TW200733820A - Rotating plasma discharging device - Google Patents
Rotating plasma discharging deviceInfo
- Publication number
- TW200733820A TW200733820A TW095106159A TW95106159A TW200733820A TW 200733820 A TW200733820 A TW 200733820A TW 095106159 A TW095106159 A TW 095106159A TW 95106159 A TW95106159 A TW 95106159A TW 200733820 A TW200733820 A TW 200733820A
- Authority
- TW
- Taiwan
- Prior art keywords
- cavity
- opening
- discharging device
- plasma
- shell
- Prior art date
Links
Landscapes
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
A rotating plasma-discharging device comprises a grounding electrode, an insulator layer, an inner electrode, and a shell. The grounding electrode has a cavity, in which an opening is set at the back end of the cavity. The insulator layer covers the inner wall of the cavity. The inner electrode installed in the cavity has a discharge end used to send out a plasma column towards the inner edge of the opening through the cavity to create plasma jetted out of the opening. The shell having an angled nozzle connected with the opening is set on a rotating bearing against the outer sidewall of the cavity, whereby the angled nozzle can be rotated along the axis of the opening
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW95106159A TWI302422B (en) | 2006-02-23 | 2006-02-23 | Rotating plasma discharging device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW95106159A TWI302422B (en) | 2006-02-23 | 2006-02-23 | Rotating plasma discharging device |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200733820A true TW200733820A (en) | 2007-09-01 |
TWI302422B TWI302422B (en) | 2008-10-21 |
Family
ID=45070481
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW95106159A TWI302422B (en) | 2006-02-23 | 2006-02-23 | Rotating plasma discharging device |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI302422B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3082384B1 (en) | 2013-12-11 | 2019-05-01 | Applied Plasma Inc Co., Ltd. | Plasma generating device |
TWI670908B (en) * | 2017-10-20 | 2019-09-01 | 日商夏普股份有限公司 | Discharge device |
CN112738968A (en) * | 2020-12-18 | 2021-04-30 | 北京北方华创微电子装备有限公司 | Plasma generating device and semiconductor processing equipment |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI407842B (en) * | 2008-12-31 | 2013-09-01 | Ind Tech Res Inst | Wide area atmospheric pressure plasma jet apparatus |
TWI531280B (en) * | 2014-04-16 | 2016-04-21 | 馗鼎奈米科技股份有限公司 | Plasma device |
TWI685279B (en) * | 2019-04-16 | 2020-02-11 | 馗鼎奈米科技股份有限公司 | Plasma device |
-
2006
- 2006-02-23 TW TW95106159A patent/TWI302422B/en not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3082384B1 (en) | 2013-12-11 | 2019-05-01 | Applied Plasma Inc Co., Ltd. | Plasma generating device |
TWI670908B (en) * | 2017-10-20 | 2019-09-01 | 日商夏普股份有限公司 | Discharge device |
CN112738968A (en) * | 2020-12-18 | 2021-04-30 | 北京北方华创微电子装备有限公司 | Plasma generating device and semiconductor processing equipment |
Also Published As
Publication number | Publication date |
---|---|
TWI302422B (en) | 2008-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |