JP4456503B2 - 電子部品の製造方法 - Google Patents
電子部品の製造方法 Download PDFInfo
- Publication number
- JP4456503B2 JP4456503B2 JP2005056722A JP2005056722A JP4456503B2 JP 4456503 B2 JP4456503 B2 JP 4456503B2 JP 2005056722 A JP2005056722 A JP 2005056722A JP 2005056722 A JP2005056722 A JP 2005056722A JP 4456503 B2 JP4456503 B2 JP 4456503B2
- Authority
- JP
- Japan
- Prior art keywords
- solder
- electronic component
- package substrate
- manufacturing
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004519 manufacturing process Methods 0.000 title claims description 42
- 229910000679 solder Inorganic materials 0.000 claims description 87
- 238000007789 sealing Methods 0.000 claims description 70
- 239000000758 substrate Substances 0.000 claims description 52
- 239000002184 metal Substances 0.000 claims description 46
- 229910052751 metal Inorganic materials 0.000 claims description 46
- 230000001681 protective effect Effects 0.000 claims description 27
- 229920005989 resin Polymers 0.000 claims description 22
- 239000011347 resin Substances 0.000 claims description 22
- 238000005520 cutting process Methods 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000005476 soldering Methods 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 description 33
- 239000010410 layer Substances 0.000 description 31
- 238000000034 method Methods 0.000 description 24
- 238000010586 diagram Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000010897 surface acoustic wave method Methods 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 229910020836 Sn-Ag Inorganic materials 0.000 description 3
- 229910020988 Sn—Ag Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910000833 kovar Inorganic materials 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229910015363 Au—Sn Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910020888 Sn-Cu Inorganic materials 0.000 description 1
- 229910019204 Sn—Cu Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
- H03H9/1085—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a non-uniform sealing mass covering the non-active sides of the BAW device
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
- H03H9/1078—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a foil covering the non-active sides of the SAW device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
Description
22 バンプ
23 パッケージ基板
24 配線パターン
25 封止部
25A 側部
25B 上部
26 パッケージ側封止パターン
27 チップ側封止パターン
28 キャビティ
29 電極パターン
32 金属層
33 樹脂層
34 保護膜
35 金属ボール
36 金属枠
37 貫通穴
39 溝
Claims (4)
- 多面取り構造のパッケージ基板に複数のデバイスチップをフリップチップ実装する第1の工程と、はんだを前記パッケージ基板と複数のデバイスチップの各々の少なくとも一方に供給し、加熱することではんだを溶融させ、側部がはんだで形成される封止部を形成する第2の工程と、前記第2の工程の後に前記パッケージ基板を個片化する第3の工程と、を含み、
前記第2の工程は、はんだシートを前記デバイスチップ上に供給し、かつ板状の金属層又は樹脂層を前記はんだシート上に供給し、前記金属層又は前記樹脂層の上から前記はんだシートを加熱・加圧し、前記第3の工程は前記パッケージ基板及び前記金属層又は前記樹脂層を個片化することを特徴とする電子部品の製造方法。 - 前記製造方法は前記第2の工程の前に、前記パッケージ基板の切断予定部に貫通穴を形成する第4の工程を含むことを特徴とする請求項1記載の電子部品の製造方法。
- 前記製造方法は前記第2の工程の後であって前記第3の工程の前に、隣り合うデバイスチップ間に形成されているはんだに溝を形成し、その後前記パッケージ基板に保護膜を形成することを特徴とする請求項1記載の電子部品の製造方法。
- 前記保護膜はCu又はNiからなることを特徴とする請求項3記載の電子部品の製造方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005056722A JP4456503B2 (ja) | 2004-12-24 | 2005-03-01 | 電子部品の製造方法 |
KR1020050120686A KR100695255B1 (ko) | 2004-12-24 | 2005-12-09 | 전자 부품 및 그 제조 방법 |
EP05257680A EP1675259A3 (en) | 2004-12-24 | 2005-12-14 | Electronic device and method of fabricating the same |
US11/314,007 US7816794B2 (en) | 2004-12-24 | 2005-12-22 | Electronic device and method of fabricating the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004374596 | 2004-12-24 | ||
