JP4432728B2 - 真空処理装置 - Google Patents
真空処理装置 Download PDFInfo
- Publication number
- JP4432728B2 JP4432728B2 JP2004315095A JP2004315095A JP4432728B2 JP 4432728 B2 JP4432728 B2 JP 4432728B2 JP 2004315095 A JP2004315095 A JP 2004315095A JP 2004315095 A JP2004315095 A JP 2004315095A JP 4432728 B2 JP4432728 B2 JP 4432728B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- vacuum processing
- lid member
- upper lid
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
Description
(2)請求項2の発明による真空処理装置は、請求項1の真空処理装置において、蓋部材は、矩形状平板であり、回転軸は、蓋部材の側面の中心軸心に一致しており、蓋部材の回転角度は、180°であることが好ましい。
(3)請求項3の発明による真空処理装置は、請求項1または2の真空処理装置において、被処理基板を真空容器へ投入するとともに、被処理基板を真空容器から処理済みの基板として回収する、大気開放と真空密閉とを切り換え可能な受け渡し室をさらに備えることを特徴とする。
図1は、本発明の実施の形態による真空処理装置の構成を模式的に示す全体構成図であり、図2は、真空処理装置の主要部の外観を模式的に示す斜視図である。図3は、本発明の実施の形態による真空処理装置における蓋部材(上蓋30)の動作を説明する模式図である。図1〜3においては、同じ構成部品には同一符号を付し、XYZ直交座標で方向を表す。
11:搬送ロボット
20:プラズマ処理室
20a:真空容器
21:ヒータ
30:上蓋
31a,31b:真空処理用機器
32a,32b:回転軸
40:昇降機構
41:モータ
42:マイタギアボックス
43:ネジシャッキ
50:回転機構
51:ウォーム減速機付きモータ
52:回転軸
53,54:軸受部
60:昇降フレーム
100:真空処理装置
A:開口部
G1,G2:ゲート
M:昇降動作
R:回転動作
W:基板
x1〜x4:移送動作(動作)
Claims (3)
- 被処理基板を真空処理する真空容器と、
前記真空容器の開口部を開閉する蓋部材と、
前記蓋部材を前記真空容器に対して着脱自在に並進移動させる昇降機構と、
前記蓋部材に連結された回転軸を回転することにより、前記蓋部材の表裏を反転させる回転機構とを備え、
前記蓋部材の表裏両面には、同一の真空処理用機器が表裏対称に配置されていることを特徴とする真空処理装置。 - 請求項1に記載の真空処理装置において、
前記蓋部材は、矩形状平板であり、
前記回転軸は、前記蓋部材の側面の中心軸心に一致しており、
前記蓋部材の回転角度は、180°であることを特徴とする真空処理装置。 - 請求項1または2に記載の真空処理装置において、
前記被処理基板を前記真空容器へ投入するとともに、前記被処理基板を前記真空容器から処理済みの基板として回収する、大気開放と真空密閉とを切り換え可能な受け渡し室をさらに備えることを特徴とする真空処理装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004315095A JP4432728B2 (ja) | 2004-10-29 | 2004-10-29 | 真空処理装置 |
KR1020050074172A KR100629805B1 (ko) | 2004-10-29 | 2005-08-12 | 진공 처리 장치 |
TW094127686A TWI298910B (en) | 2004-10-29 | 2005-08-15 | Vacuum processing equipment |
CNB2005100907927A CN100382237C (zh) | 2004-10-29 | 2005-08-16 | 真空处理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004315095A JP4432728B2 (ja) | 2004-10-29 | 2004-10-29 | 真空処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006122825A JP2006122825A (ja) | 2006-05-18 |
JP4432728B2 true JP4432728B2 (ja) | 2010-03-17 |
Family
ID=36718062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004315095A Expired - Fee Related JP4432728B2 (ja) | 2004-10-29 | 2004-10-29 | 真空処理装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4432728B2 (ja) |
KR (1) | KR100629805B1 (ja) |
CN (1) | CN100382237C (ja) |
TW (1) | TWI298910B (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100790797B1 (ko) * | 2006-06-08 | 2008-01-02 | 주식회사 아이피에스 | 진공처리장치 |
JP5196474B2 (ja) * | 2008-01-29 | 2013-05-15 | サムコ株式会社 | 薄膜製造装置 |
KR101066033B1 (ko) * | 2009-07-28 | 2011-09-20 | 엘아이지에이디피 주식회사 | 화학기상 증착장치 및 기판 처리장치 |
JP5595202B2 (ja) * | 2010-09-28 | 2014-09-24 | 東京エレクトロン株式会社 | 処理装置およびそのメンテナンス方法 |
JP6293499B2 (ja) * | 2014-01-27 | 2018-03-14 | 株式会社日立ハイテクノロジーズ | 真空処理装置 |
CN103818861A (zh) * | 2014-03-12 | 2014-05-28 | 合肥彩虹蓝光科技有限公司 | 一种反应室腔体上盖起降系统 |
JP5941943B2 (ja) * | 2014-05-08 | 2016-06-29 | ワイエイシイ株式会社 | 蓋体開閉装置およびマルチチャンバー処理システム |
