JP4833040B2 - 感光性樹脂組成物及び液晶パネル用スペーサ - Google Patents

感光性樹脂組成物及び液晶パネル用スペーサ Download PDF

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Publication number
JP4833040B2
JP4833040B2 JP2006316280A JP2006316280A JP4833040B2 JP 4833040 B2 JP4833040 B2 JP 4833040B2 JP 2006316280 A JP2006316280 A JP 2006316280A JP 2006316280 A JP2006316280 A JP 2006316280A JP 4833040 B2 JP4833040 B2 JP 4833040B2
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JP
Japan
Prior art keywords
group
photosensitive resin
resin composition
acrylate
meth
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2006316280A
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English (en)
Japanese (ja)
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JP2008129463A (ja
Inventor
公隆 森尾
弘明 武内
将俊 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP2006316280A priority Critical patent/JP4833040B2/ja
Priority to KR1020070110318A priority patent/KR100911076B1/ko
Priority to TW096143749A priority patent/TWI366069B/zh
Priority to CN2007101939106A priority patent/CN101196688B/zh
Publication of JP2008129463A publication Critical patent/JP2008129463A/ja
Application granted granted Critical
Publication of JP4833040B2 publication Critical patent/JP4833040B2/ja
Expired - Fee Related legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
JP2006316280A 2006-11-22 2006-11-22 感光性樹脂組成物及び液晶パネル用スペーサ Expired - Fee Related JP4833040B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006316280A JP4833040B2 (ja) 2006-11-22 2006-11-22 感光性樹脂組成物及び液晶パネル用スペーサ
KR1020070110318A KR100911076B1 (ko) 2006-11-22 2007-10-31 감광성 수지 조성물 및 액정 패널용 스페이서
TW096143749A TWI366069B (en) 2006-11-22 2007-11-19 Photosensitive resin composition and spacer for liquid crystal panel
CN2007101939106A CN101196688B (zh) 2006-11-22 2007-11-20 感光性树脂组合物及液晶面板用间隔物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006316280A JP4833040B2 (ja) 2006-11-22 2006-11-22 感光性樹脂組成物及び液晶パネル用スペーサ

Publications (2)

Publication Number Publication Date
JP2008129463A JP2008129463A (ja) 2008-06-05
JP4833040B2 true JP4833040B2 (ja) 2011-12-07

Family

ID=39547161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006316280A Expired - Fee Related JP4833040B2 (ja) 2006-11-22 2006-11-22 感光性樹脂組成物及び液晶パネル用スペーサ

Country Status (4)

