CN101556908B - 光照射装置 - Google Patents
光照射装置 Download PDFInfo
- Publication number
- CN101556908B CN101556908B CN2009101276785A CN200910127678A CN101556908B CN 101556908 B CN101556908 B CN 101556908B CN 2009101276785 A CN2009101276785 A CN 2009101276785A CN 200910127678 A CN200910127678 A CN 200910127678A CN 101556908 B CN101556908 B CN 101556908B
- Authority
- CN
- China
- Prior art keywords
- light
- light shield
- adsorption tube
- tubing
- ultraviolet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010521 absorption reaction Methods 0.000 claims abstract description 18
- 238000001179 sorption measurement Methods 0.000 claims description 82
- 230000008093 supporting effect Effects 0.000 claims description 34
- 230000005540 biological transmission Effects 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 230000003760 hair shine Effects 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 39
- 239000000853 adhesive Substances 0.000 description 30
- 230000001070 adhesive effect Effects 0.000 description 29
- 239000003566 sealing material Substances 0.000 description 14
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical group C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 12
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 238000005286 illumination Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 208000034189 Sclerosis Diseases 0.000 description 1
- 230000008485 antagonism Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
Images
Landscapes
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lining Or Joining Of Plastics Or The Like (AREA)
- External Artificial Organs (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008100331 | 2008-04-08 | ||
| JP2008-100331 | 2008-04-08 | ||
| JP2008100331A JP5112151B2 (ja) | 2008-04-08 | 2008-04-08 | 光照射装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101556908A CN101556908A (zh) | 2009-10-14 |
| CN101556908B true CN101556908B (zh) | 2012-05-30 |
Family
ID=41174964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009101276785A Expired - Fee Related CN101556908B (zh) | 2008-04-08 | 2009-03-18 | 光照射装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5112151B2 (enExample) |
| CN (1) | CN101556908B (enExample) |
| TW (1) | TWI474375B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011089828A1 (ja) * | 2010-01-22 | 2011-07-28 | シャープ株式会社 | 光照射装置、光照射方法および液晶パネルの製造方法 |
| JP5472616B2 (ja) * | 2010-01-27 | 2014-04-16 | ウシオ電機株式会社 | 光照射装置 |
| JP5373168B2 (ja) * | 2012-10-09 | 2013-12-18 | 株式会社アルバック | 光照射装置 |
| JP6614795B2 (ja) * | 2015-05-11 | 2019-12-04 | Aiメカテック株式会社 | 紫外線照射装置、及び基板組立システム |
| CN108717250B (zh) * | 2018-06-05 | 2021-03-23 | 江苏永鼎股份有限公司 | 一种半导体芯片生产用接触式光刻机 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5847813A (en) * | 1996-08-07 | 1998-12-08 | Nikon Corporation | Mask holder for microlithography exposure |
| CN1485663A (zh) * | 2002-08-12 | 2004-03-31 | 优志旺电机株式会社 | 显示面板粘合装置 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3094827B2 (ja) * | 1995-02-14 | 2000-10-03 | ウシオ電機株式会社 | 液晶パネルの貼り合わせ方法および装置 |
| JP2001059953A (ja) * | 1999-08-23 | 2001-03-06 | Seiko Epson Corp | 基板圧着装置及び液晶装置の製造方法 |
| JP3483809B2 (ja) * | 1999-08-31 | 2004-01-06 | シャープ株式会社 | 基板の貼り合わせ方法および貼り合わせ装置並びに液晶表示装置の製造方法 |
| US7365822B2 (en) * | 2002-02-20 | 2008-04-29 | Lg.Philips Lcd Co., Ltd. | Method for fabricating LCD |
| JP2004151325A (ja) * | 2002-10-30 | 2004-05-27 | Fujitsu Ltd | 基板貼り合せ方法 |
| KR100578262B1 (ko) * | 2003-11-13 | 2006-05-11 | 주식회사 디엠에스 | 진공을 이용한 대면적 마스크 고정장치 및 그를 이용한노광장치와 노광방법 |
| JP4380316B2 (ja) * | 2003-12-17 | 2009-12-09 | ウシオ電機株式会社 | マスク取り付け治具および該マスク取り付け治具を用いたマスク取り付け方法 |
| JP4572626B2 (ja) * | 2004-08-26 | 2010-11-04 | ウシオ電機株式会社 | 光照射装置 |
| US20070070311A1 (en) * | 2005-09-23 | 2007-03-29 | Asml Netherlands B.V. | Contacts to microdevices |
| JP4150041B2 (ja) * | 2005-12-26 | 2008-09-17 | 富士通株式会社 | 貼合せ基板製造装置 |
| JP4150042B2 (ja) * | 2005-12-26 | 2008-09-17 | 富士通株式会社 | 貼合せ基板製造装置及び貼合せ基板製造方法 |
| JP4118922B2 (ja) * | 2006-03-24 | 2008-07-16 | 富士通株式会社 | 貼合せ基板製造装置及び貼合せ基板製造方法 |
-
2008
- 2008-04-08 JP JP2008100331A patent/JP5112151B2/ja not_active Expired - Fee Related
-
2009
- 2009-03-12 TW TW98107966A patent/TWI474375B/zh not_active IP Right Cessation
- 2009-03-18 CN CN2009101276785A patent/CN101556908B/zh not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5847813A (en) * | 1996-08-07 | 1998-12-08 | Nikon Corporation | Mask holder for microlithography exposure |
| CN1485663A (zh) * | 2002-08-12 | 2004-03-31 | 优志旺电机株式会社 | 显示面板粘合装置 |
Non-Patent Citations (1)
| Title |
|---|
| JP平8-334887A 1996.12.17 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5112151B2 (ja) | 2013-01-09 |
| JP2009253079A (ja) | 2009-10-29 |
| CN101556908A (zh) | 2009-10-14 |
| TW200943385A (en) | 2009-10-16 |
| TWI474375B (zh) | 2015-02-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120530 |
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| CF01 | Termination of patent right due to non-payment of annual fee |