TWI318545B - Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge - Google Patents

Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge

Info

Publication number
TWI318545B
TWI318545B TW095125144A TW95125144A TWI318545B TW I318545 B TWI318545 B TW I318545B TW 095125144 A TW095125144 A TW 095125144A TW 95125144 A TW95125144 A TW 95125144A TW I318545 B TWI318545 B TW I318545B
Authority
TW
Taiwan
Prior art keywords
electrode structure
generating apparatus
plasma generating
atmospheric plasma
preventing unnecessary
Prior art date
Application number
TW095125144A
Other languages
English (en)
Other versions
TW200719772A (en
Inventor
Jae Hwack Pyo
Bong Chul Jang
Yun Hwan Kim
Jae Weon Kim
Sang Ro Lee
Original Assignee
Se Plasma Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Se Plasma Inc filed Critical Se Plasma Inc
Publication of TW200719772A publication Critical patent/TW200719772A/zh
Application granted granted Critical
Publication of TWI318545B publication Critical patent/TWI318545B/zh

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348Dielectric barrier discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332Coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335Cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
TW095125144A 2005-08-22 2006-07-10 Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge TWI318545B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050076828A KR100749406B1 (ko) 2005-08-22 2005-08-22 불용방전 방지를 위한 전극 구조를 갖는 대기압 플라즈마발생장치

Publications (2)

Publication Number Publication Date
TW200719772A TW200719772A (en) 2007-05-16
TWI318545B true TWI318545B (en) 2009-12-11

Family

ID=37778875

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095125144A TWI318545B (en) 2005-08-22 2006-07-10 Atmospheric plasma generating apparatus with electrode structure for preventing unnecessary discharge

Country Status (4)

Country Link
JP (1) JP4705891B2 (zh)
KR (1) KR100749406B1 (zh)
CN (1) CN1921250B (zh)
TW (1) TWI318545B (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008296526A (ja) * 2007-06-04 2008-12-11 Tohoku Ricoh Co Ltd 基材搬送システム及び印刷装置
KR101103349B1 (ko) * 2009-10-22 2012-01-05 (주)에스이피 Tft 기판의 패드영역 개방을 위한 대기압 플라즈마 에칭 장치 및 이를 이용한 대기압 플라즈마 에칭 방법
JP5940239B2 (ja) * 2009-11-02 2016-06-29 株式会社イー・スクエア プラズマ表面処理装置およびその製造方法
WO2011093497A1 (ja) * 2010-01-31 2011-08-04 国立大学法人九州大学 プラズマ酸化還元方法及びそれを用いた動植物成長促進方法、並びに動植物成長促進方法に用いるプラズマ生成装置
JP6083093B2 (ja) * 2011-11-11 2017-02-22 国立大学法人佐賀大学 プラズマ生成装置
KR101845767B1 (ko) 2016-09-30 2018-04-05 주식회사 에이아이코리아 플라즈마 장치용 전극 및 이의 제조방법
JP7159694B2 (ja) * 2018-08-28 2022-10-25 日本電産株式会社 プラズマ処理装置
KR102014892B1 (ko) * 2018-09-20 2019-08-27 주식회사 경동냉열산업 수처리장치 등에 사용되는 플라즈마 발생장치
WO2021171462A1 (ja) * 2020-02-27 2021-09-02 東芝三菱電機産業システム株式会社 活性ガス生成装置
JP7240362B2 (ja) * 2020-08-26 2023-03-15 川田工業株式会社 誘電体バリア放電リアクター

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4079260A (en) * 1976-07-20 1978-03-14 Andrei Vladimirovich Dmitriev Ozone generator
JPS6424835A (en) * 1987-07-22 1989-01-26 Sankyo Dengyo Kk Discharge process and apparatus for modifying surface of solid
JP3930625B2 (ja) * 1997-10-31 2007-06-13 芝浦メカトロニクス株式会社 プラズマ処理装置
CN2312518Y (zh) * 1997-11-28 1999-03-31 复旦大学 低温等离子体放电管
KR100634654B1 (ko) * 1998-08-03 2006-10-16 동경 엘렉트론 주식회사 Esrf 챔버 냉각시스템 및 처리
JP3982153B2 (ja) * 1999-07-27 2007-09-26 松下電工株式会社 プラズマ処理装置及びプラズマ処理方法
KR100499917B1 (ko) * 2001-12-04 2005-07-25 이동훈 수중방전/유중방전 겸용 플라즈마 반응장치
JP4046224B2 (ja) * 2003-02-14 2008-02-13 日鉄鉱業株式会社 気体励起用の電極
US20070163499A1 (en) * 2003-05-05 2007-07-19 Australian Wool Innovation Limited Plasma treatment apparatus and method
JP4381963B2 (ja) * 2003-11-19 2009-12-09 パナソニック株式会社 プラズマ処理装置
KR100481492B1 (ko) 2004-04-22 2005-04-07 주식회사 피에스엠 미세아크 방지형 플라즈마 형성장치 및 형성방법

Also Published As

Publication number Publication date
CN1921250A (zh) 2007-02-28
TW200719772A (en) 2007-05-16
KR100749406B1 (ko) 2007-08-14
KR20070022527A (ko) 2007-02-27
JP2007059385A (ja) 2007-03-08
CN1921250B (zh) 2010-05-12
JP4705891B2 (ja) 2011-06-22

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees