JP4411100B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4411100B2
JP4411100B2 JP2004040977A JP2004040977A JP4411100B2 JP 4411100 B2 JP4411100 B2 JP 4411100B2 JP 2004040977 A JP2004040977 A JP 2004040977A JP 2004040977 A JP2004040977 A JP 2004040977A JP 4411100 B2 JP4411100 B2 JP 4411100B2
Authority
JP
Japan
Prior art keywords
original
contact
holding
reticle
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004040977A
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English (en)
Japanese (ja)
Other versions
JP2005235890A5 (enExample
JP2005235890A (ja
Inventor
義一 宮島
康裕 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004040977A priority Critical patent/JP4411100B2/ja
Priority to US11/059,331 priority patent/US7307698B2/en
Publication of JP2005235890A publication Critical patent/JP2005235890A/ja
Publication of JP2005235890A5 publication Critical patent/JP2005235890A5/ja
Application granted granted Critical
Publication of JP4411100B2 publication Critical patent/JP4411100B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2004040977A 2004-02-18 2004-02-18 露光装置 Expired - Fee Related JP4411100B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004040977A JP4411100B2 (ja) 2004-02-18 2004-02-18 露光装置
US11/059,331 US7307698B2 (en) 2004-02-18 2005-02-17 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004040977A JP4411100B2 (ja) 2004-02-18 2004-02-18 露光装置

Publications (3)

Publication Number Publication Date
JP2005235890A JP2005235890A (ja) 2005-09-02
JP2005235890A5 JP2005235890A5 (enExample) 2008-11-20
JP4411100B2 true JP4411100B2 (ja) 2010-02-10

Family

ID=34857908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004040977A Expired - Fee Related JP4411100B2 (ja) 2004-02-18 2004-02-18 露光装置

Country Status (2)

Country Link
US (1) US7307698B2 (enExample)
JP (1) JP4411100B2 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP2006120798A (ja) * 2004-10-20 2006-05-11 Canon Inc 露光装置
JP2006261156A (ja) * 2005-03-15 2006-09-28 Canon Inc 原版保持装置およびそれを用いた露光装置
US7352438B2 (en) * 2006-02-14 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070268476A1 (en) * 2006-05-19 2007-11-22 Nikon Corporation Kinematic chucks for reticles and other planar bodies
JPWO2007135998A1 (ja) * 2006-05-24 2009-10-01 株式会社ニコン 保持装置及び露光装置
US7869003B2 (en) 2006-07-12 2011-01-11 Asml Holding Nv Lithographic apparatus and device manufacturing method with reticle gripper
JP5013941B2 (ja) * 2007-04-19 2012-08-29 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
JP2011023425A (ja) 2009-07-13 2011-02-03 Canon Inc ステージ装置、露光装置及びデバイス製造方法
DE102009037939A1 (de) * 2009-08-19 2011-06-30 ERS electronic GmbH, 82110 Verfahren und Vorrichtung zur Bestimmung der Durchbiegung eines scheibenförmigen Werkstücks
NL2006190A (en) * 2010-03-11 2011-09-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US20130250271A1 (en) * 2012-02-17 2013-09-26 Nikon Corporation Stage assembly with secure device holder
NL2020281A (en) 2017-02-10 2018-08-22 Asml Holding Nv Reticle clamping device
US11289355B2 (en) 2017-06-02 2022-03-29 Lam Research Corporation Electrostatic chuck for use in semiconductor processing
US11469084B2 (en) 2017-09-05 2022-10-11 Lam Research Corporation High temperature RF connection with integral thermal choke
KR102595728B1 (ko) * 2017-12-28 2023-10-27 온투 이노베이션 아이엔씨. 순응형 스테이지
US11183368B2 (en) 2018-08-02 2021-11-23 Lam Research Corporation RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks
CN115803684A (zh) * 2020-06-15 2023-03-14 株式会社尼康 台装置、曝光装置、平板显示器的制造方法及元件制造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62100753A (ja) * 1985-10-29 1987-05-11 Canon Inc 多点支持レチクルチヤツク
JP2750554B2 (ja) * 1992-03-31 1998-05-13 日本電信電話株式会社 真空吸着装置
JPH07136885A (ja) * 1993-06-30 1995-05-30 Toshiba Corp 真空チャック
JPH07326566A (ja) 1994-05-31 1995-12-12 Nikon Corp マスク支持台
JP3372127B2 (ja) * 1994-11-18 2003-01-27 日本電信電話株式会社 真空吸着装置
JPH08167553A (ja) 1994-12-14 1996-06-25 Toshiba Mach Co Ltd 被処理材の固定装置
JP3708984B2 (ja) 1995-04-17 2005-10-19 東芝機械株式会社 被処理材の固定装置
JP3483452B2 (ja) 1998-02-04 2004-01-06 キヤノン株式会社 ステージ装置および露光装置、ならびにデバイス製造方法
JP3810039B2 (ja) 1998-05-06 2006-08-16 キヤノン株式会社 ステージ装置
US6196532B1 (en) * 1999-08-27 2001-03-06 Applied Materials, Inc. 3 point vacuum chuck with non-resilient support members
JP2001332480A (ja) * 2000-05-24 2001-11-30 Canon Inc 原版チャック、該原版チャックを備えた露光装置および半導体デバイス製造方法
JP4196675B2 (ja) * 2001-02-13 2008-12-17 株式会社ニコン 保持装置、保持方法、露光装置、およびデバイス製造方法
US6801301B2 (en) 2001-10-12 2004-10-05 Canon Kabushiki Kaisha Exposure apparatus
TW200303593A (en) * 2002-02-19 2003-09-01 Olympus Optical Co Substrate sucking apparatus
JP3826118B2 (ja) 2003-07-08 2006-09-27 キヤノン株式会社 露光装置
US7119884B2 (en) * 2003-12-24 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US7307698B2 (en) 2007-12-11
JP2005235890A (ja) 2005-09-02
US20050185166A1 (en) 2005-08-25

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