JP4857531B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP4857531B2 JP4857531B2 JP2004201354A JP2004201354A JP4857531B2 JP 4857531 B2 JP4857531 B2 JP 4857531B2 JP 2004201354 A JP2004201354 A JP 2004201354A JP 2004201354 A JP2004201354 A JP 2004201354A JP 4857531 B2 JP4857531 B2 JP 4857531B2
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- 239000004065 semiconductor Substances 0.000 title claims description 32
- 230000010355 oscillation Effects 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 17
- 238000010586 diagram Methods 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- OQCFWECOQNPQCG-UHFFFAOYSA-N 1,3,4,8-tetrahydropyrimido[4,5-c]oxazin-7-one Chemical compound C1CONC2=C1C=NC(=O)N2 OQCFWECOQNPQCG-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0641—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region without components of the field effect type
- H01L27/0647—Bipolar transistors in combination with diodes, or capacitors, or resistors, e.g. vertical bipolar transistor and bipolar lateral transistor and resistor
- H01L27/0652—Vertical bipolar transistor in combination with diodes, or capacitors, or resistors
- H01L27/0658—Vertical bipolar transistor in combination with resistors or capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/0805—Capacitors only
- H01L27/0808—Varactor diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/92—Capacitors with potential-jump barrier or surface barrier
- H01L29/93—Variable capacitance diodes, e.g. varactors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
- H03B5/08—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
- H03B5/12—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
- H03B5/1203—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device the amplifier being a single transistor
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
- H03B5/08—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
- H03B5/12—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
- H03B5/1231—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device the amplifier comprising one or more bipolar transistors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
- H03B5/08—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
- H03B5/12—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
- H03B5/1237—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device comprising means for varying the frequency of the generator
- H03B5/124—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device comprising means for varying the frequency of the generator the means comprising a voltage dependent capacitance
- H03B5/1243—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device comprising means for varying the frequency of the generator the means comprising a voltage dependent capacitance the means comprising voltage variable capacitance diodes
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
- H03B5/08—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
- H03B5/12—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
- H03B5/1296—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device the feedback circuit comprising a transformer
Description
また、図3(B)は図3(A)において破線で囲んだ可変容量素子の構成を示す平面図、図3(C)は図3(B)におけるB−B線に沿った側面構造を示す断面図、図3(D)は可変容量素子の小信号等価回路である。
15は発振回路の出力端子である。
前記複数のベース層に配置され前記複数のベース層をそれぞれ1つ置きに接続する2組のベース電極と、
前記単一のコレクタ層に接続されたコンタクト層と、
前記コンタクト層の両側で前記2組のベース電極を挟む位置に配置されたコレクタ電極と、
前記2組のベース電極により前記コレクタ層を共通として前記複数のPN接合を逆直列接続し、上記各ベース層間に発生する容量が共通のコレクタ層に印加する電圧に応じて変化するようにした可変容量素子を備え、
前記同一半導体基板上のバイポーラトランジスタと、前記可変容量素子とを組み合わせて接続した電圧制御発振回路を有することを特徴とするものである。
以下、この発明の実施の形態1を図にもとづいて説明する。図1(A)は実施の形態1における可変容量素子の構成を示す平面図、図1(B)は図1(A)のA−A線に沿った側面構造を示す断面図、図1(C)は可変容量素子の小信号等価回路、図1(D)は実施の形態1の可変容量素子とNPN形バイポーラトランジスタとを同一半導体基板上に形成して組み合わせることにより形成された電圧制御発振回路の一例を示す。
更に、半導体基板6上には図1(D)に示す他の回路要素が設けられ、電圧制御発振回路が形成されている。
8 コレクタ層、 9 ベース層。
Claims (3)
- 同一半導体基板上のバイポーラトランジスタのコレクタ層と共通する単一のコレクタ層と、前記バイポーラトランジスタのベース層と共通するベース層であって互いに分離した少なくとも4つの複数のベース層とからなる少なくとも4つの複数のPN接合と、
前記複数のベース層に配置され前記複数のベース層をそれぞれ1つ置きに接続する2組のベース電極と、
前記単一のコレクタ層に接続されたコンタクト層と、
前記コンタクト層の両側で前記2組のベース電極を挟む位置に配置されたコレクタ電極と、
前記2組のベース電極により前記コレクタ層を共通として前記複数のPN接合を逆直列接続し、上記各ベース層間に発生する容量が共通のコレクタ層に印加する電圧に応じて変化するようにした可変容量素子を備え、
前記同一半導体基板上のバイポーラトランジスタと、前記可変容量素子とを組み合わせて接続した電圧制御発振回路を有することを特徴とする半導体装置。 - 半導体基板上のコレクタ層と、このコレクタ層の上に互いに分離して一列に配置された少なくとも4つのベース層とからなる少なくとも4つのPN接合と、
上記少なくとも4つのベース層を1つ置きに接続した2組のベース電極と、
上記コレクタ層の下に配置されたコンタクト層と、
上記コンタクト層の両端であって上記少なくとも4つのベース層を挟む位置に配置されたコレクタ電極と、
上記コレクタ電極を共通として上記2組のベース電極の間で上記各PN接合を逆直列接続し、上記2組のベース電極間に発生する容量が上記共通のコレクタ電極に印加する電圧に応じて変化するようにした可変容量素子を備え、
さらに、同一の上記半導体基板上において、上記ベース層と上記コレクタ層とをそれぞれ共通にするバイポーラトランジスタを備え、
上記可変容量素子と上記バイポーラトランジスタとを組み合わせて接続した電圧制御発振回路を有することを特徴とする半導体装置。 - 前記2組のベース電極が、夫々くし型形状を有することを特徴とする請求項1又は2に記載の半導体装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004201354A JP4857531B2 (ja) | 2004-07-08 | 2004-07-08 | 半導体装置 |
TW094122128A TWI289933B (en) | 2004-07-08 | 2005-06-30 | Semiconductor device |
DE102005030658.6A DE102005030658B4 (de) | 2004-07-08 | 2005-06-30 | Halbleitervorrichtung mit einer verbesserten spannungsgesteuerten Oszillatorschaltung |
FR0507217A FR2872959B1 (fr) | 2004-07-08 | 2005-07-06 | Dispositif a semiconducteur ayant un circuit oscillateur commande par tension perfectionne |
KR1020050060588A KR100659386B1 (ko) | 2004-07-08 | 2005-07-06 | 바이폴러 트랜지스터를 이용한 발진회로 |
US11/175,378 US7323763B2 (en) | 2004-07-08 | 2005-07-07 | Semiconductor device having an improved voltage controlled oscillator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004201354A JP4857531B2 (ja) | 2004-07-08 | 2004-07-08 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006024731A JP2006024731A (ja) | 2006-01-26 |
JP4857531B2 true JP4857531B2 (ja) | 2012-01-18 |
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Application Number | Title | Priority Date | Filing Date |
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JP2004201354A Expired - Fee Related JP4857531B2 (ja) | 2004-07-08 | 2004-07-08 | 半導体装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7323763B2 (ja) |
JP (1) | JP4857531B2 (ja) |
KR (1) | KR100659386B1 (ja) |
DE (1) | DE102005030658B4 (ja) |
FR (1) | FR2872959B1 (ja) |
TW (1) | TWI289933B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150325573A1 (en) | 2014-05-08 | 2015-11-12 | Triquint Semiconductor, Inc. | Dual stack varactor |
US10109623B2 (en) | 2014-05-08 | 2018-10-23 | Qorvo Us, Inc. | Dual-series varactor EPI |
US9484471B2 (en) * | 2014-09-12 | 2016-11-01 | Qorvo Us, Inc. | Compound varactor |
US9590669B2 (en) | 2015-05-08 | 2017-03-07 | Qorvo Us, Inc. | Single varactor stack with low second-harmonic generation |
US10158030B2 (en) | 2017-02-13 | 2018-12-18 | Qualcomm Incorporated | CMOS and bipolar device integration including a tunable capacitor |
CN113271078B (zh) * | 2021-05-19 | 2023-10-24 | 上海鸿晔电子科技股份有限公司 | 一种滤波器的制造方法 |
Family Cites Families (22)
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DE1803883A1 (de) * | 1968-10-18 | 1970-05-27 | Siemens Ag | Durch mindestens zwei abstimmbare Kapazitaetsdioden gesteuerte elektrische Anordnung |
US3582823A (en) * | 1969-02-24 | 1971-06-01 | Fairchild Camera Instr Co | Voltage controlled oscillator in which capacitive diodes become resistive during portions of each cycle |
JPS58210668A (ja) * | 1982-05-31 | 1983-12-07 | Matsushita Electric Ind Co Ltd | 半導体集積回路 |
FR2567325B1 (fr) * | 1984-07-03 | 1986-11-14 | Thomson Csf | Element a capacite variable, commandable par une tension continue |
JPH02206203A (ja) * | 1989-02-03 | 1990-08-16 | Fujitsu Ltd | 発振器 |
JPH03126062A (ja) * | 1989-10-12 | 1991-05-29 | Ricoh Co Ltd | 画像形成装置および画像形成方法 |
US5220194A (en) * | 1989-11-27 | 1993-06-15 | Motorola, Inc. | Tunable capacitor with RF-DC isolation |
US5747857A (en) * | 1991-03-13 | 1998-05-05 | Matsushita Electric Industrial Co., Ltd. | Electronic components having high-frequency elements and methods of manufacture therefor |
JP3081432B2 (ja) * | 1993-12-22 | 2000-08-28 | 三洋電機株式会社 | 可変容量素子およびラジオ受信機 |
JP2909406B2 (ja) * | 1995-03-17 | 1999-06-23 | 東光株式会社 | 可変容量ダイオード装置 |
SE515783C2 (sv) * | 1997-09-11 | 2001-10-08 | Ericsson Telefon Ab L M | Elektriska anordningar jämte förfarande för deras tillverkning |
JP2000124473A (ja) | 1998-10-15 | 2000-04-28 | Nippon Dempa Kogyo Co Ltd | 電圧可変容量を具備した集積回路素子及びこれを用い た電圧制御発振器 |
EP1080490B1 (en) * | 1999-03-10 | 2007-12-26 | Nxp B.V. | Method of manufacturing a semiconductor device comprising a bipolar transistor and a capacitor |
US6278158B1 (en) | 1999-12-29 | 2001-08-21 | Motorola, Inc. | Voltage variable capacitor with improved C-V linearity |
JP2001308106A (ja) * | 2000-04-27 | 2001-11-02 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
JP2002198733A (ja) * | 2000-12-27 | 2002-07-12 | Toshiba Corp | 発振回路 |
US6642607B2 (en) * | 2001-02-05 | 2003-11-04 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device |
JP3794963B2 (ja) * | 2001-02-05 | 2006-07-12 | 松下電器産業株式会社 | 半導体装置及びその製造方法 |
JP3631464B2 (ja) * | 2001-12-27 | 2005-03-23 | 株式会社東芝 | 半導体装置 |
DE10222764B4 (de) * | 2002-05-15 | 2011-06-01 | Ihp Gmbh - Innovations For High Performance Microelectronics / Leibniz-Institut Für Innovative Mikroelektronik | Halbleitervaraktor und damit aufgebauter Oszillator |
JP2004241624A (ja) * | 2003-02-06 | 2004-08-26 | Mitsubishi Electric Corp | 電圧制御発振回路 |
JP2005101295A (ja) * | 2003-09-25 | 2005-04-14 | Matsushita Electric Ind Co Ltd | 差動型電圧制御発振器 |
-
2004
- 2004-07-08 JP JP2004201354A patent/JP4857531B2/ja not_active Expired - Fee Related
-
2005
- 2005-06-30 TW TW094122128A patent/TWI289933B/zh not_active IP Right Cessation
- 2005-06-30 DE DE102005030658.6A patent/DE102005030658B4/de not_active Expired - Fee Related
- 2005-07-06 FR FR0507217A patent/FR2872959B1/fr not_active Expired - Fee Related
- 2005-07-06 KR KR1020050060588A patent/KR100659386B1/ko active IP Right Grant
- 2005-07-07 US US11/175,378 patent/US7323763B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
FR2872959B1 (fr) | 2008-12-26 |
JP2006024731A (ja) | 2006-01-26 |
KR100659386B1 (ko) | 2006-12-19 |
DE102005030658A1 (de) | 2006-02-09 |
KR20060049874A (ko) | 2006-05-19 |
US7323763B2 (en) | 2008-01-29 |
US20060006418A1 (en) | 2006-01-12 |
FR2872959A1 (fr) | 2006-01-13 |
TW200608583A (en) | 2006-03-01 |
DE102005030658B4 (de) | 2015-01-15 |
TWI289933B (en) | 2007-11-11 |
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