JP5043317B2 - 環状ジハイドロジェンポリシロキサン、ハイドロジェンポリシロキサン、それらの製造方法、シリカ系ガラス成形体およびその製造方法、光学素子およびその製造方法 - Google Patents

環状ジハイドロジェンポリシロキサン、ハイドロジェンポリシロキサン、それらの製造方法、シリカ系ガラス成形体およびその製造方法、光学素子およびその製造方法 Download PDF

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Publication number
JP5043317B2
JP5043317B2 JP2005228774A JP2005228774A JP5043317B2 JP 5043317 B2 JP5043317 B2 JP 5043317B2 JP 2005228774 A JP2005228774 A JP 2005228774A JP 2005228774 A JP2005228774 A JP 2005228774A JP 5043317 B2 JP5043317 B2 JP 5043317B2
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Japan
Prior art keywords
silica
light region
sio
based glass
polysiloxane
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Expired - Fee Related
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JP2005228774A
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English (en)
Japanese (ja)
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JP2007045859A5 (enExample
JP2007045859A (ja
Inventor
志成 張原
信男 櫛引
真樹 伊藤
エリアス カツオリス ディミトリス
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Dow Silicones Corp
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Dow Corning Corp
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Priority to JP2005228774A priority Critical patent/JP5043317B2/ja
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Priority to EP06782687A priority patent/EP1934274B1/en
Priority to DE602006010585T priority patent/DE602006010585D1/de
Priority to PCT/JP2006/315901 priority patent/WO2007018283A1/en
Priority to US11/997,888 priority patent/US8097690B2/en
Priority to CNA2006800288173A priority patent/CN101238165A/zh
Priority to AT06782687T priority patent/ATE449124T1/de
Priority to KR1020087005470A priority patent/KR101303852B1/ko
Publication of JP2007045859A publication Critical patent/JP2007045859A/ja
Publication of JP2007045859A5 publication Critical patent/JP2007045859A5/ja
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Publication of JP5043317B2 publication Critical patent/JP5043317B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/12—Polysiloxanes containing silicon bound to hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C08G77/10—Equilibration processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Silicon Polymers (AREA)
  • Silicon Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2005228774A 2005-08-05 2005-08-05 環状ジハイドロジェンポリシロキサン、ハイドロジェンポリシロキサン、それらの製造方法、シリカ系ガラス成形体およびその製造方法、光学素子およびその製造方法 Expired - Fee Related JP5043317B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2005228774A JP5043317B2 (ja) 2005-08-05 2005-08-05 環状ジハイドロジェンポリシロキサン、ハイドロジェンポリシロキサン、それらの製造方法、シリカ系ガラス成形体およびその製造方法、光学素子およびその製造方法
DE602006010585T DE602006010585D1 (de) 2005-08-05 2006-08-04 Cyclische dihydrogenpolysiloxane, hydrogenpolysiloxane, herstellungsverfahren dafür, siliciumdioxidglasformkörper und herstellungsverfahren dafür, optische elemente und herstellungsverfahren dafür
PCT/JP2006/315901 WO2007018283A1 (en) 2005-08-05 2006-08-04 Cyclic dihydrogenpolysiloxanes, hydrogenpolysiloxanes, processes for their production, silica type glass moldings and a process for their production, optical elements and a process for their production
US11/997,888 US8097690B2 (en) 2005-08-05 2006-08-04 Cyclic dihydrogenpolysiloxanes, hydrogenpolysiloxanes, processes for their production, silica type glass moldings and a process for their production, optical elements and a process for their production
EP06782687A EP1934274B1 (en) 2005-08-05 2006-08-04 Cyclic dihydrogenpolysiloxanes, hydrogenpolysiloxanes, processes for their production, silica type glass moldings and a process for their production, optical elements and a process for their production
CNA2006800288173A CN101238165A (zh) 2005-08-05 2006-08-04 环状二氢聚硅氧烷、氢聚硅氧烷、其生产方法、二氧化硅类玻璃模制品及其生产方法，光学元件及其生产方法
AT06782687T ATE449124T1 (de) 2005-08-05 2006-08-04 Cyclische dihydrogenpolysiloxane, hydrogenpolysiloxane, herstellungsverfahren dafür,siliciumdioxidglasformkörper und herstellungsverfahren dafür, optische elemente und herstellungsverfahren dafür
KR1020087005470A KR101303852B1 (ko) 2005-08-05 2006-08-04 사이클릭 디하이드로겐폴리실록산, 하이드로겐폴리실록산,이의 제조방법, 실리카계 유리 성형체 및 이의 제조방법,광학 소자 및 이의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005228774A JP5043317B2 (ja) 2005-08-05 2005-08-05 環状ジハイドロジェンポリシロキサン、ハイドロジェンポリシロキサン、それらの製造方法、シリカ系ガラス成形体およびその製造方法、光学素子およびその製造方法

