CN101238165A - 环状二氢聚硅氧烷、氢聚硅氧烷、其生产方法、二氧化硅类玻璃模制品及其生产方法，光学元件及其生产方法 - Google Patents

环状二氢聚硅氧烷、氢聚硅氧烷、其生产方法、二氧化硅类玻璃模制品及其生产方法，光学元件及其生产方法 Download PDF

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Publication number
CN101238165A
CN101238165A CNA2006800288173A CN200680028817A CN101238165A CN 101238165 A CN101238165 A CN 101238165A CN A2006800288173 A CNA2006800288173 A CN A2006800288173A CN 200680028817 A CN200680028817 A CN 200680028817A CN 101238165 A CN101238165 A CN 101238165A
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Prior art keywords
hydrogen polysiloxanes
under
sio
hydrogen
zone
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Pending
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CNA2006800288173A
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English (en)
Chinese (zh)
Inventor
张原志成
栉引信男
伊藤真树
E·D·卡特索里斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Toray Specialty Materials KK
Dow Silicones Corp
Original Assignee
Dow Corning Toray Co Ltd
Dow Corning Corp
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Application filed by Dow Corning Toray Co Ltd, Dow Corning Corp filed Critical Dow Corning Toray Co Ltd
Publication of CN101238165A publication Critical patent/CN101238165A/zh
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/12—Polysiloxanes containing silicon bound to hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C08G77/10—Equilibration processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Silicon Polymers (AREA)
  • Silicon Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CNA2006800288173A 2005-08-05 2006-08-04 环状二氢聚硅氧烷、氢聚硅氧烷、其生产方法、二氧化硅类玻璃模制品及其生产方法，光学元件及其生产方法 Pending CN101238165A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005228774A JP5043317B2 (ja) 2005-08-05 2005-08-05 環状ジハイドロジェンポリシロキサン、ハイドロジェンポリシロキサン、それらの製造方法、シリカ系ガラス成形体およびその製造方法、光学素子およびその製造方法
JP228774/2005 2005-08-05

Publications (1)

Publication Number Publication Date
CN101238165A true CN101238165A (zh) 2008-08-06

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CNA2006800288173A Pending CN101238165A (zh) 2005-08-05 2006-08-04 环状二氢聚硅氧烷、氢聚硅氧烷、其生产方法、二氧化硅类玻璃模制品及其生产方法，光学元件及其生产方法

Country Status (7)

Country Link
US (1) US8097690B2 (enExample)
EP (1) EP1934274B1 (enExample)
JP (1) JP5043317B2 (enExample)
KR (1) KR101303852B1 (enExample)
CN (1) CN101238165A (enExample)
DE (1) DE602006010585D1 (enExample)
WO (1) WO2007018283A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012058798A1 (en) * 2010-11-02 2012-05-10 Henkel China Co. Ltd. Hydrosilicone resin and preparation process thereof
CN101516970B (zh) * 2006-09-21 2013-04-24 Jsr株式会社 有机硅树脂组合物和沟槽隔离的形成方法
CN108370034A (zh) * 2015-12-16 2018-08-03 捷恩智株式会社 锂离子二次电池用负极活性物质的制造方法
CN113183481A (zh) * 2020-01-10 2021-07-30 中国科学院化学研究所 一种可重复使用的类玻璃或类玻璃制品及其制备方法与回收再利用方法
JP2022541285A (ja) * 2020-01-10 2022-09-22 中国科学院化学研究所 自己修復又は繰返し使用可能な製品、その製造方法及び適用