Country Link
JP (1) JP4833040B2 (ko)
KR (1) KR100911076B1 (ko)
CN (1) CN101196688B (ko)
TW (1) TWI366069B (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5279353B2 (ja) * 2008-06-09 2013-09-04 東京応化工業株式会社 感光性樹脂組成物、感光性樹脂積層体およびパターン形成方法
TWI559079B (zh) * 2008-11-18 2016-11-21 Sumitomo Chemical Co Photosensitive resin composition and display device
KR101717784B1 (ko) * 2009-03-31 2017-03-17 도쿄 오카 고교 가부시키가이샤 감광성 수지 조성물 및 액정 패널
WO2013089403A1 (ko) * 2011-12-13 2013-06-20 주식회사 동진쎄미켐 포토레지스트 조성물
KR102025099B1 (ko) * 2011-12-13 2019-09-25 주식회사 동진쎄미켐 포토레지스트 조성물
JP5327345B2 (ja) 2012-02-23 2013-10-30 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、およびタッチパネル用部材。
WO2014035116A1 (ko) * 2012-08-27 2014-03-06 주식회사 엘지화학 광배향성 공중합체, 이를 이용한 광학 이방성 필름 및 이의 제조 방법
KR101592430B1 (ko) 2012-08-27 2016-02-05 주식회사 엘지화학 광배향성 공중합체, 이를 이용한 광학 이방성 필름 및 이의 제조 방법
JP5476490B2 (ja) * 2013-01-18 2014-04-23 東京応化工業株式会社 感光性樹脂組成物、感光性樹脂積層体およびパターン形成方法
JP5890337B2 (ja) * 2013-02-13 2016-03-22 東京応化工業株式会社 感放射線性樹脂組成物、絶縁膜、及び表示装置
WO2015194639A1 (ja) * 2014-06-20 2015-12-23 大阪有機化学工業株式会社 感光性組成物およびその硬化膜
KR102206495B1 (ko) 2015-03-26 2021-01-21 동우 화인켐 주식회사 착색 감광성 수지 조성물
KR102450387B1 (ko) 2015-05-13 2022-10-04 롬엔드하스전자재료코리아유한회사 네거티브형 감광성 수지 조성물 및 이를 이용한 절연막
WO2017001039A1 (en) * 2015-06-30 2017-01-05 Merck Patent Gmbh Polymerisable liquid crystal material and polymerised liquid crystal film
KR101886991B1 (ko) 2017-01-20 2018-08-10 동우 화인켐 주식회사 감광성 수지 조성물, 이를 사용하여 제조된 블랙 매트릭스, 컬럼 스페이서 또는 블랙 컬럼 스페이서를 포함하는 컬러필터, 및 상기 컬러필터를 포함하는 표시장치
CN115960303B (zh) * 2022-12-30 2024-09-13 阜阳欣奕华新材料科技股份有限公司 具有热交联结构的树脂及其制备方法、光敏性树脂组合物、微透镜及其制备方法和光学设备

Family Cites Families (13)

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Publication number Priority date Publication date Assignee Title
JPH10319597A (ja) * 1997-05-23 1998-12-04 Mitsubishi Electric Corp 感光性シリコーンラダー系樹脂組成物、この樹脂組成物にパターンを転写するパターン転写方法および上記樹脂組成物を用いた半導体装置
JPH11161138A (ja) * 1997-11-26 1999-06-18 Toppan Printing Co Ltd ホログラム記録用媒体及びホログラムの製造方法
JP3509612B2 (ja) * 1998-05-29 2004-03-22 日立化成デュポンマイクロシステムズ株式会社 感光性重合体組成物、レリーフパターンの製造法及び電子部品
JP2000035670A (ja) * 1998-07-21 2000-02-02 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
JP3426531B2 (ja) * 1998-10-30 2003-07-14 日立化成デュポンマイクロシステムズ株式会社 感光性重合体組成物、レリーフパターンの製造法及び電子部品
JP4462679B2 (ja) * 1999-03-30 2010-05-12 旭化成イーマテリアルズ株式会社 シリコン系カップリング剤及びその用途
JP3680128B2 (ja) * 2000-07-04 2005-08-10 富士フイルムエレクトロニクスマテリアルズ株式会社 感放射線硬化性組成物
JP4560222B2 (ja) * 2001-02-28 2010-10-13 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
US20040161619A1 (en) * 2002-12-12 2004-08-19 Arch Specialty Chemicals, Inc. Process for producing a heat resistant relief structure
JP4315010B2 (ja) * 2004-02-13 2009-08-19 Ｊｓｒ株式会社 感放射線性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP2005283914A (ja) * 2004-03-29 2005-10-13 Fuji Photo Film Co Ltd 着色感光性樹脂組成物、フォトマスク作製材料、フォトマスク及びその製造方法
JP4586623B2 (ja) * 2005-04-28 2010-11-24 日立化成工業株式会社 感光性樹脂組成物及び感光性エレメント、並びにスペーサーの製造方法
KR100731325B1 (ko) * 2005-06-23 2007-06-25 주식회사 삼양이엠에스 음성 레지스트 조성물

Also Published As

Publication number Publication date
JP2008129463A (ja) 2008-06-05
KR100911076B1 (ko) 2009-08-06
TWI366069B (en) 2012-06-11
KR20080046560A (ko) 2008-05-27
CN101196688A (zh) 2008-06-11
TW200823600A (en) 2008-06-01
CN101196688B (zh) 2012-05-30

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