KR101253377B1 - 스퍼터링 타겟 및 그 제조 방법 - Google Patents

스퍼터링 타겟 및 그 제조 방법 Download PDF

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Publication number
KR101253377B1
KR101253377B1 KR1020077020482A KR20077020482A KR101253377B1 KR 101253377 B1 KR101253377 B1 KR 101253377B1 KR 1020077020482 A KR1020077020482 A KR 1020077020482A KR 20077020482 A KR20077020482 A KR 20077020482A KR 101253377 B1 KR101253377 B1 KR 101253377B1
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South Korea
Prior art keywords
metal
plate
rolling
bcc
article
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Expired - Lifetime
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KR1020077020482A
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Korean (ko)
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KR20070107114A (ko
Inventor
찰스 이. 제이알. 윅커스햄
브라디미르 아이. 레비트
피. 토드 알렉산더
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캐보트 코포레이션
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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/02—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling heavy work, e.g. ingots, slabs, blooms, or billets, in which the cross-sectional form is unimportant ; Rolling combined with forging or pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/38—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling sheets of limited length, e.g. folded sheets, superimposed sheets, pack rolling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21H—MAKING PARTICULAR METAL OBJECTS BY ROLLING, e.g. SCREWS, WHEELS, RINGS, BARRELS, BALLS
    • B21H1/00—Making articles shaped as bodies of revolution
    • B21H1/02—Making articles shaped as bodies of revolution discs; disc wheels
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18—High-melting or refractory metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12229—Intermediate article [e.g., blank, etc.]
    • Y10T428/12236—Panel having nonrectangular perimeter
    • Y10T428/12243—Disk

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Metal Rolling (AREA)
KR1020077020482A 2005-02-10 2006-02-07 스퍼터링 타겟 및 그 제조 방법 Expired - Lifetime KR101253377B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/055,535 2005-02-10
US11/055,535 US7998287B2 (en) 2005-02-10 2005-02-10 Tantalum sputtering target and method of fabrication
PCT/US2006/004143 WO2006086319A2 (en) 2005-02-10 2006-02-07 Sputtering target and method of fabrication

Publications (2)

Publication Number Publication Date
KR20070107114A KR20070107114A (ko) 2007-11-06
KR101253377B1 true KR101253377B1 (ko) 2013-04-11

Family

ID=36572042

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077020482A Expired - Lifetime KR101253377B1 (ko) 2005-02-10 2006-02-07 스퍼터링 타겟 및 그 제조 방법

Country Status (6)

Country Link
US (2) US7998287B2 (https=)
EP (1) EP1848552B1 (https=)
JP (1) JP4880620B2 (https=)
KR (1) KR101253377B1 (https=)
CN (2) CN102513353B (https=)
WO (1) WO2006086319A2 (https=)

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KR20170127548A (ko) * 2015-05-22 2017-11-21 제이엑스금속주식회사 탄탈 스퍼터링 타깃 및 그 제조 방법

