) * 2017-06-13 2019-11-26 陕西生益科技有限公司 一种立式上胶机
CN108927310A (zh) * 2018-05-10 2018-12-04 惠州市普利司德高分子材料有限公司 一种多功能双面涂布设备
CN110608590A (zh) * 2018-06-15 2019-12-24 内蒙古兆沣生物科技有限公司 一种滚筒刮板干燥机的布料方法
CN108793774A (zh) * 2018-06-21 2018-11-13 无锡腾华电缆材料科技有限公司 一种阻水玻璃纱生产工艺及其专用生产设备
CN111871674A (zh) * 2020-07-14 2020-11-03 安徽友发包装科技有限公司 一种彩色布基胶带的三次涂胶生产装置
CN114850004A (zh) * 2022-06-02 2022-08-05 东莞市坚华机械有限公司 一种回字形烤箱

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5919273Y2 (ja) * 1979-10-03 1984-06-04 株式会社阪田商会 乾燥装置
JPH0623912Y2 (ja) * 1986-07-15 1994-06-22 京都機械株式会社 布帛の移動式乾燥装置
JPH0896800A (ja) * 1994-09-21 1996-04-12 Mitsubishi Chem Corp リチウムイオン二次電池の電極板の製造方法
JP2003037053A (ja) * 2001-07-26 2003-02-07 Toshiba Corp 塗布型成膜方法、塗布型成膜装置及び半導体装置の製造方法
JP3658355B2 (ja) * 2001-10-03 2005-06-08 Ｈｏｙａ株式会社 塗布膜の乾燥方法、塗布膜の形成方法、及び塗布膜形成装置
JP2003240434A (ja) * 2002-02-20 2003-08-27 Fuji Photo Film Co Ltd 乾燥装置及びその運転・清掃方法
JP4754790B2 (ja) * 2004-07-30 2011-08-24 パナソニック株式会社 電池用電極の製造方法
JP2008173590A (ja) * 2007-01-19 2008-07-31 Toyota Motor Corp 塗工装置、及び電極箔の製造方法

Also Published As

Publication number Publication date
JP2012037163A (ja) 2012-02-23
CN102371239A (zh) 2012-03-14
TW201217732A (en) 2012-05-01
KR20120022499A (ko) 2012-03-12
CN102371239B (zh) 2015-01-07

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