ATE346852T1 - Perfluorpolyetheramidgebundene phosphonate, phosphate und derivate davon - Google Patents

Perfluorpolyetheramidgebundene phosphonate, phosphate und derivate davon

Info

Publication number
ATE346852T1
ATE346852T1 AT04756725T AT04756725T ATE346852T1 AT E346852 T1 ATE346852 T1 AT E346852T1 AT 04756725 T AT04756725 T AT 04756725T AT 04756725 T AT04756725 T AT 04756725T AT E346852 T1 ATE346852 T1 AT E346852T1
Authority
AT
Austria
Prior art keywords
derivatives
phosphonates
phosphates
perfluorpolyetheramid
bonded
Prior art date
Application number
AT04756725T
Other languages
German (de)
English (en)
Inventor
Richard M Flynn
Mark J Pellerite
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Application granted granted Critical
Publication of ATE346852T1 publication Critical patent/ATE346852T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/3804—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)] not used, see subgroups
    • C07F9/3808—Acyclic saturated acids which can have further substituents on alkyl
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
    • C07F9/3804—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)] not used, see subgroups
    • C07F9/3882—Arylalkanephosphonic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Paints Or Removers (AREA)
  • Detergent Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
AT04756725T 2003-08-21 2004-07-07 Perfluorpolyetheramidgebundene phosphonate, phosphate und derivate davon ATE346852T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US49683703P 2003-08-21 2003-08-21

Publications (1)

Publication Number Publication Date
ATE346852T1 true ATE346852T1 (de) 2006-12-15

Family

ID=34272523

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04756725T ATE346852T1 (de) 2003-08-21 2004-07-07 Perfluorpolyetheramidgebundene phosphonate, phosphate und derivate davon

Country Status (8)

Country Link
US (1) US7678426B2 (OSRAM)
EP (1) EP1656385B1 (OSRAM)
JP (1) JP4718463B2 (OSRAM)
KR (1) KR20060080920A (OSRAM)
CN (1) CN100558735C (OSRAM)
AT (1) ATE346852T1 (OSRAM)
DE (1) DE602004003506T2 (OSRAM)
WO (1) WO2005023822A1 (OSRAM)

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US8476385B2 (en) * 2007-06-06 2013-07-02 3M Innovative Properties Company Fluorinated ether compositions and methods of using the same
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CN101679572A (zh) * 2007-06-06 2010-03-24 3M创新有限公司 氟化组合物和由其制成的表面处理剂
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
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US7891636B2 (en) * 2007-08-27 2011-02-22 3M Innovative Properties Company Silicone mold and use thereof
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CN102015122A (zh) * 2008-03-26 2011-04-13 3M创新有限公司 坡流涂布两种或更多种流体的方法
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EP2456823A4 (en) * 2009-07-21 2012-12-26 3M Innovative Properties Co CURABLE COMPOSITION, METHOD FOR COATING A PHOTO TOOL, AND COATED PHOTO TOOL
KR101768237B1 (ko) 2009-09-16 2017-08-14 쓰리엠 이노베이티브 프로퍼티즈 컴파니 플루오르화된 코팅 및 그로 제조된 포토툴
US8268067B2 (en) * 2009-10-06 2012-09-18 3M Innovative Properties Company Perfluoropolyether coating composition for hard surfaces
JP6345935B2 (ja) 2010-10-28 2018-06-20 スリーエム イノベイティブ プロパティズ カンパニー 細菌付着を低減するための加工表面
CN103189422B (zh) 2010-11-02 2015-05-27 3M创新有限公司 用于脱模的硅氧烷接枝共聚物
CN103180353B (zh) * 2010-11-04 2016-02-17 3M创新有限公司 包含含磷酸基团和烷氧基硅烷基团的氟化组合物
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EP2500009A1 (en) 2011-03-17 2012-09-19 3M Innovative Properties Company Dental ceramic article, process of production and use thereof
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CN105814462B (zh) 2013-10-24 2019-02-22 3M创新有限公司 具有防沾污性质的回射制品
BR112017003223A2 (pt) 2014-08-19 2017-11-28 3M Innovative Properties Co polímero anfifílico, dispersão aquosa e métodos de tratamento de uma superfície dura
CN107108810B (zh) 2014-12-18 2020-04-24 3M创新有限公司 包含膦酸部分的氟化聚合物
US10534120B2 (en) 2015-04-03 2020-01-14 Moxtek, Inc. Wire grid polarizer with protected wires
JP6488890B2 (ja) * 2015-06-03 2019-03-27 信越化学工業株式会社 フルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体、該誘導体を含む表面処理剤、該表面処理剤で処理された物品及び光学物品
JP6520419B2 (ja) * 2015-06-04 2019-05-29 信越化学工業株式会社 フルオロオキシアルキレン基含有ポリマー変性ホスホン酸誘導体及び該誘導体を含む表面処理剤、該表面処理剤で処理された物品及び光学物品
CN108137798B (zh) * 2015-10-09 2020-06-09 信越化学工业株式会社 含有氟代氧化亚烷基的聚合物改性膦酸衍生物、以及对应的表面处理剂和表面处理方法
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Also Published As

Publication number Publication date
DE602004003506D1 (de) 2007-01-11
DE602004003506T2 (de) 2007-09-20
CN1839141A (zh) 2006-09-27
WO2005023822A1 (en) 2005-03-17
EP1656385A1 (en) 2006-05-17
KR20060080920A (ko) 2006-07-11
JP2007502814A (ja) 2007-02-15
US7678426B2 (en) 2010-03-16
JP4718463B2 (ja) 2011-07-06
CN100558735C (zh) 2009-11-11
EP1656385B1 (en) 2006-11-29
US20050048288A1 (en) 2005-03-03

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