JP5168907B2 - プラズマ処理装置、プラズマ処理方法及び記憶媒体 - Google Patents

プラズマ処理装置、プラズマ処理方法及び記憶媒体 Download PDF

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Publication number
JP5168907B2
JP5168907B2 JP2007006206A JP2007006206A JP5168907B2 JP 5168907 B2 JP5168907 B2 JP 5168907B2 JP 2007006206 A JP2007006206 A JP 2007006206A JP 2007006206 A JP2007006206 A JP 2007006206A JP 5168907 B2 JP5168907 B2 JP 5168907B2
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Prior art keywords
electrode
plasma
processing
gas
mounting table
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Expired - Fee Related
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JP2007006206A
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Japanese (ja)
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JP2008172168A5 (enExample
JP2008172168A (ja
Inventor
郁夫 沢田
Ｖｅｎｔｚｅｋ Ｐｅｔｅｒ
辰郎 大下
和愛 松崎
松潤 康
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2007006206A priority Critical patent/JP5168907B2/ja
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to CN2007800499145A priority patent/CN101601125B/zh
Priority to PCT/JP2007/075076 priority patent/WO2008087843A1/ja
Priority to KR1020097014829A priority patent/KR101124924B1/ko
Priority to US12/523,212 priority patent/US8636871B2/en
Priority to TW097101386A priority patent/TW200839924A/zh
Publication of JP2008172168A publication Critical patent/JP2008172168A/ja
Publication of JP2008172168A5 publication Critical patent/JP2008172168A5/ja
Application granted granted Critical
Publication of JP5168907B2 publication Critical patent/JP5168907B2/ja
Priority to US14/164,564 priority patent/US9252001B2/en
Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP2007006206A 2007-01-15 2007-01-15 プラズマ処理装置、プラズマ処理方法及び記憶媒体 Expired - Fee Related JP5168907B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2007006206A JP5168907B2 (ja) 2007-01-15 2007-01-15 プラズマ処理装置、プラズマ処理方法及び記憶媒体
PCT/JP2007/075076 WO2008087843A1 (ja) 2007-01-15 2007-12-27 プラズマ処理装置、プラズマ処理方法及び記憶媒体
KR1020097014829A KR101124924B1 (ko) 2007-01-15 2007-12-27 플라즈마 처리 장치, 플라즈마 처리 방법 및 기억 매체
US12/523,212 US8636871B2 (en) 2007-01-15 2007-12-27 Plasma processing apparatus, plasma processing method and storage medium
CN2007800499145A CN101601125B (zh) 2007-01-15 2007-12-27 等离子体处理装置
TW097101386A TW200839924A (en) 2007-01-15 2008-01-14 Plasma processing apparatus, plasma processing method and storage medium
US14/164,564 US9252001B2 (en) 2007-01-15 2014-01-27 Plasma processing apparatus, plasma processing method and storage medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007006206A JP5168907B2 (ja) 2007-01-15 2007-01-15 プラズマ処理装置、プラズマ処理方法及び記憶媒体

Publications (3)

Publication Number Publication Date
JP2008172168A JP2008172168A (ja) 2008-07-24
JP2008172168A5 JP2008172168A5 (enExample) 2009-10-08
JP5168907B2 true JP5168907B2 (ja) 2013-03-27

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US (2) US8636871B2 (enExample)
JP (1) JP5168907B2 (enExample)
KR (1) KR101124924B1 (enExample)
CN (1) CN101601125B (enExample)
TW (1) TW200839924A (enExample)
WO (1) WO2008087843A1 (enExample)

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