JP4425688B2 - めっきターミネーション - Google Patents
めっきターミネーション Download PDFInfo
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- JP4425688B2 JP4425688B2 JP2004114450A JP2004114450A JP4425688B2 JP 4425688 B2 JP4425688 B2 JP 4425688B2 JP 2004114450 A JP2004114450 A JP 2004114450A JP 2004114450 A JP2004114450 A JP 2004114450A JP 4425688 B2 JP4425688 B2 JP 4425688B2
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- Prior art keywords
- termination
- exposed
- electrode
- plating
- multilayer
- Prior art date
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- Expired - Lifetime
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- 238000007747 plating Methods 0.000 title description 137
- 238000000034 method Methods 0.000 abstract description 76
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 55
- 239000000463 material Substances 0.000 abstract description 51
- 239000000919 ceramic Substances 0.000 abstract description 27
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 26
- 239000010949 copper Substances 0.000 abstract description 26
- 229910052759 nickel Inorganic materials 0.000 abstract description 26
- 229910052802 copper Inorganic materials 0.000 abstract description 24
- 239000000758 substrate Substances 0.000 abstract description 13
- 239000010410 layer Substances 0.000 description 289
- 239000003990 capacitor Substances 0.000 description 142
- 238000005516 engineering process Methods 0.000 description 38
- 229910052751 metal Inorganic materials 0.000 description 18
- 239000002184 metal Substances 0.000 description 18
- 239000010408 film Substances 0.000 description 16
- 238000007772 electroless plating Methods 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 13
- 229910000679 solder Inorganic materials 0.000 description 13
- 239000004020 conductor Substances 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 238000009713 electroplating Methods 0.000 description 10
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 9
- 230000004913 activation Effects 0.000 description 9
- 238000001465 metallisation Methods 0.000 description 9
- 239000011135 tin Substances 0.000 description 9
- 230000008901 benefit Effects 0.000 description 8
- 229910052718 tin Inorganic materials 0.000 description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000013461 design Methods 0.000 description 6
- 238000013019 agitation Methods 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 238000000137 annealing Methods 0.000 description 5
- 238000003491 array Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000001965 increasing effect Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000006911 nucleation Effects 0.000 description 5
- 238000010899 nucleation Methods 0.000 description 5
- 238000005498 polishing Methods 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 125000002524 organometallic group Chemical group 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
- 239000003985 ceramic capacitor Substances 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910000480 nickel oxide Inorganic materials 0.000 description 2
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/228—Terminals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C1/00—Details
- H01C1/14—Terminals or tapping points or electrodes specially adapted for resistors; Arrangements of terminals or tapping points or electrodes on resistors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1605—Process or apparatus coating on selected surface areas by masking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/008—Thermistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/10—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material voltage responsive, i.e. varistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/228—Terminals
