JP4666908B2 - 露光装置、計測方法及びデバイス製造方法 - Google Patents

露光装置、計測方法及びデバイス製造方法 Download PDF

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Publication number
JP4666908B2
JP4666908B2 JP2003414579A JP2003414579A JP4666908B2 JP 4666908 B2 JP4666908 B2 JP 4666908B2 JP 2003414579 A JP2003414579 A JP 2003414579A JP 2003414579 A JP2003414579 A JP 2003414579A JP 4666908 B2 JP4666908 B2 JP 4666908B2
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Japan
Prior art keywords
temperature
exposure
optical element
optical system
mirror
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Expired - Fee Related
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JP2003414579A
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Japanese (ja)
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JP2005175255A5 (enExample
JP2005175255A (ja
Inventor
義一 宮島
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Canon Inc
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Canon Inc
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Priority to JP2003414579A priority Critical patent/JP4666908B2/ja
Priority to US11/006,629 priority patent/US7315347B2/en
Publication of JP2005175255A publication Critical patent/JP2005175255A/ja
Publication of JP2005175255A5 publication Critical patent/JP2005175255A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003414579A 2003-12-12 2003-12-12 露光装置、計測方法及びデバイス製造方法 Expired - Fee Related JP4666908B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003414579A JP4666908B2 (ja) 2003-12-12 2003-12-12 露光装置、計測方法及びデバイス製造方法
US11/006,629 US7315347B2 (en) 2003-12-12 2004-12-08 Exposure apparatus and device manufacturing method

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Application Number Priority Date Filing Date Title
JP2003414579A JP4666908B2 (ja) 2003-12-12 2003-12-12 露光装置、計測方法及びデバイス製造方法

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JP2005175255A JP2005175255A (ja) 2005-06-30
JP2005175255A5 JP2005175255A5 (enExample) 2007-02-01
JP4666908B2 true JP4666908B2 (ja) 2011-04-06

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JP2003414579A Expired - Fee Related JP4666908B2 (ja) 2003-12-12 2003-12-12 露光装置、計測方法及びデバイス製造方法

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US (1) US7315347B2 (enExample)
JP (1) JP4666908B2 (enExample)

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JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP4383911B2 (ja) * 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法
KR101122881B1 (ko) * 2004-02-20 2012-03-20 칼 짜이스 에스엠테 게엠베하 마이크로리소그래픽 투사 노출 시스템의 투사 렌즈
JP2005353986A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置
JP2006261605A (ja) * 2005-03-18 2006-09-28 Canon Inc 露光装置及び露光方法
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
JP5245261B2 (ja) * 2007-03-02 2013-07-24 株式会社ニコン 走査型露光装置、露光方法、及びデバイスの製造方法
JP5785419B2 (ja) * 2010-04-07 2015-09-30 エーエスエムエル ネザーランズ ビー．ブイ． 光学要素を冷却する方法、リソグラフィ装置、およびデバイスを製造する方法
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CN102411264B (zh) * 2011-11-22 2014-07-16 上海华力微电子有限公司 光刻机投影物镜温度均衡装置及均衡方法
US20150212432A1 (en) * 2012-09-25 2015-07-30 Asml Netherlands B.V. Reticle Heater to Keep Reticle Heating Uniform
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JP2018040856A (ja) * 2016-09-05 2018-03-15 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
DE102018203925A1 (de) * 2018-03-15 2019-09-19 Carl Zeiss Smt Gmbh Strahlformungs- und Beleuchtungssystem für eine Lithographieanlage und Verfahren
DE102018208653A1 (de) 2018-05-30 2019-12-05 Carl Zeiss Smt Gmbh Verfahren sowie Vorrichtung zum Bestimmen des Erwärmungszustandes eines Spiegels in einem optischen System
US11474439B2 (en) * 2019-06-25 2022-10-18 Canon Kabushiki Kaisha Exposure apparatus, exposure method, and method of manufacturing article
JP6951498B2 (ja) * 2019-06-25 2021-10-20 キヤノン株式会社 露光装置、露光方法および物品製造方法
JP6924235B2 (ja) * 2019-09-19 2021-08-25 キヤノン株式会社 露光方法、露光装置、物品製造方法、および半導体デバイスの製造方法
EP4288838A1 (en) * 2021-02-05 2023-12-13 ASML Netherlands B.V. A method and system for predicting aberrations in a projection system
DE102021201258A1 (de) * 2021-02-10 2022-08-11 Carl Zeiss Smt Gmbh Verfahren zum Heizen eines optischen Elements in einer mikrolithographischen Projektionsbelichtungsanlage, sowie optisches System

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JP2004247473A (ja) 2003-02-13 2004-09-02 Canon Inc 冷却装置及び方法、当該冷却装置を有する露光装置
JP4532835B2 (ja) 2003-02-13 2010-08-25 キヤノン株式会社 冷却装置、それを有する光学部材並びに露光装置
JP4458333B2 (ja) 2003-02-13 2010-04-28 キヤノン株式会社 露光装置、およびデバイスの製造方法
JP4018564B2 (ja) 2003-03-14 2007-12-05 キヤノン株式会社 光学系、及びそれを用いた露光装置、デバイスの製造方法
JP4307130B2 (ja) * 2003-04-08 2009-08-05 キヤノン株式会社 露光装置
JP2005175187A (ja) 2003-12-11 2005-06-30 Canon Inc 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス
JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP4383911B2 (ja) 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法
JP4411100B2 (ja) 2004-02-18 2010-02-10 キヤノン株式会社 露光装置

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Publication number Publication date
US7315347B2 (en) 2008-01-01
US20050140947A1 (en) 2005-06-30
JP2005175255A (ja) 2005-06-30

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