JP5091243B2 - Euv光源のための駆動レーザ送出システム - Google Patents
Euv光源のための駆動レーザ送出システム Download PDFInfo
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Description
本出願は、代理人整理番号第2006−0025−01号である2006年10月13日出願の「EUV光源のための駆動レーザ送出システム」という名称の米国特許出願第11/580、414号に対する優先権を請求するものであり、かつ代理人整理番号第2005−0081−01号である2006年2月21日出願の「レーザ生成プラズマEUV光源」という名称の現在特許出願中で本出願人所有の米国特許出願出願番号第11/358、992号にも関するものであり、これらの特許の開示内容全体は、本明細書において引用により組み込まれている。
本出願は、代理人整理番号第2005−0044−01号である2005年6月29日出願の「LLP−EUV光源駆動レーザシステム」という名称の現在特許出願中で本出願人所有の米国特許出願出願番号第11/174、299号にも関するものであり、この特許の開示内容全体は、本明細書において引用により組み込まれている。
本出願は、代理人整理番号第2006−001−01号である2006年6月14日出願の「EUV光源のための駆動レーザ」という名称の現在特許出願中で本出願人所有の米国特許出願出願番号第11/452、558号にも関するものであり、この特許の開示内容全体は、本明細書において引用により組み込まれている。
本出願は、ターゲット材料から創生され、かつ極紫外線(EUV)光源チャンバ外での利用に向けて、例えば、約50nm及びそれ未満の波長で、例えば、半導体集積回路製造フォトリソグラフィに向けて集光されて誘導されるプラズマからEUV光を供給する極紫外線(EUV)光源に関する。
EUV光を生成する方法には、輝線がEUV範囲にあって、元素、例えば、キセノン、リチウム、又は錫を有する材料をプラズマ状態に変換することがあるが必ずしもこれに限定されるわけではない。レーザ生成プラズマ(LPP)いうことが多い1つのこのような方法においては、材料の液滴、流れ、又はクラスターの形態のターゲット材料にレーザビームを照射することにより所要のプラズマを生成することができる。
これらのプラズマ形成副産物は、垂直入射及び/又は斜入射でのEUV反射が可能な多層ミラー(MLM)を含む集光ミラー、測定検出器の表面、プラズマ形成体処理を撮像するのに使用される窓、及びレーザ入力窓を含むがこれらの限定されない様々なプラズマチャンバ光学要素の作動効率に潜在的に損なうか又は低減する可能性がある。熱、高エネルギイオン及び/又はデブリは、光透過率を低減する材料で光学要素を被覆すること、光学要素に浸入して、例えば、構造的一体性及び/又は光学特性、例えば、このような短波長で光を反射するミラーの機能に損害を与えること、光学要素を腐食又は浸食し、及び/又は光学要素内に拡散することを含むいくつかの点で光学要素に有害である場合がある。一部のターゲット材料、例えば、錫に対しては、プラズマチャンバにエッチング液、例えば、HBrを導入して、材料、例えば、光学要素上に堆積したデブリをエッチングすることが望ましいであろう。影響を受けた要素表面を加熱してエッチング液の反応率を増大させることができることが更に考えられている。
特定的な実施形態では、EUV光源は、プラズマチャンバに配置されてプラズマチャンバ内で焦点にレーザビームを集束させる集束光学器械、例えば、集束ミラーを更に含むことができる。この光源に対しては、入力窓は、ZnSe製とすることができ、かつ反射防止膜で被覆することができ、ターゲット材料は、錫を含み、エッチング液は、HBr、HI、Br2、Cl2、HCl、H2、又はその組合せとすることができる。
この態様の一実施形態では、少なくとも1つの光学器械及びターゲット材料は、協働して光学発振器を確立することができ、少なくとも1つの光学器械は、平面ミラー、曲面ミラー、コーナ反射器、及び位相共役ミラーから成る光学器械の群から選択される。この態様の別の実施形態では、少なくとも1つの光学器械及びターゲット材料は、協働してリング形状部分を有するビーム経路を確立することができ、少なくとも1つの光学器械は、3つの回転ミラーを含むことができる。
この態様の一実施例では、EUV光源は、ターゲット材料と増幅器の間でビーム経路に沿って位置決めされた光アイソレータを更に含むことができ、特定的な実施例では、増幅器は、1次偏光方向を有し、光アイソレータは、位相遅延光学器械及び偏光子を含むことができる。
この態様の一構成においては、少なくとも1つの光学器械及びターゲット材料は、協働してリング形状部分を有するビーム経路を確立し、EUV光源は、ファラデーアイソレータ及び/又は減衰器、及び/又はターゲット材料がビーム経路上にない期間の少なくとも一部分の間に光学利得媒体を維持するスイッチ、及び/又は空間フィルタ及び/又は光アイソレータを更に含むことができる。
この態様の一実施形態では、EUV光源は、ターゲット材料と増幅器の間でビーム経路に沿って位置決めされた光アイソレータを更に含むことができ、特定的な実施例では、増幅器は、1次偏光方向を有することができ、光アイソレータは、位相遅延光学器械及び偏光子を含むことができる。
この態様の一構成においては、少なくとも1つの光学器械及びターゲット材料は、協働してリング形状部分を有するビーム経路を確立し、EUV光源は、ファラデーアイソレータ及び/又は減衰器、及び/又はターゲット材料がビーム経路上にない期間の少なくとも一部分の間に光学利得媒体を維持するスイッチ、及び/又は空間フィルタ及び/又は光アイソレータを更に含むことができる。
より具体的には、図9に示すEUV光源は、光増幅器906(対応する増幅器606に対して上述したように、増幅器を出る光が1次偏光方向を有するように偏光子及び/又はブルースターの窓を有する)と、ターゲット材料902、例えば、錫液滴(上述のような)と、光アイソレータ912(上述のように、例えば100:1の効率を有する)と、集束光学器械914(上述のような)とを含む。
より定量的には、一般的な設定は、出力電力=10kW、液滴からの反射=0.01であり、プラズマからの全ての反射光は、ミラー1030(減衰器1042を通じて)に向かうことができ、ミラー1030上の後方反射電力=10kW*0.01=100Wであるように構成することができる。100X減衰器が使用された場合、電力は、1Wに低減される。この設定に対しては、必要とされる単光路利得は、減衰器なしでは100X、100X減衰器有りで10、000Xである。
より具体的には、図13に示すEUV光源は、光増幅器1306a、1306b、1306c(対応する増幅器1106に対して上述したように、増幅器を出る光が1次偏光方向を有するように偏光子及び/又はブルースターの窓を有する)と、ターゲット材料1302、例えば、錫液滴(上述のような)と、増幅器1306と協働してリング形状部分1336を有するビーム経路1310を確立する光学器械(例えば、回転ミラー1330、1332、1334)と、集束光学器械1314(上述のような)と、空間フィルタ1352(上述のような)と、各々が増幅器1306によって定められる1次偏光方向と平行に整列した透過軸を有する2つの偏光子の間に配置された電気光学スイッチ、例えばPockel製又はKerrセルを含むことができるスイッチ1384(概略的に図示)とを含む。また、図示のように、一部の実施例に対しては、減衰器1342を設置することができる。
より具体的には、図14に示すEUV光源は、光増幅器1406a、1406b、1406c(対応する増幅器1106に対して上述したように、増幅器を出る光が1次偏光方向を有するように偏光子及び/又はブルースターの窓を有する)と、ターゲット材料1402、例えば、錫液滴(上述のような)と、増幅器1406と協働してリング形状部分1436を有するビーム経路1410を確立する光学器械(例えば、回転ミラー1430、1432、1434)と、集束光学器械1414(上述のような)と、ビーム経路1410のリング形状部分1436のための出力カプラとして作動可能な空間フィルタ1478(上述のような)と、ビーム経路1410のリング形状部分1436内での光進行方向を定める反射器1480(上述のような)と、スイッチ1484(スイッチ1384に対して上述したような)と、空間フィルタ1452(上述のような)とを含む。また、図示のように、一部の実施例に対しては、減衰器1442を設置することができる。
50’ ビーム送出システム
200 容器
202 ビーム送出チャンバ
204 レーザビーム
Claims (18)
- ターゲット材料と、
前記ターゲット材料を有するビーム経路を確立する少なくとも1つの光学器械と、
前記ビーム経路に沿って位置決めされ、ビーム経路に出力光子を供給するシードレーザなしで、前記ターゲット材料と相互作用してEUV発光プラズマを生成する増幅光子ビームを生成する光学利得媒体と、
を含むことを特徴とするEUV光源。 - 前記少なくとも1つの光学器械及び前記ターゲット材料は、協働して光学発振器を確立することを特徴とする請求項1に記載のEUV光源。
- 前記少なくとも1つの光学器械及び前記ターゲット材料は、協働してリング形状部分を有するビーム経路を確立することを特徴とする請求項1に記載のEUV光源。
- 前記ターゲット材料は、液滴の形態であることを特徴とする請求項1に記載のEUV光源。
- 前記少なくとも1つの光学器械は、平面ミラー、曲面ミラー、コーナ反射器、及び位相共役ミラーから成る光学器械の群から選択されることを特徴とする請求項1に記載のEUV光源。
- 前記ターゲット材料は、錫を含み、増幅器が、CO2レーザ増幅器であることを特徴とする請求項1に記載のEUV光源。
- 前記ターゲット材料と増幅器の間に前記ビーム経路に沿って位置決めされた光アイソレータを更に含むことを特徴とする請求項1に記載のEUV光源。
- 前記増幅器は、1次偏光方向を有し、前記光アイソレータは、位相遅延光学器械及び偏光子を含むことを特徴とする請求項7に記載のEUV光源。
- 前記増幅器は、1次偏光方向を有し、前記光アイソレータは、位相遅延ミラー及び偏光ミラーを含むことを特徴とする請求項7に記載のEUV光源。
- 増幅器が、複数の増幅チャンバを含むことを特徴とする請求項1に記載のEUV光源。
- 前記ターゲット材料と増幅器の間に配置された平行化光学器械を更に含むことを特徴とする請求項1に記載のEUV光源。
- ターゲット材料が前記ビーム経路上にない期間の少なくとも一部分の間に前記光学利得媒体を維持するためのスイッチを更に含むことを特徴とする請求項1に記載のEUV光源。
- EUV光を発生させる方法であって、
照射部位を確立する工程、
光学器械を所定の位置に設置して、前記照射部位を有するビーム経路を確立する工程、 前記ビーム経路に沿って光学利得媒体を配置する工程、及び
ターゲット材料を前記照射部位に位置決めして、ビーム経路に出力光子を供給するシードレーザなしで、前記ターゲット材料と相互作用してEUV発光プラズマを生成する増幅光子ビームを生成するする工程、
を含むことを特徴とする方法。 - 前記ビーム経路に沿って前記ターゲット材料と光学利得媒体との間に光アイソレータを位置決めする工程、
を更に含むことを特徴とする請求項13に記載の方法。 - 前記光アイソレータが可飽和吸収材料を含むことを特徴とする請求項14に記載の方法。
- ビーム経路上の光を反射するように位置決めされた光学器械と、
前記光学器械とともに発振空洞を確立するように前記ビーム経路上に位置決め可能なターゲット材料と、
前記ビーム経路に結合され、前記発振空洞内の光学利得が光学損失を超えるように、外部シードなしに励起可能な光学利得媒体と、
を含むことを特徴とするEUV光源。 - 前記ターゲット材料は、液滴の形態であることを特徴とする請求項16に記載のEUV光源。
- 前記ビーム経路に沿って前記ターゲット材料と利得媒体の間に位置決めされた光学器械を更に含み、該光学器械は前記ビーム経路上の光を前記ターゲット材料に収束させることを特徴とする請求項16に記載のEUV光源。
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TW200822813A (en) | 2008-05-16 |
WO2008048415A2 (en) | 2008-04-24 |
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EP2084500A4 (en) | 2010-08-04 |
EP2084500B1 (en) | 2014-02-26 |
JP2010506425A (ja) | 2010-02-25 |
US20080087847A1 (en) | 2008-04-17 |
KR101406810B1 (ko) | 2014-06-12 |
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