JP4718463B2 - パーフルオロポリエーテルアミド連結ホスホネート、ホスフェートおよびそれらの誘導体 - Google Patents

パーフルオロポリエーテルアミド連結ホスホネート、ホスフェートおよびそれらの誘導体 Download PDF

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Publication number
JP4718463B2
JP4718463B2 JP2006523841A JP2006523841A JP4718463B2 JP 4718463 B2 JP4718463 B2 JP 4718463B2 JP 2006523841 A JP2006523841 A JP 2006523841A JP 2006523841 A JP2006523841 A JP 2006523841A JP 4718463 B2 JP4718463 B2 JP 4718463B2
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Japan
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alkyl
group
formula
hydrogen
combinations
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Expired - Fee Related
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JP2006523841A
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English (en)
Japanese (ja)
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JP2007502814A (ja
JP2007502814A5 (OSRAM
Inventor
エム． フライン，リチャード
ジェイ． ペルリート，マーク
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/3804—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)] not used, see subgroups
    • C07F9/3808—Acyclic saturated acids which can have further substituents on alkyl
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/3804—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)] not used, see subgroups
    • C07F9/3882—Arylalkanephosphonic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Paints Or Removers (AREA)
  • Detergent Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
JP2006523841A 2003-08-21 2004-07-07 パーフルオロポリエーテルアミド連結ホスホネート、ホスフェートおよびそれらの誘導体 Expired - Fee Related JP4718463B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US49683703P 2003-08-21 2003-08-21
US60/496,837 2003-08-21
PCT/US2004/021713 WO2005023822A1 (en) 2003-08-21 2004-07-07 Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof

Publications (3)

Publication Number Publication Date
JP2007502814A JP2007502814A (ja) 2007-02-15
JP2007502814A5 JP2007502814A5 (OSRAM) 2007-08-09
JP4718463B2 true JP4718463B2 (ja) 2011-07-06

Family

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Family Applications (1)

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JP2006523841A Expired - Fee Related JP4718463B2 (ja) 2003-08-21 2004-07-07 パーフルオロポリエーテルアミド連結ホスホネート、ホスフェートおよびそれらの誘導体

Country Status (8)

Country Link
US (1) US7678426B2 (OSRAM)
EP (1) EP1656385B1 (OSRAM)
JP (1) JP4718463B2 (OSRAM)
KR (1) KR20060080920A (OSRAM)
CN (1) CN100558735C (OSRAM)
AT (1) ATE346852T1 (OSRAM)
DE (1) DE602004003506T2 (OSRAM)
WO (1) WO2005023822A1 (OSRAM)

