JP4636469B2 - 体積型ホログラム記録用感光性組成物 - Google Patents
体積型ホログラム記録用感光性組成物 Download PDFInfo
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- JP4636469B2 JP4636469B2 JP2005255677A JP2005255677A JP4636469B2 JP 4636469 B2 JP4636469 B2 JP 4636469B2 JP 2005255677 A JP2005255677 A JP 2005255677A JP 2005255677 A JP2005255677 A JP 2005255677A JP 4636469 B2 JP4636469 B2 JP 4636469B2
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- WKMROCDMFOTMJE-UHFFFAOYSA-N C1(=C2C(=CC=C1)C1C(COCC3C2O3)O1)C1=CC=CC=C1 Chemical compound C1(=C2C(=CC=C1)C1C(COCC3C2O3)O1)C1=CC=CC=C1 WKMROCDMFOTMJE-UHFFFAOYSA-N 0.000 description 1
- ARTMRTIKMRNJMJ-UHFFFAOYSA-N CC(C=C(C=C1)C2=CC=CC3=C2CC2=CC=CC=C32)=C1OCCOC(C=C)=O Chemical compound CC(C=C(C=C1)C2=CC=CC3=C2CC2=CC=CC=C32)=C1OCCOC(C=C)=O ARTMRTIKMRNJMJ-UHFFFAOYSA-N 0.000 description 1
- GUGHGNMOGHFKFF-UHFFFAOYSA-N CC(C=CC=C1C2)=C1C1=C2C=CC(C)=C1OCCOC(C=C)=O Chemical compound CC(C=CC=C1C2)=C1C1=C2C=CC(C)=C1OCCOC(C=C)=O GUGHGNMOGHFKFF-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- ULQMPOIOSDXIGC-UHFFFAOYSA-N [2,2-dimethyl-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(C)COC(=O)C(C)=C ULQMPOIOSDXIGC-UHFFFAOYSA-N 0.000 description 1
- OCTZVFPSLQFHCN-UHFFFAOYSA-N [2,3,6-triethoxy-4-[9-(2,3,5-triethoxy-4-prop-2-enoyloxyphenyl)fluoren-9-yl]phenyl] prop-2-enoate Chemical compound CCOC1=C(OC(=O)C=C)C(OCC)=CC(C2(C3=CC=CC=C3C3=CC=CC=C32)C=2C(=C(OCC)C(OC(=O)C=C)=C(OCC)C=2)OCC)=C1OCC OCTZVFPSLQFHCN-UHFFFAOYSA-N 0.000 description 1
- HSZUHSXXAOWGQY-UHFFFAOYSA-N [2-methyl-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(C)(COC(=O)C=C)COC(=O)C=C HSZUHSXXAOWGQY-UHFFFAOYSA-N 0.000 description 1
- ZCZFEIZSYJAXKS-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] prop-2-enoate Chemical compound OCC(CO)(CO)COC(=O)C=C ZCZFEIZSYJAXKS-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical class C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 1
- IUOALUVIEFDYAP-UHFFFAOYSA-N [4-[9-(2,3-diethoxy-4-prop-2-enoyloxyphenyl)fluoren-9-yl]-2,3-diethoxyphenyl] prop-2-enoate Chemical compound CCOC1=C(OC(=O)C=C)C=CC(C2(C3=CC=CC=C3C3=CC=CC=C32)C=2C(=C(OCC)C(OC(=O)C=C)=CC=2)OCC)=C1OCC IUOALUVIEFDYAP-UHFFFAOYSA-N 0.000 description 1
- WDMWODJQZUZRGY-UHFFFAOYSA-N [4-[9-(4-prop-2-enoyloxy-2,3-dipropoxyphenyl)fluoren-9-yl]-2,3-dipropoxyphenyl] prop-2-enoate Chemical compound CCCOC1=C(OC(=O)C=C)C=CC(C2(C3=CC=CC=C3C3=CC=CC=C32)C=2C(=C(OCCC)C(OC(=O)C=C)=CC=2)OCCC)=C1OCCC WDMWODJQZUZRGY-UHFFFAOYSA-N 0.000 description 1
