PL1864313T3 - Próżniowy generator plazmowy - Google Patents

Próżniowy generator plazmowy

Info

Publication number
PL1864313T3
PL1864313T3 PL06705364T PL06705364T PL1864313T3 PL 1864313 T3 PL1864313 T3 PL 1864313T3 PL 06705364 T PL06705364 T PL 06705364T PL 06705364 T PL06705364 T PL 06705364T PL 1864313 T3 PL1864313 T3 PL 1864313T3
Authority
PL
Poland
Prior art keywords
plasma generator
vacuum plasma
vacuum
generator
plasma
Prior art date
Application number
PL06705364T
Other languages
English (en)
Inventor
Gerhard Tuymer
Jürgen Ramm
Daniel Lendi
Original Assignee
Oerlikon Trading Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading Ag filed Critical Oerlikon Trading Ag
Publication of PL1864313T3 publication Critical patent/PL1864313T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M7/00—Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
    • H02M7/02—Conversion of ac power input into dc power output without possibility of reversal
    • H02M7/04—Conversion of ac power input into dc power output without possibility of reversal by static converters
    • H02M7/06—Conversion of ac power input into dc power output without possibility of reversal by static converters using discharge tubes without control electrode or semiconductor devices without control electrode
    • H02M7/10—Conversion of ac power input into dc power output without possibility of reversal by static converters using discharge tubes without control electrode or semiconductor devices without control electrode arranged for operation in series, e.g. for multiplication of voltage
PL06705364T 2005-03-24 2006-03-01 Próżniowy generator plazmowy PL1864313T3 (pl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CH5182005 2005-03-24
CH12902005 2005-08-03
PCT/CH2006/000124 WO2006099759A2 (de) 2005-03-24 2006-03-01 Vakuumplasmagenerator
EP06705364A EP1864313B1 (de) 2005-03-24 2006-03-01 Vakuumplasmagenerator

Publications (1)

Publication Number Publication Date
PL1864313T3 true PL1864313T3 (pl) 2013-05-31

Family

ID=37024184

Family Applications (1)

Application Number Title Priority Date Filing Date
PL06705364T PL1864313T3 (pl) 2005-03-24 2006-03-01 Próżniowy generator plazmowy

Country Status (6)

Country Link
US (1) US7455755B2 (pl)
EP (1) EP1864313B1 (pl)
ES (1) ES2401289T3 (pl)
PL (1) PL1864313T3 (pl)
PT (1) PT1864313E (pl)
WO (1) WO2006099759A2 (pl)

