JP4667580B2 - ２つの中間像を持つ反射屈折対物レンズ - Google Patents

２つの中間像を持つ反射屈折対物レンズ Download PDF

Info

Publication number
JP4667580B2
JP4667580B2 JP2000334325A JP2000334325A JP4667580B2 JP 4667580 B2 JP4667580 B2 JP 4667580B2 JP 2000334325 A JP2000334325 A JP 2000334325A JP 2000334325 A JP2000334325 A JP 2000334325A JP 4667580 B2 JP4667580 B2 JP 4667580B2
Authority
JP
Japan
Prior art keywords
objective lens
partial
lens according
image
partial objective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000334325A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001166210A5 (enExample
JP2001166210A (ja
Inventor
デイビッド・シェファー
ヴィルヘルム・ウルリッヒ
アロイス・ヘルコマー
カール−ハインツ・シュスター
ゲルト・フュルター
ビュナウ ルドルフ・フォン
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2001166210A publication Critical patent/JP2001166210A/ja
Publication of JP2001166210A5 publication Critical patent/JP2001166210A5/ja
Application granted granted Critical
Publication of JP4667580B2 publication Critical patent/JP4667580B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000334325A 1999-11-05 2000-11-01 ２つの中間像を持つ反射屈折対物レンズ Expired - Fee Related JP4667580B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/434702 1999-11-05
US09/434,702 US6600608B1 (en) 1999-11-05 1999-11-05 Catadioptric objective comprising two intermediate images

Publications (3)

Publication Number Publication Date
JP2001166210A JP2001166210A (ja) 2001-06-22
JP2001166210A5 JP2001166210A5 (enExample) 2007-11-08
JP4667580B2 true JP4667580B2 (ja) 2011-04-13

Family

ID=23725311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000334325A Expired - Fee Related JP4667580B2 (ja) 1999-11-05 2000-11-01 ２つの中間像を持つ反射屈折対物レンズ

Country Status (6)

Country Link
US (2) US6600608B1 (enExample)
EP (1) EP1098215B1 (enExample)
JP (1) JP4667580B2 (enExample)
KR (1) KR100724784B1 (enExample)
DE (1) DE60008834T2 (enExample)
TW (1) TW559674B (enExample)

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4717974B2 (ja) 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
CA2380527A1 (en) * 1999-07-29 2001-02-08 Privacash.Com, Inc. Method and system for transacting an anonymous purchase over the internet
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
DE10005189A1 (de) 2000-02-05 2001-08-09 Zeiss Carl Projektionsbelichtungsanlage mit reflektivem Retikel
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
US7136234B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
US6842298B1 (en) * 2000-09-12 2005-01-11 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
RU2192028C1 (ru) * 2001-04-04 2002-10-27 Общество С Ограниченной Ответственностью "Инсмат Технология" Катадиоптрическая система
US7180658B2 (en) * 2003-02-21 2007-02-20 Kla-Tencor Technologies Corporation High performance catadioptric imaging system
DE10316428A1 (de) * 2003-04-08 2004-10-21 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
JP2004333761A (ja) * 2003-05-06 2004-11-25 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
US7348575B2 (en) * 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
KR101516140B1 (ko) 2003-05-06 2015-05-04 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
CN1307456C (zh) * 2003-05-23 2007-03-28 佳能株式会社 投影光学系统、曝光装置及器件的制造方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
FR2860304B1 (fr) * 2003-09-26 2005-11-25 Sagem Systeme optique a haute ouverture numerique
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
CN1910494B (zh) * 2004-01-14 2011-08-10 卡尔蔡司Smt有限责任公司 反射折射投影物镜
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
WO2005098504A1 (en) 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
EP1771771B1 (en) 2004-07-14 2009-12-30 Carl Zeiss SMT AG Catadioptric projection objective
JP5600128B2 (ja) * 2004-07-14 2014-10-01 カール・ツァイス・エスエムティー・ゲーエムベーハー カタディオプトリック投影対物系
US7573781B2 (en) * 2004-07-30 2009-08-11 Teledyne Technologies Incorporation Streamer cable with enhanced properties
DE102005045862A1 (de) * 2004-10-19 2006-04-20 Carl Zeiss Smt Ag Optisches System für Ultraviolettlicht
US7218453B2 (en) * 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI454731B (zh) * 2005-05-27 2014-10-01 Zeiss Carl Smt Gmbh 用於改進投影物鏡的成像性質之方法以及該投影物鏡
WO2006133800A1 (en) 2005-06-14 2006-12-21 Carl Zeiss Smt Ag Lithography projection objective, and a method for correcting image defects of the same
EP1746463A2 (de) * 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
US7738188B2 (en) * 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7920338B2 (en) * 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
EP1852745A1 (en) * 2006-05-05 2007-11-07 Carl Zeiss SMT AG High-NA projection objective
DE102006022958A1 (de) * 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
TW200801578A (en) * 2006-06-21 2008-01-01 Canon Kk Projection optical system
EP1890191A1 (en) * 2006-08-14 2008-02-20 Carl Zeiss SMT AG Catadioptric projection objective with pupil mirror
US7929114B2 (en) 2007-01-17 2011-04-19 Carl Zeiss Smt Gmbh Projection optics for microlithography
JP2010527160A (ja) * 2007-05-14 2010-08-05 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ用投影対物器械及び投影露光装置
US7760425B2 (en) * 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
DE102007051669A1 (de) 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
DE102008017645A1 (de) * 2008-04-04 2009-10-08 Carl Zeiss Smt Ag Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats
DE102008046699B4 (de) * 2008-09-10 2014-03-13 Carl Zeiss Smt Gmbh Abbildende Optik
DE102008049588B4 (de) 2008-09-30 2018-04-05 Carl Zeiss Smt Gmbh Optische Abbildungseinrichtung, Mikroskop und Abbildungsverfahren für die Mikroskopie
DE102008049589A1 (de) 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Optische Abbildungseinrichtung und Abbildungsverfahren für die Mikroskopie
DE102009045217B3 (de) * 2009-09-30 2011-04-07 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv
US8908294B2 (en) 2012-05-18 2014-12-09 Canon Kabushiki Kaisha Catadioptric optical system with high numerical aperture
US9329373B2 (en) 2013-02-13 2016-05-03 Canon Kabushiki Kaisha Catadioptric optical system with multi-reflection element for high numerical aperture imaging
JP5786919B2 (ja) * 2013-10-28 2015-09-30 株式会社ニコン 投影光学系、露光装置及び露光方法
JP2014160274A (ja) * 2014-04-21 2014-09-04 Nikon Corp 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP2015132843A (ja) * 2015-03-02 2015-07-23 株式会社ニコン 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP2016136273A (ja) * 2016-03-07 2016-07-28 株式会社ニコン 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP2018010303A (ja) * 2017-08-03 2018-01-18 株式会社ニコン 露光装置およびデバイス製造方法
TWI831849B (zh) * 2018-12-07 2024-02-11 日商索尼股份有限公司 圖像顯示裝置及投射光學系統
JP2019091057A (ja) * 2019-01-15 2019-06-13 株式会社ニコン 露光装置及びデバイス製造方法
JP2019082711A (ja) * 2019-01-15 2019-05-30 株式会社ニコン 投影光学系、露光装置、露光方法、及びデバイス製造方法
CN119200204B (zh) * 2024-11-25 2025-10-03 中科院南京天文仪器有限公司 一种具有类齐明特性的折反式望远镜光学系统及装调方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU124665A1 (ru) 1959-03-30 1959-11-30 В.А. Панов Безиммерсионный зеркально-линзовый ахроматический объектив микроскопа
NL269391A (enExample) 1961-09-19
US4701035A (en) 1984-08-14 1987-10-20 Canon Kabushiki Kaisha Reflection optical system
JPS627000A (ja) * 1985-02-06 1987-01-13 大和紡績株式会社 消臭性湿式不織布
DE3527393A1 (de) 1985-07-31 1987-02-05 Wolf Gmbh Richard Endoskopoptik
US5004331A (en) 1989-05-03 1991-04-02 Hughes Aircraft Company Catadioptric projector, catadioptric projection system and process
US5636066A (en) 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
JP3635684B2 (ja) * 1994-08-23 2005-04-06 株式会社ニコン 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
JP3339592B2 (ja) * 1993-03-12 2002-10-28 株式会社ニコン 反射屈折投影光学系、並びに露光方法及び装置
US5488229A (en) 1994-10-04 1996-01-30 Excimer Laser Systems, Inc. Deep ultraviolet microlithography system
US5739964A (en) * 1995-03-22 1998-04-14 Etec Systems, Inc. Magnification correction for small field scanning
IL113350A (en) 1995-04-12 1998-06-15 State Rafaelel Ministry Of Def Catadioptric optics working staring detector system
JP3352325B2 (ja) 1996-05-21 2002-12-03 キヤノン株式会社 走査露光装置及びそれを用いたデバイスの製造方法
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US6631036B2 (en) * 1996-09-26 2003-10-07 Carl-Zeiss-Stiftung Catadioptric objective
DE19639586A1 (de) 1996-09-26 1998-04-02 Zeiss Carl Fa Katadioptrisches Mikrolithographie-Reduktionsobjektiv
US6169607B1 (en) 1996-11-18 2001-01-02 Xerox Corporation Printing black and white reproducible colored test documents
US6212334B1 (en) * 1998-05-02 2001-04-03 Cine Photo Tech, Inc. Supplementary optical system for a camera
KR20000034967A (ko) 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
DE19942281A1 (de) 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
JP2005233979A (ja) 2000-02-09 2005-09-02 Nikon Corp 反射屈折光学系
US7218453B2 (en) * 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus

Also Published As

Publication number Publication date
US6600608B1 (en) 2003-07-29
DE60008834T2 (de) 2005-01-13
JP2001166210A (ja) 2001-06-22
EP1098215B1 (en) 2004-03-10
KR100724784B1 (ko) 2007-06-04
DE60008834D1 (de) 2004-04-15
USRE41350E1 (en) 2010-05-25
KR20010051043A (ko) 2001-06-25
EP1098215A1 (en) 2001-05-09
TW559674B (en) 2003-11-01

Similar Documents

Publication Publication Date Title
JP4667580B2 (ja) ２つの中間像を持つ反射屈折対物レンズ
US7859748B2 (en) Microlithographic reduction projection catadioptric objective
JP4693947B2 (ja) カタディオプトリック光学系およびそれを有する露光装置
US5861997A (en) Catadioptric reduction projection optical system and exposure apparatus having the same
JP4245286B2 (ja) 反射屈折光学系および該光学系を備えた露光装置
KR100451339B1 (ko) 높은개구수의링필드광학축소시스템
JP5396673B2 (ja) 投影露光装置、投影露光方法及び投影対物レンズ
USRE38403E1 (en) Projection optical system and projection exposure apparatus
US20080259441A1 (en) Imaging System
JPH103039A (ja) 反射屈折光学系
US20040160677A1 (en) Catadioptric reduction lens
US20030011894A1 (en) Catadioptric objective
JPH04234722A (ja) 補償型光学システム
JP2000100694A (ja) 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
WO2004062262A2 (en) Large-field unit-magnification projection system
USRE38438E1 (en) Catadioptric reduction projection optical system and exposure apparatus having the same
JPH1184248A (ja) 反射屈折縮小光学系
JP2002323658A (ja) 照明システムの分割形対物レンズ
US7672043B2 (en) Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth
KR20040005677A (ko) 리소그래피 시스템의 조명 시스템에서 사용되는 릴레이 렌즈
US7046459B1 (en) Catadioptric reductions lens
JP2000098229A (ja) 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
USRE42570E1 (en) Catadioptric objective

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20040819

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070925

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070925

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20080828

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20080828

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20080904

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100806

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101108

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20101213

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110112

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140121

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees