TWI474375B - Light irradiation apparatus - Google Patents
Light irradiation apparatus Download PDFInfo
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- TWI474375B TWI474375B TW98107966A TW98107966A TWI474375B TW I474375 B TWI474375 B TW I474375B TW 98107966 A TW98107966 A TW 98107966A TW 98107966 A TW98107966 A TW 98107966A TW I474375 B TWI474375 B TW I474375B
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Description
本發明，係有關例如在用於液晶等平板顯示器(FPD：Flat Panel Display)之兩片光透射性基板之貼合步驟所使用之光照射裝置。The present invention relates to a light irradiation device used in a bonding step of, for example, two light-transmitting substrates for a flat panel display (FPD: Flat Panel Display) such as a liquid crystal.
習知，此種例如紫外線光照射裝置，藉由對設於具有光透射性之貼合基板內之由紫外線硬化性樹脂構成之密封材，隔著該基板照射紫外線，據以使該密封材硬化而將該基板彼此貼合。此種光照射裝置，例如揭示於專利文獻1者，將基板載置於配置在射出紫外線之燈的下方之工件載台(work stage)上，在該基板與燈之間配置有遮光罩。遮光罩係用以於玻璃基板之板面形成所要的遮光圖案者，來自燈之紫外線藉由遮光罩局部遮光。此種光照射裝置，藉由遮光罩可使紫外線僅照射基板之密封材部分，可抑制以該密封材密封於基板間之液晶因紫外線的照射而產生特性變化。In the ultraviolet light irradiation device, for example, a sealing material made of an ultraviolet curable resin provided in a light-transmitting bonded substrate is irradiated with ultraviolet rays through the substrate, whereby the sealing material is hardened. The substrates are bonded to each other. Such a light irradiation device is disclosed, for example, in Patent Document 1, in which a substrate is placed on a workpiece stage disposed below a lamp that emits ultraviolet rays, and a light shielding cover is disposed between the substrate and the lamp. The hood is used to form a desired light-shielding pattern on the surface of the glass substrate, and the ultraviolet light from the lamp is partially shielded from light by the hood. In such a light irradiation device, the ultraviolet ray can illuminate only the sealing material portion of the substrate by the hood, and it is possible to suppress the change in characteristics of the liquid crystal sealed between the substrates by the sealing material due to the irradiation of ultraviolet rays.
作為上述之遮光罩之保持構造，例如在專利文獻1，於具有光透射性之板狀光罩保持構件下面吸附保持遮光罩。光罩保持部其周緣部被支承，在光罩保持構件下面形成與真空源連通之吸附槽等。又，利用吸附槽之真空吸引，將遮光罩密合保持於光罩保持構件。此種光照射裝置，係將來自燈之紫外線透過光罩保持構件及遮光罩而照射於基板。In the holding structure of the above-described hood, for example, in Patent Document 1, the hood is sucked and held under the plate-shaped reticle holding member having light transparency. The peripheral portion of the mask holding portion is supported, and an adsorption groove or the like that communicates with a vacuum source is formed under the mask holding member. Moreover, the hood is adhered and held by the reticle holding member by vacuum suction of the adsorption groove. In such a light irradiation device, ultraviolet rays from the lamp are transmitted through the mask holding member and the hood to be irradiated onto the substrate.
然而，如上述專利文獻1之紫外線光照射裝置，由於來自燈之紫外線不僅透射過遮光罩亦透射過光罩保持構件，因此，存在有因光罩保持構件而使照射於基板之紫外線量減少的問題。由於近年來對於FPD等要求更大畫面化，謀求貼合基板的大型化，因此，在紫外線光照射裝置亦需將遮光罩及光罩保持構件大型化，若光罩保持構件的厚度尺寸變大，則會出現如上述之紫外線量減少的問題更顯著。However, in the ultraviolet light irradiation device of Patent Document 1, since the ultraviolet light from the lamp is transmitted not only through the hood but also through the reticle holding member, there is a possibility that the amount of ultraviolet ray irradiated to the substrate is reduced by the reticle holding member. problem. In recent years, in order to increase the size of the FPD and the like, and to increase the size of the bonded substrate, it is necessary to increase the size of the reticle and the reticle holding member in the ultraviolet ray irradiation device, and the thickness of the reticle holding member becomes large. The problem of a decrease in the amount of ultraviolet rays as described above is more remarkable.
[專利文獻1]日本特開2006-66585號公報[Patent Document 1] Japanese Laid-Open Patent Publication No. 2006-66585
本發明係提供一種光照射裝置，可增加從光源射出而照射於被照射體的光量。The present invention provides a light irradiation device capable of increasing the amount of light emitted from a light source and irradiated onto an object to be irradiated.
本發明之一態樣之光照射裝置，係將從光源射出、透射過配置於該光源下方之遮光罩之光，照射於配置在該遮光罩下方之被照射體，其具備：支承構件，設於該遮光罩上方；及吸附管，被該支承構件支承，具有光透射性，利用真空吸引以吸附保持該遮光罩。A light irradiation device according to an aspect of the present invention is configured to emit light that is emitted from a light source and transmitted through a hood disposed under the light source, and is irradiated to an object to be irradiated disposed under the hood, and includes: a support member; Above the hood; and the absorbing tube is supported by the supporting member and is light transmissive, and is vacuum-sucked to adsorb and hold the hood.
以下，根據圖式以說明一實施形態之光照射裝置。一實施形態之光照射裝置，具體化為例如照射紫外線之紫外線照射裝置。紫外線照射裝置，例如用於製造液晶顯示器(LCD)的面板之面板製造裝置。Hereinafter, a light irradiation device according to an embodiment will be described based on the drawings. The light irradiation device of one embodiment is embodied, for example, as an ultraviolet irradiation device that irradiates ultraviolet rays. An ultraviolet ray irradiation device such as a panel manufacturing device for manufacturing a panel of a liquid crystal display (LCD).
圖1所示之紫外線照射裝置，係藉由對介設於構成液晶面板之貼合基板W(圖中，中央上部)內之由紫外線硬化性樹脂構成之密封材S(參照圖2)照射紫外線UV，以使該密封材S硬化者。又，介設有密封材S之貼合基板W，係經由面板製造裝置之密封材塗布步驟、液晶滴下步驟及衝壓步驟所形成。藉由該等步驟，於貼合基板W內，使密封材S沿著板面形成框狀，於該密封材S之框中存在有滴下之液晶L(參照圖2)。The ultraviolet irradiation device shown in Fig. 1 is irradiated with ultraviolet rays by a sealing material S (see Fig. 2) made of an ultraviolet curable resin interposed in a bonded substrate W (in the center upper portion) constituting the liquid crystal panel. UV to cure the sealing material S. Moreover, the bonded substrate W in which the sealing material S is interposed is formed by the sealing material application step of the panel manufacturing apparatus, the liquid crystal dropping step, and the pressing step. By the above steps, the sealing material S is formed in a frame shape along the plate surface in the bonded substrate W, and the liquid crystal L dripped in the frame of the sealing material S (see FIG. 2).
如圖1所示，在形成平面之基部1上設有工件載台部11，以載置上述衝壓步驟後所搬送之貼合基板W。工件載台部11下段之工件移動機構12，係設置成可移動於沿基部1上面方向，且相對於基部1上面可旋轉於水平方向。在工件移動機構12上段，設有用以使工件載台部11進行上下動作之驅動部13。在驅動部13立設一對升降銷14，且在升降銷14的上下方向中間位置，固定有跨設於兩升降銷14之支承台15。在驅動部13之兩升降銷14之間，將插通於支承台15之柱狀的可動部16設成可移動於上下方向。As shown in Fig. 1, a workpiece stage portion 11 is provided on a base portion 1 for forming a flat surface, and the bonded substrate W conveyed after the above-described press step is placed. The workpiece moving mechanism 12 in the lower stage of the workpiece stage portion 11 is provided to be movable in the direction of the upper surface of the base portion 1 and is rotatable in the horizontal direction with respect to the upper surface of the base portion 1. In the upper stage of the workpiece moving mechanism 12, a drive unit 13 for moving the workpiece stage 11 up and down is provided. A pair of lift pins 14 are erected on the drive unit 13, and a support base 15 spanning the two lift pins 14 is fixed at an intermediate position in the vertical direction of the lift pins 14. Between the two lift pins 14 of the drive unit 13, the columnar movable portion 16 inserted through the support base 15 is provided to be movable in the vertical direction.
在可動部16上端，固定有作為載置台之工件載台本體17，且於該工件載台本體17上面形成有呈平面狀的載置面17a。工件載台本體17，係隨著上述工件移動機構12的動作而平面移動及旋轉，並隨著可動部16的動作而上下移動。在工件載台本體17，貫通形成有分別供升降銷14插通之插通孔17b，並於較插通孔17b更外側位置分別形成有貫通孔17c。於照射加工時，將上述貼合基板W載置於該工件載台本體17之載置面17a。A workpiece stage main body 17 as a mounting table is fixed to the upper end of the movable portion 16, and a flat mounting surface 17a is formed on the upper surface of the workpiece stage main body 17. The workpiece stage main body 17 moves and rotates in a plane in accordance with the operation of the workpiece moving mechanism 12, and moves up and down in accordance with the movement of the movable portion 16. The workpiece stage main body 17 is formed with insertion holes 17b through which the lift pins 14 are inserted, and through holes 17c are formed at positions outside the insertion holes 17b. At the time of irradiation processing, the bonded substrate W is placed on the mounting surface 17a of the workpiece stage main body 17.
在工件載台部11周圍，立設於基部1之第1框體21，其上端部係往內側彎曲，藉由該上端部形成矩形狀的開口21a。又，該開口21a係大於貼合基板W及遮光罩M之平面尺寸。第1框體21，係設置成可從其側方將貼合基板W插入而載置於工件載台本體17。又，在第1框體21之上下方向中間位置，於往內側延設之一對支承部21b，在該貫通孔17c正下方位置分別固定有用以進行該工件載台部11的對位之對準攝影機21c。The first frame body 21 is erected on the base portion 1 around the workpiece stage portion 11, and its upper end portion is bent inward, and a rectangular opening 21a is formed in the upper end portion. Moreover, the opening 21a is larger than the planar size of the bonded substrate W and the shade M. The first frame body 21 is provided so that the bonded substrate W can be inserted from the side thereof and placed on the workpiece stage main body 17. Further, at the intermediate position in the lower direction of the first frame body 21, a pair of support portions 21b are extended on the inner side, and the alignment of the workpiece stage portion 11 is fixed to the position directly below the through hole 17c. The camera 21c.
被第1框體21支承之第2框體22，係從該第1框體21往上方延伸，且其上端部往內側彎曲，藉由該上端部形成開口22a。在該開口22a上方，於第2框體22架設有水平延伸之支承樑23。較佳係複數根支承樑23並設於與其長邊方向正交的方向(圖1中正交於紙面方向)。在各支承樑23設有作為支承構件之保持構件24。較佳係複數個保持構件24並設於各支承樑23之長邊方向。各保持構件24支承有吸附管30，該吸附管30係在該貼合基板W上方用以保持遮光罩M者。各保持構件24，係設置成可沿著支承樑23之長邊方向變更配置位置，且可若干移動於與支承樑23之長邊方向正交的方向，並可對支承樑23旋動於水平方向，藉此，各吸附管23之保持位置可在既定範圍變更自如。The second frame body 22 supported by the first frame body 21 extends upward from the first frame body 21, and the upper end portion thereof is bent inward, and the opening 22a is formed by the upper end portion. Above the opening 22a, a horizontally extending support beam 23 is placed on the second frame 22. Preferably, the plurality of support beams 23 are disposed in a direction orthogonal to the longitudinal direction thereof (the direction orthogonal to the paper surface in Fig. 1). A holding member 24 as a supporting member is provided on each of the support beams 23. Preferably, a plurality of holding members 24 are provided in the longitudinal direction of each of the support beams 23. Each of the holding members 24 supports an adsorption tube 30 that is held above the bonded substrate W to hold the light shielding cover M. Each of the holding members 24 is provided so as to be changeable in the longitudinal direction of the support beam 23, and is movable in a direction orthogonal to the longitudinal direction of the support beam 23, and can be rotated to the horizontal direction of the support beam 23. With this direction, the holding position of each adsorption tube 23 can be changed freely within a predetermined range.
各吸附管23，係由第1管材31、與固定於該第1管材31之下端部的第2管材32構成。又，該等第1及第2管材31、32分別呈截面圓筒狀，且該等材質係使用石英玻璃。各第1管材31插通於保持構件24，固定於該第1管材31之上部開口端的蓋體33載置於保持構件24上部。藉此，第1管材31通過保持構件24而以可移動於軸方向的方式被支承於蓋體33。各第1管材31透過設於蓋體33之連結件34而連接於作為真空源之真空泵35，從該真空泵35可將負壓供應於第1管材31內。Each of the adsorption tubes 23 is composed of a first tube 31 and a second tube 32 fixed to the lower end portion of the first tube 31. Further, each of the first and second pipes 31 and 32 has a cylindrical cross section, and quartz glass is used as the materials. Each of the first tubes 31 is inserted into the holding member 24, and the lid 33 fixed to the open end of the upper portion of the first tube 31 is placed on the upper portion of the holding member 24. Thereby, the first pipe member 31 is supported by the lid body 33 so as to be movable in the axial direction by the holding member 24. Each of the first pipes 31 is connected to a vacuum pump 35 as a vacuum source through a coupling member 34 provided in the lid body 33, and a negative pressure is supplied from the vacuum pump 35 to the first pipe member 31.
如圖2所示，第1管材31下端插入第2管材32之開口端，該第1及第2管材31、32固定成同軸。又，在圖2中，為避免圖複雜，故省略表示第1及第2管材31、32之截面之圖示。第1管材31插入至第2管材32之軸方向中間部為止，第1及第2管材31、32，係以介設於第2管材32內周面與第1管材31外周面間之由具有光透射性之紫外線硬化性樹脂構成之黏著劑(省略圖示)固定。As shown in Fig. 2, the lower end of the first pipe member 31 is inserted into the open end of the second pipe member 32, and the first and second pipes 31, 32 are fixed coaxially. In addition, in FIG. 2, in order to avoid the complexity of the figure, the illustration of the cross section of the 1st and 2nd tube material 31 and 32 is abbreviate|omitted. The first pipe member 31 is inserted into the intermediate portion of the second pipe member 32 in the axial direction, and the first and second pipes 31 and 32 are interposed between the inner circumferential surface of the second pipe member 32 and the outer peripheral surface of the first pipe member 31. An adhesive (not shown) made of a light-transmitting ultraviolet curable resin is fixed.
如圖1所示，在支承樑23下方，作為細長形狀紫外線源(光源)之燈40配置於不與吸附管30干涉之位置。又，燈40係配置成其長邊方向沿著支承樑23之長邊方向。較佳係複數個燈40在與其長邊方向正交的方向(圖1中正交於紙面方向)，並設於各吸附管30之間。各燈40從其長邊方向觀之，朝下方以既定角度擴散的方式射出紫外線UV。又，該支承樑23及保持構件24，係設於偏離從燈40照射於遮光罩M之紫外線UV之光路的位置。藉此，可防止從燈40射出之紫外線UV被支承樑23及保持構件24遮光。As shown in FIG. 1, under the support beam 23, the lamp 40 which is an elongated ultraviolet source (light source) is disposed at a position which does not interfere with the adsorption tube 30. Further, the lamp 40 is disposed such that its longitudinal direction is along the longitudinal direction of the support beam 23. Preferably, the plurality of lamps 40 are disposed between the respective adsorption tubes 30 in a direction orthogonal to the longitudinal direction thereof (orthogonal to the plane of the paper in FIG. 1). Each of the lamps 40 is viewed from the longitudinal direction thereof, and emits ultraviolet rays UV so as to diffuse downward at a predetermined angle. Further, the support beam 23 and the holding member 24 are disposed at positions deviated from the optical path of the ultraviolet ray UV irradiated from the lamp 40 to the hood M. Thereby, it is possible to prevent the ultraviolet ray UV emitted from the lamp 40 from being shielded from light by the support beam 23 and the holding member 24.
各吸附管30，利用真空泵35的真空吸引而在第2管材32下端吸附保持遮光罩M。如圖2所示，遮光罩M，係於玻璃板Ma的板面(較佳為下面)具有以所要圖案所形成之遮光部Mb，以該遮光部Mb遮光來自上方之紫外線UV，並以透光部(遮光部Mb以外的部位)使紫外線UV透射過。遮光罩M，被保持成使其遮光部Mb位於貼合基板W內部之液晶L上方，透光部位於貼合基板W內部之密封材S上方。又，遮光罩M的平面大小係設定成與貼合基板W的平面大小大致相等。又，在遮光罩M與貼合基板W間設定有些微間隙。該遮光罩M係對應於貼合基板W的種類而準備複數種類，可對應於貼合基板W的種類變更而更換。Each of the adsorption tubes 30 sucks and holds the shade M at the lower end of the second tube 32 by vacuum suction of the vacuum pump 35. As shown in FIG. 2, the hood M is attached to the plate surface (preferably below) of the glass plate Ma to have a light shielding portion Mb formed in a desired pattern, and the light shielding portion Mb blocks the ultraviolet ray UV from above. The light portion (a portion other than the light shielding portion Mb) transmits ultraviolet rays UV. The shade M is held such that the light shielding portion Mb is positioned above the liquid crystal L inside the bonded substrate W, and the light transmitting portion is positioned above the sealing material S inside the bonded substrate W. Moreover, the plane size of the hood M is set to be substantially equal to the plane size of the bonded substrate W. Further, a slight gap is set between the hood M and the bonded substrate W. The hood M is prepared in a plurality of types depending on the type of the bonded substrate W, and can be replaced in accordance with the type of the bonded substrate W.
