TW200719772A - Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge - Google Patents

Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge

Info

Publication number
TW200719772A
TW200719772A TW095125144A TW95125144A TW200719772A TW 200719772 A TW200719772 A TW 200719772A TW 095125144 A TW095125144 A TW 095125144A TW 95125144 A TW95125144 A TW 95125144A TW 200719772 A TW200719772 A TW 200719772A
Authority
TW
Taiwan
Prior art keywords
dielectric layer
electrode
plasma generating
electrode structure
generating apparatus
Prior art date
Application number
TW095125144A
Other languages
Chinese (zh)
Other versions
TWI318545B (en
Inventor
Jae-Hwack Pyo
Bong-Chul Jang
Yun-Hwan Kim
Jae-Weon Kim
Sang-Ro Lee
Original Assignee
Se Plasma Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Se Plasma Inc filed Critical Se Plasma Inc
Publication of TW200719772A publication Critical patent/TW200719772A/en
Application granted granted Critical
Publication of TWI318545B publication Critical patent/TWI318545B/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

An atmosphere plasma generating device with electrodes capable of avoiding useless discharge is provided. The electrode and the dielectric layer are separated from each other by a gap, and the liquid dielectric layer is filled between the first electrode and the dielectric layer. In this way, the useless discharge can be avoided. The atmosphere plasma generating device comprises a first electrode, a dielectric layer, a liquid dielectric layer and a second electrode. A discharge voltage is applied from a power supply unit to the first electrode. The dielectric layer is separated from the first electrode by a predetermined gap, and surrounds the first electrode. The liquid dielectric layer is filled into a space between the first electrode and the dielectric layer. The second electrode is arranged to be separated from the dielectric layer by a predetermined gap. In addition, the device further comprises a sceond dielectric layer and a second liquid dielectric layer. The second dielectric layer is spearated from the second electrode by a predetermined gap, and surrounds the second electrode. The second liquid dielectric layer is filled into a space between the second electrode and the second dielectric layer.
TW095125144A 2005-08-22 2006-07-10 Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge TWI318545B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050076828A KR100749406B1 (en) 2005-08-22 2005-08-22 Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge

Publications (2)

Publication Number Publication Date
TW200719772A true TW200719772A (en) 2007-05-16
TWI318545B TWI318545B (en) 2009-12-11

Family

ID=37778875

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095125144A TWI318545B (en) 2005-08-22 2006-07-10 Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge

Country Status (4)

Country Link
JP (1) JP4705891B2 (en)
KR (1) KR100749406B1 (en)
CN (1) CN1921250B (en)
TW (1) TWI318545B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008296526A (en) * 2007-06-04 2008-12-11 Tohoku Ricoh Co Ltd Base material carrying system and printing device
KR101103349B1 (en) * 2009-10-22 2012-01-05 (주)에스이피 Atmospheric Plasma Etching Device for Opening Of Pad Region On TFT Substrate, And Plasma Etching Method Using The Same
JP5940239B2 (en) * 2009-11-02 2016-06-29 株式会社イー・スクエア Plasma surface treatment apparatus and manufacturing method thereof
WO2011093497A1 (en) * 2010-01-31 2011-08-04 国立大学法人九州大学 Plasma oxidation-reduction method, method for promoting plant/animal growth using the same, and plasma generating device for use in method for promoting plant/animal growth
WO2013069799A1 (en) 2011-11-11 2013-05-16 国立大学法人佐賀大学 Plasma generation device
KR101845767B1 (en) 2016-09-30 2018-04-05 주식회사 에이아이코리아 Electrode for plasma apparatus and method of manufacturing the same
JP7159694B2 (en) * 2018-08-28 2022-10-25 日本電産株式会社 Plasma processing equipment
KR102014892B1 (en) * 2018-09-20 2019-08-27 주식회사 경동냉열산업 Plasma generating device used for water treatment apparatus or the like
KR102656912B1 (en) * 2020-02-27 2024-04-16 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 active gas generation device
JP7240362B2 (en) * 2020-08-26 2023-03-15 川田工業株式会社 dielectric barrier discharge reactor