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4783117B2 (ja) * 2005-10-21 2011-09-28 東レ・ダウコーニング株式会社 シリカ系ガラス薄層付き無機質基板、その製造方法、コーテイング剤および半導体装置
US8207442B2 (en) 2006-04-18 2012-06-26 Itn Energy Systems, Inc. Reinforcing structures for thin-film photovoltaic device substrates, and associated methods
WO2008036769A2 (en) 2006-09-19 2008-03-27 Itn Energy Systems, Inc. Semi-transparent dual layer back contact for bifacial and tandem junction thin-film photovolataic devices
JP2008101206A (ja) * 2006-09-21 2008-05-01 Jsr Corp シリコーン樹脂、シリコーン樹脂組成物およびトレンチアイソレーションの形成方法
JP2008266119A (ja) * 2006-11-24 2008-11-06 Jsr Corp シリコーン樹脂、シリコーン樹脂組成物およびトレンチアイソレーションの形成方法
JP5091249B2 (ja) 2006-12-20 2012-12-05 ダウ・コーニング・コーポレイション 多層の硬化シリコーン樹脂組成物で被覆またはラミネートされたガラス基板
WO2008079179A1 (en) 2006-12-20 2008-07-03 Dow Corning Corporation Glass substrates coated or laminated with cured silicone resin compositions
JP5149512B2 (ja) 2007-02-02 2013-02-20 東レ・ダウコーニング株式会社 液状硬化性組成物、コーテイング方法、無機質基板および半導体装置
JPWO2009096603A1 (ja) 2008-02-01 2011-05-26 Jsr株式会社 トレンチアイソレーションの形成方法
JP5226336B2 (ja) * 2008-02-15 2013-07-03 株式会社神戸製鋼所 酸化シリコン膜の製造方法
JP2011518893A (ja) * 2008-03-04 2011-06-30 ダウ・コーニング・コーポレイション ボロシロキサン組成物、ボロシロキサン接着剤、塗装基板及び積層基板
JP2011516626A (ja) * 2008-03-04 2011-05-26 ダウ・コーニング・コーポレイション シリコーン組成物、シリコーン接着剤、被覆基板及び積層基板
US20110045277A1 (en) * 2008-05-27 2011-02-24 Nathan Greer Adhesive Tape and Laminated Glass
TW201004795A (en) * 2008-07-31 2010-02-01 Dow Corning Laminated glass
US9336925B1 (en) * 2008-11-26 2016-05-10 Thin Film Electronics Asa Siloxanes, doped siloxanes, methods for their synthesis, compositions containing the same, and films formed therefrom
JP2014500897A (ja) 2010-11-09 2014-01-16 ダウ コーニング コーポレーション 有機リン酸化合物により可塑化されたヒドロシリル化硬化シリコーン樹脂
US20150050816A1 (en) * 2013-08-19 2015-02-19 Korea Atomic Energy Research Institute Method of electrochemically preparing silicon film
CN112203971A (zh) * 2018-05-02 2021-01-08 氢试实验室有限公司 氢载体化合物
JP7595073B2 (ja) * 2019-10-31 2024-12-05 イシラブズ サス 水素担体化合物を生成する方法及び再生する方法
US12371318B2 (en) 2019-10-31 2025-07-29 Hysilabs Sas Hydrogen carrier compounds
ES2949013T3 (es) * 2019-10-31 2023-09-25 Hysilabs Sas Procedimiento para producir y regenerar compuestos portadores de hidrógeno
WO2021200541A1 (ja) * 2020-03-31 2021-10-07 住友大阪セメント株式会社 表面処理金属酸化物粒子、分散液、化粧料および表面処理金属酸化物粒子の製造方法
JP7367587B2 (ja) * 2020-03-31 2023-10-24 住友大阪セメント株式会社 表面処理金属酸化物粒子、分散液、化粧料および表面処理金属酸化物粒子の製造方法
JP7367589B2 (ja) * 2020-03-31 2023-10-24 住友大阪セメント株式会社 表面処理金属酸化物粒子、分散液、化粧料および表面処理金属酸化物粒子の製造方法
WO2023178055A2 (en) * 2022-03-13 2023-09-21 Far Uv Technologies, Inc. Excimer illuminator with replaceable lamp

