TW200943385A - A light irradiation apparatus - Google Patents
A light irradiation apparatusInfo
- Publication number
- TW200943385A TW200943385A TW98107966A TW98107966A TW200943385A TW 200943385 A TW200943385 A TW 200943385A TW 98107966 A TW98107966 A TW 98107966A TW 98107966 A TW98107966 A TW 98107966A TW 200943385 A TW200943385 A TW 200943385A
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- hood
- irradiation apparatus
- light irradiation
- transmittant
- Prior art date
Links
Landscapes
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lining Or Joining Of Plastics Or The Like (AREA)
- External Artificial Organs (AREA)
Abstract
This invention is a light irradiation device. It can increase the light intensity emitted from a light resource onto an object. The light irradiation apparatus comprises a light source 40, a hood M that is placed beneath the light source 40, a supporting piece 24 that is installed above the hood M, a suction tube 30 which is supported by the supporting piece 24 and is light transmittant and utilizes vacuum suction to attach to the hood M. The light irradiation apparatus emits light from the light source 40. The light travels through the light transmittant hood M, and illuminates an object W which is placed beneath the light transmittant hood M.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008100331A JP5112151B2 (en) | 2008-04-08 | 2008-04-08 | Light irradiation device |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200943385A true TW200943385A (en) | 2009-10-16 |
TWI474375B TWI474375B (en) | 2015-02-21 |
Family
ID=41174964
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW98107966A TWI474375B (en) | 2008-04-08 | 2009-03-12 | Light irradiation apparatus |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5112151B2 (en) |
CN (1) | CN101556908B (en) |
TW (1) | TWI474375B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2011089828A1 (en) * | 2010-01-22 | 2013-05-23 | シャープ株式会社 | Light irradiation apparatus, light irradiation method, and liquid crystal panel manufacturing method |
JP5472616B2 (en) * | 2010-01-27 | 2014-04-16 | ウシオ電機株式会社 | Light irradiation device |
JP5373168B2 (en) * | 2012-10-09 | 2013-12-18 | 株式会社アルバック | Light irradiation device |
JP6614795B2 (en) * | 2015-05-11 | 2019-12-04 | Aiメカテック株式会社 | Ultraviolet irradiation device and substrate assembly system |
CN108717250B (en) * | 2018-06-05 | 2021-03-23 | 江苏永鼎股份有限公司 | Contact photoetching machine for semiconductor chip production |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3094827B2 (en) * | 1995-02-14 | 2000-10-03 | ウシオ電機株式会社 | Method and apparatus for bonding liquid crystal panels |
JPH1050584A (en) * | 1996-08-07 | 1998-02-20 | Nikon Corp | Mask holder |
JP2001059953A (en) * | 1999-08-23 | 2001-03-06 | Seiko Epson Corp | Substrate press-contacting device and manufacture of liquid crystal device |
JP3483809B2 (en) * | 1999-08-31 | 2004-01-06 | シャープ株式会社 | Substrate bonding method and bonding apparatus, and liquid crystal display device manufacturing method |
CN100385300C (en) * | 2002-02-20 | 2008-04-30 | Lg.菲利浦Lcd株式会社 | Liquid-crystal display production |
JP4039174B2 (en) * | 2002-08-12 | 2008-01-30 | ウシオ電機株式会社 | Display panel bonding device |
JP2004151325A (en) * | 2002-10-30 | 2004-05-27 | Fujitsu Ltd | Method of bonding substrates together |
KR100578262B1 (en) * | 2003-11-13 | 2006-05-11 | 주식회사 디엠에스 | Apparatus for fixing mask by vacuum and exposure method of the same |
JP4380316B2 (en) * | 2003-12-17 | 2009-12-09 | ウシオ電機株式会社 | Mask mounting jig and mask mounting method using the mask mounting jig |
JP4572626B2 (en) * | 2004-08-26 | 2010-11-04 | ウシオ電機株式会社 | Light irradiation device |
US20070070311A1 (en) * | 2005-09-23 | 2007-03-29 | Asml Netherlands B.V. | Contacts to microdevices |
JP4150042B2 (en) * | 2005-12-26 | 2008-09-17 | 富士通株式会社 | Bonded substrate manufacturing apparatus and bonded substrate manufacturing method |
JP4150041B2 (en) * | 2005-12-26 | 2008-09-17 | 富士通株式会社 | Bonded board manufacturing equipment |
JP4118922B2 (en) * | 2006-03-24 | 2008-07-16 | 富士通株式会社 | Bonded substrate manufacturing apparatus and bonded substrate manufacturing method |
-
2008
- 2008-04-08 JP JP2008100331A patent/JP5112151B2/en not_active Expired - Fee Related
-
2009
- 2009-03-12 TW TW98107966A patent/TWI474375B/en active
- 2009-03-18 CN CN2009101276785A patent/CN101556908B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2009253079A (en) | 2009-10-29 |
CN101556908A (en) | 2009-10-14 |
TWI474375B (en) | 2015-02-21 |
CN101556908B (en) | 2012-05-30 |
JP5112151B2 (en) | 2013-01-09 |
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