JP2008532765A5 - - Google Patents

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Publication number
JP2008532765A5
JP2008532765A5 JP2007555157A JP2007555157A JP2008532765A5 JP 2008532765 A5 JP2008532765 A5 JP 2008532765A5 JP 2007555157 A JP2007555157 A JP 2007555157A JP 2007555157 A JP2007555157 A JP 2007555157A JP 2008532765 A5 JP2008532765 A5 JP 2008532765A5
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JP
Japan
Prior art keywords
metal plate
axis
texture
pole
rolling
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2007555157A
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English (en)
Japanese (ja)
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JP2008532765A (ja
JP4880620B2 (ja
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Priority claimed from US11/055,535 external-priority patent/US7998287B2/en
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Publication of JP2008532765A publication Critical patent/JP2008532765A/ja
Publication of JP2008532765A5 publication Critical patent/JP2008532765A5/ja
Application granted granted Critical
Publication of JP4880620B2 publication Critical patent/JP4880620B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2007555157A 2005-02-10 2006-02-07 スパッタリングターゲットおよびその製造方法 Expired - Lifetime JP4880620B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/055,535 2005-02-10
US11/055,535 US7998287B2 (en) 2005-02-10 2005-02-10 Tantalum sputtering target and method of fabrication
PCT/US2006/004143 WO2006086319A2 (en) 2005-02-10 2006-02-07 Sputtering target and method of fabrication

Publications (3)

Publication Number Publication Date
JP2008532765A JP2008532765A (ja) 2008-08-21
JP2008532765A5 true JP2008532765A5 (https=) 2009-02-12
JP4880620B2 JP4880620B2 (ja) 2012-02-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007555157A Expired - Lifetime JP4880620B2 (ja) 2005-02-10 2006-02-07 スパッタリングターゲットおよびその製造方法

Country Status (6)

Country Link
US (2) US7998287B2 (https=)
EP (1) EP1848552B1 (https=)
JP (1) JP4880620B2 (https=)
KR (1) KR101253377B1 (https=)
CN (2) CN102513353B (https=)
WO (1) WO2006086319A2 (https=)

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TW201738395A (zh) * 2015-11-06 2017-11-01 塔沙Ｓｍｄ公司 具有提高的沉積速率的製備鉭濺鍍靶材的方法
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