TW200733820A - Rotating plasma discharging device - Google Patents

Rotating plasma discharging device

Info

Publication number
TW200733820A
TW200733820A TW095106159A TW95106159A TW200733820A TW 200733820 A TW200733820 A TW 200733820A TW 095106159 A TW095106159 A TW 095106159A TW 95106159 A TW95106159 A TW 95106159A TW 200733820 A TW200733820 A TW 200733820A
Authority
TW
Taiwan
Prior art keywords
cavity
opening
discharging device
plasma
shell
Prior art date
Application number
TW095106159A
Other languages
Chinese (zh)
Other versions
TWI302422B (en
Inventor
Chau-Nan Hong
Yih-Ming Shyu
Kuo-Chao Liang
Chun-Yao Wang
Ji-Yung Li
Liang Chun Wang
Chun Chin Chen
Yan Gen Chen
Original Assignee
Creating Nano Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Creating Nano Technologies Inc filed Critical Creating Nano Technologies Inc
Priority to TW95106159A priority Critical patent/TWI302422B/en
Publication of TW200733820A publication Critical patent/TW200733820A/en
Application granted granted Critical
Publication of TWI302422B publication Critical patent/TWI302422B/en

Links

Landscapes

  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

A rotating plasma-discharging device comprises a grounding electrode, an insulator layer, an inner electrode, and a shell. The grounding electrode has a cavity, in which an opening is set at the back end of the cavity. The insulator layer covers the inner wall of the cavity. The inner electrode installed in the cavity has a discharge end used to send out a plasma column towards the inner edge of the opening through the cavity to create plasma jetted out of the opening. The shell having an angled nozzle connected with the opening is set on a rotating bearing against the outer sidewall of the cavity, whereby the angled nozzle can be rotated along the axis of the opening
TW95106159A 2006-02-23 2006-02-23 Rotating plasma discharging device TWI302422B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95106159A TWI302422B (en) 2006-02-23 2006-02-23 Rotating plasma discharging device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95106159A TWI302422B (en) 2006-02-23 2006-02-23 Rotating plasma discharging device

Publications (2)

Publication Number Publication Date
TW200733820A true TW200733820A (en) 2007-09-01
TWI302422B TWI302422B (en) 2008-10-21

Family

ID=45070481

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95106159A TWI302422B (en) 2006-02-23 2006-02-23 Rotating plasma discharging device

Country Status (1)

Country Link
TW (1) TWI302422B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3082384B1 (en) 2013-12-11 2019-05-01 Applied Plasma Inc Co., Ltd. Plasma generating device
TWI670908B (en) * 2017-10-20 2019-09-01 日商夏普股份有限公司 Discharge device
CN112738968A (en) * 2020-12-18 2021-04-30 北京北方华创微电子装备有限公司 Plasma generating device and semiconductor processing equipment

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI407842B (en) * 2008-12-31 2013-09-01 Ind Tech Res Inst Wide area atmospheric pressure plasma jet apparatus
TWI531280B (en) * 2014-04-16 2016-04-21 馗鼎奈米科技股份有限公司 Plasma device
TWI685279B (en) * 2019-04-16 2020-02-11 馗鼎奈米科技股份有限公司 Plasma device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3082384B1 (en) 2013-12-11 2019-05-01 Applied Plasma Inc Co., Ltd. Plasma generating device
TWI670908B (en) * 2017-10-20 2019-09-01 日商夏普股份有限公司 Discharge device
CN112738968A (en) * 2020-12-18 2021-04-30 北京北方华创微电子装备有限公司 Plasma generating device and semiconductor processing equipment

Also Published As

Publication number Publication date
TWI302422B (en) 2008-10-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees