JP4705891B2 - 無駄な放電を防止するための電極構造の大気圧プラズマ発生装置 - Google Patents

無駄な放電を防止するための電極構造の大気圧プラズマ発生装置 Download PDF

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JP4705891B2
JP4705891B2 JP2006197647A JP2006197647A JP4705891B2 JP 4705891 B2 JP4705891 B2 JP 4705891B2 JP 2006197647 A JP2006197647 A JP 2006197647A JP 2006197647 A JP2006197647 A JP 2006197647A JP 4705891 B2 JP4705891 B2 JP 4705891B2
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electrode
dielectric
discharge
atmospheric pressure
pressure plasma
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Japanese (ja)
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JP2007059385A (ja
Inventor
ジェワック ピョ
ボンチョル ジャン
ユナン キム
ジェウォン キム
サンロ リー
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エスイー プラズマ インク
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2006197647A 2005-08-22 2006-07-20 無駄な放電を防止するための電極構造の大気圧プラズマ発生装置 Expired - Fee Related JP4705891B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2005-0076828 2005-08-22
KR1020050076828A KR100749406B1 (ko) 2005-08-22 2005-08-22 불용방전 방지를 위한 전극 구조를 갖는 대기압 플라즈마발생장치

Publications (2)

Publication Number Publication Date
JP2007059385A JP2007059385A (ja) 2007-03-08
JP4705891B2 true JP4705891B2 (ja) 2011-06-22

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Family Applications (1)

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JP2006197647A Expired - Fee Related JP4705891B2 (ja) 2005-08-22 2006-07-20 無駄な放電を防止するための電極構造の大気圧プラズマ発生装置

Country Status (4)

Country Link
JP (1) JP4705891B2 (zh)
KR (1) KR100749406B1 (zh)
CN (1) CN1921250B (zh)
TW (1) TWI318545B (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008296526A (ja) * 2007-06-04 2008-12-11 Tohoku Ricoh Co Ltd 基材搬送システム及び印刷装置
KR101103349B1 (ko) * 2009-10-22 2012-01-05 (주)에스이피 Ｔｆｔ 기판의 패드영역 개방을 위한 대기압 플라즈마 에칭 장치 및 이를 이용한 대기압 플라즈마 에칭 방법
JP5940239B2 (ja) * 2009-11-02 2016-06-29 株式会社イー・スクエア プラズマ表面処理装置およびその製造方法
US20120315684A1 (en) * 2010-01-31 2012-12-13 Saga University Plasma Oxidation-Reduction Method, Method for Promoting Plant/Animal Growth Using the Same, and Plasma-Generating Device for Use in Method for Promoting Plant/Animal Growth
JP6083093B2 (ja) * 2011-11-11 2017-02-22 国立大学法人佐賀大学 プラズマ生成装置
KR101845767B1 (ko) 2016-09-30 2018-04-05 주식회사 에이아이코리아 플라즈마 장치용 전극 및 이의 제조방법
JP7159694B2 (ja) * 2018-08-28 2022-10-25 日本電産株式会社 プラズマ処理装置
KR102014892B1 (ko) * 2018-09-20 2019-08-27 주식회사 경동냉열산업 수처리장치 등에 사용되는 플라즈마 발생장치
US20220174807A1 (en) * 2020-02-27 2022-06-02 Toshiba Mitsubishi-Electric Industrial Systems Corporation Active gas generation apparatus
JP7240362B2 (ja) * 2020-08-26 2023-03-15 川田工業株式会社 誘電体バリア放電リアクター

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001102199A (ja) * 1999-07-27 2001-04-13 Matsushita Electric Works Ltd プラズマ処理装置及びプラズマ処理方法
JP2002522212A (ja) * 1998-08-03 2002-07-23 東京エレクトロン株式会社 Ｅｓｒｆチャンバ冷却システム並びに方法
JP2004247223A (ja) * 2003-02-14 2004-09-02 Nittetsu Mining Co Ltd 気体励起用の電極
JP2005175460A (ja) * 2003-11-19 2005-06-30 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2006525627A (ja) * 2003-05-05 2006-11-09 コモンウェルス　サイエンティフィック　アンド　インダストリアル　リサーチ　オーガニゼーション プラズマ処理装置および方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4079260A (en) * 1976-07-20 1978-03-14 Andrei Vladimirovich Dmitriev Ozone generator
JPS6424835A (en) * 1987-07-22 1989-01-26 Sankyo Dengyo Kk Discharge process and apparatus for modifying surface of solid
JP3930625B2 (ja) * 1997-10-31 2007-06-13 芝浦メカトロニクス株式会社 プラズマ処理装置
CN2312518Y (zh) * 1997-11-28 1999-03-31 复旦大学 低温等离子体放电管
KR100499917B1 (ko) * 2001-12-04 2005-07-25 이동훈 수중방전/유중방전 겸용 플라즈마 반응장치
KR100481492B1 (ko) 2004-04-22 2005-04-07 주식회사 피에스엠 미세아크 방지형 플라즈마 형성장치 및 형성방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002522212A (ja) * 1998-08-03 2002-07-23 東京エレクトロン株式会社 Ｅｓｒｆチャンバ冷却システム並びに方法
JP2001102199A (ja) * 1999-07-27 2001-04-13 Matsushita Electric Works Ltd プラズマ処理装置及びプラズマ処理方法
JP2004247223A (ja) * 2003-02-14 2004-09-02 Nittetsu Mining Co Ltd 気体励起用の電極
JP2006525627A (ja) * 2003-05-05 2006-11-09 コモンウェルス　サイエンティフィック　アンド　インダストリアル　リサーチ　オーガニゼーション プラズマ処理装置および方法
JP2005175460A (ja) * 2003-11-19 2005-06-30 Matsushita Electric Ind Co Ltd プラズマ処理装置

Also Published As

Publication number Publication date
KR20070022527A (ko) 2007-02-27
TW200719772A (en) 2007-05-16
CN1921250A (zh) 2007-02-28
TWI318545B (en) 2009-12-11
KR100749406B1 (ko) 2007-08-14
CN1921250B (zh) 2010-05-12
JP2007059385A (ja) 2007-03-08

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