JP5112151B2 - 光照射装置 - Google Patents

光照射装置 Download PDF

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Publication number
JP5112151B2
JP5112151B2 JP2008100331A JP2008100331A JP5112151B2 JP 5112151 B2 JP5112151 B2 JP 5112151B2 JP 2008100331 A JP2008100331 A JP 2008100331A JP 2008100331 A JP2008100331 A JP 2008100331A JP 5112151 B2 JP5112151 B2 JP 5112151B2
Authority
JP
Japan
Prior art keywords
light
shielding mask
irradiation apparatus
light shielding
light irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008100331A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009253079A (ja
JP2009253079A5 (enExample
Inventor
徹二 門脇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP2008100331A priority Critical patent/JP5112151B2/ja
Priority to TW98107966A priority patent/TWI474375B/zh
Priority to CN2009101276785A priority patent/CN101556908B/zh
Publication of JP2009253079A publication Critical patent/JP2009253079A/ja
Publication of JP2009253079A5 publication Critical patent/JP2009253079A5/ja
Application granted granted Critical
Publication of JP5112151B2 publication Critical patent/JP5112151B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
  • External Artificial Organs (AREA)
JP2008100331A 2008-04-08 2008-04-08 光照射装置 Expired - Fee Related JP5112151B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008100331A JP5112151B2 (ja) 2008-04-08 2008-04-08 光照射装置
TW98107966A TWI474375B (zh) 2008-04-08 2009-03-12 光照射裝置
CN2009101276785A CN101556908B (zh) 2008-04-08 2009-03-18 光照射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008100331A JP5112151B2 (ja) 2008-04-08 2008-04-08 光照射装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012224005A Division JP5373168B2 (ja) 2012-10-09 2012-10-09 光照射装置

Publications (3)

Publication Number Publication Date
JP2009253079A JP2009253079A (ja) 2009-10-29
JP2009253079A5 JP2009253079A5 (enExample) 2011-03-03
JP5112151B2 true JP5112151B2 (ja) 2013-01-09

Family

ID=41174964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008100331A Expired - Fee Related JP5112151B2 (ja) 2008-04-08 2008-04-08 光照射装置

Country Status (3)

Country Link
JP (1) JP5112151B2 (enExample)
CN (1) CN101556908B (enExample)
TW (1) TWI474375B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011089828A1 (ja) * 2010-01-22 2011-07-28 シャープ株式会社 光照射装置、光照射方法および液晶パネルの製造方法
JP5472616B2 (ja) * 2010-01-27 2014-04-16 ウシオ電機株式会社 光照射装置
JP5373168B2 (ja) * 2012-10-09 2013-12-18 株式会社アルバック 光照射装置
JP6614795B2 (ja) * 2015-05-11 2019-12-04 Ａｉメカテック株式会社 紫外線照射装置、及び基板組立システム
CN108717250B (zh) * 2018-06-05 2021-03-23 江苏永鼎股份有限公司 一种半导体芯片生产用接触式光刻机

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3094827B2 (ja) * 1995-02-14 2000-10-03 ウシオ電機株式会社 液晶パネルの貼り合わせ方法および装置
JPH1050584A (ja) * 1996-08-07 1998-02-20 Nikon Corp マスク保持装置
JP2001059953A (ja) * 1999-08-23 2001-03-06 Seiko Epson Corp 基板圧着装置及び液晶装置の製造方法
JP3483809B2 (ja) * 1999-08-31 2004-01-06 シャープ株式会社 基板の貼り合わせ方法および貼り合わせ装置並びに液晶表示装置の製造方法
US7365822B2 (en) * 2002-02-20 2008-04-29 Lg.Philips Lcd Co., Ltd. Method for fabricating LCD
JP4039174B2 (ja) * 2002-08-12 2008-01-30 ウシオ電機株式会社 ディスプレイパネルの貼り合わせ装置
JP2004151325A (ja) * 2002-10-30 2004-05-27 Fujitsu Ltd 基板貼り合せ方法
KR100578262B1 (ko) * 2003-11-13 2006-05-11 주식회사 디엠에스 진공을 이용한 대면적 마스크 고정장치 및 그를 이용한노광장치와 노광방법
JP4380316B2 (ja) * 2003-12-17 2009-12-09 ウシオ電機株式会社 マスク取り付け治具および該マスク取り付け治具を用いたマスク取り付け方法
JP4572626B2 (ja) * 2004-08-26 2010-11-04 ウシオ電機株式会社 光照射装置
US20070070311A1 (en) * 2005-09-23 2007-03-29 Asml Netherlands B.V. Contacts to microdevices
JP4150041B2 (ja) * 2005-12-26 2008-09-17 富士通株式会社 貼合せ基板製造装置
JP4150042B2 (ja) * 2005-12-26 2008-09-17 富士通株式会社 貼合せ基板製造装置及び貼合せ基板製造方法
JP4118922B2 (ja) * 2006-03-24 2008-07-16 富士通株式会社 貼合せ基板製造装置及び貼合せ基板製造方法

Also Published As

Publication number Publication date
CN101556908B (zh) 2012-05-30
JP2009253079A (ja) 2009-10-29
CN101556908A (zh) 2009-10-14
TW200943385A (en) 2009-10-16
TWI474375B (zh) 2015-02-21

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