因此，對應於遮光罩M的種類而調整吸附管30的水平方向位置，藉此，可變更該遮光罩M的吸附位置。此時，藉各吸附管30所致之遮光罩M的吸附位置，更佳係在遮光部Mb上方。藉此，來自燈40的紫外線UV並未透射過吸附管30，而可增加對密封材S的照射量，可整體提高照射於密封材S的紫外線量。又，在圖2，雖圖示將一部分的吸附管30，並非在遮光罩M之遮光部Mb而在透光部上方吸附保持遮光罩M之情形，在此情形，亦能比習知更提高光照射量。即，習知，光罩保持手段係將光罩上面全部覆蓋，相對於此，本實施形態，各吸附管30僅保持遮光罩M上面的一部分，而未覆蓋遮光罩M整面。因此，到達遮光罩M之紫外線量、乃至對密封材S的紫外線照射量增加。Therefore, the horizontal position of the adsorption tube 30 is adjusted in accordance with the type of the light shielding cover M, whereby the suction position of the light shielding cover M can be changed. At this time, the suction position of the shade M by the respective adsorption tubes 30 is preferably above the light shielding portion Mb. Thereby, the ultraviolet ray UV from the lamp 40 is not transmitted through the absorbing tube 30, and the amount of irradiation to the sealing material S can be increased, and the amount of ultraviolet ray irradiated to the sealing material S can be increased as a whole. In addition, in FIG. 2, it is shown that a part of the adsorption tube 30 does not adhere to the light-shielding part M in the light-shielding part Mb of the hood M, and the hood M is adsorbed and held above the light-transmitting part. The amount of light exposure. That is, conventionally, the mask holding means covers the entire surface of the mask, whereas in the present embodiment, each of the adsorption tubes 30 holds only a part of the upper surface of the mask M, and does not cover the entire surface of the mask M. Therefore, the amount of ultraviolet rays reaching the hood M and the amount of ultraviolet ray irradiation to the sealing material S increase.
如圖1所示，在該第1框體21上部，沿該遮光罩M之周緣部Mc設有複數個支承體41，該複數個支承體41，係支承用以吸附保持遮光罩M之周緣部Mc的周緣部吸附管47。如圖3所示，各支承體41，其底座部42係固定於第1筐體21，該底座部42的上面呈水平，該上面載置有可動保持部43。底座部42及可動保持部43，係在與遮光罩M相反側的端面藉由作為彈性構件之板彈簧44彼此連結，可動保持部43對抗該板彈簧44的彈壓力而可在底座部42上移動。在可動保持部43，形成自其下端往兩側延伸之凸緣部43a(僅圖示單側)。在底座部42設有複數個按壓部45，該複數個按壓部45，具有將各凸緣部43a之上端面朝下方按壓之壓縮彈簧45a，可動保持部43藉由各按壓部45的彈壓力而壓接於底座部42。即，凸緣部43a，對於底座部42容許可動保持部43的水平移動，且支承壓縮彈簧45a。又，在圖1，為使圖示簡化，故省略按壓部45之圖示。As shown in FIG. 1, a plurality of support bodies 41 are provided along the peripheral edge portion Mc of the hood M in the upper portion of the first frame body 21, and the plurality of support bodies 41 are supported to hold and hold the periphery of the hood M. The peripheral portion of the portion Mc is adsorbed by the tube 47. As shown in FIG. 3, each of the support bodies 41 has its base portion 42 fixed to the first housing 21, and the upper surface of the base portion 42 is horizontal, and the movable holding portion 43 is placed on the upper surface. The base portion 42 and the movable holding portion 43 are connected to each other by an end surface on the opposite side of the shade M by a leaf spring 44 as an elastic member, and the movable holding portion 43 is movable on the base portion 42 against the elastic pressure of the leaf spring 44. mobile. The movable holding portion 43 is formed with a flange portion 43a (only one side is shown) extending from the lower end thereof to both sides. The base portion 42 is provided with a plurality of pressing portions 45 having compression springs 45a that press the upper end faces of the respective flange portions 43a downward, and the movable holding portion 43 is biased by the pressing portions 45. The pressure is applied to the base portion 42. In other words, the flange portion 43a allows the base portion 42 to allow horizontal movement of the movable holding portion 43, and supports the compression spring 45a. In addition, in FIG. 1, in order to simplify the illustration, the illustration of the pressing portion 45 is omitted.
在可動保持部43，插入固定有延伸至遮光罩M的上方位置為止之連通管46的基端，在該連通管46前端，固定有由石英玻璃構成之周緣部吸附管47。在周緣部吸附管47，於與連通管46的連接位置形成有貫通孔47a，該周緣部吸附管47係透過連通管46而與可動保持部43連通。又，周緣部吸附管47上端係藉由密封構件48密封，周緣部吸附管47之下端面，形成與周緣部吸附管47的軸線垂直。又，在周緣部吸附管47與連通管46之間設有用以使固定堅固之補強肋49。在上述之支承體41，周緣部吸附管47利用可動保持部43與底座部42間所產生之摩擦力而被不搖晃地穩定支承。A proximal end of the communication tube 46 extending to the upper position of the hood M is inserted and fixed to the movable holding portion 43, and a peripheral portion adsorption tube 47 made of quartz glass is fixed to the distal end of the communication tube 46. In the peripheral portion adsorption pipe 47, a through hole 47a is formed at a connection position with the communication pipe 46, and the peripheral portion adsorption pipe 47 is transmitted through the communication pipe 46 to communicate with the movable holding portion 43. Further, the upper end of the peripheral portion adsorption tube 47 is sealed by the sealing member 48, and the peripheral portion of the peripheral portion of the adsorption tube 47 is formed to be perpendicular to the axis of the peripheral portion adsorption tube 47. Further, between the peripheral portion adsorption pipe 47 and the communication pipe 46, a reinforcing rib 49 for fixing and fixing is provided. In the support body 41 described above, the peripheral portion suction pipe 47 is stably supported without being shaken by the frictional force generated between the movable holding portion 43 and the base portion 42.
可動保持部43與該真空泵45連接，可自該真空泵45將負壓供應於周緣部吸附管47內。在該支承體41，利用來自真空泵45之真空吸引，在周緣部吸附管47下端吸附保持遮光罩M之周緣部Mc。如此，在本實施形態之紫外線照射裝置，由於遮光罩M之周緣部Mc被支承體41保持，因此可安定保持遮光罩M，可抑制該遮光罩M及吸附管30的搖晃。又，在上述支承體41，由於對抗板彈簧44及按壓部45的彈壓力，可使周緣部吸附管47與可動保持部43皆能於上方移動，故亦可容許在既定範圍進行遮光罩M的上方移動。又，可動保持部43，在壓接於底座部42的狀態下，因其與該底座部42的摩擦力而不易移動於水平方向。The movable holding portion 43 is connected to the vacuum pump 45, and a negative pressure can be supplied from the vacuum pump 45 to the peripheral portion adsorption tube 47. In the support body 41, the peripheral portion Mc of the shade M is suction-held at the lower end of the peripheral portion adsorption tube 47 by vacuum suction from the vacuum pump 45. As described above, in the ultraviolet irradiation apparatus of the present embodiment, since the peripheral edge portion Mc of the shade M is held by the support 41, the shade M can be stably held, and the shade M and the suction tube 30 can be prevented from being shaken. Further, in the support body 41, the peripheral portion suction pipe 47 and the movable holding portion 43 can be moved upward by the biasing force against the leaf spring 44 and the pressing portion 45, so that the shade M can be allowed to be carried in a predetermined range. Move above. Further, the movable holding portion 43 is less likely to move in the horizontal direction due to the frictional force with the base portion 42 in a state where the movable holding portion 43 is pressed against the base portion 42.
