JP4505201B2 - ３−ｄスパイラル積層インダクタおよび３−ｄスパイラル積層インダクタを形成する方法 - Google Patents

３−ｄスパイラル積層インダクタおよび３−ｄスパイラル積層インダクタを形成する方法 Download PDF

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Publication number
JP4505201B2
JP4505201B2 JP2003312890A JP2003312890A JP4505201B2 JP 4505201 B2 JP4505201 B2 JP 4505201B2 JP 2003312890 A JP2003312890 A JP 2003312890A JP 2003312890 A JP2003312890 A JP 2003312890A JP 4505201 B2 JP4505201 B2 JP 4505201B2
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winding
level
dielectric layer
via opening
forming
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Japanese (ja)
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JP2004104129A (ja
JP2004104129A5 (enExample
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チューン−ベン・シア
キアット・セン・ヨー
シャオ−フ・サンフォード・チュ
チェン・ヨウ・ン
コック・ワイ・チュー
ワン・リン・ゴー
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チャータード・セミコンダクター・マニュファクチャリング・リミテッド
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/20—Inductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/4906—Providing winding
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49073—Electromagnet, transformer or inductor by assembling coil and core
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base

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  • Coils Or Transformers For Communication (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)
  • Resistance Heating (AREA)
JP2003312890A 2002-09-04 2003-09-04 ３−ｄスパイラル積層インダクタおよび３−ｄスパイラル積層インダクタを形成する方法 Expired - Fee Related JP4505201B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/131,336 US6841847B2 (en) 2002-09-04 2002-09-04 3-D spiral stacked inductor on semiconductor material

Publications (3)

Publication Number Publication Date
JP2004104129A JP2004104129A (ja) 2004-04-02
JP2004104129A5 JP2004104129A5 (enExample) 2006-10-12
JP4505201B2 true JP4505201B2 (ja) 2010-07-21

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JP2003312890A Expired - Fee Related JP4505201B2 (ja) 2002-09-04 2003-09-04 ３−ｄスパイラル積層インダクタおよび３−ｄスパイラル積層インダクタを形成する方法

Country Status (6)

Country Link
US (2) US6841847B2 (enExample)
EP (1) EP1396875B1 (enExample)
JP (1) JP4505201B2 (enExample)
AT (1) ATE414990T1 (enExample)
DE (1) DE60324748D1 (enExample)
SG (2) SG109527A1 (enExample)

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US7221251B2 (en) * 2005-03-22 2007-05-22 Acutechnology Semiconductor Air core inductive element on printed circuit board for use in switching power conversion circuitries
US7399696B2 (en) * 2005-08-02 2008-07-15 International Business Machines Corporation Method for high performance inductor fabrication using a triple damascene process with copper BEOL
TWI299556B (en) * 2006-07-07 2008-08-01 Holtek Semiconductor Inc Spiral inductor with high quality factor of integrated circuit
CN101090025B (zh) * 2007-05-25 2012-10-03 威盛电子股份有限公司 一种具有多层结构的螺旋电感元件
JP5578797B2 (ja) * 2009-03-13 2014-08-27 ルネサスエレクトロニクス株式会社 半導体装置
TWI385680B (zh) * 2009-05-19 2013-02-11 Realtek Semiconductor Corp 螺旋電感之堆疊結構
US8143952B2 (en) 2009-10-08 2012-03-27 Qualcomm Incorporated Three dimensional inductor and transformer
US8319564B2 (en) * 2010-03-26 2012-11-27 Altera Corporation Integrated circuits with configurable inductors
US8692608B2 (en) 2011-09-19 2014-04-08 United Microelectronics Corp. Charge pump system capable of stabilizing an output voltage
US9030221B2 (en) 2011-09-20 2015-05-12 United Microelectronics Corporation Circuit structure of test-key and test method thereof
US8395455B1 (en) 2011-10-14 2013-03-12 United Microelectronics Corp. Ring oscillator
US8421509B1 (en) 2011-10-25 2013-04-16 United Microelectronics Corp. Charge pump circuit with low clock feed-through
US8588020B2 (en) 2011-11-16 2013-11-19 United Microelectronics Corporation Sense amplifier and method for determining values of voltages on bit-line pair
CN102522388B (zh) * 2011-12-22 2015-11-11 上海华虹宏力半导体制造有限公司 电感及形成方法
US8493806B1 (en) 2012-01-03 2013-07-23 United Microelectronics Corporation Sense-amplifier circuit of memory and calibrating method thereof
US8970197B2 (en) 2012-08-03 2015-03-03 United Microelectronics Corporation Voltage regulating circuit configured to have output voltage thereof modulated digitally
US8724404B2 (en) 2012-10-15 2014-05-13 United Microelectronics Corp. Memory, supply voltage generation circuit, and operation method of a supply voltage generation circuit used for a memory array
US8836460B2 (en) 2012-10-18 2014-09-16 International Business Machines Corporation Folded conical inductor
US8669897B1 (en) 2012-11-05 2014-03-11 United Microelectronics Corp. Asynchronous successive approximation register analog-to-digital converter and operating method thereof
US8711598B1 (en) 2012-11-21 2014-04-29 United Microelectronics Corp. Memory cell and memory cell array using the same
US8873295B2 (en) 2012-11-27 2014-10-28 United Microelectronics Corporation Memory and operation method thereof
US8643521B1 (en) 2012-11-28 2014-02-04 United Microelectronics Corp. Digital-to-analog converter with greater output resistance
US8953401B2 (en) 2012-12-07 2015-02-10 United Microelectronics Corp. Memory device and method for driving memory array thereof
US9030886B2 (en) 2012-12-07 2015-05-12 United Microelectronics Corp. Memory device and driving method thereof
US8917109B2 (en) 2013-04-03 2014-12-23 United Microelectronics Corporation Method and device for pulse width estimation
US9105355B2 (en) 2013-07-04 2015-08-11 United Microelectronics Corporation Memory cell array operated with multiple operation voltage
US9251948B2 (en) 2013-07-24 2016-02-02 International Business Machines Corporation High efficiency on-chip 3D transformer structure
US9831026B2 (en) * 2013-07-24 2017-11-28 Globalfoundries Inc. High efficiency on-chip 3D transformer structure
US9171663B2 (en) 2013-07-25 2015-10-27 Globalfoundries U.S. 2 Llc High efficiency on-chip 3D transformer structure
US9779869B2 (en) 2013-07-25 2017-10-03 International Business Machines Corporation High efficiency on-chip 3D transformer structure
US8947911B1 (en) 2013-11-07 2015-02-03 United Microelectronics Corp. Method and circuit for optimizing bit line power consumption
US8866536B1 (en) 2013-11-14 2014-10-21 United Microelectronics Corp. Process monitoring circuit and method
US9143143B2 (en) 2014-01-13 2015-09-22 United Microelectronics Corp. VCO restart up circuit and method thereof
KR20160058592A (ko) * 2014-11-17 2016-05-25 에스케이하이닉스 주식회사 알에프 집적회로 및 그 제조방법
US9653204B2 (en) 2015-01-22 2017-05-16 Globalfoundries Inc. Symmetric multi-port inductor for differential multi-band RF circuits
US10249580B2 (en) 2016-06-22 2019-04-02 Qualcomm Incorporated Stacked substrate inductor
US10525690B2 (en) 2016-09-07 2020-01-07 General Electric Company Additive manufacturing-based low-profile inductor
US10199157B2 (en) 2016-09-30 2019-02-05 Intel IP Corporation Stacked metal inductor
TWI723343B (zh) * 2019-02-19 2021-04-01 頎邦科技股份有限公司 具立體電感之半導體結構及其製造方法

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Also Published As

Publication number Publication date
EP1396875A3 (en) 2006-06-07
US6841847B2 (en) 2005-01-11
EP1396875B1 (en) 2008-11-19
US7721414B2 (en) 2010-05-25
EP1396875A2 (en) 2004-03-10
SG151088A1 (en) 2009-04-30
JP2004104129A (ja) 2004-04-02
DE60324748D1 (de) 2009-01-02
SG109527A1 (en) 2005-03-30
US20040041234A1 (en) 2004-03-04
ATE414990T1 (de) 2008-12-15
US20050057335A1 (en) 2005-03-17

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