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* Cited by examiner, † Cited by third party
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US7189479B2 (en) * 2003-08-21 2007-03-13 3M Innovative Properties Company Phototool coating
WO2005080406A2 (en) * 2003-12-19 2005-09-01 Jerini Ag Compounds for the inhibition of undesired cell proliferation and use thereof
ITMI20051533A1 (it) * 2005-08-04 2007-02-05 Solvay Solexis Spa Usi di composti fluororurati per il trattamento protettivo di superfici in titanio
GB2432836A (en) * 2005-12-01 2007-06-06 3M Innovative Properties Co Fluorinated surfactant
US7824755B2 (en) * 2006-06-29 2010-11-02 3M Innovative Properties Company Fluorinated leveling agents
JP5385146B2 (ja) * 2006-10-20 2014-01-08 スリーエム イノベイティブ プロパティズ カンパニー 易洗浄基材のための方法及びそれによる物品
CN101563383B (zh) * 2006-12-20 2012-08-15 3M创新有限公司 具有侧链甲硅烷基的含氟氨基甲酸酯化合物
KR20100017848A (ko) * 2007-05-23 2010-02-16 쓰리엠 이노베이티브 프로퍼티즈 컴파니 플루오르화 계면활성제의 수성 조성물 및 그의 사용 방법
EP2444428B1 (en) 2007-06-06 2013-07-24 3M Innovative Properties Company Fluorinated compositions and surface treatments made therefrom
CN101679572A (zh) * 2007-06-06 2010-03-24 3M创新有限公司 氟化组合物和由其制成的表面处理剂
CN101679569A (zh) * 2007-06-06 2010-03-24 3M创新有限公司 氟化醚组合物以及使用该组合物的方法
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
US20090041986A1 (en) * 2007-06-21 2009-02-12 3M Innovative Properties Company Method of making hierarchical articles
US7891636B2 (en) * 2007-08-27 2011-02-22 3M Innovative Properties Company Silicone mold and use thereof
US8115920B2 (en) * 2007-11-14 2012-02-14 3M Innovative Properties Company Method of making microarrays
US8071277B2 (en) * 2007-12-21 2011-12-06 3M Innovative Properties Company Method and system for fabricating three-dimensional structures with sub-micron and micron features
US20100270020A1 (en) * 2007-12-21 2010-10-28 Baran Jr Jimmie R Methods for treating hydrocarbon-bearing formations with fluorinated anionic surfactant compositions
KR20100101635A (ko) * 2007-12-31 2010-09-17 쓰리엠 이노베이티브 프로퍼티즈 컴파니 코팅성 물질의 도포방법
BRPI0910877A2 (pt) * 2008-03-26 2015-10-06 3M Innovative Proferties Company método para aplicar dois ou mais fluidos como um revestimento de deslizamento
BRPI0910075A2 (pt) * 2008-03-26 2015-12-29 3M Innovative Properties Co métodos para aplicar dois ou mais fluidos como um revestimento de deslizamento
US20110027493A1 (en) * 2008-03-26 2011-02-03 Yapel Robert A Methods of slide coating fluids containing multi unit polymeric precursors
WO2010009191A2 (en) * 2008-07-18 2010-01-21 3M Innovative Properties Company Fluorinated ether compounds and methods of using the same
US20110232530A1 (en) * 2008-11-25 2011-09-29 Dams Rudolf J Fluorinated ether urethanes and methods of using the same
CN102301277B (zh) 2008-12-05 2013-07-17 3M创新有限公司 使用非线性热聚合的三维制品
EP2370269B1 (en) * 2008-12-11 2015-08-05 3M Innovative Properties Company Patterning process
US8629089B2 (en) 2008-12-18 2014-01-14 3M Innovative Properties Company Method of contacting hydrocarbon-bearing formations with fluorinated ether compositions
MX2011006673A (es) * 2008-12-18 2011-07-20 3M Innovative Properties Co Metodo para poner en contacto formaciones que contienen hidrocarburos con posiciones de fosfatos y fosfonatos fluorados.
MX2012000413A (es) 2009-07-09 2012-02-08 3M Innovative Prosperties Company Metodos para tratar con compuestos anfotericos fluorados a las formaciones de carbonato que poseen hidrocarburos.
CN102597116B (zh) * 2009-07-21 2013-12-11 3M创新有限公司 可固化组合物、涂覆底片的方法、以及被涂覆的底片
US9051423B2 (en) 2009-09-16 2015-06-09 3M Innovative Properties Company Fluorinated coating and phototools made therewith
US8268067B2 (en) 2009-10-06 2012-09-18 3M Innovative Properties Company Perfluoropolyether coating composition for hard surfaces
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CN103180353B (zh) * 2010-11-04 2016-02-17 3M创新有限公司 包含含磷酸基团和烷氧基硅烷基团的氟化组合物
FR2969663B1 (fr) * 2010-12-23 2013-01-18 Surfactis Technologies Composition hydrophobe et lipophobe de molecules bisphosphoniques et thiols
EP2500009A1 (en) 2011-03-17 2012-09-19 3M Innovative Properties Company Dental ceramic article, process of production and use thereof
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US10534120B2 (en) 2015-04-03 2020-01-14 Moxtek, Inc. Wire grid polarizer with protected wires
JP6488890B2 (ja) * 2015-06-03 2019-03-27 信越化学工業株式会社 フルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体、該誘導体を含む表面処理剤、該表面処理剤で処理された物品及び光学物品
JP6520419B2 (ja) * 2015-06-04 2019-05-29 信越化学工業株式会社 フルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体及び該誘導体を含む表面処理剤、該表面処理剤で処理された物品及び光学物品
CN108137798B (zh) * 2015-10-09 2020-06-09 信越化学工业株式会社 含有氟代氧化亚烷基的聚合物改性膦酸衍生物、以及对应的表面处理剂和表面处理方法
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CN113549211B (zh) * 2021-06-04 2024-01-26 广州优尔材料科技有限公司 含全氟聚醚的磷酸化合物、表面处理剂及物品
CN113321799B (zh) * 2021-06-04 2023-10-24 广州优尔材料科技有限公司 全氟聚醚偕二磷酸化合物、表面处理剂及使用方法、物品
JP7365086B1 (ja) * 2023-04-04 2023-10-19 株式会社ハーベス パーフルオロポリエーテル基含有ホスホネート化合物、表面処理剤、及び該表面処理剤で処理された物品

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA761007A (en) 1967-06-13 E. Le Bleu Ronald Polyfluoropolyoxa-alkyl phosphates
US3274244A (en) * 1963-06-14 1966-09-20 Du Pont Polyfluoropolyoxa-alkanamidoalkyl compounds
US3492374A (en) 1963-06-14 1970-01-27 Du Pont Polyfluoropolyoxa-alkyl phosphates
US3306855A (en) 1966-03-24 1967-02-28 Du Pont Corrosion and rust inhibited poly (hexafluoropropylene oxide) oil compositions
US3810874A (en) 1969-03-10 1974-05-14 Minnesota Mining & Mfg Polymers prepared from poly(perfluoro-alkylene oxide) compounds
US3734687A (en) * 1969-04-04 1973-05-22 Fmc Corp A fabric finished with a fluorinated quarternized halomethyl ether
US3646085A (en) 1970-09-24 1972-02-29 Du Pont Perfluoroalkyletheramidoalkyltrialkoxysilanes
US3901727A (en) * 1971-03-08 1975-08-26 Minnesota Mining & Mfg Process and composition for cleaning and imparting water and oil repellency and stain resistance to a substrate
US3950588A (en) 1974-11-01 1976-04-13 Minnesota Mining And Manufacturing Company Coating of silanol-reactive surfaces with di-silyl poly(perfluorooxyalkylenes)
JPS60190727A (ja) * 1984-03-09 1985-09-28 Daikin Ind Ltd 含フツ素有機シラン化合物およびその製法と用途
DE3787533T2 (de) 1987-12-21 1994-01-20 Union Carbide Corp Verwendung von superkritischen Flüssigkeiten als Verdünner beim Aufsprühen von Überzügen.
JPH01268696A (ja) 1988-04-19 1989-10-26 Daikin Ind Ltd 含フッ素リン酸エステル及びその製法並びに含フッ素防錆剤
US5106650A (en) 1988-07-14 1992-04-21 Union Carbide Chemicals & Plastics Technology Corporation Electrostatic liquid spray application of coating with supercritical fluids as diluents and spraying from an orifice
US5108799A (en) 1988-07-14 1992-04-28 Union Carbide Chemicals & Plastics Technology Corporation Liquid spray application of coatings with supercritical fluids as diluents and spraying from an orifice
US5066522A (en) 1988-07-14 1991-11-19 Union Carbide Chemicals And Plastics Technology Corporation Supercritical fluids as diluents in liquid spray applications of adhesives
US5032279A (en) 1989-09-21 1991-07-16 Occidental Chemical Corporation Separation of fluids using polyimidesiloxane membrane
AU632869B2 (en) 1989-12-14 1993-01-14 Minnesota Mining And Manufacturing Company Fluorocarbon-based coating compositions and articles derived therefrom
CA2039667C (en) 1990-04-07 2001-10-02 Tetsuya Masutani Leather treatment composition and process for treating leather
US5227008A (en) 1992-01-23 1993-07-13 Minnesota Mining And Manufacturing Company Method for making flexible circuits
IT1256721B (it) 1992-12-16 1995-12-15 Ausimont Spa Processo per impartire oleo- ed idro-repellenza alla superficie di materiali ceramici porosi
US5274159A (en) 1993-02-18 1993-12-28 Minnesota Mining And Manufacturing Company Destructable fluorinated alkoxysilane surfactants and repellent coatings derived therefrom
US5550277A (en) 1995-01-19 1996-08-27 Paciorek; Kazimiera J. L. Perfluoroalkyl and perfluoroalkylether substituted aromatic phosphates, phosphonates and related compositions
JP3820614B2 (ja) 1996-02-09 2006-09-13 住友化学株式会社 シラン化合物被膜の形成方法
JP3365470B2 (ja) * 1996-07-31 2003-01-14 エヌオーケー株式会社 フッ素ベース磁性流体
WO1998040439A1 (en) 1997-03-14 1998-09-17 Minnesota Mining And Manufacturing Company Cure-on-demand, moisture-curable compositions having reactive silane functionality
US5851674A (en) 1997-07-30 1998-12-22 Minnesota Mining And Manufacturing Company Antisoiling coatings for antireflective surfaces and methods of preparation
US6127000A (en) 1997-10-10 2000-10-03 North Carolina State University Method and compositions for protecting civil infrastructure
AU2230599A (en) 1998-01-27 1999-08-09 Minnesota Mining And Manufacturing Company Fluorochemical benzotriazoles
US6277485B1 (en) 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
US6184187B1 (en) 1998-04-07 2001-02-06 E. I. Dupont De Nemours And Company Phosphorus compounds and their use as corrosion inhibitors for perfluoropolyethers
TW591097B (en) 1998-12-10 2004-06-11 Toray Industries Optical articles and the preparation of optical articles
US6177357B1 (en) 1999-04-30 2001-01-23 3M Innovative Properties Company Method for making flexible circuits
US6403211B1 (en) 2000-07-18 2002-06-11 3M Innovative Properties Company Liquid crystal polymer for flexible circuits
ITMI20010114A1 (it) 2001-01-23 2002-07-23 Ausimont Spa Processo per ottenere miscele di mono- e biesteri fosforici
JP4409122B2 (ja) 2001-07-18 2010-02-03 Ｎｏｋクリューバー株式会社 軸受用グリース組成物
US6824882B2 (en) 2002-05-31 2004-11-30 3M Innovative Properties Company Fluorinated phosphonic acids
US7189479B2 (en) * 2003-08-21 2007-03-13 3M Innovative Properties Company Phototool coating

Also Published As

Publication number Publication date
JP2007502814A (ja) 2007-02-15
EP1656385A1 (en) 2006-05-17
DE602004003506D1 (de) 2007-01-11
US20050048288A1 (en) 2005-03-03
CN1839141A (zh) 2006-09-27
KR20060080920A (ko) 2006-07-11
US7678426B2 (en) 2010-03-16
CN100558735C (zh) 2009-11-11
ATE346852T1 (de) 2006-12-15
DE602004003506T2 (de) 2007-09-20
WO2005023822A1 (en) 2005-03-17
EP1656385B1 (en) 2006-11-29

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