JP2005056722A JP4456503B2 (ja) | 2004-12-24 | 2005-03-01 | 電子部品の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006203149A JP2006203149A (ja) | 2006-08-03 |
JP4456503B2 true JP4456503B2 (ja) | 2010-04-28 |
Family
ID=36095641
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005056722A Active JP4456503B2 (ja) | 2004-12-24 | 2005-03-01 | 電子部品の製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7816794B2 (ja) |
EP (1) | EP1675259A3 (ja) |
JP (1) | JP4456503B2 (ja) |
KR (1) | KR100695255B1 (ja) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5092526B2 (ja) * | 2007-04-24 | 2012-12-05 | パナソニック株式会社 | 弾性表面波デバイス |
JP4555369B2 (ja) * | 2008-08-13 | 2010-09-29 | 富士通メディアデバイス株式会社 | 電子部品モジュール及びその製造方法 |
JP5686943B2 (ja) | 2008-09-17 | 2015-03-18 | 太陽誘電株式会社 | 弾性波デバイス及びその製造方法 |
JP5583612B2 (ja) | 2011-01-31 | 2014-09-03 | 太陽誘電株式会社 | 分波器 |
JP2012182395A (ja) * | 2011-03-02 | 2012-09-20 | Taiyo Yuden Co Ltd | 電子デバイス |
WO2012144036A1 (ja) * | 2011-04-20 | 2012-10-26 | 太陽誘電株式会社 | デュープレクサ |
TWI578453B (zh) * | 2011-12-12 | 2017-04-11 | 鴻海精密工業股份有限公司 | 晶片封裝結構及其封裝方法 |
JP6116120B2 (ja) | 2012-01-24 | 2017-04-19 | 太陽誘電株式会社 | 弾性波デバイス及び弾性波デバイスの製造方法 |
WO2013146374A1 (ja) * | 2012-03-26 | 2013-10-03 | 株式会社村田製作所 | 弾性波装置及びその製造方法 |
JP6166525B2 (ja) | 2012-06-18 | 2017-07-19 | 太陽誘電株式会社 | 電子部品の製造方法 |
JP6315650B2 (ja) * | 2013-07-31 | 2018-04-25 | 太陽誘電株式会社 | 電子デバイス |
JP6374675B2 (ja) * | 2014-03-05 | 2018-08-15 | 太陽誘電株式会社 | 電子デバイス及びその製造方法 |
JP6284811B2 (ja) * | 2014-04-14 | 2018-02-28 | 太陽誘電株式会社 | 電子デバイス及びその製造方法 |
JP6310354B2 (ja) * | 2014-07-28 | 2018-04-11 | 太陽誘電株式会社 | 弾性波デバイス |
JP6407102B2 (ja) * | 2014-07-30 | 2018-10-17 | 太陽誘電株式会社 | 弾性波デバイス及びその製造方法 |
TWI621378B (zh) * | 2015-07-29 | 2018-04-11 | 乾坤科技股份有限公司 | 具有電磁屏蔽結構的電子模組及其製造方法 |
JP6433930B2 (ja) * | 2016-02-23 | 2018-12-05 | 太陽誘電株式会社 | 弾性波デバイス |
CN105958963B (zh) * | 2016-05-12 | 2019-03-26 | 锐迪科微电子(上海)有限公司 | 一种封装结构及其制造方法 |
JP6556105B2 (ja) | 2016-07-28 | 2019-08-07 | 太陽誘電株式会社 | 電子デバイスの製造方法 |
JP2018074051A (ja) * | 2016-11-01 | 2018-05-10 | 太陽誘電株式会社 | 電子部品およびその製造方法 |
JP6144440B1 (ja) | 2017-01-27 | 2017-06-07 | 有限会社 ナプラ | 半導体封止用プリフォーム |
JP6156965B1 (ja) * | 2017-03-31 | 2017-07-05 | 有限会社 ナプラ | 半導体封止用プリフォーム |
JP6865340B2 (ja) * | 2017-03-31 | 2021-04-28 | ナガセケムテックス株式会社 | 実装構造体の製造方法およびこれに用いられる積層シート |
CN113675101B (zh) * | 2021-10-20 | 2021-12-21 | 深圳新声半导体有限公司 | 用于芯片封装的方法和芯片颗粒 |
CN115425938A (zh) * | 2022-09-28 | 2022-12-02 | 天通瑞宏科技有限公司 | 高可靠性csp封装方法和声表面波滤波器 |
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JP3152834B2 (ja) * | 1993-06-24 | 2001-04-03 | 株式会社東芝 | 電子回路装置 |
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JPH0818390A (ja) * | 1994-07-01 | 1996-01-19 | Kokusai Electric Co Ltd | 弾性表面波装置 |
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JP2004207674A (ja) * | 2002-10-30 | 2004-07-22 | Kyocera Corp | 電子部品装置の製造方法 |
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JP2005095977A (ja) * | 2003-08-26 | 2005-04-14 | Sanyo Electric Co Ltd | 回路装置 |
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-
2005
- 2005-03-01 JP JP2005056722A patent/JP4456503B2/ja active Active
- 2005-12-09 KR KR1020050120686A patent/KR100695255B1/ko active IP Right Grant
- 2005-12-14 EP EP05257680A patent/EP1675259A3/en not_active Withdrawn
- 2005-12-22 US US11/314,007 patent/US7816794B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20060138672A1 (en) | 2006-06-29 |
KR100695255B1 (ko) | 2007-03-14 |
US7816794B2 (en) | 2010-10-19 |
KR20060073453A (ko) | 2006-06-28 |
JP2006203149A (ja) | 2006-08-03 |
EP1675259A3 (en) | 2012-05-02 |
EP1675259A2 (en) | 2006-06-28 |
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