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- FLTDLGPEJAJANE-UHFFFAOYSA-N but-3-enyl triethyl silicate Chemical compound CCO[Si](OCC)(OCC)OCCC=C FLTDLGPEJAJANE-UHFFFAOYSA-N 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000012663 cationic photopolymerization Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- BIAWWFZNZAIXRF-UHFFFAOYSA-N ditert-butyl 1-benzoylcyclohexa-3,5-diene-1,3-dicarboperoxoate Chemical compound C1C(C(=O)OOC(C)(C)C)=CC=CC1(C(=O)OOC(C)(C)C)C(=O)C1=CC=CC=C1 BIAWWFZNZAIXRF-UHFFFAOYSA-N 0.000 description 1
- KGGOIDKBHYYNIC-UHFFFAOYSA-N ditert-butyl 4-[3,4-bis(tert-butylperoxycarbonyl)benzoyl]benzene-1,2-dicarboperoxoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=C1 KGGOIDKBHYYNIC-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 229920006000 epoxidized styrene-butadiene-styrene block copolymer Polymers 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000004715 ethylene vinyl alcohol Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- RZXDTJIXPSCHCI-UHFFFAOYSA-N hexa-1,5-diene-2,5-diol Chemical compound OC(=C)CCC(O)=C RZXDTJIXPSCHCI-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- KSCKTBJJRVPGKM-UHFFFAOYSA-N octan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCCCCCC[O-].CCCCCCCC[O-].CCCCCCCC[O-].CCCCCCCC[O-] KSCKTBJJRVPGKM-UHFFFAOYSA-N 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000001022 rhodamine dye Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229920006132 styrene block copolymer Polymers 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- MVQLEZWPIWKLBY-UHFFFAOYSA-N tert-butyl 2-benzoylbenzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 MVQLEZWPIWKLBY-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- OKYDCMQQLGECPI-UHFFFAOYSA-N thiopyrylium Chemical class C1=CC=[S+]C=C1 OKYDCMQQLGECPI-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- RLGKSXCGHMXELQ-ZRDIBKRKSA-N trans-2-styrylquinoline Chemical compound C=1C=C2C=CC=CC2=NC=1\C=C\C1=CC=CC=C1 RLGKSXCGHMXELQ-ZRDIBKRKSA-N 0.000 description 1
- SGCFZHOZKKQIBU-UHFFFAOYSA-N tributoxy(ethenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C=C SGCFZHOZKKQIBU-UHFFFAOYSA-N 0.000 description 1
- GAMLUOSQYHLFCT-UHFFFAOYSA-N triethoxy-[3-[(3-ethyloxetan-3-yl)methoxy]propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1(CC)COC1 GAMLUOSQYHLFCT-UHFFFAOYSA-N 0.000 description 1
