JP5061703B2 - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物 Download PDF

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Publication number
JP5061703B2
JP5061703B2 JP2007115131A JP2007115131A JP5061703B2 JP 5061703 B2 JP5061703 B2 JP 5061703B2 JP 2007115131 A JP2007115131 A JP 2007115131A JP 2007115131 A JP2007115131 A JP 2007115131A JP 5061703 B2 JP5061703 B2 JP 5061703B2
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group
general formula
carbon atoms
weight
resin composition
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JP2008268788A5 (https=
JP2008268788A (ja
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真佐夫 富川
陽二 藤田
美加 越野
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Toray Industries Inc
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Toray Industries Inc
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  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP2007115131A 2007-04-25 2007-04-25 感光性樹脂組成物 Expired - Fee Related JP5061703B2 (ja)

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JP2007115131A JP5061703B2 (ja) 2007-04-25 2007-04-25 感光性樹脂組成物

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Application Number Priority Date Filing Date Title
JP2007115131A JP5061703B2 (ja) 2007-04-25 2007-04-25 感光性樹脂組成物

Publications (3)

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JP2008268788A JP2008268788A (ja) 2008-11-06
JP2008268788A5 JP2008268788A5 (https=) 2010-05-13
JP5061703B2 true JP5061703B2 (ja) 2012-10-31

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JP2007115131A Expired - Fee Related JP5061703B2 (ja) 2007-04-25 2007-04-25 感光性樹脂組成物

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Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5589187B2 (ja) * 2008-04-23 2014-09-17 株式会社 マイクロプロセス 感光性樹脂組成物およびパターン形成方法
KR101113063B1 (ko) * 2008-05-22 2012-02-15 주식회사 엘지화학 폴리이미드와 노볼락 수지를 포함하는 감광성 수지 조성물
CN103091987B (zh) 2008-12-26 2016-11-23 日立化成株式会社 正型感光性树脂组合物、抗蚀图形的制造方法、半导体装置以及电子器件
JP2010256034A (ja) * 2009-04-21 2010-11-11 Jsr Corp 樹脂組成物及びバイオチップの製造方法
JP5691645B2 (ja) * 2011-02-28 2015-04-01 住友ベークライト株式会社 感光性樹脂組成物、硬化膜、保護膜、絶縁膜、半導体装置、および表示体装置
JP5831092B2 (ja) * 2011-09-27 2015-12-09 東レ株式会社 ポジ型感光性樹脂組成物
KR101882217B1 (ko) * 2011-10-18 2018-07-26 주식회사 동진쎄미켐 오엘이디용 폴리이미드 감광성 수지 조성물
JP2013134346A (ja) * 2011-12-26 2013-07-08 Hitachi Chemical Co Ltd 感光性樹脂組成物、パターン硬化膜の製造方法、半導体装置及び電子部品
JP2014059463A (ja) * 2012-09-18 2014-04-03 Asahi Kasei E-Materials Corp 感光性樹脂組成物
WO2014046062A1 (ja) * 2012-09-18 2014-03-27 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP6255740B2 (ja) * 2013-06-24 2018-01-10 住友ベークライト株式会社 ポジ型感光性樹脂組成物、硬化膜、保護膜、絶縁膜、半導体装置、表示体装置、およびポジ型感光性樹脂組成物の製造方法
CN107430335B (zh) * 2015-04-01 2021-04-02 东丽株式会社 感光性着色树脂组合物
WO2017057281A1 (ja) * 2015-09-30 2017-04-06 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び表示装置、並びにその製造方法
JP6513596B2 (ja) * 2016-04-04 2019-05-15 日立化成株式会社 感光性樹脂組成物、パターン硬化膜の製造方法、半導体装置及び電子部品
DE112017002428T5 (de) * 2016-05-12 2019-01-31 Quingzhou Cui Polysulfonamide-redistributionszusammensetzungen und verfahren zu ihrer verwendung
JP6259033B2 (ja) * 2016-09-01 2018-01-10 旭化成株式会社 感光性樹脂組成物
US11739215B2 (en) * 2017-02-21 2023-08-29 Zeon Corporation Photosensitive resin composition
JP2018028690A (ja) * 2017-10-31 2018-02-22 日立化成株式会社 感光性樹脂組成物、パターン硬化膜の製造方法、半導体装置及び電子部品
JP6523419B2 (ja) * 2017-12-07 2019-05-29 旭化成株式会社 感光性樹脂組成物
CN112654927B (zh) 2018-09-18 2024-02-27 东丽株式会社 感光性树脂组合物、树脂片、固化膜、有机el显示装置、半导体电子部件、半导体器件、及有机el显示装置的制造方法
CN111458978B (zh) * 2020-04-17 2024-08-30 北京北旭电子材料有限公司 一种光刻胶组合物
JPWO2022181419A1 (https=) * 2021-02-26 2022-09-01
KR20240110932A (ko) 2021-11-26 2024-07-16 도레이 카부시키가이샤 감광성 수지 조성물, 경화물, 유기 el 표시 장치, 반도체 장치 및 경화물의 제조 방법
JP2023118158A (ja) * 2022-02-15 2023-08-25 日鉄ケミカル＆マテリアル株式会社 ジヒドロキシ樹脂、エポキシ樹脂、その製造方法、及びエポキシ樹脂組成物並びに硬化物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005250160A (ja) * 2004-03-04 2005-09-15 Kyocera Chemical Corp ポジ型感光性樹脂組成物及びその硬化物
WO2005121895A1 (ja) * 2004-06-08 2005-12-22 Nissan Chemical Industries, Ltd. ポジ型感光性樹脂組成物
JP4677887B2 (ja) * 2004-11-24 2011-04-27 東レ株式会社 感光性樹脂組成物

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