上述紫外線照射裝置，如圖2所示，從燈40射出之紫外線UV(圖2中虛線之箭頭標記)直接到達遮光罩M，或透射過吸附管30與周緣部吸附管47而到達遮光罩M。又，該紫外線UV的一部分透射過遮光罩M之透光部而到達貼合基板W，以照射該貼合基板W內之密封材S。如此，以吸附管30保持遮光罩M之構成，不需要如習知技術之板狀的光罩保持構件，其結果，可增加自燈40射出而照射於貼合基板W之紫外線UV之紫外線量。As shown in FIG. 2, the ultraviolet irradiation device emits ultraviolet light UV (marked by a broken line in FIG. 2) directly from the lamp 40 to the hood M, or passes through the adsorption tube 30 and the peripheral portion adsorption tube 47 to reach the hood M. . Further, a part of the ultraviolet ray UV is transmitted through the light transmitting portion of the hood M to reach the bonded substrate W to illuminate the sealing material S in the bonded substrate W. In this manner, the configuration in which the visor M is held by the absorbing tube 30 does not require a plate-shaped reticle holding member as in the prior art, and as a result, the amount of ultraviolet ray ultraviolet rays that are emitted from the lamp 40 and irradiated to the bonded substrate W can be increased. .
又，在透射過吸附管30之紫外線UV中，自第2管材32之上端面32a而射入該第2管材32之紫外線UV的一部分，在該第2管材32內全反射後，自該下端面32b往下方射出。即，第2管材32亦具有將紫外線UV導引之導管的作用，可增加吸附管30下方之紫外線UV之紫外線量。藉此，在吸附管30下方亦可增加照射於貼合基板W之紫外線UV之紫外線量，其結果，可抑制照射於貼合基板W之紫外線UV之不均。又，第2管材32，其上端面32a及下端面32b係經研磨處理之研磨面。藉此，可抑制紫外線UV通過上端面32a及下端面32b時之擴散，其結果，可更增加吸附管30下方之紫外線UV之紫外線量。又，周緣部吸附管47係與第2管材32同樣形成。因此，自周緣部吸附管47之上端面射入該周緣部吸附管47內之紫外線UV，亦與上述第2管材32之情形同樣，被往該周緣部吸附管47下方導引。藉此，可增加該周緣部吸附管47下方之紫外線UV之紫外線量。Further, in the ultraviolet ray UV transmitted through the absorbing tube 30, a part of the ultraviolet ray UV that has entered the second tube 32 from the upper end surface 32a of the second tube 32 is totally reflected in the second tube 32, and then The end surface 32b is emitted downward. That is, the second tube 32 also functions as a conduit for guiding the ultraviolet rays UV, and the amount of ultraviolet rays of the ultraviolet rays below the adsorption tube 30 can be increased. Thereby, the amount of ultraviolet rays of the ultraviolet rays UV irradiated on the bonded substrate W can be increased under the adsorption tube 30, and as a result, the unevenness of the ultraviolet rays UV applied to the bonded substrate W can be suppressed. Further, the second pipe member 32 has an upper end surface 32a and a lower end surface 32b which are polished surfaces. Thereby, it is possible to suppress the diffusion of the ultraviolet ray UV when passing through the upper end surface 32a and the lower end surface 32b, and as a result, the amount of ultraviolet ray ultraviolet rays below the adsorption tube 30 can be further increased. Further, the peripheral portion adsorption tube 47 is formed in the same manner as the second tube 32. Therefore, the ultraviolet ray UV incident on the peripheral edge adsorption tube 47 from the upper end surface of the peripheral portion adsorption tube 47 is also guided downward toward the peripheral portion adsorption tube 47 as in the case of the second tube 32 described above. Thereby, the amount of ultraviolet rays of ultraviolet rays UV under the peripheral portion adsorption tube 47 can be increased.
上述紫外線照射裝置，於遮光罩M安裝時，首先，使工件載台本體17充分下降，將遮光罩M載置於其載置面17a後，使工件載台本體17上升。接著，將遮光罩M抵接於各吸附管30及各周緣部吸附管47，在此狀態下使各吸附管30及各周緣部吸附管47往上方推若干之位置為止，而使工件載台本體17上升。藉此，各吸附管30及各周緣部吸附管47之下部開口端成為位於同一平面上的狀態，該下不開口端皆被遮光罩M阻塞。在此狀態下，首先，自真空泵35將負壓供應於吸附管30，將遮光罩M吸附，其次，自真空泵35將負壓供應於周緣部吸附管47，以吸附遮光罩M之周緣部Mc。又，當將遮光罩M卸下時，停止自真空泵35將負壓供應於各吸附管30及各周緣部吸附管47，以解除遮光罩M之吸附保持狀態。藉由該吸附管30及周緣部吸附管47所致之遮光罩M的保持構造，使得遮光罩M的裝卸容易，可提高該遮光罩M的更換性。In the above-described ultraviolet irradiation apparatus, when the shade M is attached, first, the workpiece stage main body 17 is sufficiently lowered, and the shade M is placed on the mounting surface 17a, and the workpiece stage main body 17 is raised. Then, the shade M is brought into contact with each of the adsorption tube 30 and each of the peripheral portion adsorption tubes 47, and in this state, the respective adsorption tubes 30 and the peripheral portion adsorption tubes 47 are pushed up to a certain position, and the workpiece stage is placed. The body 17 rises. Thereby, each of the adsorption tube 30 and the open end of the lower portion of each of the peripheral edge adsorption tubes 47 are in the same plane, and the lower non-open ends are blocked by the shade M. In this state, first, a vacuum is supplied from the vacuum pump 35 to the adsorption tube 30 to adsorb the hood M, and secondly, a negative pressure is supplied from the vacuum pump 35 to the peripheral portion adsorption tube 47 to adsorb the peripheral portion Mc of the hood M. . When the hood M is removed, the vacuum pump 35 is stopped from supplying the negative pressure to each of the adsorption tubes 30 and the peripheral portion adsorption tubes 47 to release the absorbing and holding state of the hood M. The holding structure of the shade M by the adsorption tube 30 and the peripheral portion adsorption tube 47 makes it easy to attach and detach the shade M, and the replaceability of the shade M can be improved.