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US7998287B2 (en) 2005-02-10 2011-08-16 Cabot Corporation Tantalum sputtering target and method of fabrication
CN101374611B (zh) * 2006-03-07 2015-04-08 卡伯特公司 制备变形金属制品的方法
US7776166B2 (en) * 2006-12-05 2010-08-17 Praxair Technology, Inc. Texture and grain size controlled hollow cathode magnetron targets and method of manufacture
US9677170B2 (en) * 2007-02-09 2017-06-13 Jx Nippon Mining & Metals Corporation Target formed of sintering-resistant material of high-melting point metal alloy, high-melting point metal silicide, high-melting point metal carbide, high-melting point metal nitride, or high-melting point metal boride, process for producing the target, assembly of the sputtering target-backing plate, and process for producing the same
WO2008105453A1 (ja) * 2007-02-27 2008-09-04 Ngk Insulators, Ltd. 金属板材の圧延方法および前記圧延方法を用いて製造された圧延板材
EP2185300B1 (en) * 2007-08-06 2018-10-24 H. C. Starck, Inc. Refractory metal plates with improved uniformity of texture
US8250895B2 (en) * 2007-08-06 2012-08-28 H.C. Starck Inc. Methods and apparatus for controlling texture of plates and sheets by tilt rolling
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KR101626286B1 (ko) * 2008-11-03 2016-06-01 토소우 에스엠디, 인크 스퍼터 타겟 제조 방법 및 이에 의해 제조된 스퍼터 타겟
CN101649439B (zh) * 2009-05-08 2012-07-25 宁波江丰电子材料有限公司 靶材塑性变形方法
SG173141A1 (en) * 2009-05-22 2011-08-29 Jx Nippon Mining & Metals Corp Tantalum sputtering target
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CN101956159A (zh) * 2010-09-30 2011-01-26 金堆城钼业股份有限公司 一种高纯钼溅射靶材的制备方法
CN102350439B (zh) * 2011-09-23 2014-04-23 宁波江丰电子材料有限公司 半导体用镍靶坯热轧方法
SG2014009997A (en) 2011-11-30 2014-04-28 Jx Nippon Mining & Metals Corp Tantalum sputtering target and method for manufacturing same
CN102513789B (zh) * 2011-12-21 2014-04-09 宁波江丰电子材料有限公司 钨靶材的制作方法
CN104204282B (zh) 2012-03-21 2017-05-24 吉坤日矿日石金属株式会社 钽溅射靶及其制造方法以及使用该靶形成的半导体布线用阻挡膜
CN102699247B (zh) * 2012-05-18 2014-06-18 宁夏东方钽业股份有限公司 一种超导钽棒的锻造方法
WO2014097897A1 (ja) 2012-12-19 2014-06-26 Jx日鉱日石金属株式会社 タンタルスパッタリングターゲット及びその製造方法
KR20170036121A (ko) 2012-12-19 2017-03-31 제이엑스금속주식회사 탄탈 스퍼터링 타깃 및 그 제조 방법
CN104937133A (zh) 2013-03-04 2015-09-23 吉坤日矿日石金属株式会社 钽溅射靶及其制造方法
MX2015017559A (es) * 2013-07-10 2016-05-09 Alcoa Inc Metodos para generar productos forjados y otros productos trabajados.
CN105593399B (zh) 2013-10-01 2018-05-25 吉坤日矿日石金属株式会社 钽溅射靶
WO2015146516A1 (ja) 2014-03-27 2015-10-01 Jx日鉱日石金属株式会社 タンタルスパッタリングターゲット及びその製造方法
JP2018519413A (ja) 2015-04-10 2018-07-19 トーソー エスエムディー，インク． タンタルスパッターターゲットの製造方法及びこれにより製造されたスパッターターゲット
JP6293929B2 (ja) * 2015-05-22 2018-03-14 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
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CN108472712A (zh) * 2016-01-14 2018-08-31 奥科宁克公司 用于生产锻造产品和其它加工产品的方法
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Publication number Priority date Publication date Assignee Title
KR20170127548A (ko) * 2015-05-22 2017-11-21 제이엑스금속주식회사 탄탈 스퍼터링 타깃 및 그 제조 방법
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Also Published As

Publication number Publication date
WO2006086319A3 (en) 2006-12-28
US8231745B2 (en) 2012-07-31
CN101155650A (zh) 2008-04-02
WO2006086319A2 (en) 2006-08-17
JP2008532765A (ja) 2008-08-21
US7998287B2 (en) 2011-08-16
CN102513353A (zh) 2012-06-27
CN102513353B (zh) 2016-02-17
EP1848552A2 (en) 2007-10-31
KR20070107114A (ko) 2007-11-06
EP1848552B1 (en) 2012-10-10
CN101155650B (zh) 2012-02-01
US20070089815A1 (en) 2007-04-26
JP4880620B2 (ja) 2012-02-22
US20110297536A1 (en) 2011-12-08

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