WO2008147184A3 - Atmospheric pressure glow discharge plasma method and system using heated substrate - Google Patents

Atmospheric pressure glow discharge plasma method and system using heated substrate Download PDF

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Publication number
WO2008147184A3
WO2008147184A3 PCT/NL2008/050303 NL2008050303W WO2008147184A3 WO 2008147184 A3 WO2008147184 A3 WO 2008147184A3 NL 2008050303 W NL2008050303 W NL 2008050303W WO 2008147184 A3 WO2008147184 A3 WO 2008147184A3
Authority
WO
WIPO (PCT)
Prior art keywords
atmospheric pressure
glow discharge
discharge plasma
pressure glow
heated substrate
Prior art date
Application number
PCT/NL2008/050303
Other languages
French (fr)
Other versions
WO2008147184A2 (en
Inventor
Vries Hindrik Willem De
Original Assignee
Fujifilm Mfg Europe Bv
Vries Hindrik Willem De
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Mfg Europe Bv, Vries Hindrik Willem De filed Critical Fujifilm Mfg Europe Bv
Publication of WO2008147184A2 publication Critical patent/WO2008147184A2/en
Publication of WO2008147184A3 publication Critical patent/WO2008147184A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32825—Working under atmospheric pressure or higher
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature

Abstract

Method and plasma treatment apparatus for treatment of a substrate, using a pulsed atmospheric pressure glow discharge plasma in a treatment space (5) filled with a gas composition. At least two electrodes (2, 3) are connected to a power supply (4) for providing electrical power to the at least two electrodes (2, 3), a gas supply device (8) for providing a gas composition to the treatment space (5), and a temperature control unit (16) for controlling the temperature of the substrate within a range from above 70 up to 130°C.
PCT/NL2008/050303 2007-05-25 2008-05-22 Atmospheric pressure glow discharge plasma method and system using heated substrate WO2008147184A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07108923.9 2007-05-25
EP07108923 2007-05-25

Publications (2)

Publication Number Publication Date
WO2008147184A2 WO2008147184A2 (en) 2008-12-04
WO2008147184A3 true WO2008147184A3 (en) 2009-01-22

Family

ID=38458003

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/NL2008/050303 WO2008147184A2 (en) 2007-05-25 2008-05-22 Atmospheric pressure glow discharge plasma method and system using heated substrate

Country Status (1)

Country Link
WO (1) WO2008147184A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110311734A1 (en) 2009-02-12 2011-12-22 Fujifilm Manufacturing Europe B.V. Two Layer Barrier on Polymeric Substrate
EP2226832A1 (en) 2009-03-06 2010-09-08 FUJIFILM Manufacturing Europe B.V. Substrate plasma treatment using side tabs
GB0910040D0 (en) * 2009-06-11 2009-07-22 Fujifilm Mfg Europe Bv Substrate structure
GB201012226D0 (en) 2010-07-21 2010-09-08 Fujifilm Mfg Europe Bv Method for manufacturing a barrier on a sheet and a sheet for PV modules
GB201012225D0 (en) 2010-07-21 2010-09-08 Fujifilm Mfg Europe Bv Method for manufacturing a barrier layer on a substrate and a multi-layer stack
CN104619106B (en) * 2015-01-15 2018-04-20 合肥工业大学 A kind of device for realizing uniform glow discharge in atmosphere air
EP3655719A1 (en) * 2017-07-21 2020-05-27 Applied Materials, Inc. Heat treatment apparatus for a vacuum chamber, deposition apparatus for depositing material on a flexible substrate, method of heat treatment of a flexible substrate in a vacuum chamber, and method for processing a flexible substrate

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03236475A (en) * 1990-02-13 1991-10-22 Sachiko Okazaki Atmospheric plasma surface treatment
WO2002023960A1 (en) * 2000-09-12 2002-03-21 Sigma Technologies International, Inc. Electrode for glow-discharge atmospheric plasma treatment
EP1340838A1 (en) * 2000-11-14 2003-09-03 Sekisui Chemical Co., Ltd. Method and device for atmospheric plasma processing
US20060141290A1 (en) * 2002-07-30 2006-06-29 Saint-Gobain Glass Grance Titania coatings by cvd at atmospheric pressure
US20060240648A1 (en) * 1999-02-01 2006-10-26 Mikhael Michael G Atmospheric glow discharge with concurrent coating deposition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03236475A (en) * 1990-02-13 1991-10-22 Sachiko Okazaki Atmospheric plasma surface treatment
US20060240648A1 (en) * 1999-02-01 2006-10-26 Mikhael Michael G Atmospheric glow discharge with concurrent coating deposition
WO2002023960A1 (en) * 2000-09-12 2002-03-21 Sigma Technologies International, Inc. Electrode for glow-discharge atmospheric plasma treatment
EP1340838A1 (en) * 2000-11-14 2003-09-03 Sekisui Chemical Co., Ltd. Method and device for atmospheric plasma processing
US20060141290A1 (en) * 2002-07-30 2006-06-29 Saint-Gobain Glass Grance Titania coatings by cvd at atmospheric pressure

Also Published As

Publication number Publication date
WO2008147184A2 (en) 2008-12-04

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