KR100724784B1 - 두 개의 중간 이미지를 포함하는 카타디옵트릭 대물렌즈 - Google Patents

두 개의 중간 이미지를 포함하는 카타디옵트릭 대물렌즈 Download PDF

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Publication number
KR100724784B1
KR100724784B1 KR1020000060640A KR20000060640A KR100724784B1 KR 100724784 B1 KR100724784 B1 KR 100724784B1 KR 1020000060640 A KR1020000060640 A KR 1020000060640A KR 20000060640 A KR20000060640 A KR 20000060640A KR 100724784 B1 KR100724784 B1 KR 100724784B1
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South Korea
Prior art keywords
objective lens
lens
partial
partial objective
lenses
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Expired - Fee Related
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KR1020000060640A
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English (en)
Korean (ko)
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KR20010051043A (ko
Inventor
샤퍼데이비드
울리히빌헬름
헤르콤머알로이스
슈스터칼-하인쯔
퓌르터게르트
뷔나우루돌프폰
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칼 짜이스 에스엠테 아게
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020000060640A 1999-11-05 2000-10-16 두 개의 중간 이미지를 포함하는 카타디옵트릭 대물렌즈 Expired - Fee Related KR100724784B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US9/434702 1999-11-05
US09/434,702 US6600608B1 (en) 1999-11-05 1999-11-05 Catadioptric objective comprising two intermediate images
US09/434702 1999-11-05

Publications (2)

Publication Number Publication Date
KR20010051043A KR20010051043A (ko) 2001-06-25
KR100724784B1 true KR100724784B1 (ko) 2007-06-04

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000060640A Expired - Fee Related KR100724784B1 (ko) 1999-11-05 2000-10-16 두 개의 중간 이미지를 포함하는 카타디옵트릭 대물렌즈

Country Status (6)

Country Link
US (2) US6600608B1 (enExample)
EP (1) EP1098215B1 (enExample)
JP (1) JP4667580B2 (enExample)
KR (1) KR100724784B1 (enExample)
DE (1) DE60008834T2 (enExample)
TW (1) TW559674B (enExample)

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US7136234B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
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JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
RU2192028C1 (ru) * 2001-04-04 2002-10-27 Общество С Ограниченной Ответственностью "Инсмат Технология" Катадиоптрическая система
US7180658B2 (en) * 2003-02-21 2007-02-20 Kla-Tencor Technologies Corporation High performance catadioptric imaging system
DE10316428A1 (de) * 2003-04-08 2004-10-21 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
KR101516141B1 (ko) 2003-05-06 2015-05-04 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP2004333761A (ja) * 2003-05-06 2004-11-25 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
EP1480065A3 (en) * 2003-05-23 2006-05-10 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and device manufacturing method
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
FR2860304B1 (fr) * 2003-09-26 2005-11-25 Sagem Systeme optique a haute ouverture numerique
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
CN102207608B (zh) * 2004-01-14 2013-01-02 卡尔蔡司Smt有限责任公司 反射折射投影物镜
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
WO2005098504A1 (en) * 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
KR20170028451A (ko) 2004-05-17 2017-03-13 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
EP1771771B1 (en) 2004-07-14 2009-12-30 Carl Zeiss SMT AG Catadioptric projection objective
JP5600128B2 (ja) * 2004-07-14 2014-10-01 カール・ツァイス・エスエムティー・ゲーエムベーハー カタディオプトリック投影対物系
US7573781B2 (en) * 2004-07-30 2009-08-11 Teledyne Technologies Incorporation Streamer cable with enhanced properties
DE102005045862A1 (de) * 2004-10-19 2006-04-20 Carl Zeiss Smt Ag Optisches System für Ultraviolettlicht
US7218453B2 (en) * 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI454731B (zh) 2005-05-27 2014-10-01 Zeiss Carl Smt Gmbh 用於改進投影物鏡的成像性質之方法以及該投影物鏡
WO2006133800A1 (en) * 2005-06-14 2006-12-21 Carl Zeiss Smt Ag Lithography projection objective, and a method for correcting image defects of the same
EP1746463A2 (de) * 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
US7738188B2 (en) * 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7920338B2 (en) * 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
EP1852745A1 (en) * 2006-05-05 2007-11-07 Carl Zeiss SMT AG High-NA projection objective
DE102006022958A1 (de) * 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
TW200801578A (en) * 2006-06-21 2008-01-01 Canon Kk Projection optical system
EP1890191A1 (en) * 2006-08-14 2008-02-20 Carl Zeiss SMT AG Catadioptric projection objective with pupil mirror
US7929114B2 (en) 2007-01-17 2011-04-19 Carl Zeiss Smt Gmbh Projection optics for microlithography
JP2010527160A (ja) * 2007-05-14 2010-08-05 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ用投影対物器械及び投影露光装置
US7760425B2 (en) * 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
DE102007051669A1 (de) 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
DE102008017645A1 (de) * 2008-04-04 2009-10-08 Carl Zeiss Smt Ag Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats
DE102008046699B4 (de) * 2008-09-10 2014-03-13 Carl Zeiss Smt Gmbh Abbildende Optik
DE102008049589A1 (de) 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Optische Abbildungseinrichtung und Abbildungsverfahren für die Mikroskopie
DE102008049588B4 (de) 2008-09-30 2018-04-05 Carl Zeiss Smt Gmbh Optische Abbildungseinrichtung, Mikroskop und Abbildungsverfahren für die Mikroskopie
DE102009045217B3 (de) * 2009-09-30 2011-04-07 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv
US8908294B2 (en) 2012-05-18 2014-12-09 Canon Kabushiki Kaisha Catadioptric optical system with high numerical aperture
US9329373B2 (en) 2013-02-13 2016-05-03 Canon Kabushiki Kaisha Catadioptric optical system with multi-reflection element for high numerical aperture imaging
JP5786919B2 (ja) * 2013-10-28 2015-09-30 株式会社ニコン 投影光学系、露光装置及び露光方法
JP2014160274A (ja) * 2014-04-21 2014-09-04 Nikon Corp 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP2015132843A (ja) * 2015-03-02 2015-07-23 株式会社ニコン 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP2016136273A (ja) * 2016-03-07 2016-07-28 株式会社ニコン 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP2018010303A (ja) * 2017-08-03 2018-01-18 株式会社ニコン 露光装置およびデバイス製造方法
TWI831849B (zh) * 2018-12-07 2024-02-11 日商索尼股份有限公司 圖像顯示裝置及投射光學系統
JP2019091057A (ja) * 2019-01-15 2019-06-13 株式会社ニコン 露光装置及びデバイス製造方法
JP2019082711A (ja) * 2019-01-15 2019-05-30 株式会社ニコン 投影光学系、露光装置、露光方法、及びデバイス製造方法
CN119200204B (zh) * 2024-11-25 2025-10-03 中科院南京天文仪器有限公司 一种具有类齐明特性的折反式望远镜光学系统及装调方法

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Also Published As

Publication number Publication date
DE60008834T2 (de) 2005-01-13
DE60008834D1 (de) 2004-04-15
EP1098215A1 (en) 2001-05-09
EP1098215B1 (en) 2004-03-10
KR20010051043A (ko) 2001-06-25
TW559674B (en) 2003-11-01
US6600608B1 (en) 2003-07-29
USRE41350E1 (en) 2010-05-25
JP4667580B2 (ja) 2011-04-13
JP2001166210A (ja) 2001-06-22

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