- H01G4/232—Terminals electrically connecting two or more layers of a stacked or rolled capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
Description
104a、104b 電極タブ
106a、106b アンカータブ
108 デバイス
109 アセンブリ
111a、111a′、111b、111b′ ターミネーション
150、152 電極層
154 矩形のタブ
155 矩形のベース部分
154 角部タブ
156 多層デバイス
161a、161b、163a、163b 角部ターミネーション
162、164 電極プレート
166、168 稜
170 多層デバイス
172 アンカータブ
174 ランド
176、178 電極層
180 多層デバイス
181、182 導電部
186、188 側部
190 端部ターミネーション
192、194、196 アンカータブ
198 共通の電極層
200 アクティブ電極層
204 導電部
206 ブリッジ部分
208 多層デバイス
210a、210b 端部ターミネーション
212、214 電極層
217、220、230、270 アンカータブ
218 カバー層
224 ランド
260 導電部
Claims (2)
- 側部を有する複数の誘電層と、
前記複数の誘電層のうちの選択された誘電層の間にインタリーブされた複数の内部電極要素であって、該複数の内部電極要素の選択された部分が前記複数の誘電層の少なくとも1つの側部に露出し、前記電極要素と前記誘電層をインタリーブした組合せが、頂面および底面を有するモノリシックアセンブリを形成する複数の内部電極要素と、
前記複数の誘電層のうちの選択された誘電層とインタリーブされ、前記複数の誘電層の側部に露出する複数の内部アンカータブと
を備え、
前記複数の内部電極要素の露出部分と、前記複数の内部アンカータブの露出部分とは、前記多層電子コンポーネントの側部に1つ以上の列で整列し、
所与の列に整列している前記内部電極要素の各露出部分と、前記内部アンカータブの各露出部分とはそれぞれ、前記所与の列に整列している前記内部電極要素の前記露出部分および前記内部アンカータブの前記露出部分のうちの少なくとも1つから約8ミクロン未満の距離で前記多層電子コンポーネントの側部に露出しており、
前記モノリシックアセンブリの前記頂面と底面とが側部と出会う稜部は、全体に丸められ、
隣接する前記内部アンカータブの露出部分間の距離は、前記モノリシックアセンブリの内部よりも、前記モノリシックアセンブリの前記頂面および前記底面に向かって、より近接していることを特徴とする多層電子コンポーネント。 - 縁部を有する複数の第1誘電層と、
該複数の第1誘電層とインタリーブされた複数の内部電極要素であって、前記複数の第1誘電層の少なくとも1つの側部において露出し、前記内部電極要素と前記第1誘電層のインタリーブされた組合せが、頂面と底面を有するアクティブアセンブリを形成する内部電極要素と、
縁部を有する第2誘電層であって、前記アクティブアセンブリの頂面と底面に設けられて、少なくとも1層の多層電子コンポーネント用のカバー層を形成する複数の第2誘電層であり、前記アクティブアセンブリと前記少なくとも1層のカバー層が、頂面と底面を有するモノリシック素子アセンブリを形成する第2誘電層と、
前記第1誘電層および前記第2誘電層とインタリーブされ、側部において露出する複数の内部アンカータブと
を備えた多層電子コンポーネントであって、
前記複数の内部電極要素の露出部分と前記複数の内部アンカータブの露出部分は、前記多層電子コンポーネントの側部において1つ以上の列で整列し、
所与の列に整列した、前記内部電極要素の各露出部分および前記内部アンカータブの各露出部分は、前記多層電子コンポーネントの側部に露出する前記所与の列中の露出した前記内部電極要素および前記内部アンカータブの露出部分のうちの少なくとも1つから約8ミクロン未満の距離で、前記多層電子コンポーネントの側部に露出しており、
前記モノリシックアセンブリの前記頂面と底面がデバイスの側部と接する稜は、全体に丸められ、
隣接する内部アンカータブの露出部分間の距離は、前記モノリシック素子アセンブリの内部よりも、前記モノリシック素子アセンブリの前記頂面と底面に向かって、より近接していることを特徴とする多層電子コンポーネント。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/409,023 US7152291B2 (en) | 2002-04-15 | 2003-04-08 | Method for forming plated terminations |
US10/632,514 US6960366B2 (en) | 2002-04-15 | 2003-08-01 | Plated terminations |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004327983A JP2004327983A (ja) | 2004-11-18 |
JP4425688B2 true JP4425688B2 (ja) | 2010-03-03 |
Family
ID=46205142
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004113445A Pending JP2004312023A (ja) | 2003-04-08 | 2004-04-07 | めっきターミネーション |
JP2004114450A Expired - Lifetime JP4425688B2 (ja) | 2003-04-08 | 2004-04-08 | めっきターミネーション |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004113445A Pending JP2004312023A (ja) | 2003-04-08 | 2004-04-07 | めっきターミネーション |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP2004312023A (ja) |
KR (1) | KR20040087934A (ja) |
CN (1) | CN1540692B (ja) |
GB (1) | GB2400493B (ja) |
TW (1) | TWI368923B (ja) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7576968B2 (en) * | 2002-04-15 | 2009-08-18 | Avx Corporation | Plated terminations and method of forming using electrolytic plating |
JP2006147901A (ja) * | 2004-11-22 | 2006-06-08 | Murata Mfg Co Ltd | 積層電子部品、その製造方法およびその特性測定方法 |
JP2006253371A (ja) * | 2005-03-10 | 2006-09-21 | Tdk Corp | 多端子型積層コンデンサ及びその製造方法 |
JP4539440B2 (ja) * | 2005-06-01 | 2010-09-08 | 株式会社村田製作所 | 積層コンデンサの実装構造 |
US7414857B2 (en) * | 2005-10-31 | 2008-08-19 | Avx Corporation | Multilayer ceramic capacitor with internal current cancellation and bottom terminals |
WO2007116566A1 (ja) * | 2006-04-07 | 2007-10-18 | Murata Manufacturing Co., Ltd. | コンデンサ |
US20090154056A1 (en) * | 2007-12-17 | 2009-06-18 | General Electric Company | Low inductance capacitor and method of manufacturing same |