- 229960000834 vinyl ether Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Description
光カチオン重合性化合物とは、光カチオン重合性を示す官能基を有する化合物である。光カチオン重合性を示す官能基は多く知られているが、特に実用性の高い物として、エポキシ基、ビニル基、オキセタニル基等が広く用いられている。
本ホログラム記録用感光性組成物に使用するバインダー樹脂としては、特に限定されるわけではないが、ポリメタアクリル酸エステル若しくはその部分加水分解物、ポリ酢酸ビニル若しくはその加水分解物、ポリビニルアルコール若しくはその部分アセタール化物、トリアセチルセルロース、ポリイソプレン、ポリブタジエン、ポリクロロプレン、シリコーンゴム、ポリスチレン、ポリビニルブチラール、ポリクロロプレン、ポリ塩化ビニル、ポリアリレート、塩素化ポリエチレン、塩素化ポリプロピレン、ポリ−N−ビニルカルバゾール若しくはその誘導体、ポリ−N−ビニルピロリドン若しくはその誘導体、ポリアリレート、スチレンと無水マレイン酸との共重合体若しくはその半エステル、アクリル酸、アクリル酸エステル、メタクリル酸、メタクリル酸エステル、アクリルアミド、アクリルニトリル、エチレン、プロピレン、塩化ビニル、酢酸ビニル等の共重合可能なモノマー群の少なくとも1つを重合成分とする共重合体等、またはそれらの混合物を好適に用いることができる。
なお、メタクリル酸エステルの具体例としては、上記アクリル酸エステル化合物のうち、化合物名における「アクリレート」が「メタクリレート」に、「アクリロキシ」が「メタクリロキシ」に、「アクリロイル」が「メタクリロイル」になる化合物が挙げられる。
光カチオン重合可能な化合物を使用する場合の光カチオン重合開始剤としては、以下に限定されるわけではないが、芳香族ジアゾニウム塩、芳香族ヨードニウム塩、芳香族スルホニウム塩、芳香族ホスホニウム塩、混合配位子金属塩、(η6−ベンゼン)(η5−シクロペンタジエニル)鉄(II)、シラノール−アルミニウム錯体等を好適に用いることができる。
増感色素としては、ホログラム記録時における感光性能を増幅するために必要に応じて添加されるものであり、以下に限定されるわけではないが、チオピリリウム塩系色素、メロシアニン系色素、キノリン系色素、スチリルキノリン系色素、ケトクマリン系色素、チオキサンテン系色素、キサンテン系色素、オキソノール系色素、シアニン系色素、ローダミン系色素、ピリリウム塩系色素等を好適に用いることができる。
次に、本体積型ホログラム記録用感光性媒体について説明する。本体積型ホログラム記録用感光性媒体は、上述した体積型ホログラム記録用感光性組成物を溶剤に溶解して塗工液とし、基材フィルム上に塗布し、乾燥させることにより得ることができる。
下記組成の体積型ホログラム記録用感光性組成物塗工液を調製し、この塗工液を縦横76×52mm、厚さ1.3mmのガラス板上に乾燥後の膜厚が20μmとなるようにスピンコート法により成膜し、十分にシクロヘキサノンを飛ばした後、体積型ホログラム記録用感光性媒体を作製した。
下記構造式(5)の化合物(以下「EBP」という) 50重量部
3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート(セロキサイド2021P;ダイセル化学工業社製) 50重量部
ジアリールヨードニウム塩(PI2074;ローディア製) 5重量部
3,3’−カルボニルビス[7−(ジエチルアミノ)クマリン] 0.15重量部
シクロヘキサノン 172重量部
実施例1において、化合物(5)を100重量部とし、3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレートを0重量部(加えていない)とした以外はほぼ実施例1と同様に体積型ホログラムを作製し、更に実施例1と同様に分光光度計透過率測定を行ったところ、露光量30mJ/cm2における回折効率は15.7%であり、記録後の体積膨張率は、1.64%であった。
下記組成の体積型ホログラム記録用感光性組成物塗工液を調製し、実施例1と同様にして、体積型ホログラム記録用感光性媒体を得た。
3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート(セロキサイド2021P;ダイセル化学工業社製) 100重量部
ジアリールヨードニウム塩(PI2074;ローディア製) 5重量部
3,3’−カルボニルビス[7−(ジエチルアミノ)クマリン] 0.15重量部
シクロヘキサノン 172重量部
下記組成の体積型ホログラム記録用感光性組成物塗工液を調製し、実施例1と同様にして、体積型ホログラム記録用感光性媒体を得、さらに実施例1と同様の方法により、回折効率と体積収縮率を測定した。この結果、記録後の回折効率は17.3%となり、体積収縮率は0.74%であった。
下記構造式(6)の化合物 25重量部
3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート(セロキサイド2021P;ダイセル化学工業社製) 100重量部
ジアリールヨードニウム塩(PI2074;ローディア製) 5重量部
3,3’−カルボニルビス[7−(ジエチルアミノ)クマリン] 0.15重量部
シクロヘキサノン 172重量部