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2810628A (en) * 1957-10-22 Method of preparing cyclic polysilox-
US2547678A (en) * 1946-10-11 1951-04-03 Gen Electric Liquid polysiloxanes
BE547382A (enExample) * 1955-05-03
US3615272A (en) * 1968-11-04 1971-10-26 Dow Corning Condensed soluble hydrogensilsesquioxane resin
US3992426A (en) * 1973-08-22 1976-11-16 Union Carbide Corporation Quadripolymer siloxanes containing Si-H bonds
US4412080A (en) * 1982-08-16 1983-10-25 General Electric Company Methods for preparing cyclopolysiloxanes
JPS5984920A (ja) * 1982-11-05 1984-05-16 Fujitsu Ltd ポリジハイドロジエンシロキサンの製法
JPS6042426A (ja) * 1983-08-19 1985-03-06 Fujitsu Ltd ポリジハイドロジェンシロキサンの製法
JPS6086018A (ja) 1983-10-17 1985-05-15 Fujitsu Ltd シリコ−ン樹脂
US4565714B1 (en) * 1984-06-14 1999-06-29 Minnesota Mining & Mfg Low surface energy material
US4756977A (en) * 1986-12-03 1988-07-12 Dow Corning Corporation Multilayer ceramics from hydrogen silsesquioxane
US5010159A (en) 1989-09-01 1991-04-23 Dow Corning Corporation Process for the synthesis of soluble, condensed hydridosilicon resins containing low levels of silanol
US5091162A (en) * 1990-10-01 1992-02-25 Dow Corning Corporation Perhydrosiloxane copolymers and their use as coating materials
US5436029A (en) 1992-07-13 1995-07-25 Dow Corning Corporation Curing silicon hydride containing materials by exposure to nitrous oxide
US5985229A (en) * 1995-09-21 1999-11-16 Toagosei Co., Ltd. Solid silica derivative and process for producing the same
US6043330A (en) 1997-04-21 2000-03-28 Alliedsignal Inc. Synthesis of siloxane resins
US6281285B1 (en) 1999-06-09 2001-08-28 Dow Corning Corporation Silicone resins and process for synthesis
US6143360A (en) * 1999-12-13 2000-11-07 Dow Corning Corporation Method for making nanoporous silicone resins from alkylydridosiloxane resins
KR100624603B1 (ko) * 2000-03-31 2006-09-19 히다치 가세고교 가부시끼가이샤 신규한 실리콘 중합체의 제조 방법, 이 방법에 의해제조된 실리콘 중합체, 열경화성 수지 조성물, 수지 필름,절연 재료 부착 금속박, 양면 금속박 부착 절연 필름,금속장 적층판, 다층 금속장 적층판 및 다층 프린트 배선판
JP4360595B2 (ja) * 2002-10-18 2009-11-11 ペルノックス株式会社 光電変換装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101516970B (zh) * 2006-09-21 2013-04-24 Jsr株式会社 有机硅树脂组合物和沟槽隔离的形成方法
WO2012058798A1 (en) * 2010-11-02 2012-05-10 Henkel China Co. Ltd. Hydrosilicone resin and preparation process thereof
CN103261281A (zh) * 2010-11-02 2013-08-21 汉高股份有限公司 含氢硅树脂及其制备方法
CN103261281B (zh) * 2010-11-02 2015-09-30 汉高股份有限公司 含氢硅树脂及其制备方法
CN108370034A (zh) * 2015-12-16 2018-08-03 捷恩智株式会社 锂离子二次电池用负极活性物质的制造方法
CN113183481A (zh) * 2020-01-10 2021-07-30 中国科学院化学研究所 一种可重复使用的类玻璃或类玻璃制品及其制备方法与回收再利用方法
JP2022541285A (ja) * 2020-01-10 2022-09-22 中国科学院化学研究所 自己修復又は繰返し使用可能な製品、その製造方法及び適用
CN113183481B (zh) * 2020-01-10 2022-10-28 中国科学院化学研究所 一种可重复使用的类玻璃或类玻璃制品及其制备方法与回收再利用方法
JP7317203B2 (ja) 2020-01-10 2023-07-28 中国科学院化学研究所 自己修復又は繰返し使用可能な製品、その製造方法及び適用

Also Published As

Publication number Publication date
US8097690B2 (en) 2012-01-17
US20100188766A1 (en) 2010-07-29
JP5043317B2 (ja) 2012-10-10
KR101303852B1 (ko) 2013-09-05
JP2007045859A (ja) 2007-02-22
DE602006010585D1 (de) 2009-12-31
EP1934274A1 (en) 2008-06-25
WO2007018283A1 (en) 2007-02-15
KR20080034025A (ko) 2008-04-17
EP1934274B1 (en) 2009-11-18

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