JP4880620B2 - スパッタリングターゲットおよびその製造方法 - Google Patents

スパッタリングターゲットおよびその製造方法 Download PDF

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Publication number
JP4880620B2
JP4880620B2 JP2007555157A JP2007555157A JP4880620B2 JP 4880620 B2 JP4880620 B2 JP 4880620B2 JP 2007555157 A JP2007555157 A JP 2007555157A JP 2007555157 A JP2007555157 A JP 2007555157A JP 4880620 B2 JP4880620 B2 JP 4880620B2
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Japan
Prior art keywords
texture
rolling
metal plate
tantalum
metal
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Expired - Lifetime
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JP2007555157A
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English (en)
Japanese (ja)
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JP2008532765A (ja
JP2008532765A5 (https=
Inventor
イー．，ジュニア ウイッカーシャム，チャールズ
アイ． レビット，ブラディミール
アレクサンダー，ピー．トッド
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Cabot Corp
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Cabot Corp
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Publication of JP2008532765A5 publication Critical patent/JP2008532765A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/02—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling heavy work, e.g. ingots, slabs, blooms, or billets, in which the cross-sectional form is unimportant ; Rolling combined with forging or pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/38—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling sheets of limited length, e.g. folded sheets, superimposed sheets, pack rolling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21H—MAKING PARTICULAR METAL OBJECTS BY ROLLING, e.g. SCREWS, WHEELS, RINGS, BARRELS, BALLS
    • B21H1/00—Making articles shaped as bodies of revolution
    • B21H1/02—Making articles shaped as bodies of revolution discs; disc wheels
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18—High-melting or refractory metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12229—Intermediate article [e.g., blank, etc.]
    • Y10T428/12236—Panel having nonrectangular perimeter
    • Y10T428/12243—Disk

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Metal Rolling (AREA)
JP2007555157A 2005-02-10 2006-02-07 スパッタリングターゲットおよびその製造方法 Expired - Lifetime JP4880620B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/055,535 2005-02-10
US11/055,535 US7998287B2 (en) 2005-02-10 2005-02-10 Tantalum sputtering target and method of fabrication
PCT/US2006/004143 WO2006086319A2 (en) 2005-02-10 2006-02-07 Sputtering target and method of fabrication

Publications (3)

Publication Number Publication Date
JP2008532765A JP2008532765A (ja) 2008-08-21
JP2008532765A5 JP2008532765A5 (https=) 2009-02-12
JP4880620B2 true JP4880620B2 (ja) 2012-02-22

Family

ID=36572042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007555157A Expired - Lifetime JP4880620B2 (ja) 2005-02-10 2006-02-07 スパッタリングターゲットおよびその製造方法

Country Status (6)

Country Link
US (2) US7998287B2 (https=)
EP (1) EP1848552B1 (https=)
JP (1) JP4880620B2 (https=)
KR (1) KR101253377B1 (https=)
CN (2) CN102513353B (https=)
WO (1) WO2006086319A2 (https=)

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CN101374611B (zh) * 2006-03-07 2015-04-08 卡伯特公司 制备变形金属制品的方法
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WO2008105453A1 (ja) * 2007-02-27 2008-09-04 Ngk Insulators, Ltd. 金属板材の圧延方法および前記圧延方法を用いて製造された圧延板材
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CN101956159A (zh) * 2010-09-30 2011-01-26 金堆城钼业股份有限公司 一种高纯钼溅射靶材的制备方法
CN102350439B (zh) * 2011-09-23 2014-04-23 宁波江丰电子材料有限公司 半导体用镍靶坯热轧方法
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CN102513789B (zh) * 2011-12-21 2014-04-09 宁波江丰电子材料有限公司 钨靶材的制作方法
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CN102699247B (zh) * 2012-05-18 2014-06-18 宁夏东方钽业股份有限公司 一种超导钽棒的锻造方法
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KR20170036121A (ko) 2012-12-19 2017-03-31 제이엑스금속주식회사 탄탈 스퍼터링 타깃 및 그 제조 방법
CN104937133A (zh) 2013-03-04 2015-09-23 吉坤日矿日石金属株式会社 钽溅射靶及其制造方法
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CN105593399B (zh) 2013-10-01 2018-05-25 吉坤日矿日石金属株式会社 钽溅射靶
WO2015146516A1 (ja) 2014-03-27 2015-10-01 Jx日鉱日石金属株式会社 タンタルスパッタリングターゲット及びその製造方法
JP2018519413A (ja) 2015-04-10 2018-07-19 トーソー エスエムディー，インク． タンタルスパッターターゲットの製造方法及びこれにより製造されたスパッターターゲット
JP6293929B2 (ja) * 2015-05-22 2018-03-14 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
WO2016190159A1 (ja) * 2015-05-22 2016-12-01 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
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TW201738395A (zh) * 2015-11-06 2017-11-01 塔沙Ｓｍｄ公司 具有提高的沉積速率的製備鉭濺鍍靶材的方法
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Also Published As

Publication number Publication date
WO2006086319A3 (en) 2006-12-28
US8231745B2 (en) 2012-07-31
CN101155650A (zh) 2008-04-02
WO2006086319A2 (en) 2006-08-17
JP2008532765A (ja) 2008-08-21
US7998287B2 (en) 2011-08-16
CN102513353A (zh) 2012-06-27
CN102513353B (zh) 2016-02-17
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KR20070107114A (ko) 2007-11-06
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US20070089815A1 (en) 2007-04-26
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