本實施形態之紫外線照射裝置具有以下優點。The ultraviolet irradiation apparatus of this embodiment has the following advantages.
(1)具備吸附管30，被設於遮光罩M上方之作為支承構件之保持構件24(具體而言係蓋體33)支承，具有光透射性，利用真空吸引以吸附保持遮光罩M。依此構成，由於將遮光罩M直接吸附保持於吸附管30，因此，不需要板狀的光罩保持構件，其結果，可增加自作為紫外線源(光源)之燈40而照射於作為被照射體之貼合基板W之紫外線UV的紫外線量。進而，由於吸附管30具有光透射性，可抑制照射於貼合基板W之紫外線UV之不均。又，可易於裝卸遮光罩M，可提高遮光罩M的更換性。(1) The adsorption tube 30 is provided, and is supported by a holding member 24 (specifically, a lid body 33) as a support member provided above the shade M, and has light transmissivity, and suction and holding the shade M by vacuum suction. According to this configuration, since the shade M is directly adsorbed and held by the adsorption tube 30, the plate-shaped mask holding member is not required, and as a result, the lamp 40 as an ultraviolet source (light source) can be irradiated and irradiated as the irradiation. The amount of ultraviolet rays of the ultraviolet rays UV of the substrate W is bonded to the body. Further, since the adsorption tube 30 has light transmittance, unevenness of ultraviolet rays UV applied to the bonded substrate W can be suppressed. Moreover, the hood M can be easily attached and detached, and the replaceability of the hood M can be improved.
(2)保持構件24係設於偏離紫外線UV之光路的位置。因此，可避免自燈40射出之紫外線UV被保持構件24遮蔽，而可更抑制照射於貼合基板W之紫外線UV之不均。(2) The holding member 24 is provided at a position deviated from the optical path of the ultraviolet ray UV. Therefore, it is possible to prevent the ultraviolet ray UV emitted from the lamp 40 from being blocked by the holding member 24, and it is possible to further suppress the unevenness of the ultraviolet ray UV applied to the bonded substrate W.
(3)吸附管30，係由被保持構件24支承之第1管材31、及插入該第1管材31之下端部之第2管材32構成。依此構成，由於可將自第2管材32之上端面32a射入之紫外線UV往該第2管材32下方導引，因此，在吸附管30下方，亦可增加照射於貼合基板W之紫外線UV的紫外線量，藉此，亦可更抑制照射於貼合基板W之紫外線UV之不均。(3) The adsorption tube 30 is composed of a first tube 31 supported by the holding member 24 and a second tube 32 inserted into the lower end portion of the first tube 31. According to this configuration, since the ultraviolet ray UV incident from the upper end surface 32a of the second tube 32 can be guided downward under the second tube 32, the ultraviolet ray irradiated to the bonding substrate W can be increased under the absorbing tube 30. The amount of ultraviolet rays of the UV can further suppress the unevenness of the ultraviolet rays UV applied to the bonded substrate W.
(4)由於第2管材32之軸方向兩端面(上端面32a及下端面32b)係經研磨處理之研磨面，因此，可抑制紫外線UV通過該上端面32a及下端面32b時的擴散，其結果，可更增加照射於貼合基板W之紫外線UV的紫外線量。(4) Since the both end faces (the upper end surface 32a and the lower end surface 32b) of the second pipe member 32 in the axial direction are polished surfaces, the diffusion of the ultraviolet rays UV through the upper end surface 32a and the lower end surface 32b can be suppressed. As a result, the amount of ultraviolet rays of the ultraviolet ray UV irradiated to the bonded substrate W can be further increased.
(5)藉由在吸附管30採用光透射率較高的石英玻璃，可更增加照射於貼合基板W之紫外線UV的紫外線量。(5) By using quartz glass having a high light transmittance in the adsorption tube 30, the amount of ultraviolet rays irradiated onto the bonded substrate W by ultraviolet rays can be further increased.
(6)由於保持吸附管30之保持構件24設置成可移動於水平方向，故可變更吸附管30之配置位置。藉此，當變更遮光罩M的種類時，可將遮光罩M吸附於與遮光部Mb對應的位置。藉此，來自燈40之紫外線UV未透射過吸附管30，而可增加對密封材S的照射量，可整體提高照射於密封材S的紫外線量。(6) Since the holding member 24 holding the adsorption tube 30 is provided to be movable in the horizontal direction, the arrangement position of the adsorption tube 30 can be changed. Thereby, when the type of the light shielding cover M is changed, the light shielding cover M can be adsorbed to the position corresponding to the light shielding part Mb. Thereby, the ultraviolet ray UV from the lamp 40 is not transmitted through the absorbing tube 30, and the amount of irradiation to the sealing material S can be increased, and the amount of ultraviolet ray irradiated to the sealing material S can be increased as a whole.
(7)具備周緣部吸附管47，被設於遮光罩M側方之支承體41支承，具有光透射性，利用真空吸引以吸附保持遮光罩M之周緣部Mc。依此構成，由於藉由周緣部吸附管47將遮光罩M穩定保持，故可抑制被該遮光罩M及保持構件24支承之吸附管30的搖晃。(7) The peripheral portion adsorption pipe 47 is provided, and is supported by the support 41 provided on the side of the shade M, and has light transmissivity, and suctions and holds the peripheral edge portion Mc of the shade M by vacuum suction. According to this configuration, since the shade M is stably held by the peripheral portion adsorption tube 47, the shaking of the adsorption tube 30 supported by the shade M and the holding member 24 can be suppressed.
(8)由於以吸附管30保持遮光罩M，故可吸收因UV能量所造成之遮光罩M的熱膨脹所致之畸變，其結果，可抑制遮光罩M產生彎曲。又，由於保持周緣部吸附管47之可動保持部43設成可移動於水平方向，因此，在該可動保持部43亦可吸收遮光罩M的熱膨脹所致之畸變，其結果，可抑制遮光罩M產生彎曲。(8) Since the hood M is held by the absorbing tube 30, distortion due to thermal expansion of the hood M due to UV energy can be absorbed, and as a result, bending of the hood M can be suppressed. Further, since the movable holding portion 43 holding the peripheral portion adsorption pipe 47 is provided to be movable in the horizontal direction, the movable holding portion 43 can also absorb the distortion caused by the thermal expansion of the shade M, and as a result, the hood can be suppressed. M produces a bend.
又，上述實施形態，亦可作以下變更。Further, the above embodiment can be modified as follows.
支承構件，未限於包含蓋體33之保持構件24。例如，亦可使用伸縮管等蛇腹構件或彈簧等彈性構件，將保持構件24構成可伸縮，藉此，保持構件24可直接支承吸附管30。或是，將支承吸附管30之保持構件24設成對支成樑23可上下移動。The support member is not limited to the holding member 24 including the lid body 33. For example, an elastic member such as a bellows member such as a bellows or a spring may be used, and the holding member 24 may be configured to be expandable and contractible, whereby the holding member 24 may directly support the adsorption tube 30. Alternatively, the holding member 24 that supports the adsorption tube 30 is disposed so that the pair of beams 23 can be moved up and down.
亦可將保持構件24設於較燈40更下方位置。但，為了減少保持構件24所致之遮光量，保持構件24亦可設成較燈40更上方位置。The holding member 24 can also be disposed at a position lower than the lamp 40. However, in order to reduce the amount of shading caused by the holding member 24, the holding member 24 may be disposed at a position higher than the lamp 40.
亦可在支承樑23下方，以保持構件24(支承構件)支承吸附管30，藉此，將保持構件24設成對支承樑23在360度的範圍可旋動於水平方向。在此情形，可使吸附管30的配置位置(遮光罩M的吸附位置)更自由變更。The suction pipe 30 may be supported by the holding member 24 (support member) under the support beam 23, whereby the holding member 24 may be set to be rotatable in the horizontal direction to the support beam 23 within a range of 360 degrees. In this case, the arrangement position of the adsorption tube 30 (the adsorption position of the hood M) can be more freely changed.
亦可取代周緣部吸附管47，藉由吸附管30吸附保持遮光罩M之周緣部。Instead of the peripheral portion adsorption tube 47, the peripheral portion of the shade M may be adsorbed and held by the adsorption tube 30.
於第1管材31及第2管材32雖使用石英玻璃，除此之外，例如亦可使用高透射玻璃或i線玻璃等。For the first pipe member 31 and the second pipe member 32, quartz glass is used. For example, high-transmission glass or i-line glass can be used.
吸附管30雖由第1及第2管材31、32構成，除此之外，例如亦可僅以第1管材31構成。又，作為吸附管30，亦可使用例如將第1管材31與第2管材32一體形成的形狀之管材。The adsorption tube 30 is composed of the first and second tubes 31 and 32, and may be formed of, for example, only the first tube 31. Further, as the adsorption tube 30, for example, a tube having a shape in which the first tube 31 and the second tube 32 are integrally formed may be used.
雖使第1管材31之下端部位於第2管材32的中腹部分，亦可使第1管材31之下端面與第2管材32之下端面32b位於同一平面上，又，亦可使第1管材31之下端面自第2管材32若干突出。The lower end portion of the first pipe member 31 is located on the mid-abdominal portion of the second pipe member 32, and the lower end surface of the first pipe member 31 and the lower end surface 32b of the second pipe member 32 may be placed on the same plane, and the first pipe member may be used. The lower end surface of 31 protrudes from the second pipe 32 several times.
亦可利用來自底座部42之真空吸附等，將支承體41之可動保持部43固定於該底座部42。藉此，於將遮光罩M吸附保持後，可更安定保持遮光罩M。The movable holding portion 43 of the support body 41 can be fixed to the base portion 42 by vacuum suction or the like from the base portion 42. Thereby, after the hood M is suction-held, the hood M can be held more stably.
1．．．基部1. . . Base
11．．．工件載台部11. . . Workpiece stage
12．．．工件移動機構12. . . Workpiece moving mechanism
13．．．驅動部13. . . Drive department
14．．．升降銷14. . . Lift pin
15．．．支承台15. . . Support table
16．．．可動部16. . . Movable part
17．．．工件載台本體17. . . Workpiece stage body
17a．．．載置面17a. . . Mounting surface
17b．．．插通孔17b. . . Insert hole
17c．．．貫通孔17c. . . Through hole
21．．．第1框體twenty one. . . First frame
21a．．．開口21a. . . Opening
21b．．．支承部21b. . . Support
21c．．．對準攝影機21c. . . Aligning camera
22．．．第2框體twenty two. . . 2nd frame
22a．．．開口22a. . . Opening
23．．．支承樑twenty three. . . Support beam
24．．．保持構件twenty four. . . Holding member
30．．．吸附管30. . . Adsorption tube
31．．．第1管材31. . . First pipe
32．．．第2管材32. . . 2nd pipe
32a．．．上端面32a. . . Upper end
32b．．．下端面32b. . . Lower end
33．．．蓋體33. . . Cover
34．．．連結件34. . . Link
35．．．真空泵35. . . Vacuum pump
40．．．燈40. . . light
41．．．支承體41. . . Support
42．．．底座部42. . . Base
43．．．可動保持部43. . . Movable holding unit
43a．．．凸緣部43a. . . Flange
44．．．板彈簧44. . . Leaf spring
45．．．按壓部45. . . Pressing part
45a．．．壓縮彈簧45a. . . compressed spring
46．．．連通管46. . . Connecting pipe
47．．．周緣部吸附管47. . . Peripheral adsorption tube
47a．．．貫通孔47a. . . Through hole
48．．．密封構件48. . . Sealing member
49．．．補強肋49. . . Reinforcing rib
L．．．液晶L. . . liquid crystal
M．．．遮光罩M. . . Hood
Ma．．．玻璃板Ma. . . glass plate
Mb．．．遮光部Mb. . . Shading
Mc．．．周緣部Mc. . . Peripheral part
S．．．密封材S. . . Sealing material
UV．．．紫外線UV. . . Ultraviolet light
圖1係表示本實施形態之紫外線照射裝置之概略構成圖。Fig. 1 is a schematic block diagram showing an ultraviolet irradiation apparatus of the embodiment.
圖2係表示照射於貼合基板之紫外線之示意圖。Fig. 2 is a schematic view showing ultraviolet rays irradiated onto a bonded substrate.
圖3係表示周緣部吸附管之概略構成圖。Fig. 3 is a schematic view showing the configuration of a peripheral portion adsorption tube.
1．．．基部1. . . Base
11．．．工件載台部11. . . Workpiece stage
12．．．工件移動機構12. . . Workpiece moving mechanism
13．．．驅動部13. . . Drive department
14．．．升降銷14. . . Lift pin
15．．．支承台15. . . Support table
16．．．可動部16. . . Movable part
17．．．工件載台本體17. . . Workpiece stage body
17a．．．載置面17a. . . Mounting surface
17b．．．插通孔17b. . . Insert hole
17c．．．貫通孔17c. . . Through hole
21．．．第1框體twenty one. . . First frame
21a．．．開口21a. . . Opening
21b．．．支承部21b. . . Support
21c．．．對準攝影機21c. . . Aligning camera
22．．．第2框體twenty two. . . 2nd frame
22a．．．開口22a. . . Opening
23．．．支承樑twenty three. . . Support beam
24．．．保持構件twenty four. . . Holding member
30．．．吸附管30. . . Adsorption tube
31．．．第1管材31. . . First pipe
32．．．第2管材32. . . 2nd pipe
33．．．蓋體33. . . Cover
34．．．連結件34. . . Link
35．．．真空泵35. . . Vacuum pump
40．．．燈40. . . light
41．．．支承體41. . . Support
47．．．周緣部吸附管47. . . Peripheral adsorption tube
UV．．．紫外線UV. . . Ultraviolet light
Claims (8)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008100331A JP5112151B2 (en) | 2008-04-08 | 2008-04-08 | Light irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200943385A TW200943385A (en) | 2009-10-16 |
| TWI474375B true TWI474375B (en) | 2015-02-21 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW98107966A TWI474375B (en) | 2008-04-08 | 2009-03-12 | Light irradiation apparatus |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5112151B2 (en) |
| CN (1) | CN101556908B (en) |
| TW (1) | TWI474375B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102713760A (en) * | 2010-01-22 | 2012-10-03 | 夏普株式会社 | Light irradiation device, light irradiation method and liquid crystal panel manufacturing method |
| JP5472616B2 (en) * | 2010-01-27 | 2014-04-16 | ウシオ電機株式会社 | Light irradiation device |
| JP5373168B2 (en) * | 2012-10-09 | 2013-12-18 | 株式会社アルバック | Light irradiation device |
| JP6614795B2 (en) * | 2015-05-11 | 2019-12-04 | Ａｉメカテック株式会社 | Ultraviolet irradiation device and substrate assembly system |
| CN108717250B (en) * | 2018-06-05 | 2021-03-23 | 江苏永鼎股份有限公司 | Contact photoetching machine for semiconductor chip production |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200715513A (en) * | 2005-09-23 | 2007-04-16 | Asml Netherlands Bv | Contacts to microdevices |
| TWI282029B (en) * | 2002-08-12 | 2007-06-01 | Ushio Electric Inc | Adhering device of display panel |
| TWI290267B (en) * | 2003-11-13 | 2007-11-21 | Dms Co Ltd | Mask supporting apparatus using vacuum and light exposing system, and method using the same |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3094827B2 (en) * | 1995-02-14 | 2000-10-03 | ウシオ電機株式会社 | Method and apparatus for bonding liquid crystal panels |
| JPH1050584A (en) * | 1996-08-07 | 1998-02-20 | Nikon Corp | Mask holder |
| JP2001059953A (en) * | 1999-08-23 | 2001-03-06 | Seiko Epson Corp | Substrate press-contacting device and manufacture of liquid crystal device |
| JP3483809B2 (en) * | 1999-08-31 | 2004-01-06 | シャープ株式会社 | Substrate bonding method and bonding apparatus, and liquid crystal display device manufacturing method |
| US7365822B2 (en) * | 2002-02-20 | 2008-04-29 | Lg.Philips Lcd Co., Ltd. | Method for fabricating LCD |
| JP2004151325A (en) * | 2002-10-30 | 2004-05-27 | Fujitsu Ltd | Method of bonding substrates together |
| JP4380316B2 (en) * | 2003-12-17 | 2009-12-09 | ウシオ電機株式会社 | Mask mounting jig and mask mounting method using the mask mounting jig |
| JP4572626B2 (en) * | 2004-08-26 | 2010-11-04 | ウシオ電機株式会社 | Light irradiation device |
| JP4150042B2 (en) * | 2005-12-26 | 2008-09-17 | 富士通株式会社 | Bonded substrate manufacturing apparatus and bonded substrate manufacturing method |
| JP4150041B2 (en) * | 2005-12-26 | 2008-09-17 | 富士通株式会社 | Bonded board manufacturing equipment |
| JP4118922B2 (en) * | 2006-03-24 | 2008-07-16 | 富士通株式会社 | Bonded substrate manufacturing apparatus and bonded substrate manufacturing method |
-
2008
- 2008-04-08 JP JP2008100331A patent/JP5112151B2/en not_active Expired - Fee Related
-
2009
- 2009-03-12 TW TW98107966A patent/TWI474375B/en active
- 2009-03-18 CN CN2009101276785A patent/CN101556908B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI282029B (en) * | 2002-08-12 | 2007-06-01 | Ushio Electric Inc | Adhering device of display panel |
| TWI290267B (en) * | 2003-11-13 | 2007-11-21 | Dms Co Ltd | Mask supporting apparatus using vacuum and light exposing system, and method using the same |
| TW200715513A (en) * | 2005-09-23 | 2007-04-16 | Asml Netherlands Bv | Contacts to microdevices |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101556908B (en) | 2012-05-30 |
| TW200943385A (en) | 2009-10-16 |
| CN101556908A (en) | 2009-10-14 |
| JP5112151B2 (en) | 2013-01-09 |
| JP2009253079A (en) | 2009-10-29 |
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