JP5239731B2 (ja) * | 2007-12-21 | 2013-07-17 | 株式会社村田製作所 | 積層セラミック電子部品およびその製造方法 |
US8194391B2 (en) | 2007-12-21 | 2012-06-05 | Murata Manufacturing Co., Ltd. | Multilayer ceramic electronic component and manufacturing method thereof |
JP4743222B2 (ja) * | 2008-04-25 | 2011-08-10 | ソニー株式会社 | 可変容量素子及び、電子機器 |
JP5217677B2 (ja) | 2008-06-20 | 2013-06-19 | 株式会社村田製作所 | 積層セラミック電子部品およびその製造方法 |
JP5282634B2 (ja) | 2008-06-25 | 2013-09-04 | 株式会社村田製作所 | 積層セラミック電子部品およびその製造方法 |
JP5217692B2 (ja) | 2008-07-02 | 2013-06-19 | 株式会社村田製作所 | 積層セラミック電子部品 |
JP5347350B2 (ja) | 2008-07-02 | 2013-11-20 | 株式会社村田製作所 | 積層型電子部品の製造方法 |
JP2010118499A (ja) | 2008-11-13 | 2010-05-27 | Murata Mfg Co Ltd | 積層セラミック電子部品 |
KR101069989B1 (ko) | 2009-09-10 | 2011-10-04 | 삼성전기주식회사 | 적층형 칩 커패시터 및 회로 기판 장치 |
JP2012156315A (ja) | 2011-01-26 | 2012-08-16 | Murata Mfg Co Ltd | 積層セラミック電子部品 |
JP2012253245A (ja) * | 2011-06-03 | 2012-12-20 | Tdk Corp | 積層電子部品及び積層電子部品の製造方法 |
JP2013021300A (ja) | 2011-06-16 | 2013-01-31 | Murata Mfg Co Ltd | 積層セラミック電子部品 |
JP2013021299A (ja) | 2011-06-16 | 2013-01-31 | Murata Mfg Co Ltd | 積層セラミック電子部品 |
JP2013051392A (ja) | 2011-08-02 | 2013-03-14 | Murata Mfg Co Ltd | 積層セラミック電子部品 |
JP5794222B2 (ja) | 2012-02-03 | 2015-10-14 | 株式会社村田製作所 | セラミック電子部品 |
JP5799948B2 (ja) | 2012-02-03 | 2015-10-28 | 株式会社村田製作所 | セラミック電子部品及びその製造方法 |
JP5796568B2 (ja) | 2012-02-03 | 2015-10-21 | 株式会社村田製作所 | セラミック電子部品 |
JP5971236B2 (ja) | 2013-03-26 | 2016-08-17 | 株式会社村田製作所 | セラミック電子部品及びガラスペースト |
KR102004781B1 (ko) * | 2014-01-27 | 2019-07-29 | 삼성전기주식회사 | 적층 세라믹 커패시터 및 그 실장 기판 |
JP6241541B2 (ja) | 2014-03-27 | 2017-12-06 | 株式会社村田製作所 | 電子部品 |
WO2016186053A1 (ja) | 2015-05-21 | 2016-11-24 | 株式会社村田製作所 | 電子部品 |
CN107731524A (zh) * | 2016-08-10 | 2018-02-23 | 钰邦电子(无锡)有限公司 | 薄膜电容器及其制作方法 |
CN107768142A (zh) * | 2016-08-19 | 2018-03-06 | 钰邦电子(无锡)有限公司 | 用于提升介电常数的薄膜电容器及其制作方法 |
CN106960882B (zh) * | 2017-03-20 | 2018-06-15 | 河北盛平电子科技有限公司 | 一种表面金属化陶瓷立方体和制作方法 |
MX2021000770A (es) * | 2018-07-26 | 2021-03-29 | Ihi Corp | Metodo de union de miembros metalicos y cuerpo unido de miembros metalicos. |
RU194681U1 (ru) * | 2019-09-02 | 2019-12-19 | Российская Федерация, от имени которой выступает Министерство обороны Российской Федерации | Высоковольтный конденсатор |
JP2022085502A (ja) | 2020-11-27 | 2022-06-08 | 株式会社村田製作所 | 積層セラミックコンデンサ |
KR20220081632A (ko) * | 2020-12-09 | 2022-06-16 | 삼성전기주식회사 | 적층형 전자 부품 |
JP7400758B2 (ja) | 2021-03-16 | 2023-12-19 | 株式会社村田製作所 | 積層セラミックコンデンサ |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4064606A (en) * | 1975-07-14 | 1977-12-27 | Trw Inc. | Method for making multi-layer capacitors |
US4811162A (en) * | 1987-04-27 | 1989-03-07 | Engelhard Corporation | Capacitor end termination composition and method of terminating |
JP2531019B2 (ja) * | 1988-05-20 | 1996-09-04 | 株式会社村田製作所 | 正の抵抗温度特性を有する半導体磁器 |
US4831494A (en) * | 1988-06-27 | 1989-05-16 | International Business Machines Corporation | Multilayer capacitor |
JPH02294007A (ja) * | 1989-05-08 | 1990-12-05 | Tdk Corp | セラミック電子部品の電極形成方法 |
US5576053A (en) * | 1993-05-11 | 1996-11-19 | Murata Manufacturing Co., Ltd. | Method for forming an electrode on an electronic part |
JPH09129476A (ja) * | 1995-10-30 | 1997-05-16 | Murata Mfg Co Ltd | セラミック電子部品 |
JP2001155953A (ja) * | 1999-11-26 | 2001-06-08 | Tdk Corp | 三次元搭載用多端子積層セラミックコンデンサ |
JP2001167969A (ja) * | 1999-12-06 | 2001-06-22 | Tdk Corp | 三次元搭載用多端子積層セラミックコンデンサ |
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GB0405993D0 (en) | 2004-04-21 |
CN1540692B (zh) | 2011-04-27 |
JP2004327983A (ja) | 2004-11-18 |
GB2400493B (en) | 2005-11-09 |
GB2400493A (en) | 2004-10-13 |
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