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4079260A (en) * 1976-07-20 1978-03-14 Andrei Vladimirovich Dmitriev Ozone generator
JPS6424835A (en) * 1987-07-22 1989-01-26 Sankyo Dengyo Kk Discharge process and apparatus for modifying surface of solid
JP3930625B2 (en) * 1997-10-31 2007-06-13 芝浦メカトロニクス株式会社 Plasma processing equipment
CN2312518Y (en) * 1997-11-28 1999-03-31 复旦大学 Low temp. plasma discharging tube
KR100634654B1 (en) * 1998-08-03 2006-10-16 동경 엘렉트론 주식회사 ESR chamber cooling system and treatment
JP3982153B2 (en) * 1999-07-27 2007-09-26 松下電工株式会社 Plasma processing apparatus and plasma processing method
KR100499917B1 (en) * 2001-12-04 2005-07-25 이동훈 Plasma device using underwater discharge and underoil discharge
JP4046224B2 (en) * 2003-02-14 2008-02-13 日鉄鉱業株式会社 Electrode for gas excitation
US20070163499A1 (en) * 2003-05-05 2007-07-19 Australian Wool Innovation Limited Plasma treatment apparatus and method
JP4381963B2 (en) * 2003-11-19 2009-12-09 パナソニック株式会社 Plasma processing equipment
KR100481492B1 (en) 2004-04-22 2005-04-07 주식회사 피에스엠 Apparatus and method for plasma formation of micro arc prevention type

Also Published As

Publication number Publication date
CN1921250A (en) 2007-02-28
CN1921250B (en) 2010-05-12
JP2007059385A (en) 2007-03-08
KR100749406B1 (en) 2007-08-14
TWI318545B (en) 2009-12-11
JP4705891B2 (en) 2011-06-22
KR20070022527A (en) 2007-02-27

Similar Documents

Publication Publication Date Title
TW200719772A (en) Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge
WO2011063407A3 (en) Methods and apparatus for plasma based adaptive optics
TWI262894B (en) Ozone generating apparatus
WO2009028084A1 (en) Apparatus for generating dielectric barrier discharge gas
TW200739719A (en) Plasma etching method and computer-readable storage medium
WO2010008711A3 (en) Cathode with inner and outer electrodes at different heights
TW200802597A (en) Plasma processing apparatus and plasma processing method
CL2008003670A1 (en) Device and method for the treatment of surfaces by means of a plasma produced under atmospheric pressure in which ambient air drawn into a working space between an electrode and a counter-electrode is ionized by discharging asymmetric high voltage pulses of opposite polarity between the electrodes
TW200746295A (en) Etching apparatus and etching method for substrate bevel
TW200802598A (en) Plasma processing apparatus and plasma processing method
TW200612488A (en) Plasma processing apparatus, method thereof, and computer readable memory medium
NL1033983A1 (en) Device for generating extreme ultraviolet radiation by means of electrical discharge on regenerable electrodes.
TW200701152A (en) Display device and driving apparatus having reduced pixel electrode discharge time upon power cut-off
EP2120254A3 (en) Plasma processing apparatus
SG178616A1 (en) Liquid medium plasma discharge generating apparatus
WO2009005148A1 (en) Surface treatment apparatus
EP1830610A3 (en) Plasma discharged static eliminator
EP2270130A3 (en) Cell fusion device, and method for cell fusion using the same
CN105491774A (en) Array type microplasma generating device based on conductive coating
WO2008147184A3 (en) Atmospheric pressure glow discharge plasma method and system using heated substrate
GB0413121D0 (en) Improved displays
WO2009051834A3 (en) System, method and apparatus for creating an electric glow discharge
TW200708208A (en) Low temperature plasma discharging device and the applying method therof
TW200944066A (en) Device constructed and arranged to generate radiation, lithographic apparatus, and device manufacturing method
WO2009011010A1 (en) Liquid crystal display device

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees