JP4697827B2 - 化学増幅型レジスト用樹脂の精製方法および化学増幅型レジスト用樹脂 - Google Patents

化学増幅型レジスト用樹脂の精製方法および化学増幅型レジスト用樹脂 Download PDF

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Publication number
JP4697827B2
JP4697827B2 JP2001022227A JP2001022227A JP4697827B2 JP 4697827 B2 JP4697827 B2 JP 4697827B2 JP 2001022227 A JP2001022227 A JP 2001022227A JP 2001022227 A JP2001022227 A JP 2001022227A JP 4697827 B2 JP4697827 B2 JP 4697827B2
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Prior art keywords
resin
chemically amplified
amplified resist
alcohol
resist resin
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JP2001022227A
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Japanese (ja)
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JP2002229220A5 (enExample
JP2002229220A (ja
Inventor
斉 友部
浩敏 溝田
博生 山中
法正 岩崎
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
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Publication of JP2002229220A5 publication Critical patent/JP2002229220A5/ja
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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2001022227A 2001-01-30 2001-01-30 化学増幅型レジスト用樹脂の精製方法および化学増幅型レジスト用樹脂 Expired - Lifetime JP4697827B2 (ja)

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JP2001022227A JP4697827B2 (ja) 2001-01-30 2001-01-30 化学増幅型レジスト用樹脂の精製方法および化学増幅型レジスト用樹脂

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JP2001022227A JP4697827B2 (ja) 2001-01-30 2001-01-30 化学増幅型レジスト用樹脂の精製方法および化学増幅型レジスト用樹脂

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JP2007237691A Division JP5089303B2 (ja) 2007-09-13 2007-09-13 化学増幅型レジスト用樹脂

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JP2002229220A JP2002229220A (ja) 2002-08-14
JP2002229220A5 JP2002229220A5 (enExample) 2008-03-06
JP4697827B2 true JP4697827B2 (ja) 2011-06-08

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3759526B2 (ja) 2003-10-30 2006-03-29 丸善石油化学株式会社 半導体リソグラフィー用共重合体の製造方法
KR101191687B1 (ko) 2004-04-30 2012-10-16 마루젠 세끼유가가꾸 가부시키가이샤 반도체 리소그래피용 공중합체와 그 제조 방법, 및 조성물
JP4698972B2 (ja) * 2004-05-10 2011-06-08 三菱レイヨン株式会社 レジスト用重合体の製造方法
JP5172118B2 (ja) * 2006-08-04 2013-03-27 三菱レイヨン株式会社 重合体湿粉、重合体湿粉の製造方法、重合体の製造方法およびレジスト組成物の製造方法
JP4979300B2 (ja) * 2006-08-04 2012-07-18 三菱レイヨン株式会社 重合体湿粉、重合体湿粉の製造方法、および重合体の製造方法
JP4989940B2 (ja) * 2006-08-11 2012-08-01 三菱レイヨン株式会社 重合体の製造方法およびレジスト組成物の製造方法
JP5362177B2 (ja) * 2006-08-25 2013-12-11 三菱レイヨン株式会社 レジスト用重合体湿粉の製造方法
JP5092721B2 (ja) * 2007-12-05 2012-12-05 Ｊｓｒ株式会社 フォトレジスト用樹脂の製造方法
WO2009116253A1 (ja) * 2008-03-17 2009-09-24 ダイセル化学工業株式会社 重合体の製造方法
JP5640787B2 (ja) * 2011-02-09 2014-12-17 三菱レイヨン株式会社 重合体の製造方法
JP5939009B2 (ja) * 2012-04-17 2016-06-22 三菱レイヨン株式会社 （メタ）アクリル酸エステルの評価方法及びリソグラフィー用共重合体の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPS62106911A (ja) * 1985-11-01 1987-05-18 Sekisui Chem Co Ltd 医療器材用樹脂組成物の安定化助剤の精製方法
JPH06220106A (ja) * 1993-01-26 1994-08-09 Tosoh Corp 共重合体の製造法
JPH10168119A (ja) * 1996-12-12 1998-06-23 Mitsui Chem Inc ポリオレフィンの精製方法
WO1998027462A1 (en) * 1996-12-18 1998-06-25 Clariant International Ltd. Photoresist composition containing a polymeric additive
JP4012600B2 (ja) * 1997-06-23 2007-11-21 富士通株式会社 酸感応性重合体、レジスト組成物、レジストパターン形成方法、および半導体装置の製造方法

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