Publications (3)

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JP2007045859A JP2007045859A (ja) 2007-02-22
JP2007045859A5 JP2007045859A5 (enExample) 2008-09-04
JP5043317B2 true JP5043317B2 (ja) 2012-10-10

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JP2005228774A Expired - Fee Related JP5043317B2 (ja) 2005-08-05 2005-08-05 環状ジハイドロジェンポリシロキサン、ハイドロジェンポリシロキサン、それらの製造方法、シリカ系ガラス成形体およびその製造方法、光学素子およびその製造方法

Country Status (7)

Country Link
US (1) US8097690B2 (enExample)
EP (1) EP1934274B1 (enExample)
JP (1) JP5043317B2 (enExample)
KR (1) KR101303852B1 (enExample)
CN (1) CN101238165A (enExample)
DE (1) DE602006010585D1 (enExample)
WO (1) WO2007018283A1 (enExample)

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US8207442B2 (en) 2006-04-18 2012-06-26 Itn Energy Systems, Inc. Reinforcing structures for thin-film photovoltaic device substrates, and associated methods
WO2008036769A2 (en) 2006-09-19 2008-03-27 Itn Energy Systems, Inc. Semi-transparent dual layer back contact for bifacial and tandem junction thin-film photovolataic devices
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US20100029057A1 (en) * 2006-09-21 2010-02-04 Jsr Corporation Silicone resin composition and method of forming a trench isolation
JP2008266119A (ja) * 2006-11-24 2008-11-06 Jsr Corp シリコーン樹脂、シリコーン樹脂組成物およびトレンチアイソレーションの形成方法
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WO2008079179A1 (en) 2006-12-20 2008-07-03 Dow Corning Corporation Glass substrates coated or laminated with cured silicone resin compositions
JP5149512B2 (ja) 2007-02-02 2013-02-20 東レ・ダウコーニング株式会社 液状硬化性組成物、コーテイング方法、無機質基板および半導体装置
JPWO2009096603A1 (ja) 2008-02-01 2011-05-26 Jsr株式会社 トレンチアイソレーションの形成方法
JP5226336B2 (ja) * 2008-02-15 2013-07-03 株式会社神戸製鋼所 酸化シリコン膜の製造方法
JP2011518893A (ja) * 2008-03-04 2011-06-30 ダウ・コーニング・コーポレイション ボロシロキサン組成物、ボロシロキサン接着剤、塗装基板及び積層基板
JP2011516626A (ja) * 2008-03-04 2011-05-26 ダウ・コーニング・コーポレイション シリコーン組成物、シリコーン接着剤、被覆基板及び積層基板
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JP7595073B2 (ja) * 2019-10-31 2024-12-05 イシラブズ サス 水素担体化合物を生成する方法及び再生する方法
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CN113183481B (zh) * 2020-01-10 2022-10-28 中国科学院化学研究所 一种可重复使用的类玻璃或类玻璃制品及其制备方法与回收再利用方法
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Also Published As

Publication number Publication date
US8097690B2 (en) 2012-01-17
US20100188766A1 (en) 2010-07-29
CN101238165A (zh) 2008-08-06
KR101303852B1 (ko) 2013-09-05
JP2007045859A (ja) 2007-02-22
DE602006010585D1 (de) 2009-12-31
EP1934274A1 (en) 2008-06-25
WO2007018283A1 (en) 2007-02-15
KR20080034025A (ko) 2008-04-17
EP1934274B1 (en) 2009-11-18

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