TWI596692B (zh) * | 2016-06-08 | 2017-08-21 | 漢民科技股份有限公司 | 應用於半導體設備之組裝裝置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1050798A (ja) * | 1996-08-02 | 1998-02-20 | Kokusai Electric Co Ltd | 真空処理装置のロードロック室 |
JPH10237653A (ja) * | 1997-02-26 | 1998-09-08 | Ulvac Japan Ltd | 真空処理装置 |
JP3076775B2 (ja) * | 1997-07-31 | 2000-08-14 | 芝浦メカトロニクス株式会社 | 真空処理装置 |
JP3527450B2 (ja) * | 1999-12-22 | 2004-05-17 | 東京エレクトロン株式会社 | 処理装置 |
JP2002164685A (ja) * | 2000-11-29 | 2002-06-07 | Matsushita Electric Ind Co Ltd | 真空処理装置と電磁シールド装置及び傾斜コイルばね |
-
2004
- 2004-10-29 JP JP2004315095A patent/JP4432728B2/ja not_active Expired - Fee Related
-
2005
- 2005-08-12 KR KR1020050074172A patent/KR100629805B1/ko not_active IP Right Cessation
- 2005-08-15 TW TW094127686A patent/TWI298910B/zh not_active IP Right Cessation
- 2005-08-16 CN CNB2005100907927A patent/CN100382237C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100629805B1 (ko) | 2006-09-28 |
KR20060050432A (ko) | 2006-05-19 |
JP2006122825A (ja) | 2006-05-18 |
CN1767145A (zh) | 2006-05-03 |
TWI298910B (en) | 2008-07-11 |
CN100382237C (zh) | 2008-04-16 |
TW200614370A (en) | 2006-05-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6095741A (en) | Dual sided slot valve and method for implementing the same | |
TW486554B (en) | Single shaft, dual blade vacuum slot valve and method for implementing the same | |
KR100629805B1 (ko) | 진공 처리 장치 | |
JP4010314B2 (ja) | ゲートバルブ装置、処理システム及びシール部材の交換方法 | |
US7628574B2 (en) | Apparatus and method for processing substrates using one or more vacuum transfer chamber units | |
TW382740B (en) | Three chamber load lock apparatus | |
JP2001185534A (ja) | 真空処理装置 | |
JP2007067218A (ja) | 基板処理装置および基板処理システム | |
JP2017139274A (ja) | 基板収納容器の連結機構および連結方法 | |
JP5482500B2 (ja) | 基板処理装置 | |
JP2007073540A (ja) | 基板処理装置、ロードロック室ユニット、および搬送装置の搬出方法 | |
US9145611B2 (en) | Load lock chamber with slit valve doors | |
JP2003503844A (ja) | 処理モジュールの隔離能力を有した半導体処理プラットホーム構造 | |
TW201526140A (zh) | 閘閥及基板處理裝置 | |
JP5351317B2 (ja) | 基板処理装置 | |
JP5595202B2 (ja) | 処理装置およびそのメンテナンス方法 | |
JP2010034505A (ja) | 積層ロードロックチャンバおよびそれを備えた基板処理装置 | |
JP3604241B2 (ja) | 縦型熱処理装置 | |
JP2000150613A (ja) | 被処理体の搬送装置 | |
WO2001020663A1 (fr) | Dispositif de traitement par le vide | |
US8545158B2 (en) | Loading unit and processing system | |
JPH10303099A (ja) | 基板処理装置 | |
JP4570852B2 (ja) | 半導体製造装置 | |
JP5481079B2 (ja) | ゲートバルブ及びゲートバルブの開閉方法 | |
JP3071517B2 (ja) | ゲートバルブ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061211 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090908 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091106 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20091201 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20091214 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 4432728 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130108 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140108 Year of fee payment: 4 |
|
LAPS | Cancellation because of no payment of annual fees |