TW200708208A - Low temperature plasma discharging device and the applying method therof - Google Patents

Low temperature plasma discharging device and the applying method therof

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Publication number
TW200708208A
TW200708208A TW094126614A TW94126614A TW200708208A TW 200708208 A TW200708208 A TW 200708208A TW 094126614 A TW094126614 A TW 094126614A TW 94126614 A TW94126614 A TW 94126614A TW 200708208 A TW200708208 A TW 200708208A
Authority
TW
Taiwan
Prior art keywords
low temperature
cavity
discharging device
temperature plasma
applying method
Prior art date
Application number
TW094126614A
Other languages
Chinese (zh)
Other versions
TWI294257B (en
Inventor
Yih-Ming Shyu
Liang-Chun Wang
Ji-Yung Li
Yan-Gen Chen
Chun-Chin Chen
Chun Yao Wang
Kuo Chao Liang
Chau Nan Hong
Original Assignee
Creating Nano Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Creating Nano Technologies Inc filed Critical Creating Nano Technologies Inc
Priority to TW94126614A priority Critical patent/TWI294257B/en
Publication of TW200708208A publication Critical patent/TW200708208A/en
Application granted granted Critical
Publication of TWI294257B publication Critical patent/TWI294257B/en

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  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

A low temperature plasma-discharging device and the applying method thereof are provided, wherein the low temperature plasma-discharging device operated with a working voltage substantially from 100 V to 30000 V and a power substantially from 10 W to 3000 W comprises an outer electrode, an insulator layer, and an inner electrode. The outer electrode has a cavity, in which an opening is set at the back end of the cavity. The insulator layer covers the inner wall of the cavity. The inner electrode installed in the cavity has a discharge end used to send out a plasma column towards the inner edge of the opening through the cavity, wherein the distance between the discharge end and the inner edge is substantially between 0.1 mm to 300 mm.
TW94126614A 2005-08-04 2005-08-04 Low temperature plasma discharging device and the applying method thereof TWI294257B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW94126614A TWI294257B (en) 2005-08-04 2005-08-04 Low temperature plasma discharging device and the applying method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW94126614A TWI294257B (en) 2005-08-04 2005-08-04 Low temperature plasma discharging device and the applying method thereof

Publications (2)

Publication Number Publication Date
TW200708208A true TW200708208A (en) 2007-02-16
TWI294257B TWI294257B (en) 2008-03-01

Family

ID=45068101

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94126614A TWI294257B (en) 2005-08-04 2005-08-04 Low temperature plasma discharging device and the applying method thereof

Country Status (1)

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TW (1) TWI294257B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI578854B (en) 2008-08-04 2017-04-11 Ａｇｃ北美平面玻璃公司 Method of forming coating using plasma enhanced chemical vapor deposition (pecvd)
MX2017007357A (en) 2014-12-05 2018-04-24 Agc Flat Glass Na Inc Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces.
MX2017007356A (en) 2014-12-05 2018-04-11 Agc Flat Glass Europe S A Hollow cathode plasma source.
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions

Also Published As

Publication number Publication date
TWI294257B (en) 2008-03-01

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