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US8025775B2 (en) * 2002-03-15 2011-09-27 Oerlikon Trading Ag, Truebbach Vacuum plasma generator
DE102007021386A1 (de) * 2007-05-04 2008-11-06 Christof-Herbert Diener Kurztaktniederdruckplasmaanlage
US7697253B1 (en) * 2007-06-01 2010-04-13 The Electric Controller and Manufacturing Company, LLC Method and apparatus for controlling a lifting magnet of a materials handling machine
US8000078B2 (en) * 2007-12-19 2011-08-16 The Electric Controller & Manufacturing Company, Llc Method and apparatus for controlling a lifting magnet supplied with an AC source
US8004814B2 (en) * 2007-12-19 2011-08-23 The Electric Controller & Manufacturing Company, Llc Method and apparatus for controlling a lifting magnet supplied with an AC source
FR2927483A1 (fr) * 2008-02-12 2009-08-14 Renault Sas Dispositif et procede d'alimentation pour reacteur plasma pour vehicule automobile
SE531797C2 (sv) * 2008-04-07 2009-08-04 Paer H Henriksson Arrangemang och förfarande för oskadliggörande av mikroorganismer med ett elektriskt fält samt användningar av arrangemanget
JP5429771B2 (ja) * 2008-05-26 2014-02-26 株式会社アルバック スパッタリング方法
JP5124344B2 (ja) * 2008-05-26 2013-01-23 株式会社アルバック バイポーラパルス電源及び複数のバイポーラパルス電源からなる電源装置並びに出力方法
EP2369031B1 (de) 2010-03-18 2016-05-04 Oerlikon Trading AG, Trübbach Beschichtung auf nial2o4 basis in spinellstruktur
NL2008208C2 (en) * 2012-01-31 2013-08-01 Univ Delft Tech Spark ablation device.
PL3890448T3 (pl) * 2012-08-31 2023-10-16 Aes Global Holdings, Pte. Ltd. Zarządzanie łukiem z odwracaniem napięcia i ulepszonym powrotem do pracy
IN2014KN03106A (pl) * 2012-09-07 2015-05-08 Kyosan Electric Mfg
US9655221B2 (en) 2013-08-19 2017-05-16 Eagle Harbor Technologies, Inc. High frequency, repetitive, compact toroid-generation for radiation production
US9706630B2 (en) 2014-02-28 2017-07-11 Eagle Harbor Technologies, Inc. Galvanically isolated output variable pulse generator disclosure
US10020800B2 (en) 2013-11-14 2018-07-10 Eagle Harbor Technologies, Inc. High voltage nanosecond pulser with variable pulse width and pulse repetition frequency
US10892140B2 (en) 2018-07-27 2021-01-12 Eagle Harbor Technologies, Inc. Nanosecond pulser bias compensation
US10978955B2 (en) 2014-02-28 2021-04-13 Eagle Harbor Technologies, Inc. Nanosecond pulser bias compensation
US9960763B2 (en) 2013-11-14 2018-05-01 Eagle Harbor Technologies, Inc. High voltage nanosecond pulser
US11539352B2 (en) 2013-11-14 2022-12-27 Eagle Harbor Technologies, Inc. Transformer resonant converter
US10790816B2 (en) 2014-01-27 2020-09-29 Eagle Harbor Technologies, Inc. Solid-state replacement for tube-based modulators
US10483089B2 (en) 2014-02-28 2019-11-19 Eagle Harbor Technologies, Inc. High voltage resistive output stage circuit
CN106460151B (zh) 2014-06-02 2018-11-13 三菱日立工具技术株式会社 硬质皮膜、硬质皮膜被覆部件、它们的制造方法、以及用于制造硬质皮膜的靶
US11542927B2 (en) 2015-05-04 2023-01-03 Eagle Harbor Technologies, Inc. Low pressure dielectric barrier discharge plasma thruster
GB2548209B (en) * 2016-03-07 2018-03-21 Intelligent Growth Solutions Ltd Controllable power and lighting system
US11430635B2 (en) 2018-07-27 2022-08-30 Eagle Harbor Technologies, Inc. Precise plasma control system
US11004660B2 (en) 2018-11-30 2021-05-11 Eagle Harbor Technologies, Inc. Variable output impedance RF generator
US10903047B2 (en) 2018-07-27 2021-01-26 Eagle Harbor Technologies, Inc. Precise plasma control system
CN115378264A (zh) 2017-02-07 2022-11-22 鹰港科技有限公司 变压器谐振转换器
KR102208429B1 (ko) 2017-08-25 2021-01-29 이글 하버 테크놀로지스, 인코포레이티드 나노초 펄스를 이용한 임의의 파형 발생
DE102018107824A1 (de) * 2018-04-03 2019-10-10 Dr. Ing. H.C. F. Porsche Aktiengesellschaft Elektrische Ladevorrichtung
US11302518B2 (en) 2018-07-27 2022-04-12 Eagle Harbor Technologies, Inc. Efficient energy recovery in a nanosecond pulser circuit
US11532457B2 (en) 2018-07-27 2022-12-20 Eagle Harbor Technologies, Inc. Precise plasma control system
US10607814B2 (en) 2018-08-10 2020-03-31 Eagle Harbor Technologies, Inc. High voltage switch with isolated power
US11222767B2 (en) 2018-07-27 2022-01-11 Eagle Harbor Technologies, Inc. Nanosecond pulser bias compensation
KR20230025034A (ko) 2018-08-10 2023-02-21 이글 하버 테크놀로지스, 인코포레이티드 RF 플라즈마 반응기용 플라즈마 시스(sheath) 제어
TW202308306A (zh) 2019-01-08 2023-02-16 美商鷹港科技股份有限公司 產生高壓脈波之方法
TWI778449B (zh) 2019-11-15 2022-09-21 美商鷹港科技股份有限公司 高電壓脈衝電路
WO2021134000A1 (en) 2019-12-24 2021-07-01 Eagle Harbor Technologies, Inc. Nanosecond pulser rf isolation for plasma systems
CN116191906B (zh) * 2023-03-07 2023-11-07 东莞市晟鼎精密仪器有限公司 一种双脉冲等离子电源智能监控系统及方法

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DE9109503U1 (pl) * 1991-07-31 1991-10-17 Magtron Magneto Elektronische Geraete Gmbh, 7583 Ottersweier, De
US5461297A (en) * 1993-05-24 1995-10-24 Analog Modules, Inc. Series-parallel switchable capacitor charging system
SE9704607D0 (sv) * 1997-12-09 1997-12-09 Chemfilt R & D Ab A method and apparatus for magnetically enhanced sputtering
US5993613A (en) * 1997-11-07 1999-11-30 Sierra Applied Sciences, Inc. Method and apparatus for periodic polarity reversal during an active state
US6256214B1 (en) * 1999-03-11 2001-07-03 Ericsson Inc. General self-driven synchronous rectification scheme for synchronous rectifiers having a floating gate
EP1278294B9 (en) 2001-07-16 2010-09-01 CPAutomation S.A. An electrical power supply suitable in particular for dc plasma processing
EP1434336A4 (en) * 2001-09-28 2008-10-08 Shibaura Mechatronics Corp POWER SUPPLY FOR SPUTTER
US8025775B2 (en) * 2002-03-15 2011-09-27 Oerlikon Trading Ag, Truebbach Vacuum plasma generator

Also Published As

Publication number Publication date
WO2006099759A3 (de) 2008-04-10
ES2401289T3 (es) 2013-04-18
EP1864313A2 (de) 2007-12-12
US7455755B2 (en) 2008-11-25
PT1864313E (pt) 2013-02-21
EP1864313B1 (de) 2012-12-19
US20080143260A1 (en) 2008-06-19
WO2006099759A2 (de) 2006-09-28

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