JP4712370B2 - インプリント・リソグラフィのための複合スタンパ - Google Patents
インプリント・リソグラフィのための複合スタンパ Download PDFInfo
- Publication number
- JP4712370B2 JP4712370B2 JP2004365869A JP2004365869A JP4712370B2 JP 4712370 B2 JP4712370 B2 JP 4712370B2 JP 2004365869 A JP2004365869 A JP 2004365869A JP 2004365869 A JP2004365869 A JP 2004365869A JP 4712370 B2 JP4712370 B2 JP 4712370B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- stamper
- patterned
- embossable
- imprint
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
- B29C33/565—Consisting of shell-like structures supported by backing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/741,316 US7632087B2 (en) | 2003-12-19 | 2003-12-19 | Composite stamper for imprint lithography |
| US10/741,316 | 2003-12-19 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005183985A JP2005183985A (ja) | 2005-07-07 |
| JP2005183985A5 JP2005183985A5 (enExample) | 2008-02-07 |
| JP4712370B2 true JP4712370B2 (ja) | 2011-06-29 |
Family
ID=34678115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004365869A Expired - Fee Related JP4712370B2 (ja) | 2003-12-19 | 2004-12-17 | インプリント・リソグラフィのための複合スタンパ |
Country Status (4)
| Country | Link |
|---|---|
| US (3) | US7632087B2 (enExample) |
| JP (1) | JP4712370B2 (enExample) |
| DE (1) | DE102004055223A1 (enExample) |
| MY (1) | MY144004A (enExample) |
Families Citing this family (135)
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-
2003
- 2003-12-19 US US10/741,316 patent/US7632087B2/en not_active Expired - Fee Related
-
2004
- 2004-11-16 DE DE102004055223A patent/DE102004055223A1/de not_active Withdrawn
- 2004-11-30 MY MYPI20044959A patent/MY144004A/en unknown
- 2004-12-17 JP JP2004365869A patent/JP4712370B2/ja not_active Expired - Fee Related
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2007
- 2007-06-07 US US11/811,194 patent/US20070245909A1/en not_active Abandoned
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2009
- 2009-10-09 US US12/576,430 patent/US8038863B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US7632087B2 (en) | 2009-12-15 |
| US20070245909A1 (en) | 2007-10-25 |
| DE102004055223A1 (de) | 2005-07-21 |
| JP2005183985A (ja) | 2005-07-07 |
| US20050133954A1 (en) | 2005-06-23 |
| US20100024962A1 (en) | 2010-02-04 |
| MY144004A (en) | 2011-07-29 |
| US8038863B2 (en) | 2011-10-18 |
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