下記組成の体積型ホログラム記録用感光性組成物塗工液を調製し、25μmペットフィルムスペーサーを挟み込んだ2枚のガラス板で挟みこむことによって、体積型ホログラム記録用感光性媒体を得た。さらに、実施例1と同様の方法により、回折効率と体積収縮率を測定した。この結果、露光量30mJ/cm2における回折効率は29.8%であったが、体積収縮率は10.2%であった。
ネオペンチルグリコールジメタアクリレート 30重量部
3,3’,4,4’−テトラキス(t−ブチルパーオキシカルボニル)ベンゾフェノン)
5重量部
3,3’−カルボニルビス[7−(ジエチルアミノ)クマリン] 0.15重量部
ジエチルセバケート 20重量部
Claims (2)
- 基材フィルムと、該基材フィルムに配置される体積型ホログラム材料層とを有する体積型ホログラム記録用感光性媒体であって、
前記体積型ホログラム材料層は、下記構造式(1)で表される光重合性の体積膨張性化合物と、
光重合開始剤と、
バインダー樹脂と、
増感色素と、
を含み、
前記体積膨張性化合物は、前記体積型ホログラム材料層の組成物の全重量を100重量部とした場合、1〜90重量部の割合で含まれ、且つ、前記増感色素は、前記光重合開始剤100重量部に対して0.01〜30重量部の割合で含まれることを特徴とする体積型ホログラム記録用感光性媒体。
- 前記体積膨張性化合物以外の光重合性化合物も含んでなる請求項1に記載の体積型ホログラム記録用感光性媒体。
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JP2005255677A JP4636469B2 (ja) | 2005-09-02 | 2005-09-02 | 体積型ホログラム記録用感光性組成物 |
CN2006800321773A CN101253454B (zh) | 2005-09-02 | 2006-08-22 | 体积型全息图记录用感光性组合物 |
US11/991,357 US20090274961A1 (en) | 2005-09-02 | 2006-08-22 | Photosensitive composition for volume type hologram memory |
KR1020087005151A KR20080039465A (ko) | 2005-09-02 | 2006-08-22 | 체적형 홀로그램 기록용 감광성 조성물 |
PCT/JP2006/316354 WO2007029483A1 (ja) | 2005-09-02 | 2006-08-22 | 体積型ホログラム記録用感光性組成物 |
TW095131347A TW200712766A (en) | 2005-09-02 | 2006-08-25 | A volume-type hologram recording photosensitive composition |
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JP (1) | JP4636469B2 (ja) |
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EP2486078B1 (en) * | 2009-10-09 | 2018-02-21 | Henkel AG & Co. KGaA | A latent curing agent and epoxy compositions containing the same |
JP5745808B2 (ja) * | 2009-10-29 | 2015-07-08 | 株式会社ダイセル | 体積ホログラム記録用感光性組成物、それから得られる記録媒体、その製造法ならびにそれを用いた記録方法 |
KR101481071B1 (ko) * | 2010-03-08 | 2015-01-13 | 주식회사 엘지화학 | 내열성 및 기계적 성질이 우수한 감광성 수지 조성물 및 인쇄회로기판용 보호필름 |
KR101971758B1 (ko) | 2012-03-13 | 2019-04-23 | 주식회사 다이셀 | 감광성 수지 조성물 및 그의 경화물, 및 광학 부품 |
JP6001320B2 (ja) * | 2012-04-23 | 2016-10-05 | 株式会社ダイセル | 体積ホログラム記録用感光性組成物、これを用いた体積ホログラム記録媒体及びその製造方法、並びにホログラム記録方法 |
JP6130122B2 (ja) * | 2012-10-15 | 2017-05-17 | 株式会社ダイセル | 体積ホログラム記録層形成用感光性組成物 |
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CN101253454B (zh) | 2010-12-01 |
TW200712766A (en) | 2007-04-01 |
CN101253454A (zh) | 2008-08-27 |
JP2007071921A (ja) | 2007-03-22 |
KR20080039465A (ko) | 2008-05-07 |
WO2007029483A1 (ja) | 2007-03-15 |
US20090274961A1 (en) | 2009-11-05 |
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