JP4857310B2 - 半導体発光素子及びその製造方法 - Google Patents
半導体発光素子及びその製造方法 Download PDFInfo
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- JP4857310B2 JP4857310B2 JP2008163168A JP2008163168A JP4857310B2 JP 4857310 B2 JP4857310 B2 JP 4857310B2 JP 2008163168 A JP2008163168 A JP 2008163168A JP 2008163168 A JP2008163168 A JP 2008163168A JP 4857310 B2 JP4857310 B2 JP 4857310B2
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- Prior art keywords
- light emitting
- light
- layer
- semiconductor
- emitting diode
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/813—Bodies having a plurality of light-emitting regions, e.g. multi-junction LEDs or light-emitting devices having photoluminescent regions within the bodies
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
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- H01L2224/0501—Shape
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- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- Power Engineering (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008163168A JP4857310B2 (ja) | 2004-02-19 | 2008-06-23 | 半導体発光素子及びその製造方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004042329 | 2004-02-19 | ||
| JP2004042330 | 2004-02-19 | ||
| JP2004042329 | 2004-02-19 | ||
| JP2004042330 | 2004-02-19 | ||
| JP2008163168A JP4857310B2 (ja) | 2004-02-19 | 2008-06-23 | 半導体発光素子及びその製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005043395A Division JP2005268775A (ja) | 2004-02-19 | 2005-02-21 | 半導体発光素子及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008227553A JP2008227553A (ja) | 2008-09-25 |
| JP2008227553A5 JP2008227553A5 (enExample) | 2009-04-30 |
| JP4857310B2 true JP4857310B2 (ja) | 2012-01-18 |
Family
ID=34863493
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008163168A Expired - Fee Related JP4857310B2 (ja) | 2004-02-19 | 2008-06-23 | 半導体発光素子及びその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US7569863B2 (enExample) |
| JP (1) | JP4857310B2 (enExample) |
Families Citing this family (62)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8545629B2 (en) | 2001-12-24 | 2013-10-01 | Crystal Is, Inc. | Method and apparatus for producing large, single-crystals of aluminum nitride |
| US20060005763A1 (en) | 2001-12-24 | 2006-01-12 | Crystal Is, Inc. | Method and apparatus for producing large, single-crystals of aluminum nitride |
| US7638346B2 (en) | 2001-12-24 | 2009-12-29 | Crystal Is, Inc. | Nitride semiconductor heterostructures and related methods |
| US7268370B2 (en) | 2003-06-05 | 2007-09-11 | Matsushita Electric Industrial Co., Ltd. | Phosphor, semiconductor light emitting device, and fabrication method thereof |
| US7915085B2 (en) * | 2003-09-18 | 2011-03-29 | Cree, Inc. | Molded chip fabrication method |
| JP2005268770A (ja) * | 2004-02-19 | 2005-09-29 | Matsushita Electric Ind Co Ltd | 白色発光素子及び白色光源 |
| US7569863B2 (en) * | 2004-02-19 | 2009-08-04 | Panasonic Corporation | Semiconductor light emitting device |
| WO2007065018A2 (en) | 2005-12-02 | 2007-06-07 | Crystal Is, Inc. | Doped aluminum nitride crystals and methods of making them |
| US9034103B2 (en) | 2006-03-30 | 2015-05-19 | Crystal Is, Inc. | Aluminum nitride bulk crystals having high transparency to ultraviolet light and methods of forming them |
| WO2007123735A1 (en) | 2006-03-30 | 2007-11-01 | Crystal Is, Inc. | Methods for controllable doping of aluminum nitride bulk crystals |
| KR100736623B1 (ko) * | 2006-05-08 | 2007-07-09 | 엘지전자 주식회사 | 수직형 발광 소자 및 그 제조방법 |
| TWI349146B (en) * | 2006-05-15 | 2011-09-21 | Epistar Corp | A light-mixing type light-emitting device |
| DE112007001235B4 (de) * | 2006-05-23 | 2018-05-09 | Meijo University | Licht emittierende Halbleitervorrichtung |
| TW200807760A (en) * | 2006-05-23 | 2008-02-01 | Alps Electric Co Ltd | Method for manufacturing semiconductor light emitting element |
| JP2008098529A (ja) * | 2006-10-13 | 2008-04-24 | Toshiba Corp | 半導体装置及びその製造方法 |
| JP4984824B2 (ja) * | 2006-10-26 | 2012-07-25 | 豊田合成株式会社 | 発光装置 |
| US9771666B2 (en) | 2007-01-17 | 2017-09-26 | Crystal Is, Inc. | Defect reduction in seeded aluminum nitride crystal growth |
| WO2008088838A1 (en) * | 2007-01-17 | 2008-07-24 | Crystal Is, Inc. | Defect reduction in seeded aluminum nitride crystal growth |
| US9024349B2 (en) * | 2007-01-22 | 2015-05-05 | Cree, Inc. | Wafer level phosphor coating method and devices fabricated utilizing method |
| US8232564B2 (en) * | 2007-01-22 | 2012-07-31 | Cree, Inc. | Wafer level phosphor coating technique for warm light emitting diodes |
| US9196799B2 (en) * | 2007-01-22 | 2015-11-24 | Cree, Inc. | LED chips having fluorescent substrates with microholes and methods for fabricating |
| US9159888B2 (en) * | 2007-01-22 | 2015-10-13 | Cree, Inc. | Wafer level phosphor coating method and devices fabricated utilizing method |
| CN101652832B (zh) | 2007-01-26 | 2011-06-22 | 晶体公司 | 厚的赝晶氮化物外延层 |
| US8080833B2 (en) * | 2007-01-26 | 2011-12-20 | Crystal Is, Inc. | Thick pseudomorphic nitride epitaxial layers |
| US8088220B2 (en) | 2007-05-24 | 2012-01-03 | Crystal Is, Inc. | Deep-eutectic melt growth of nitride crystals |
| TWI492412B (zh) * | 2007-09-07 | 2015-07-11 | Cree Inc | 晶圓級磷光體塗佈方法及使用該方法製造之裝置 |
| US9041285B2 (en) | 2007-12-14 | 2015-05-26 | Cree, Inc. | Phosphor distribution in LED lamps using centrifugal force |
| US8167674B2 (en) * | 2007-12-14 | 2012-05-01 | Cree, Inc. | Phosphor distribution in LED lamps using centrifugal force |
| US8878219B2 (en) * | 2008-01-11 | 2014-11-04 | Cree, Inc. | Flip-chip phosphor coating method and devices fabricated utilizing method |
| US8637883B2 (en) | 2008-03-19 | 2014-01-28 | Cree, Inc. | Low index spacer layer in LED devices |
| US7781780B2 (en) | 2008-03-31 | 2010-08-24 | Bridgelux, Inc. | Light emitting diodes with smooth surface for reflective electrode |
| DE102008051048A1 (de) * | 2008-10-09 | 2010-04-15 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterkörper |
| KR100992743B1 (ko) * | 2008-12-26 | 2010-11-05 | 엘지이노텍 주식회사 | 발광소자 및 그 제조방법 |
| TWI466266B (zh) * | 2009-02-24 | 2014-12-21 | 晶元光電股份有限公司 | 陣列式發光元件及其裝置 |
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| US20050184305A1 (en) | 2005-08-25 |
| US7569863B2 (en) | 2009-08-04 |
| JP2008227553A (ja) | 2008-09-25 |
| US20090261372A1 (en) | 2009-10-22 |
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