JP5212474B2 - 有機エレクトロルミネッセンス素子の製造方法 - Google Patents
有機エレクトロルミネッセンス素子の製造方法 Download PDFInfo
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- JP5212474B2 JP5212474B2 JP2010519733A JP2010519733A JP5212474B2 JP 5212474 B2 JP5212474 B2 JP 5212474B2 JP 2010519733 A JP2010519733 A JP 2010519733A JP 2010519733 A JP2010519733 A JP 2010519733A JP 5212474 B2 JP5212474 B2 JP 5212474B2
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- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
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- COLNWNFTWHPORY-UHFFFAOYSA-M lithium;8-hydroxyquinoline-2-carboxylate Chemical compound [Li+].C1=C(C([O-])=O)N=C2C(O)=CC=CC2=C1 COLNWNFTWHPORY-UHFFFAOYSA-M 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
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- 229920001778 nylon Polymers 0.000 description 1
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- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 1
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- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
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- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
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- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
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- 238000010998 test method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 125000005259 triarylamine group Chemical group 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
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- 239000002759 woven fabric Substances 0.000 description 1
- NVCBVYYESHBQKS-UHFFFAOYSA-L zinc;2-carboxyquinolin-8-olate Chemical compound [Zn+2].C1=C(C([O-])=O)N=C2C(O)=CC=CC2=C1.C1=C(C([O-])=O)N=C2C(O)=CC=CC2=C1 NVCBVYYESHBQKS-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
- H10K71/441—Thermal treatment, e.g. annealing in the presence of a solvent vapour in the presence of solvent vapors, e.g. solvent vapour annealing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
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JP2008177706 | 2008-07-08 | ||
PCT/JP2009/061732 WO2010004888A1 (fr) | 2008-07-08 | 2009-06-26 | Procédé de fabrication d’éléments électroluminescents organiques |
JP2010519733A JP5212474B2 (ja) | 2008-07-08 | 2009-06-26 | 有機エレクトロルミネッセンス素子の製造方法 |
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WO (1) | WO2010004888A1 (fr) |
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JP4893839B2 (ja) * | 2010-03-29 | 2012-03-07 | 住友化学株式会社 | 発光装置の製造方法 |
JP2013012395A (ja) * | 2011-06-29 | 2013-01-17 | Panasonic Corp | パターニング装置及びそれを用いた有機elパネルの製造方法 |
KR101434658B1 (ko) * | 2011-12-28 | 2014-08-29 | 코오롱인더스트리 주식회사 | 유기 태양전지의 제조 방법 |
CN108389514A (zh) * | 2018-02-08 | 2018-08-10 | 武汉天马微电子有限公司 | 一种柔性显示屏及显示装置 |
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JP2004152512A (ja) * | 2002-10-29 | 2004-05-27 | Canon Electronics Inc | 有機エレクトロルミネセンス表示装置、及びその製造方法 |
JP2006216253A (ja) * | 2005-02-01 | 2006-08-17 | Dainippon Screen Mfg Co Ltd | 除去装置 |
JP2007515756A (ja) * | 2003-12-12 | 2007-06-14 | ゼネラル・エレクトリック・カンパニイ | パターン化被覆フィルムの形成方法及び装置 |
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JP3896872B2 (ja) * | 2002-03-06 | 2007-03-22 | コニカミノルタホールディングス株式会社 | 感光体ドラムの製造方法、製造装置 |
JP4697769B2 (ja) * | 2004-08-27 | 2011-06-08 | コニカミノルタビジネステクノロジーズ株式会社 | 電子写真感光体の製造方法 |
JP4506586B2 (ja) * | 2005-06-27 | 2010-07-21 | 富士ゼロックス株式会社 | 電子写真感光体の製造方法および余剰塗膜除去装置 |
JP5239189B2 (ja) * | 2007-03-27 | 2013-07-17 | 凸版印刷株式会社 | 有機エレクトロルミネッセンス表示装置の製造方法 |
JP2008268802A (ja) * | 2007-04-25 | 2008-11-06 | Toppan Printing Co Ltd | 有機エレクトロルミネッセンス表示装置およびその製造方法 |
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JP2004152512A (ja) * | 2002-10-29 | 2004-05-27 | Canon Electronics Inc | 有機エレクトロルミネセンス表示装置、及びその製造方法 |
JP2007515756A (ja) * | 2003-12-12 | 2007-06-14 | ゼネラル・エレクトリック・カンパニイ | パターン化被覆フィルムの形成方法及び装置 |
JP2006216253A (ja) * | 2005-02-01 | 2006-08-17 | Dainippon Screen Mfg Co Ltd | 除去装置 |
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WO2010004888A1 (fr) | 2010-01-14 |
JPWO2010004888A1 (ja) | 2012-01-05 |
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